CN101373785B - 光电转换器件和多芯片图像传感器 - Google Patents
光电转换器件和多芯片图像传感器 Download PDFInfo
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- CN101373785B CN101373785B CN200810210016XA CN200810210016A CN101373785B CN 101373785 B CN101373785 B CN 101373785B CN 200810210016X A CN200810210016X A CN 200810210016XA CN 200810210016 A CN200810210016 A CN 200810210016A CN 101373785 B CN101373785 B CN 101373785B
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- 238000006243 chemical reaction Methods 0.000 title claims abstract description 56
- 239000012535 impurity Substances 0.000 claims abstract description 89
- 238000002955 isolation Methods 0.000 claims description 100
- 230000005611 electricity Effects 0.000 claims 3
- 230000002093 peripheral effect Effects 0.000 claims 3
- 239000010410 layer Substances 0.000 description 38
- 238000000034 method Methods 0.000 description 27
- 230000008569 process Effects 0.000 description 26
- 238000009792 diffusion process Methods 0.000 description 20
- 238000005468 ion implantation Methods 0.000 description 19
- 239000004065 semiconductor Substances 0.000 description 19
- 230000035945 sensitivity Effects 0.000 description 15
- 238000010586 diagram Methods 0.000 description 14
- 238000004519 manufacturing process Methods 0.000 description 12
- 239000000758 substrate Substances 0.000 description 12
- 238000000206 photolithography Methods 0.000 description 9
- 238000001514 detection method Methods 0.000 description 8
- 230000003321 amplification Effects 0.000 description 4
- 230000007423 decrease Effects 0.000 description 4
- 229910052751 metal Inorganic materials 0.000 description 4
- 239000002184 metal Substances 0.000 description 4
- 238000003199 nucleic acid amplification method Methods 0.000 description 4
- 229910052710 silicon Inorganic materials 0.000 description 4
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 3
- 239000011229 interlayer Substances 0.000 description 3
- 230000009467 reduction Effects 0.000 description 3
- 239000010703 silicon Substances 0.000 description 3
- WQZGKKKJIJFFOK-GASJEMHNSA-N Glucose Chemical compound OC[C@H]1OC(O)[C@H](O)[C@@H](O)[C@@H]1O WQZGKKKJIJFFOK-GASJEMHNSA-N 0.000 description 2
- 238000009825 accumulation Methods 0.000 description 2
- 238000005530 etching Methods 0.000 description 2
- 230000002349 favourable effect Effects 0.000 description 2
- 238000005286 illumination Methods 0.000 description 2
- 230000003287 optical effect Effects 0.000 description 2
- 229920002120 photoresistant polymer Polymers 0.000 description 2
- 238000005036 potential barrier Methods 0.000 description 2
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 1
- 238000013459 approach Methods 0.000 description 1
- 229910052785 arsenic Inorganic materials 0.000 description 1
- RQNWIZPPADIBDY-UHFFFAOYSA-N arsenic atom Chemical compound [As] RQNWIZPPADIBDY-UHFFFAOYSA-N 0.000 description 1
- 230000004888 barrier function Effects 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 230000008595 infiltration Effects 0.000 description 1
- 238000001764 infiltration Methods 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 229910052698 phosphorus Inorganic materials 0.000 description 1
- 239000011574 phosphorus Substances 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 238000007665 sagging Methods 0.000 description 1
- 238000012546 transfer Methods 0.000 description 1
Images
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F39/00—Integrated devices, or assemblies of multiple devices, comprising at least one element covered by group H10F30/00, e.g. radiation detectors comprising photodiode arrays
