CN101981223B - 真空蒸镀装置以及温度调节方法 - Google Patents

真空蒸镀装置以及温度调节方法 Download PDF

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Publication number
CN101981223B
CN101981223B CN200980111673.1A CN200980111673A CN101981223B CN 101981223 B CN101981223 B CN 101981223B CN 200980111673 A CN200980111673 A CN 200980111673A CN 101981223 B CN101981223 B CN 101981223B
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China
Prior art keywords
crucible
deposition material
deposition apparatus
vacuum
vacuum chamber
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Expired - Fee Related
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CN200980111673.1A
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English (en)
Chinese (zh)
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CN101981223A (zh
Inventor
平野竜也
小林敏郎
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Mitsubishi Heavy Industries Ltd
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Mitsubishi Heavy Industries Ltd
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Publication of CN101981223A publication Critical patent/CN101981223A/zh
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    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/243—Crucibles for source material
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/12—Organic material

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  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Electroluminescent Light Sources (AREA)
CN200980111673.1A 2008-12-24 2009-09-24 真空蒸镀装置以及温度调节方法 Expired - Fee Related CN101981223B (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2008327518A JP4468474B1 (ja) 2008-12-24 2008-12-24 真空蒸着装置及び温度調整方法
JP327518/08 2008-12-24
PCT/JP2009/004811 WO2010073438A1 (ja) 2008-12-24 2009-09-24 真空蒸着装置及び温度調整方法

Publications (2)

Publication Number Publication Date
CN101981223A CN101981223A (zh) 2011-02-23
CN101981223B true CN101981223B (zh) 2013-05-22

Family

ID=42287103

Family Applications (1)

Application Number Title Priority Date Filing Date
CN200980111673.1A Expired - Fee Related CN101981223B (zh) 2008-12-24 2009-09-24 真空蒸镀装置以及温度调节方法

Country Status (5)

Country Link
JP (1) JP4468474B1 (ja)
KR (1) KR101255424B1 (ja)
CN (1) CN101981223B (ja)
TW (1) TWI379914B (ja)
WO (1) WO2010073438A1 (ja)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN103866239A (zh) * 2012-12-18 2014-06-18 北京汉能创昱科技有限公司 一种线性蒸发源装置
JPWO2014174803A1 (ja) * 2013-04-22 2017-02-23 株式会社Ｊｏｌｅｄ Ｅｌ表示装置の製造方法
TWI485276B (zh) * 2013-12-05 2015-05-21 Nat Inst Chung Shan Science & Technology 提升硒化物薄膜成長品質之蒸鍍裝置
CN105276980B (zh) * 2014-05-28 2017-11-03 国核华清（北京）核电技术研发中心有限公司 陶瓷坩埚
CN104078626B (zh) * 2014-07-22 2016-07-06 深圳市华星光电技术有限公司 用于oled材料蒸镀的加热装置
WO2017195674A1 (ja) * 2016-05-13 2017-11-16 株式会社アルバック 有機薄膜製造装置、有機薄膜製造方法
WO2018024510A1 (en) * 2016-08-05 2018-02-08 Flisom Ag Homogeneous linear evaporation source with heater
WO2019235118A1 (ja) * 2018-06-08 2019-12-12 株式会社アルバック 真空蒸着装置用の蒸着源

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1807677A (zh) * 2005-01-21 2006-07-26 三菱重工业株式会社 真空蒸汽沉积设备
CN101182627A (zh) * 2006-11-16 2008-05-21 财团法人山形县产业技术振兴机构 蒸发源以及使用该蒸发源的真空蒸镀装置

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4696710B2 (ja) * 2005-06-15 2011-06-08 ソニー株式会社 蒸着成膜装置および蒸着源
KR100645688B1 (ko) * 2005-08-30 2006-11-14 삼성에스디아이 주식회사 증착장치의 히터 및 이를 채용한 증발원
JP2008208443A (ja) * 2007-02-28 2008-09-11 Sony Corp 蒸着成膜装置、蒸着成膜方法、および表示装置の製造方法
JP2008240015A (ja) * 2007-03-26 2008-10-09 Seiko Epson Corp マスク蒸着法

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1807677A (zh) * 2005-01-21 2006-07-26 三菱重工业株式会社 真空蒸汽沉积设备
CN101182627A (zh) * 2006-11-16 2008-05-21 财团法人山形县产业技术振兴机构 蒸发源以及使用该蒸发源的真空蒸镀装置

Non-Patent Citations (2)

* Cited by examiner, † Cited by third party
Title
JP特开2006-348337A 2006.12.28
JP特开2008-240015A 2008.10.09

Also Published As

Publication number Publication date
WO2010073438A1 (ja) 2010-07-01
JP4468474B1 (ja) 2010-05-26
KR20100116227A (ko) 2010-10-29
JP2010150577A (ja) 2010-07-08
CN101981223A (zh) 2011-02-23
TW201024438A (en) 2010-07-01
KR101255424B1 (ko) 2013-04-17
TWI379914B (en) 2012-12-21

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