CN101903472B - 氧化条件下二氧化硅的疏水化 - Google Patents

氧化条件下二氧化硅的疏水化 Download PDF

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Publication number
CN101903472B
CN101903472B CN200880122195XA CN200880122195A CN101903472B CN 101903472 B CN101903472 B CN 101903472B CN 200880122195X A CN200880122195X A CN 200880122195XA CN 200880122195 A CN200880122195 A CN 200880122195A CN 101903472 B CN101903472 B CN 101903472B
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silicon
group
dioxide
general formula
silica
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CN101903472A (zh
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托尔斯滕·戈特沙尔克-高迪希
迈克尔·卢卡雷利
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Wacker Chemie AG
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Wacker Chemie AG
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    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09CTREATMENT OF INORGANIC MATERIALS, OTHER THAN FIBROUS FILLERS, TO ENHANCE THEIR PIGMENTING OR FILLING PROPERTIES ; PREPARATION OF CARBON BLACK  ; PREPARATION OF INORGANIC MATERIALS WHICH ARE NO SINGLE CHEMICAL COMPOUNDS AND WHICH ARE MAINLY USED AS PIGMENTS OR FILLERS
    • C09C1/00Treatment of specific inorganic materials other than fibrous fillers; Preparation of carbon black
    • C09C1/28Compounds of silicon
    • C09C1/30Silicic acid
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09CTREATMENT OF INORGANIC MATERIALS, OTHER THAN FIBROUS FILLERS, TO ENHANCE THEIR PIGMENTING OR FILLING PROPERTIES ; PREPARATION OF CARBON BLACK  ; PREPARATION OF INORGANIC MATERIALS WHICH ARE NO SINGLE CHEMICAL COMPOUNDS AND WHICH ARE MAINLY USED AS PIGMENTS OR FILLERS
    • C09C1/00Treatment of specific inorganic materials other than fibrous fillers; Preparation of carbon black
    • C09C1/28Compounds of silicon
    • C09C1/30Silicic acid
    • C09C1/3081Treatment with organo-silicon compounds
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09DCOATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D7/00Features of coating compositions, not provided for in group C09D5/00; Processes for incorporating ingredients in coating compositions
    • C09D7/40Additives
    • C09D7/60Additives non-macromolecular
    • C09D7/61Additives non-macromolecular inorganic
    • C09D7/62Additives non-macromolecular inorganic modified by treatment with other compounds
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09JADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J11/00Features of adhesives not provided for in group C09J9/00, e.g. additives
    • C09J11/02Non-macromolecular additives
    • C09J11/04Non-macromolecular additives inorganic
    • CCHEMISTRY; METALLURGY
    • C01INORGANIC CHEMISTRY
    • C01PINDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2002/00Crystal-structural characteristics
    • C01P2002/80Crystal-structural characteristics defined by measured data other than those specified in group C01P2002/70
    • C01P2002/86Crystal-structural characteristics defined by measured data other than those specified in group C01P2002/70 by NMR- or ESR-data
    • CCHEMISTRY; METALLURGY
    • C01INORGANIC CHEMISTRY
    • C01PINDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2006/00Physical properties of inorganic compounds
    • C01P2006/12Surface area
    • CCHEMISTRY; METALLURGY
    • C01INORGANIC CHEMISTRY
    • C01PINDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2006/00Physical properties of inorganic compounds
    • C01P2006/19Oil-absorption capacity, e.g. DBP values
    • CCHEMISTRY; METALLURGY
    • C01INORGANIC CHEMISTRY
    • C01PINDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2006/00Physical properties of inorganic compounds
    • C01P2006/22Rheological behaviour as dispersion, e.g. viscosity, sedimentation stability
    • CCHEMISTRY; METALLURGY
    • C01INORGANIC CHEMISTRY
    • C01PINDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2006/00Physical properties of inorganic compounds
    • C01P2006/80Compositional purity
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08KUse of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K3/00Use of inorganic substances as compounding ingredients
    • C08K3/34Silicon-containing compounds
    • C08K3/36Silica
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08KUse of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K9/00Use of pretreated ingredients
    • C08K9/04Ingredients treated with organic substances
    • C08K9/06Ingredients treated with organic substances with silicon-containing compounds
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10TTECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00Stock material or miscellaneous articles
    • Y10T428/29Coated or structually defined flake, particle, cell, strand, strand portion, rod, filament, macroscopic fiber or mass thereof
    • Y10T428/2982Particulate matter [e.g., sphere, flake, etc.]
    • Y10T428/2991Coated
    • Y10T428/2993Silicic or refractory material containing [e.g., tungsten oxide, glass, cement, etc.]
    • Y10T428/2995Silane, siloxane or silicone coating

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  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Wood Science & Technology (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Adhesives Or Adhesive Processes (AREA)
  • Paints Or Removers (AREA)
  • Silicon Compounds (AREA)
  • Sealing Material Composition (AREA)
  • Pigments, Carbon Blacks, Or Wood Stains (AREA)
CN200880122195XA 2007-12-19 2008-12-12 氧化条件下二氧化硅的疏水化 Active CN101903472B (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
DE102007055879.3 2007-12-19
DE102007055879A DE102007055879A1 (de) 2007-12-19 2007-12-19 Hydrophobierung von Kieselsäuren und oxidierenden Bedingungen
PCT/EP2008/067377 WO2009077437A1 (de) 2007-12-19 2008-12-12 Hydrophobierung von kieselsäuren unter oxidierenden bedingungen

