CN101381101A - 钙钛矿型氧化物、铁电体膜及其制备方法、铁电体器件和液体排出装置 - Google Patents
钙钛矿型氧化物、铁电体膜及其制备方法、铁电体器件和液体排出装置 Download PDFInfo
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- CN101381101A CN101381101A CNA2008102148578A CN200810214857A CN101381101A CN 101381101 A CN101381101 A CN 101381101A CN A2008102148578 A CNA2008102148578 A CN A2008102148578A CN 200810214857 A CN200810214857 A CN 200810214857A CN 101381101 A CN101381101 A CN 101381101A
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
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- H10P14/60—Formation of materials, e.g. in the shape of layers or pillars of insulating materials
- H10P14/69—Inorganic materials
- H10P14/692—Inorganic materials composed of oxides, glassy oxides or oxide-based glasses
- H10P14/6938—Inorganic materials composed of oxides, glassy oxides or oxide-based glasses the material containing at least one metal element, e.g. metal oxides, metal oxynitrides or metal oxycarbides
- H10P14/69398—Inorganic materials composed of oxides, glassy oxides or oxide-based glasses the material containing at least one metal element, e.g. metal oxides, metal oxynitrides or metal oxycarbides the material having a perovskite structure, e.g. BaTiO3
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/135—Nozzles
- B41J2/14—Structure thereof only for on-demand ink jet heads
- B41J2/14201—Structure of print heads with piezoelectric elements
- B41J2/14233—Structure of print heads with piezoelectric elements of film type, deformed by bending and disposed on a diaphragm
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- B—PERFORMING OPERATIONS; TRANSPORTING
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- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
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- B41J2/01—Ink jet
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- B41J2/16—Production of nozzles
- B41J2/1607—Production of print heads with piezoelectric elements
- B41J2/161—Production of print heads with piezoelectric elements of film type, deformed by bending and disposed on a diaphragm
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- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/135—Nozzles
- B41J2/16—Production of nozzles
- B41J2/1621—Manufacturing processes
- B41J2/164—Manufacturing processes thin film formation
- B41J2/1646—Manufacturing processes thin film formation thin film formation by sputtering
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- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/08—Oxides
- C23C14/088—Oxides of the type ABO3 with A representing alkali, alkaline earth metal or Pb and B representing a refractory or rare earth metal
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- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D1/00—Resistors, capacitors or inductors
- H10D1/60—Capacitors
- H10D1/68—Capacitors having no potential barriers
- H10D1/682—Capacitors having no potential barriers having dielectrics comprising perovskite structures
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- H10N30/076—Forming of piezoelectric or electrostrictive parts or bodies on an electrical element or another base by depositing piezoelectric or electrostrictive layers, e.g. aerosol or screen printing by vapour phase deposition
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- H10N30/8548—Lead-based oxides
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- H10P14/63—Formation of materials, e.g. in the shape of layers or pillars of insulating materials characterised by the formation processes
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- H10P14/6328—Deposition from the gas or vapour phase
- H10P14/6329—Deposition from the gas or vapour phase using physical ablation of a target, e.g. physical vapour deposition or pulsed laser deposition
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- C04B2235/30—Constituents and secondary phases not being of a fibrous nature
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- C04B2235/3231—Refractory metal oxides, their mixed metal oxides, or oxide-forming salts thereof
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- H01G4/00—Fixed capacitors; Processes of their manufacture
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Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2007229785A JP5095315B2 (ja) | 2007-09-05 | 2007-09-05 | ペロブスカイト型酸化物、強誘電体膜とその製造方法、強誘電体素子、及び液体吐出装置 |
