CN101379607B - 静电卡盘 - Google Patents

静电卡盘 Download PDF

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Publication number
CN101379607B
CN101379607B CN2007800045852A CN200780004585A CN101379607B CN 101379607 B CN101379607 B CN 101379607B CN 2007800045852 A CN2007800045852 A CN 2007800045852A CN 200780004585 A CN200780004585 A CN 200780004585A CN 101379607 B CN101379607 B CN 101379607B
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Prior art keywords
electrostatic chuck
titanium oxide
dielectric
aluminium oxide
protuberance
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Chinese (zh)
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CN101379607A (zh
Inventor
安藤正美
宫地淳
冈本修
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Toto Ltd
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Toto Ltd
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    • HELECTRICITY
    • H02GENERATION; CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
    • H02NELECTRIC MACHINES NOT OTHERWISE PROVIDED FOR
    • H02N13/00Clutches or holding devices using electrostatic attraction, e.g. using Johnson-Rahbek effect
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/68Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for positioning, orientation or alignment
    • CCHEMISTRY; METALLURGY
    • C04CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
    • C04BLIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
    • C04B35/00Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
    • C04B35/01Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on oxide ceramics
    • C04B35/10Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on oxide ceramics based on aluminium oxide
    • C04B35/111Fine ceramics
    • CCHEMISTRY; METALLURGY
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    • C04BLIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
    • C04B35/00Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
    • C04B35/622Forming processes; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
    • C04B35/64Burning or sintering processes
    • C04B35/645Pressure sintering
    • C04B35/6455Hot isostatic pressing
    • CCHEMISTRY; METALLURGY
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    • C04BLIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
    • C04B2235/00Aspects relating to ceramic starting mixtures or sintered ceramic products
    • C04B2235/02Composition of constituents of the starting material or of secondary phases of the final product
    • C04B2235/30Constituents and secondary phases not being of a fibrous nature
    • C04B2235/32Metal oxides, mixed metal oxides, or oxide-forming salts thereof, e.g. carbonates, nitrates, (oxy)hydroxides, chlorides
    • C04B2235/3231Refractory metal oxides, their mixed metal oxides, or oxide-forming salts thereof
    • C04B2235/3232Titanium oxides or titanates, e.g. rutile or anatase
    • CCHEMISTRY; METALLURGY
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    • C04BLIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
    • C04B2235/00Aspects relating to ceramic starting mixtures or sintered ceramic products
    • C04B2235/02Composition of constituents of the starting material or of secondary phases of the final product
    • C04B2235/30Constituents and secondary phases not being of a fibrous nature
    • C04B2235/32Metal oxides, mixed metal oxides, or oxide-forming salts thereof, e.g. carbonates, nitrates, (oxy)hydroxides, chlorides
    • C04B2235/3231Refractory metal oxides, their mixed metal oxides, or oxide-forming salts thereof
    • C04B2235/3232Titanium oxides or titanates, e.g. rutile or anatase
    • C04B2235/3234Titanates, not containing zirconia
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    • C04B2235/00Aspects relating to ceramic starting mixtures or sintered ceramic products
    • C04B2235/65Aspects relating to heat treatments of ceramic bodies such as green ceramics or pre-sintered ceramics, e.g. burning, sintering or melting processes
    • C04B2235/656Aspects relating to heat treatments of ceramic bodies such as green ceramics or pre-sintered ceramics, e.g. burning, sintering or melting processes characterised by specific heating conditions during heat treatment
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    • C04B2235/00Aspects relating to ceramic starting mixtures or sintered ceramic products
    • C04B2235/65Aspects relating to heat treatments of ceramic bodies such as green ceramics or pre-sintered ceramics, e.g. burning, sintering or melting processes
    • C04B2235/658Atmosphere during thermal treatment
    • C04B2235/6582Hydrogen containing atmosphere
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    • C04B2235/00Aspects relating to ceramic starting mixtures or sintered ceramic products
    • C04B2235/70Aspects relating to sintered or melt-casted ceramic products
    • C04B2235/74Physical characteristics
    • C04B2235/77Density
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    • C04B2235/00Aspects relating to ceramic starting mixtures or sintered ceramic products
    • C04B2235/70Aspects relating to sintered or melt-casted ceramic products
    • C04B2235/74Physical characteristics
    • C04B2235/78Grain sizes and shapes, product microstructures, e.g. acicular grains, equiaxed grains, platelet-structures
    • C04B2235/786Micrometer sized grains, i.e. from 1 to 100 micron
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    • C04B2235/00Aspects relating to ceramic starting mixtures or sintered ceramic products
    • C04B2235/70Aspects relating to sintered or melt-casted ceramic products
    • C04B2235/80Phases present in the sintered or melt-cast ceramic products other than the main phase
    • CCHEMISTRY; METALLURGY
    • C04CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
    • C04BLIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
    • C04B2235/00Aspects relating to ceramic starting mixtures or sintered ceramic products
    • C04B2235/70Aspects relating to sintered or melt-casted ceramic products
    • C04B2235/80Phases present in the sintered or melt-cast ceramic products other than the main phase
    • C04B2235/85Intergranular or grain boundary phases
    • CCHEMISTRY; METALLURGY
    • C04CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
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    • C04B2235/00Aspects relating to ceramic starting mixtures or sintered ceramic products
    • C04B2235/70Aspects relating to sintered or melt-casted ceramic products
    • C04B2235/96Properties of ceramic products, e.g. mechanical properties such as strength, toughness, wear resistance
    • C04B2235/963Surface properties, e.g. surface roughness
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/683Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
    • H01L21/6831Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using electrostatic chucks
    • H01L21/6833Details of electrostatic chucks

