CN101800078A - 一种非易失存储器的擦除方法及装置 - Google Patents
一种非易失存储器的擦除方法及装置 Download PDFInfo
- Publication number
- CN101800078A CN101800078A CN200910077696A CN200910077696A CN101800078A CN 101800078 A CN101800078 A CN 101800078A CN 200910077696 A CN200910077696 A CN 200910077696A CN 200910077696 A CN200910077696 A CN 200910077696A CN 101800078 A CN101800078 A CN 101800078A
- Authority
- CN
- China
- Prior art keywords
- sectors
- sector
- storage
- carried out
- concurrently
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 230000015654 memory Effects 0.000 title claims abstract description 112
- 238000000034 method Methods 0.000 title claims abstract description 45
- 230000008569 process Effects 0.000 abstract description 13
- 238000007667 floating Methods 0.000 description 43
- 210000004027 cell Anatomy 0.000 description 24
- 239000004065 semiconductor Substances 0.000 description 10
- 238000012795 verification Methods 0.000 description 8
- 238000010586 diagram Methods 0.000 description 6
- 230000000694 effects Effects 0.000 description 5
- 230000008859 change Effects 0.000 description 4
- 238000005516 engineering process Methods 0.000 description 4
- 239000012467 final product Substances 0.000 description 4
- 210000000352 storage cell Anatomy 0.000 description 4
- 239000000758 substrate Substances 0.000 description 4
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 3
- 230000009471 action Effects 0.000 description 2
- 230000008901 benefit Effects 0.000 description 2
- 239000010410 layer Substances 0.000 description 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 229910052681 coesite Inorganic materials 0.000 description 1
- 230000008878 coupling Effects 0.000 description 1
- 238000010168 coupling process Methods 0.000 description 1
- 238000005859 coupling reaction Methods 0.000 description 1
- 229910052906 cristobalite Inorganic materials 0.000 description 1
- 230000005684 electric field Effects 0.000 description 1
- XUFQPHANEAPEMJ-UHFFFAOYSA-N famotidine Chemical compound NC(N)=NC1=NC(CSCCC(N)=NS(N)(=O)=O)=CS1 XUFQPHANEAPEMJ-UHFFFAOYSA-N 0.000 description 1
- 230000006870 function Effects 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- 238000002347 injection Methods 0.000 description 1
- 239000007924 injection Substances 0.000 description 1
- 238000009434 installation Methods 0.000 description 1
- 238000009413 insulation Methods 0.000 description 1
- 239000012212 insulator Substances 0.000 description 1
- 230000007246 mechanism Effects 0.000 description 1
- 230000007935 neutral effect Effects 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 230000002093 peripheral effect Effects 0.000 description 1
- 229910021420 polycrystalline silicon Inorganic materials 0.000 description 1
- 229920005591 polysilicon Polymers 0.000 description 1
- 238000005036 potential barrier Methods 0.000 description 1
- 230000008929 regeneration Effects 0.000 description 1
- 238000011069 regeneration method Methods 0.000 description 1
- 230000000630 rising effect Effects 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 235000012239 silicon dioxide Nutrition 0.000 description 1
