CN101479310B - 通过活化能射线照射活化的胺酰亚胺化合物、利用该化合物的组合物及该组合物的固化方法 - Google Patents
通过活化能射线照射活化的胺酰亚胺化合物、利用该化合物的组合物及该组合物的固化方法 Download PDFInfo
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- CN101479310B CN101479310B CN2007800240836A CN200780024083A CN101479310B CN 101479310 B CN101479310 B CN 101479310B CN 2007800240836 A CN2007800240836 A CN 2007800240836A CN 200780024083 A CN200780024083 A CN 200780024083A CN 101479310 B CN101479310 B CN 101479310B
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
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- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C243/00—Compounds containing chains of nitrogen atoms singly-bound to each other, e.g. hydrazines, triazanes
- C07C243/24—Hydrazines having nitrogen atoms of hydrazine groups acylated by carboxylic acids
- C07C243/26—Hydrazines having nitrogen atoms of hydrazine groups acylated by carboxylic acids with acylating carboxyl groups bound to hydrogen atoms or to acyclic carbon atoms
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C243/00—Compounds containing chains of nitrogen atoms singly-bound to each other, e.g. hydrazines, triazanes
- C07C243/40—Hydrazines having nitrogen atoms of hydrazine groups being quaternised
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
- C08G59/18—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
- C08G59/40—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the curing agents used
- C08G59/50—Amines
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
- C08G59/18—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
- C08G59/68—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the catalysts used
- C08G59/686—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the catalysts used containing nitrogen
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
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- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Epoxy Resins (AREA)
- Polymerisation Methods In General (AREA)
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP175008/2006 | 2006-06-26 | ||
JP2006175008A JP5057016B2 (ja) | 2006-06-26 | 2006-06-26 | 活性エネルギー線の照射により活性化するアミンイミド化合物、それを用いた組成物およびその硬化方法 |
PCT/JP2007/062226 WO2008001637A1 (fr) | 2006-06-26 | 2007-06-18 | Composé imide d'amine destiné à être activé par irradiation par un rayonnement d'énergie active, composition utilisant celui-ci et procédé servant à faire durcir celui-ci |
Publications (2)
Publication Number | Publication Date |
---|---|
CN101479310A CN101479310A (zh) | 2009-07-08 |
CN101479310B true CN101479310B (zh) | 2011-07-13 |
Family
ID=38845405
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN2007800240836A Expired - Fee Related CN101479310B (zh) | 2006-06-26 | 2007-06-18 | 通过活化能射线照射活化的胺酰亚胺化合物、利用该化合物的组合物及该组合物的固化方法 |
Country Status (5)
Country | Link |
---|---|
JP (1) | JP5057016B2 (ko) |
KR (1) | KR101286414B1 (ko) |
CN (1) | CN101479310B (ko) |
TW (1) | TWI412513B (ko) |
WO (1) | WO2008001637A1 (ko) |
Families Citing this family (13)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US8536242B2 (en) | 2007-08-09 | 2013-09-17 | Sekisui Chemical Co., Ltd. | Photocurable composition |
JP2009126974A (ja) * | 2007-11-26 | 2009-06-11 | Three Bond Co Ltd | 樹脂組成物 |
JP2010174210A (ja) * | 2009-02-02 | 2010-08-12 | Asahi Kasei E-Materials Corp | 光硬化型樹脂組成物及びその硬化物 |
US8686059B2 (en) * | 2009-06-17 | 2014-04-01 | Three Bond Co., Ltd. | Base and radical generator, composition using same and method for curing same |
JP6011956B2 (ja) * | 2010-04-14 | 2016-10-25 | 学校法人東京理科大学 | 感光性樹脂組成物 |
CN102338985A (zh) * | 2011-06-29 | 2012-02-01 | 山东大学 | 含羟基的烃基双环胍光碱产生剂的环保型光刻胶组合物 |
WO2015098875A1 (ja) * | 2013-12-24 | 2015-07-02 | 株式会社ブリヂストン | 接着シート、その製造方法及び積層体 |
CN107340688B (zh) * | 2016-04-29 | 2022-05-06 | 东友精细化工有限公司 | 硬掩模用组合物 |
KR102257195B1 (ko) | 2018-11-08 | 2021-05-26 | 주식회사 엘지화학 | 액정 배향제 조성물, 이를 이용한 액정 배향막의 제조 방법, 이를 이용한 액정 배향막 및 액정표시소자 |
KR102461121B1 (ko) | 2019-02-21 | 2022-10-28 | 주식회사 엘지화학 | 액정 배향제 조성물, 이를 이용한 액정 배향막의 제조 방법, 이를 이용한 액정 배향막 및 액정표시소자 |
JPWO2022014646A1 (ko) * | 2020-07-15 | 2022-01-20 | ||
CN113136022B (zh) * | 2021-06-01 | 2022-03-08 | 海洋化工研究院有限公司 | 一种超支化胺类化合物及其制备方法和应用 |
JPWO2023127800A1 (ko) * | 2021-12-28 | 2023-07-06 |
Family Cites Families (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH01197553A (ja) * | 1988-02-02 | 1989-08-09 | Catalysts & Chem Ind Co Ltd | 発泡用エポキシ樹脂組成物 |
JPH0695379A (ja) * | 1991-09-14 | 1994-04-08 | Sannopuko Kk | 感光性樹脂組成物 |
JP2776379B2 (ja) * | 1996-06-28 | 1998-07-16 | 株式会社日立製作所 | 超電導マグネットコイル |
JP2000229927A (ja) * | 1999-02-09 | 2000-08-22 | Three Bond Co Ltd | アミンイミド化合物およびそれを用いたエポキシ樹脂組成物 |
JP2000309686A (ja) * | 1999-04-27 | 2000-11-07 | Three Bond Co Ltd | 導電性樹脂組成物 |
CN1326904C (zh) * | 2000-12-27 | 2007-07-18 | 日立化成工业株式会社 | 光碱发生剂以及应用它的固化性组合物及固化方法 |
JP2003055638A (ja) * | 2001-08-21 | 2003-02-26 | Three Bond Co Ltd | フィルム状接着剤 |
-
2006
- 2006-06-26 JP JP2006175008A patent/JP5057016B2/ja active Active
-
2007
- 2007-06-18 KR KR1020087031629A patent/KR101286414B1/ko active IP Right Grant
- 2007-06-18 WO PCT/JP2007/062226 patent/WO2008001637A1/ja active Application Filing
- 2007-06-18 CN CN2007800240836A patent/CN101479310B/zh not_active Expired - Fee Related
- 2007-06-21 TW TW96122337A patent/TWI412513B/zh not_active IP Right Cessation
Non-Patent Citations (3)
Title |
---|
JP特开2000-229927A 2000.08.22 |
JP特开2000-309686A 2000.11.07 |
JP特开2003-55638A 2003.02.26 |
Also Published As
Publication number | Publication date |
---|---|
TWI412513B (zh) | 2013-10-21 |
TW200815325A (en) | 2008-04-01 |
CN101479310A (zh) | 2009-07-08 |
KR20090023642A (ko) | 2009-03-05 |
WO2008001637A1 (fr) | 2008-01-03 |
JP2008001857A (ja) | 2008-01-10 |
JP5057016B2 (ja) | 2012-10-24 |
KR101286414B1 (ko) | 2013-07-19 |
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Effective date of registration: 20140428 Address after: Kanagawa Patentee after: THREE BOND Co.,Ltd. Address before: Tokyo, Japan Patentee before: THREE BOND Co.,Ltd. |
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