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  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Manufacturing & Machinery (AREA)
  • Ceramic Engineering (AREA)
  • Organic Chemistry (AREA)
  • Structural Engineering (AREA)
  • Materials Engineering (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Inorganic Chemistry (AREA)
  • Power Engineering (AREA)
  • General Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Physics & Mathematics (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Compositions Of Oxide Ceramics (AREA)
  • Jigs For Machine Tools (AREA)
CN2007800045852A 2006-02-08 2007-02-08 静电卡盘 Active CN101379607B (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP031545/2006 2006-02-08
JP2006031545A JP4244229B2 (ja) 2006-02-08 2006-02-08 静電チャック
PCT/JP2007/052175 WO2007091619A1 (ja) 2006-02-08 2007-02-08 静電チャック

Publications (2)

Publication Number Publication Date
CN101379607A CN101379607A (zh) 2009-03-04
CN101379607B true CN101379607B (zh) 2010-04-21

Family

ID=38345213

Family Applications (1)

Application Number Title Priority Date Filing Date
CN2007800045852A Active CN101379607B (zh) 2006-02-08 2007-02-08 静电卡盘

Country Status (5)

Country Link
JP (1) JP4244229B2 (enrdf_load_stackoverflow)
KR (1) KR100989230B1 (enrdf_load_stackoverflow)
CN (1) CN101379607B (enrdf_load_stackoverflow)
TW (1) TWI342059B (enrdf_load_stackoverflow)
WO (1) WO2007091619A1 (enrdf_load_stackoverflow)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2009004752A (ja) * 2007-05-18 2009-01-08 Toto Ltd 静電チャック
JP4786693B2 (ja) 2008-09-30 2011-10-05 三菱重工業株式会社 ウェハ接合装置およびウェハ接合方法
JP5872998B2 (ja) 2012-04-26 2016-03-01 日本特殊陶業株式会社 アルミナ焼結体、それを備える部材、および半導体製造装置
KR102119867B1 (ko) * 2013-10-21 2020-06-09 주식회사 미코세라믹스 정전척
CN107663080B (zh) * 2016-07-27 2020-05-08 北京华卓精科科技股份有限公司 应用于j-r型静电卡盘的氧化铝陶瓷及其制备方法
JP2022142421A (ja) * 2021-03-16 2022-09-30 株式会社巴川製紙所 静電チャック装置およびその製造方法
JP2022142151A (ja) * 2021-03-16 2022-09-30 株式会社巴川製紙所 セラミック膜およびその製造方法、静電チャック装置およびその製造方法
CN118043292A (zh) * 2021-10-18 2024-05-14 日本特殊陶业株式会社 氧化铝质烧结体和静电卡盘
JP2023128213A (ja) * 2022-03-03 2023-09-14 株式会社巴川製紙所 静電チャック装置

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1529908A (zh) * 2001-06-28 2004-09-15 ��ķ�о����޹�˾ 陶瓷静电卡盘组件及其制备方法
CN1638084A (zh) * 2003-11-14 2005-07-13 爱德牌工程有限公司 静电卡盘、基片支持、夹具和电极结构及其制造方法

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH03204924A (ja) * 1989-10-30 1991-09-06 Sumitomo Metal Ind Ltd 試料保持装置
JPH09330974A (ja) * 1996-06-12 1997-12-22 Hitachi Ltd 静電吸着電極
JP4201502B2 (ja) * 2000-10-11 2008-12-24 独立行政法人産業技術総合研究所 静電チャックおよびその製造方法
JP2004352572A (ja) * 2003-05-29 2004-12-16 Kyocera Corp アルミナセラミックス及びその製造方法
JP4722463B2 (ja) * 2004-12-03 2011-07-13 黒崎播磨株式会社 静電チャック用誘電体セラミックス及びその製造方法

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1529908A (zh) * 2001-06-28 2004-09-15 ��ķ�о����޹�˾ 陶瓷静电卡盘组件及其制备方法
CN1638084A (zh) * 2003-11-14 2005-07-13 爱德牌工程有限公司 静电卡盘、基片支持、夹具和电极结构及其制造方法

Also Published As

Publication number Publication date
TWI342059B (en) 2011-05-11
KR100989230B1 (ko) 2010-10-20
TW200737398A (en) 2007-10-01
WO2007091619A1 (ja) 2007-08-16
JP2007214287A (ja) 2007-08-23
KR20080089444A (ko) 2008-10-06
CN101379607A (zh) 2009-03-04
JP4244229B2 (ja) 2009-03-25

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