- H10F39/80—Constructional details of image sensors
- H10F39/802—Geometry or disposition of elements in pixels, e.g. address-lines or gate electrodes
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F39/00—Integrated devices, or assemblies of multiple devices, comprising at least one element covered by group H10F30/00, e.g. radiation detectors comprising photodiode arrays
- H10F39/011—Manufacture or treatment of image sensors covered by group H10F39/12
- H10F39/026—Wafer-level processing
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F39/00—Integrated devices, or assemblies of multiple devices, comprising at least one element covered by group H10F30/00, e.g. radiation detectors comprising photodiode arrays
- H10F39/10—Integrated devices
- H10F39/12—Image sensors
- H10F39/18—Complementary metal-oxide-semiconductor [CMOS] image sensors; Photodiode array image sensors
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F77/00—Constructional details of devices covered by this subclass
- H10F77/10—Semiconductor bodies
- H10F77/14—Shape of semiconductor bodies; Shapes, relative sizes or dispositions of semiconductor regions within semiconductor bodies
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- Solid State Image Pick-Up Elements (AREA)
- Light Receiving Elements (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2007218330A JP5180537B2 (ja) | 2007-08-24 | 2007-08-24 | 光電変換装置及びマルチチップイメージセンサ |
| JP2007-218330 | 2007-08-24 | ||
| JP2007218330 | 2007-08-24 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN101373785A CN101373785A (zh) | 2009-02-25 |
| CN101373785B true CN101373785B (zh) | 2010-06-02 |
Family
ID=40381377
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN200810210016XA Expired - Fee Related CN101373785B (zh) | 2007-08-24 | 2008-08-22 | 光电转换器件和多芯片图像传感器 |
Country Status (4)
| Country | Link |
|---|---|
| US (1) | US7816755B2 (enExample) |
| JP (1) | JP5180537B2 (enExample) |
| CN (1) | CN101373785B (enExample) |
| TW (1) | TWI373842B (enExample) |
Families Citing this family (24)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP4891308B2 (ja) | 2008-12-17 | 2012-03-07 | キヤノン株式会社 | 固体撮像装置及び固体撮像装置を用いた撮像システム |
| JP5562172B2 (ja) | 2010-08-10 | 2014-07-30 | キヤノン株式会社 | 定電流回路及びそれを用いた固体撮像装置 |
| JP6045136B2 (ja) | 2011-01-31 | 2016-12-14 | キヤノン株式会社 | 光電変換装置 |
| JP6087681B2 (ja) * | 2013-03-21 | 2017-03-01 | キヤノン株式会社 | 固体撮像装置及び撮像システム |
| JP6246004B2 (ja) | 2014-01-30 | 2017-12-13 | キヤノン株式会社 | 固体撮像装置 |
| JP2015177034A (ja) * | 2014-03-14 | 2015-10-05 | キヤノン株式会社 | 固体撮像装置、その製造方法、及びカメラ |
| JP6412328B2 (ja) | 2014-04-01 | 2018-10-24 | キヤノン株式会社 | 固体撮像装置およびカメラ |
| JP6482186B2 (ja) | 2014-05-23 | 2019-03-13 | キヤノン株式会社 | 撮像装置及びその駆動方法 |
| JP6480768B2 (ja) | 2015-03-17 | 2019-03-13 | キヤノン株式会社 | 固体撮像装置及びその駆動方法 |
| JP6738200B2 (ja) * | 2016-05-26 | 2020-08-12 | キヤノン株式会社 | 撮像装置 |
| JP6806553B2 (ja) | 2016-12-15 | 2021-01-06 | キヤノン株式会社 | 撮像装置、撮像装置の駆動方法及び撮像システム |
| US10834354B2 (en) | 2018-06-25 | 2020-11-10 | Canon Kabushiki Kaisha | Imaging device, imaging system, movable object, and signal processing device |
| JP7245014B2 (ja) | 2018-09-10 | 2023-03-23 | キヤノン株式会社 | 固体撮像装置、撮像システム、および固体撮像装置の駆動方法 |
| JP7353752B2 (ja) | 2018-12-06 | 2023-10-02 | キヤノン株式会社 | 光電変換装置及び撮像システム |
| JP7303682B2 (ja) | 2019-07-19 | 2023-07-05 | キヤノン株式会社 | 光電変換装置及び撮像システム |
| JP7374639B2 (ja) | 2019-07-19 | 2023-11-07 | キヤノン株式会社 | 光電変換装置及び撮像システム |
| KR20210112055A (ko) * | 2020-03-04 | 2021-09-14 | 에스케이하이닉스 주식회사 | 픽셀 및 이를 포함하는 이미지 센서 |
| CN113497905B (zh) | 2020-04-01 | 2024-03-12 | 佳能株式会社 | 光电转换设备、成像系统和移动物体 |
| KR20220043463A (ko) * | 2020-09-29 | 2022-04-05 | 에스케이하이닉스 주식회사 | 이미지 센싱 장치 |