- 229910052814 silicon oxide Inorganic materials 0.000 description 1
- 239000002356 single layer Substances 0.000 description 1
- 229910052682 stishovite Inorganic materials 0.000 description 1
- 229910052905 tridymite Inorganic materials 0.000 description 1
Images
Landscapes
- Read Only Memory (AREA)
Abstract
Description
Claims (11)
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN200910077696.7A CN101800078B (zh) | 2009-02-11 | 2009-02-11 | 一种非易失存储器的擦除方法及装置 |
CN201210244976.4A CN102930899B (zh) | 2009-02-11 | 2009-02-11 | 一种非易失存储器的擦除方法及装置 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN200910077696.7A CN101800078B (zh) | 2009-02-11 | 2009-02-11 | 一种非易失存储器的擦除方法及装置 |
Related Child Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN201210244976.4A Division CN102930899B (zh) | 2009-02-11 | 2009-02-11 | 一种非易失存储器的擦除方法及装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
CN101800078A true CN101800078A (zh) | 2010-08-11 |
CN101800078B CN101800078B (zh) | 2013-02-13 |
Family
ID=42595710
Family Applications (2)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN200910077696.7A Active CN101800078B (zh) | 2009-02-11 | 2009-02-11 | 一种非易失存储器的擦除方法及装置 |
CN201210244976.4A Active CN102930899B (zh) | 2009-02-11 | 2009-02-11 | 一种非易失存储器的擦除方法及装置 |
Family Applications After (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN201210244976.4A Active CN102930899B (zh) | 2009-02-11 | 2009-02-11 | 一种非易失存储器的擦除方法及装置 |
Country Status (1)
Country | Link |
---|---|
CN (2) | CN101800078B (zh) |
Cited By (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN103390424A (zh) * | 2012-05-08 | 2013-11-13 | 北京兆易创新科技股份有限公司 | 一种存储器的擦除/编程方法及装置 |
CN105976867A (zh) * | 2016-07-06 | 2016-09-28 | 北京兆易创新科技股份有限公司 | 一种存储单元的擦除方法 |
CN109119120A (zh) * | 2017-06-22 | 2019-01-01 | 西部数据技术公司 | 非易失性存储器子区块擦除干扰管理方案 |
CN109491596A (zh) * | 2018-10-08 | 2019-03-19 | 华中科技大学 | 一种降低电荷捕获型3d闪存中数据保存错误率的方法 |
CN110634524A (zh) * | 2018-06-25 | 2019-12-31 | 北京兆易创新科技股份有限公司 | 一种非易失存储器擦除方法及装置 |
CN110634522A (zh) * | 2018-06-25 | 2019-12-31 | 北京兆易创新科技股份有限公司 | 一种非易失存储器擦除方法及装置 |
CN110970076A (zh) * | 2019-12-02 | 2020-04-07 | 武汉新芯集成电路制造有限公司 | 存储结构及其擦除方法 |
CN110970075A (zh) * | 2019-12-02 | 2020-04-07 | 武汉新芯集成电路制造有限公司 | 存储结构及其擦除方法 |
CN111863093A (zh) * | 2019-04-29 | 2020-10-30 | 北京兆易创新科技股份有限公司 | 一种非易失性存储器的擦除方法和装置 |
CN112020745A (zh) * | 2018-04-23 | 2020-12-01 | 美光科技公司 | 具有易失性存储器特征的非易失性存储器装置及系统及其操作方法 |
CN112825261A (zh) * | 2019-11-20 | 2021-05-21 | 合肥格易集成电路有限公司 | 非易失性存储器的擦除方法和非易失性存储器 |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US9996458B1 (en) * | 2017-07-12 | 2018-06-12 | Nxp Usa, Inc. | Memory sector retirement in a non-volatile memory |
Family Cites Families (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6055184A (en) * | 1998-09-02 | 2000-04-25 | Texas Instruments Incorporated | Semiconductor memory device having programmable parallel erase operation |
JP3920501B2 (ja) * | 1999-04-02 | 2007-05-30 | 株式会社東芝 | 不揮発性半導体記憶装置及びそのデータ消去制御方法 |
US6891752B1 (en) * | 2002-07-31 | 2005-05-10 | Advanced Micro Devices | System and method for erase voltage control during multiple sector erase of a flash memory device |
