CN101794645B - 制备导电膜的方法 - Google Patents

制备导电膜的方法 Download PDF

Info

Publication number
CN101794645B
CN101794645B CN201010105471.0A CN201010105471A CN101794645B CN 101794645 B CN101794645 B CN 101794645B CN 201010105471 A CN201010105471 A CN 201010105471A CN 101794645 B CN101794645 B CN 101794645B
Authority
CN
China
Prior art keywords
conducting film
silver
roll
smoothing processing
larger
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
CN201010105471.0A
Other languages
English (en)
Chinese (zh)
Other versions
CN101794645A (zh
Inventor
德永司
作山弘
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujifilm Corp
Original Assignee
Fujifilm Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujifilm Corp filed Critical Fujifilm Corp
Publication of CN101794645A publication Critical patent/CN101794645A/zh
Application granted granted Critical
Publication of CN101794645B publication Critical patent/CN101794645B/zh
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
    • G03C5/00—Photographic processes or agents therefor; Regeneration of such processing agents
    • G03C5/58—Processes for obtaining metallic images by vapour deposition or physical development

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Shielding Devices Or Components To Electric Or Magnetic Fields (AREA)
  • Silver Salt Photography Or Processing Solution Therefor (AREA)
  • Manufacturing Of Electric Cables (AREA)
  • Adhesives Or Adhesive Processes (AREA)
CN201010105471.0A 2009-02-02 2010-01-28 制备导电膜的方法 Expired - Fee Related CN101794645B (zh)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
JP2009021821 2009-02-02
JP021821/2009 2009-02-02
JP131305/2009 2009-05-29
JP2009131305A JP2010199052A (ja) 2009-02-02 2009-05-29 導電膜の製造方法

Publications (2)

Publication Number Publication Date
CN101794645A CN101794645A (zh) 2010-08-04
CN101794645B true CN101794645B (zh) 2013-01-23

Family

ID=42540691

Family Applications (1)

Application Number Title Priority Date Filing Date
CN201010105471.0A Expired - Fee Related CN101794645B (zh) 2009-02-02 2010-01-28 制备导电膜的方法

Country Status (4)

Country Link
US (1) US8017306B2 (enExample)
JP (1) JP2010199052A (enExample)
KR (1) KR20100089032A (enExample)
CN (1) CN101794645B (enExample)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20140231723A1 (en) * 2013-02-20 2014-08-21 Kurt Michael Sanger Enhancing silver conductivity
JP2016009731A (ja) * 2014-06-24 2016-01-18 コニカミノルタ株式会社 導電パターン形成方法および導電パターン形成装置
US10067599B2 (en) * 2016-07-29 2018-09-04 Ncr Corporation Touchscreen defroster

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6188174B1 (en) * 1996-10-01 2001-02-13 Nisshinbo Insustries, Inc. Electromagnetic radiation shield panel and method of producing the same
JP2004221564A (ja) * 2002-12-27 2004-08-05 Fuji Photo Film Co Ltd 透光性電磁波シールド膜の製造方法及び透光性電磁波シールド膜
JP2005016281A (ja) * 2003-06-27 2005-01-20 Inb Planning:Kk ゴム製直立ポール
CN101647074A (zh) * 2007-03-30 2010-02-10 富士胶片株式会社 导电膜及其生产方法

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6040338A (ja) * 1983-08-16 1985-03-02 Canon Inc シ−ト自動送り装置
JP2717734B2 (ja) 1991-02-28 1998-02-25 日本写真印刷株式会社 透光性電磁波シールド材料とその製造方法
JPH10163673A (ja) 1996-10-01 1998-06-19 Nisshinbo Ind Inc 電磁波シールドパネル及びその製造方法
JP3363083B2 (ja) 1997-12-17 2003-01-07 住友大阪セメント株式会社 透明基体およびその製造方法
JP2000176950A (ja) * 1998-12-16 2000-06-27 Konica Corp セルローストリアセテートフィルムの製造方法及び取り扱い方法
US6706165B2 (en) 2000-01-07 2004-03-16 President And Fellows Of Harvard College Fabrication of metallic microstructures via exposure of photosensitive composition
JP4169530B2 (ja) 2002-04-24 2008-10-22 株式会社ブリヂストン 電磁波シールド性光透過窓材及びその製造方法
CN101278607B (zh) * 2005-09-30 2012-08-22 富士胶片株式会社 导电薄膜的生产方法和用于导电薄膜生产的感光材料
JP4961220B2 (ja) * 2006-01-31 2012-06-27 富士フイルム株式会社 導電性膜の製造方法、並びに、透光性電磁波シールド膜、光学フィルターおよびプラズマディスプレイパネル