Publications (2)

Publication Number Publication Date
CN101903472A CN101903472A (zh) 2010-12-01
CN101903472B true CN101903472B (zh) 2013-10-02

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ID=40512911

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CN200880122195XA Active CN101903472B (zh) 2007-12-19 2008-12-12 氧化条件下二氧化硅的疏水化

Country Status (7)

Country Link
US (1) US8470443B2 (enExample)
EP (1) EP2220172B1 (enExample)
JP (1) JP5394390B2 (enExample)
KR (1) KR101259244B1 (enExample)
CN (1) CN101903472B (enExample)
DE (1) DE102007055879A1 (enExample)
WO (1) WO2009077437A1 (enExample)

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WO2013148241A1 (en) * 2012-03-26 2013-10-03 Cabot Corporation Treated fumed silica
EP2781558B1 (de) 2013-03-19 2016-12-14 Evonik Degussa GmbH Modifizierte kieselsäure enthaltende zusammensetzung und diese zusammensetzung enthaltender silikonkautschuk
DE102013224206A1 (de) * 2013-11-27 2015-05-28 Wacker Chemie Ag Oberflächenmodifizierte partikuläre Metalloxide
US10058918B2 (en) * 2014-05-09 2018-08-28 United Technologies Corporation Surface treatment of powers
SG10202001165VA (en) 2014-10-03 2020-03-30 Aspen Aerogels Inc Improved hydrophobic aerogel materials
DE102015216505A1 (de) * 2015-08-28 2017-03-02 Wacker Chemie Ag Silica Formkörper mit geringer thermischer Leitfähigkeit
KR101698525B1 (ko) * 2015-09-03 2017-02-06 (주)티엠에스 전자파 차폐용 점착 조성물 및 이를 사용하여 제조된 전자파 차폐용 점착 시트
CN108780253A (zh) * 2016-03-31 2018-11-09 陶氏环球技术有限责任公司 用钝化薄膜晶体管组件
CN106978103A (zh) * 2017-04-07 2017-07-25 德山化工(浙江)有限公司 硅油处理热解法二氧化硅、其制备方法及应用
CN113474289A (zh) * 2019-02-21 2021-10-01 三菱化学株式会社 二氧化硅粒子及其制造方法、硅溶胶、研磨组合物、研磨方法、半导体晶片的制造方法和半导体器件的制造方法
PL3877332T3 (pl) * 2020-01-14 2022-07-11 Evonik Operations Gmbh Krzemionka koloidalna o zmodyfikowanej aktywności powierzchniowej
US20230416483A1 (en) * 2020-12-16 2023-12-28 Sumitomo Electric Industries, Ltd. Resin composition, secondary coating material for optical fiber, optical fiber, and method for manufacturing optical fiber

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1121044A (zh) * 1994-06-01 1996-04-24 瓦克化学有限公司 无机氧化物的甲硅烷基化方法

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DE1163784C2 (de) 1962-03-30 1973-05-03 Degussa Verfahren zur Oberflaechenbehandlung von hochdispersen Oxyden
US3207698A (en) 1963-02-13 1965-09-21 Nopco Chem Co Composition and method for defoaming aqueous systems
DE2513608C2 (de) 1975-03-27 1982-08-05 Degussa Ag, 6000 Frankfurt Verfahren zur Hydrophobierung von Kieselsäuren und Silikaten mit Organosilanen
US4208316A (en) 1978-06-29 1980-06-17 Deutsche Gold- Und Silber-Scheideanstalt Vormals Roessler Hydrophobic precipitated silicic acid and compositions containing same
DE2929587C2 (de) 1979-07-21 1981-08-27 Degussa Ag, 6000 Frankfurt Hydrophobe Füllstoff-Mischung, Verfahren zu deren Herstellung und deren Verwendung
US6316050B1 (en) * 1997-12-22 2001-11-13 Degussa Method of producing hydrophobic pyrogenically produced oxides
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JP2003238574A (ja) * 2001-12-12 2003-08-27 Mitsubishi Chemicals Corp 有機基担持シリカゲル
JP3877608B2 (ja) * 2002-02-12 2007-02-07 三井化学株式会社 シリル化された多孔質シリカの製造方法
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JP4803630B2 (ja) * 2003-05-21 2011-10-26 扶桑化学工業株式会社 高純度疎水性有機溶媒分散シリカゾルの製造方法
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Also Published As

Publication number Publication date
WO2009077437A1 (de) 2009-06-25
US8470443B2 (en) 2013-06-25
KR101259244B1 (ko) 2013-04-29
EP2220172A1 (de) 2010-08-25
JP2011506259A (ja) 2011-03-03
EP2220172B1 (de) 2016-03-02
CN101903472A (zh) 2010-12-01
KR20100101632A (ko) 2010-09-17
DE102007055879A1 (de) 2009-06-25
JP5394390B2 (ja) 2014-01-22
US20100263574A1 (en) 2010-10-21

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