US7110301B2 (en) * | 2004-05-07 | 2006-09-19 | Samsung Electronics Co., Ltd. | Non-volatile semiconductor memory device and multi-block erase method thereof |
DE602004026934D1 (de) * | 2004-08-30 | 2010-06-10 | Spansion Llc | Löschverfahren für nichtflüchtige speicherung und nichtflüchtige speicherung |
US7640389B2 (en) * | 2006-02-28 | 2009-12-29 | Freescale Semiconductor, Inc. | Non-volatile memory having a multiple block erase mode and method therefor |
-
2009
- 2009-02-11 CN CN200910077696.7A patent/CN101800078B/zh active Active
- 2009-02-11 CN CN201210244976.4A patent/CN102930899B/zh active Active
Cited By (16)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN103390424A (zh) * | 2012-05-08 | 2013-11-13 | 北京兆易创新科技股份有限公司 | 一种存储器的擦除/编程方法及装置 |
CN105976867A (zh) * | 2016-07-06 | 2016-09-28 | 北京兆易创新科技股份有限公司 | 一种存储单元的擦除方法 |
CN109119120A (zh) * | 2017-06-22 | 2019-01-01 | 西部数据技术公司 | 非易失性存储器子区块擦除干扰管理方案 |
CN109119120B (zh) * | 2017-06-22 | 2022-06-14 | 西部数据技术公司 | 非易失性存储器子区块擦除干扰管理方案 |
CN112020745A (zh) * | 2018-04-23 | 2020-12-01 | 美光科技公司 | 具有易失性存储器特征的非易失性存储器装置及系统及其操作方法 |
CN112020745B (zh) * | 2018-04-23 | 2024-06-04 | 美光科技公司 | 具有易失性存储器特征的非易失性存储器装置及系统及其操作方法 |
CN110634524A (zh) * | 2018-06-25 | 2019-12-31 | 北京兆易创新科技股份有限公司 | 一种非易失存储器擦除方法及装置 |
CN110634522A (zh) * | 2018-06-25 | 2019-12-31 | 北京兆易创新科技股份有限公司 | 一种非易失存储器擦除方法及装置 |
CN109491596A (zh) * | 2018-10-08 | 2019-03-19 | 华中科技大学 | 一种降低电荷捕获型3d闪存中数据保存错误率的方法 |
CN111863093A (zh) * | 2019-04-29 | 2020-10-30 | 北京兆易创新科技股份有限公司 | 一种非易失性存储器的擦除方法和装置 |
CN112825261A (zh) * | 2019-11-20 | 2021-05-21 | 合肥格易集成电路有限公司 | 非易失性存储器的擦除方法和非易失性存储器 |
WO2021109243A1 (zh) * | 2019-12-02 | 2021-06-10 | 武汉新芯集成电路制造有限公司 | 存储结构及其擦除方法 |
CN110970076B (zh) * | 2019-12-02 | 2022-03-18 | 武汉新芯集成电路制造有限公司 | 存储结构及其擦除方法 |
CN110970075A (zh) * | 2019-12-02 | 2020-04-07 | 武汉新芯集成电路制造有限公司 | 存储结构及其擦除方法 |
US11366603B2 (en) | 2019-12-02 | 2022-06-21 | Wuhan Xinxin Semiconductor Manufacturing Co., Ltd. | Storage structure and erase method thereof |
CN110970076A (zh) * | 2019-12-02 | 2020-04-07 | 武汉新芯集成电路制造有限公司 | 存储结构及其擦除方法 |
Also Published As
Publication number | Publication date |
---|---|
CN102930899A (zh) | 2013-02-13 |
CN102930899B (zh) | 2015-11-25 |
CN101800078B (zh) | 2013-02-13 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
CN101800078B (zh) | 一种非易失存储器的擦除方法及装置 | |
CN107833590B (zh) | 存储器设备 | |
CN101552037B (zh) | 一种非易失存储器的擦除方法及装置 | |
CN101923899B (zh) | 一种非易失存储器的擦除方法及装置 | |
KR100819102B1 (ko) | 개선된 멀티 페이지 프로그램 동작을 갖는 불휘발성 반도체메모리 장치 | |
CN103426474B (zh) | 一种非易失存储器的擦除方法及装置 | |
CN101461008B (zh) | 页面擦除的非易失性半导体存储器 | |
CN102422362B (zh) | 存储器装置中的多电平编程检验 | |
US7345916B2 (en) | Method and apparatus for high voltage operation for a high performance semiconductor memory device | |
CN103854700B (zh) | 一种非易失性存储器的擦除方法和装置 | |
CN101923900B (zh) | 一种非易失存储器的擦除方法及装置 | |
US8493793B2 (en) | Nonvolatile memory device and erasure method thereof | |
CN102800362B (zh) | 非易失存储器的过擦除处理方法和处理系统 | |
CN102568594A (zh) | 一种非易失存储器的过擦除处理方法和处理系统 | |
US6671208B2 (en) | Nonvolatile semiconductor storage device with limited consumption current during erasure and erase method therefor | |
JP3739102B2 (ja) | 不揮発性半導体記憶装置 | |
CN101853704A (zh) | 共享字线的分栅式闪存的擦除方法 | |