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6188174B1 (en) * 1996-10-01 2001-02-13 Nisshinbo Insustries, Inc. Electromagnetic radiation shield panel and method of producing the same
JP2004221564A (ja) * 2002-12-27 2004-08-05 Fuji Photo Film Co Ltd 透光性電磁波シールド膜の製造方法及び透光性電磁波シールド膜
JP2005016281A (ja) * 2003-06-27 2005-01-20 Inb Planning:Kk ゴム製直立ポール
CN101647074A (zh) * 2007-03-30 2010-02-10 富士胶片株式会社 导电膜及其生产方法

Also Published As

Publication number Publication date
JP2010199052A (ja) 2010-09-09
CN101794645A (zh) 2010-08-04
KR20100089032A (ko) 2010-08-11
US8017306B2 (en) 2011-09-13
US20100203453A1 (en) 2010-08-12

Similar Documents

Publication Publication Date Title
CN101647074B (zh) 导电膜及其生产方法
CN101278607B (zh) 导电薄膜的生产方法和用于导电薄膜生产的感光材料
JP5192767B2 (ja) 導電膜の製造方法
US7829270B2 (en) Photosensitive material, method of manufacturing conductive metal film, conductive metal film and light-transmitting film shielding electromagnetic wave for plasma display panel
JP5629077B2 (ja) 導電膜の製造方法
US20120285726A1 (en) Electrically conductive element, photosensitive material for formation of electrically conductive element, and electrode
JP2012195443A (ja) 透明導電性材料
CN101794645A (zh) 制备导电膜的方法
CN113286697A (zh) 导电性基板的制造方法、导电性基板
US10604671B2 (en) Method for producing conductive film, conductive film, and touch panel
US20200103996A1 (en) Conductive film, touch panel, and method for manufacturing conductive film
JP6386660B2 (ja) 導電性フィルムおよびその製造方法、タッチパネル
JP2011131500A (ja) 導電膜形成用感光材料、及び導電膜の製造方法
JP4719739B2 (ja) 透光性導電性膜及び透光性導電性膜の製造方法
JP4911459B2 (ja) 導電性膜、その製造方法、電磁波シールド膜、その製造方法及びプラズマディスプレイパネル
JP5562746B2 (ja) 導電膜の製造方法
JP5329802B2 (ja) 導電膜およびその製造方法
JP2011076918A (ja) 導電膜の製造方法
WO2010143665A1 (ja) 導電膜形成用感光材料、導電膜および導電膜の製造方法
US20230077966A1 (en) Conductive substrate and touch panel
JP2011228085A (ja) 導電膜の製造方法
JP5192711B2 (ja) 導電膜の製造方法及び導電膜
WO2007077898A1 (ja) 導電性膜、その製造方法、電磁波シールド膜、その製造方法及びプラズマディスプレイパネル
WO2021059812A1 (ja) めっき液、めっきセット、導電性基板の製造方法
JP2020017381A (ja) 導電性フィルムの製造方法

Legal Events

Date Code Title Description
C06 Publication
PB01 Publication
C10 Entry into substantive examination
SE01 Entry into force of request for substantive examination
C14 Grant of patent or utility model
GR01 Patent grant
CF01 Termination of patent right due to non-payment of annual fee

Granted publication date: 20130123

CF01 Termination of patent right due to non-payment of annual fee