| KR20220075096A (ko) | 2020-11-27 | 2022-06-07 | 삼성전자주식회사 | 이미지 센서 |
| EP4195683A1 (en) | 2021-12-07 | 2023-06-14 | Canon Kabushiki Kaisha | Photoelectric conversion device |
| JP7414791B2 (ja) | 2021-12-07 | 2024-01-16 | キヤノン株式会社 | 光電変換装置、機器 |
| JP2023099394A (ja) | 2022-01-01 | 2023-07-13 | キヤノン株式会社 | 光電変換装置、光電変換システム、および機器 |
| WO2024142599A1 (ja) * | 2022-12-26 | 2024-07-04 | ソニーセミコンダクタソリューションズ株式会社 | 光検出装置、光検出装置の製造方法、及び電子機器 |
Family Cites Families (26)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2521789B2 (ja) * | 1988-05-31 | 1996-08-07 | 沖電気工業株式会社 | 固体撮像装置の感光部構造 |
| US5563429A (en) * | 1994-06-14 | 1996-10-08 | Nikon Corp. | Solid state imaging device |
| JP3412390B2 (ja) * | 1996-03-18 | 2003-06-03 | 株式会社ニコン | 光電変換装置 |
| JP3874135B2 (ja) * | 1997-12-05 | 2007-01-31 | 株式会社ニコン | 固体撮像素子 |
| JPH11261046A (ja) | 1998-03-12 | 1999-09-24 | Canon Inc | 固体撮像装置 |
| JP3571909B2 (ja) | 1998-03-19 | 2004-09-29 | キヤノン株式会社 | 固体撮像装置及びその製造方法 |
| JP3457551B2 (ja) * | 1998-11-09 | 2003-10-20 | 株式会社東芝 | 固体撮像装置 |
| JP3467013B2 (ja) | 1999-12-06 | 2003-11-17 | キヤノン株式会社 | 固体撮像装置 |
| US6717151B2 (en) | 2000-07-10 | 2004-04-06 | Canon Kabushiki Kaisha | Image pickup apparatus |
| JP3759435B2 (ja) * | 2001-07-11 | 2006-03-22 | ソニー株式会社 | X−yアドレス型固体撮像素子 |
| JP4282049B2 (ja) * | 2002-02-28 | 2009-06-17 | キヤノン株式会社 | 半導体装置、光電変換装置及びカメラ |
| US7470944B2 (en) * | 2002-06-26 | 2008-12-30 | Nikon Corporation | Solid-state image sensor |
| US7473977B2 (en) * | 2003-03-06 | 2009-01-06 | Sony Corporation | Method of driving solid state image sensing device |
| JP4228887B2 (ja) * | 2003-04-02 | 2009-02-25 | ソニー株式会社 | 固体撮像素子およびその製造方法 |
| JP2004319683A (ja) * | 2003-04-15 | 2004-11-11 | Sharp Corp | 固体撮像装置およびその駆動方法 |
| TWI236838B (en) * | 2004-04-22 | 2005-07-21 | Avision Inc | Image acquisition device and method capable of rotating document images |
| JP2005317875A (ja) * | 2004-04-30 | 2005-11-10 | Toshiba Corp | 固体撮像装置 |
| JP4507769B2 (ja) * | 2004-08-31 | 2010-07-21 | ソニー株式会社 | 固体撮像素子、カメラモジュール及び電子機器モジュール |
| JP4069918B2 (ja) * | 2004-09-27 | 2008-04-02 | セイコーエプソン株式会社 | 固体撮像装置 |
| JP4508891B2 (ja) | 2005-01-28 | 2010-07-21 | キヤノン株式会社 | 光電変換装置、マルチチップ型イメージセンサ、密着型イメージセンサおよび画像読取装置 |
| JP4572130B2 (ja) * | 2005-03-09 | 2010-10-27 | 富士フイルム株式会社 | 固体撮像素子 |
| JP2006294871A (ja) * | 2005-04-11 | 2006-10-26 | Matsushita Electric Ind Co Ltd | 固体撮像装置 |
| JP2007027558A (ja) | 2005-07-20 | 2007-02-01 | Canon Inc | 光電変換装置、及びマルチチップ型イメージセンサ |
| JP4679340B2 (ja) * | 2005-11-11 | 2011-04-27 | 株式会社東芝 | 固体撮像装置 |
| JP2007335751A (ja) * | 2006-06-16 | 2007-12-27 | Toshiba Corp | 固体撮像装置 |
| JP5116264B2 (ja) * | 2006-07-10 | 2013-01-09 | キヤノン株式会社 | 光電変換装置、光電変換装置の製造方法および光電変換装置を用いた撮像システム |
-
2007
- 2007-08-24 JP JP2007218330A patent/JP5180537B2/ja not_active Expired - Fee Related
-
2008
- 2008-08-04 US US12/185,267 patent/US7816755B2/en not_active Expired - Fee Related
- 2008-08-12 TW TW097130662A patent/TWI373842B/zh not_active IP Right Cessation
- 2008-08-22 CN CN200810210016XA patent/CN101373785B/zh not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| CN101373785A (zh) | 2009-02-25 |
| US20090050993A1 (en) | 2009-02-26 |
| TW200924179A (en) | 2009-06-01 |
| JP5180537B2 (ja) | 2013-04-10 |
| JP2009054696A (ja) | 2009-03-12 |
| US7816755B2 (en) | 2010-10-19 |
| TWI373842B (en) | 2012-10-01 |
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| CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20100602 Termination date: 20180822 |
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| CF01 | Termination of patent right due to non-payment of annual fee |