CN101800077A (zh) | 一种对闪存进行数据编程的方法和装置 | |
JPH0426995A (ja) | 不揮発性半導体記憶装置 | |
CN104751885A (zh) | Flash芯片及应对flash芯片异常掉电的擦除或编程方法 | |
KR960003400B1 (ko) | 불휘발성 반도체 기억장치 | |
TWI576846B (zh) | 快閃記憶體的資料寫入方法與其控制裝置 | |
JP7223900B1 (ja) | 電子機器、メモリセルの過剰消去検出及び除去方法 | |
CN104751893A (zh) | 增强nor型flash可靠性的方法 | |
US20170092360A1 (en) | Method to prevent loss of data of a transistor-based memory unit |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
C06 | Publication | ||
PB01 | Publication | ||
C10 | Entry into substantive examination | ||
SE01 | Entry into force of request for substantive examination | ||
C53 | Correction of patent of invention or patent application | ||
CB02 | Change of applicant information |
Address after: 100084 Room 301, B building, Tsinghua Science and Technology Park, Haidian District, Beijing Applicant after: GIGADEVICE SEMICONDUCTOR Inc. Address before: 100084 Room 301, B building, Tsinghua Science and Technology Park, Haidian District, Beijing Applicant before: GigaDevice Semiconductor Inc. |
|
C53 | Correction of patent of invention or patent application | ||
CB02 | Change of applicant information |
Address after: 100083 Beijing City, Haidian District Xueyuan Road No. 30, large industrial building A12 Applicant after: GIGADEVICE SEMICONDUCTOR Inc. Address before: 100084 Room 301, B building, Tsinghua Science and Technology Park, Haidian District, Beijing Applicant before: GigaDevice Semiconductor Inc. |
|
C14 | Grant of patent or utility model | ||
GR01 | Patent grant | ||
C56 | Change in the name or address of the patentee |
Owner name: BEIJING GIGADEVICE SEMICONDUCTOR CO., LTD. Free format text: FORMER NAME: BEIJING GIGADEVICE SEMICONDUCTOR INC. |
|
CP03 | Change of name, title or address |
Address after: 100083 Beijing City, Haidian District Xueyuan Road No. 30, large industrial building A block 12 layer Patentee after: GIGADEVICE SEMICONDUCTOR(BEIJING) Inc. Address before: 100083 Beijing City, Haidian District Xueyuan Road No. 30, large industrial building A12 Patentee before: GigaDevice Semiconductor Inc. |
|
C41 | Transfer of patent application or patent right or utility model | ||
TR01 | Transfer of patent right |
Effective date of registration: 20170103 Address after: 201203 Shanghai Guo Shou Jing Road, Zhangjiang hi tech Park No. 498 Building 1 502/15 Patentee after: SHANGHAI GEYI ELECTRONIC Co.,Ltd. Patentee after: GIGADEVICE SEMICONDUCTOR(BEIJING) Inc. Address before: 100083 Beijing City, Haidian District Xueyuan Road No. 30, large industrial building A block 12 layer Patentee before: GIGADEVICE SEMICONDUCTOR(BEIJING) Inc. |
|
CP03 | Change of name, title or address |
Address after: 502 / 15, building 1, 498 GuoShouJing Road, Zhangjiang High Tech Park, Pudong New Area, Shanghai 201203 Patentee after: SHANGHAI GEYI ELECTRONIC Co.,Ltd. Patentee after: Zhaoyi Innovation Technology Group Co.,Ltd. Address before: 502 / 15, building 1, 498 GuoShouJing Road, Zhangjiang hi tech park, Shanghai, 201203 Patentee before: SHANGHAI GEYI ELECTRONIC Co.,Ltd. Patentee before: GIGADEVICE SEMICONDUCTOR(BEIJING) Inc. |
|
CP03 | Change of name, title or address |