| JP2007229785 | 2007-09-05 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN101381101A true CN101381101A (zh) | 2009-03-11 |
Family
ID=39810154
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CNA2008102148578A Pending CN101381101A (zh) | 2007-09-05 | 2008-09-03 | 钙钛矿型氧化物、铁电体膜及其制备方法、铁电体器件和液体排出装置 |
Country Status (4)
| Country | Link |
|---|---|
| US (1) | US20090062114A1 (https=) |
| EP (1) | EP2034040A3 (https=) |
| JP (1) | JP5095315B2 (https=) |
| CN (1) | CN101381101A (https=) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102139565A (zh) * | 2009-11-02 | 2011-08-03 | 精工爱普生株式会社 | 液体喷射头、液体喷射装置及压电元件和压电材料 |
Families Citing this family (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP4993294B2 (ja) * | 2007-09-05 | 2012-08-08 | 富士フイルム株式会社 | ペロブスカイト型酸化物、強誘電体膜とその製造方法、強誘電体素子、及び液体吐出装置 |
| JP5449970B2 (ja) * | 2009-10-09 | 2014-03-19 | 富士フイルム株式会社 | 圧電体膜の成膜方法、圧電素子、液体吐出装置、及び圧電型超音波振動子 |
| JP5556182B2 (ja) * | 2010-01-05 | 2014-07-23 | セイコーエプソン株式会社 | 液体噴射ヘッド及び液体噴射装置並びに圧電素子 |
| WO2011089748A1 (ja) * | 2010-01-21 | 2011-07-28 | 株式会社ユーテック | Pbnzt強誘電体膜、ゾルゲル溶液、成膜方法及び強誘電体膜の製造方法 |
| CN104021264B (zh) | 2013-02-28 | 2017-06-20 | 华为技术有限公司 | 一种缺陷预测方法及装置 |
| JP6341446B2 (ja) | 2014-03-13 | 2018-06-13 | 株式会社リコー | 電気機械変換素子の製造方法、電気機械変換素子、液滴吐出ヘッド、液滴吐出装置及び画像形成装置 |
| JP6258241B2 (ja) * | 2015-02-27 | 2018-01-10 | 富士フイルム株式会社 | 圧電アクチュエータ |
| CN111525021B (zh) * | 2020-04-22 | 2023-08-22 | 济南大学 | 一种兼具正负电卡效应的钛酸铋钠基薄膜及其制备方法 |
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2532381B2 (ja) * | 1986-03-04 | 1996-09-11 | 松下電器産業株式会社 | 強誘電体薄膜素子及びその製造方法 |
| JPS63288960A (ja) * | 1987-05-21 | 1988-11-25 | Nippon Denso Co Ltd | (Pb,Bi)(Zr,Ti)0↓3の製造方法 |
| JPH0947947A (ja) * | 1994-08-30 | 1997-02-18 | Seiko Seiki Co Ltd | 研削装置、並びに研削方法、並びに半導体装置及び半導体基板の製造方法 |
| JP3482883B2 (ja) * | 1998-08-24 | 2004-01-06 | 株式会社村田製作所 | 強誘電体薄膜素子およびその製造方法 |
| JP2000208715A (ja) * | 1999-01-18 | 2000-07-28 | Nissan Motor Co Ltd | 強誘電体薄膜の構造及びその化学的気相成長法 |
| US6964873B2 (en) * | 1999-10-29 | 2005-11-15 | Fujitsu Limited | Semiconductor device having a ferroelectric capacitor and a fabrication process thereof |
| JP4266474B2 (ja) | 2000-01-21 | 2009-05-20 | キヤノン株式会社 | 圧電体磁器組成物の製造方法及び圧電体素子の製造方法 |
| JP4266480B2 (ja) | 2000-03-08 | 2009-05-20 | キヤノン株式会社 | 圧電体磁器組成物およびその製造方法、圧電体素子およびその製造方法、ならびに、それを用いたインクジェット式プリンタヘッドおよび超音波モータ |
| JP2001261338A (ja) * | 2000-03-15 | 2001-09-26 | Mitsubishi Materials Corp | Tiを含有する金属酸化物薄膜形成用原料溶液、Tiを含有する金属酸化物薄膜の形成方法及びTiを含有する金属酸化物薄膜 |
| JP3944341B2 (ja) * | 2000-03-28 | 2007-07-11 | 株式会社東芝 | 酸化物エピタキシャル歪格子膜の製造法 |
| JP2005244174A (ja) * | 2004-01-27 | 2005-09-08 | Matsushita Electric Ind Co Ltd | 圧電体素子及びその製造方法、並びに該圧電体素子を用いたインクジェットヘッド及びインクジェット式記録装置 |
| JP4324796B2 (ja) * | 2004-08-30 | 2009-09-02 | セイコーエプソン株式会社 | 強誘電体膜、強誘電体膜の製造方法、強誘電体キャパシタ、および強誘電体メモリ |
| JP4600647B2 (ja) * | 2004-08-30 | 2010-12-15 | セイコーエプソン株式会社 | 圧電体膜、圧電素子、圧電アクチュエーター、圧電ポンプ、インクジェット式記録ヘッド、インクジェットプリンター、表面弾性波素子、周波数フィルタ、発振器、電子回路、薄膜圧電共振器、および電子機器 |
| JP2006188414A (ja) | 2004-12-07 | 2006-07-20 | Murata Mfg Co Ltd | 圧電磁器組成物、及び圧電セラミック電子部品 |
| JP2006263978A (ja) | 2005-03-22 | 2006-10-05 | Toshiba Corp | 熱転写記録方法および熱転写記録装置 |
| JP2007088445A (ja) * | 2005-08-23 | 2007-04-05 | Canon Inc | 圧電体、圧電素子、液体吐出ヘッド、液体吐出装置及び圧電体の製造方法 |
| US20070046153A1 (en) * | 2005-08-23 | 2007-03-01 | Canon Kabushiki Kaisha | Piezoelectric substrate, piezoelectric element, liquid discharge head and liquid discharge apparatus |
| US7874649B2 (en) * | 2006-07-14 | 2011-01-25 | Canon Kabushiki Kaisha | Piezoelectric element, ink jet head and producing method for piezoelectric element |
| JP4142705B2 (ja) * | 2006-09-28 | 2008-09-03 | 富士フイルム株式会社 | 成膜方法、圧電膜、圧電素子、及び液体吐出装置 |
-
2007
- 2007-09-05 JP JP2007229785A patent/JP5095315B2/ja not_active Expired - Fee Related
-
2008
- 2008-08-29 EP EP20080015289 patent/EP2034040A3/en not_active Withdrawn
- 2008-09-03 CN CNA2008102148578A patent/CN101381101A/zh active Pending
- 2008-09-04 US US12/204,644 patent/US20090062114A1/en not_active Abandoned
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102139565A (zh) * | 2009-11-02 | 2011-08-03 | 精工爱普生株式会社 | 液体喷射头、液体喷射装置及压电元件和压电材料 |
| CN102139565B (zh) * | 2009-11-02 | 2013-11-06 | 精工爱普生株式会社 | 液体喷射头、液体喷射装置及压电元件和压电材料 |
Also Published As
| Publication number | Publication date |
|---|---|
| US20090062114A1 (en) | 2009-03-05 |
| EP2034040A2 (en) | 2009-03-11 |
| JP2009062207A (ja) | 2009-03-26 |
| JP5095315B2 (ja) | 2012-12-12 |
| EP2034040A3 (en) | 2012-07-25 |
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