CN101910942B - 复制母模的方法 - Google Patents

复制母模的方法 Download PDF

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Publication number
CN101910942B
CN101910942B CN2008801226192A CN200880122619A CN101910942B CN 101910942 B CN101910942 B CN 101910942B CN 2008801226192 A CN2008801226192 A CN 2008801226192A CN 200880122619 A CN200880122619 A CN 200880122619A CN 101910942 B CN101910942 B CN 101910942B
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CN
China
Prior art keywords
mold
layer
ductile metal
nickel
master mold
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Expired - Fee Related
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CN2008801226192A
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English (en)
Chinese (zh)
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CN101910942A (zh
Inventor
张俊颖
特里·L·史密斯
张海燕
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3M Innovative Properties Co
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3M Innovative Properties Co
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Publication of CN101910942A publication Critical patent/CN101910942A/zh
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y40/00—Manufacture or treatment of nanostructures

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  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Nanotechnology (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Mathematical Physics (AREA)
  • Theoretical Computer Science (AREA)
  • Moulds For Moulding Plastics Or The Like (AREA)
  • Shaping Of Tube Ends By Bending Or Straightening (AREA)
CN2008801226192A 2007-11-01 2008-10-31 复制母模的方法 Expired - Fee Related CN101910942B (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US98461607P 2007-11-01 2007-11-01
US60/984,616 2007-11-01
PCT/US2008/081928 WO2009059089A1 (en) 2007-11-01 2008-10-31 Method for replicating master molds

Publications (2)

Publication Number Publication Date
CN101910942A CN101910942A (zh) 2010-12-08
CN101910942B true CN101910942B (zh) 2013-11-20

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ID=40239632

Family Applications (1)

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CN2008801226192A Expired - Fee Related CN101910942B (zh) 2007-11-01 2008-10-31 复制母模的方法

Country Status (5)

Country Link
US (1) US20110104321A1 (https=)
EP (1) EP2212745A1 (https=)
JP (1) JP5551602B2 (https=)
CN (1) CN101910942B (https=)
WO (1) WO2009059089A1 (https=)

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KR20130091313A (ko) * 2010-07-12 2013-08-16 아사히 가라스 가부시키가이샤 임프린트 몰드용 TiO₂함유 석영 유리 기재 및 그 제조 방법
US8816211B2 (en) * 2011-02-14 2014-08-26 Eastman Kodak Company Articles with photocurable and photocured compositions
CN102193126B (zh) * 2011-05-26 2012-08-29 中国科学院上海光学精密机械研究所 宽带低电场增强反射金属介电光栅
CN105093824B (zh) * 2015-08-31 2019-05-07 西安交通大学 一种气电协同的大面积纳米压印光刻方法
EP3377290B1 (en) * 2015-11-22 2023-08-02 Orbotech Ltd. Control of surface properties of printed three-dimensional structures
CN110997266B (zh) * 2017-06-29 2022-04-26 埃肯有机硅法国简易股份公司 有机硅弹性体制模具的制造方法
KR102620913B1 (ko) 2017-08-24 2024-01-05 다우 글로벌 테크놀로지스 엘엘씨 광학 도파관 제작 방법
WO2019084770A1 (zh) * 2017-10-31 2019-05-09 香港科技大学 具有表面微纳结构的金属薄膜模具的制备方法和金属薄膜模具中间体
EP3670440B1 (fr) 2018-12-21 2025-04-09 Rolex Sa Procédé de fabrication d'un composant horloger
EP3670441B1 (fr) * 2018-12-21 2025-04-09 Rolex Sa Procédé de fabrication d'un composant horloger
CN112776495B (zh) * 2020-12-16 2022-03-18 维达力实业（赤壁）有限公司 Uv转印模具的修复方法及uv转印模具

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WO2002072189A2 (en) * 2001-03-14 2002-09-19 The Procter & Gamble Company Method of manufacturing microneedle structures using soft lithography and photolithography
US20040146611A1 (en) * 2001-03-14 2004-07-29 The Procter & Gamble Company Method of manufacturing microneedle structures using soft lithography and photolithography

Also Published As

Publication number Publication date
JP2011502817A (ja) 2011-01-27
JP5551602B2 (ja) 2014-07-16
WO2009059089A1 (en) 2009-05-07
EP2212745A1 (en) 2010-08-04
CN101910942A (zh) 2010-12-08
US20110104321A1 (en) 2011-05-05

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Granted publication date: 20131120

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CF01 Termination of patent right due to non-payment of annual fee