CN101366116B - 制造厚布线结构的双镶嵌工艺 - Google Patents
制造厚布线结构的双镶嵌工艺 Download PDFInfo
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- CN101366116B CN101366116B CN2007800021519A CN200780002151A CN101366116B CN 101366116 B CN101366116 B CN 101366116B CN 2007800021519 A CN2007800021519 A CN 2007800021519A CN 200780002151 A CN200780002151 A CN 200780002151A CN 101366116 B CN101366116 B CN 101366116B
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/48—Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor
- H01L23/481—Internal lead connections, e.g. via connections, feedthrough structures
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
- H01L21/71—Manufacture of specific parts of devices defined in group H01L21/70
- H01L21/768—Applying interconnections to be used for carrying current between separate components within a device comprising conductors and dielectrics
- H01L21/76801—Applying interconnections to be used for carrying current between separate components within a device comprising conductors and dielectrics characterised by the formation and the after-treatment of the dielectrics, e.g. smoothing
- H01L21/76802—Applying interconnections to be used for carrying current between separate components within a device comprising conductors and dielectrics characterised by the formation and the after-treatment of the dielectrics, e.g. smoothing by forming openings in dielectrics
- H01L21/76807—Applying interconnections to be used for carrying current between separate components within a device comprising conductors and dielectrics characterised by the formation and the after-treatment of the dielectrics, e.g. smoothing by forming openings in dielectrics for dual damascene structures
- H01L21/76808—Applying interconnections to be used for carrying current between separate components within a device comprising conductors and dielectrics characterised by the formation and the after-treatment of the dielectrics, e.g. smoothing by forming openings in dielectrics for dual damascene structures involving intermediate temporary filling with material
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
- H01L21/71—Manufacture of specific parts of devices defined in group H01L21/70
- H01L21/768—Applying interconnections to be used for carrying current between separate components within a device comprising conductors and dielectrics
- H01L21/76801—Applying interconnections to be used for carrying current between separate components within a device comprising conductors and dielectrics characterised by the formation and the after-treatment of the dielectrics, e.g. smoothing
- H01L21/76802—Applying interconnections to be used for carrying current between separate components within a device comprising conductors and dielectrics characterised by the formation and the after-treatment of the dielectrics, e.g. smoothing by forming openings in dielectrics
- H01L21/76807—Applying interconnections to be used for carrying current between separate components within a device comprising conductors and dielectrics characterised by the formation and the after-treatment of the dielectrics, e.g. smoothing by forming openings in dielectrics for dual damascene structures
- H01L21/76813—Applying interconnections to be used for carrying current between separate components within a device comprising conductors and dielectrics characterised by the formation and the after-treatment of the dielectrics, e.g. smoothing by forming openings in dielectrics for dual damascene structures involving a partial via etch
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
- H01L21/71—Manufacture of specific parts of devices defined in group H01L21/70
- H01L21/768—Applying interconnections to be used for carrying current between separate components within a device comprising conductors and dielectrics
- H01L21/76801—Applying interconnections to be used for carrying current between separate components within a device comprising conductors and dielectrics characterised by the formation and the after-treatment of the dielectrics, e.g. smoothing
- H01L21/76829—Applying interconnections to be used for carrying current between separate components within a device comprising conductors and dielectrics characterised by the formation and the after-treatment of the dielectrics, e.g. smoothing characterised by the formation of thin functional dielectric layers, e.g. dielectric etch-stop, barrier, capping or liner layers
- H01L21/76832—Multiple layers
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/52—Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames
- H01L23/522—Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames including external interconnections consisting of a multilayer structure of conductive and insulating layers inseparably formed on the semiconductor body
- H01L23/5222—Capacitive arrangements or effects of, or between wiring layers
- H01L23/5223—Capacitor integral with wiring layers
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2221/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof covered by H01L21/00
- H01L2221/10—Applying interconnections to be used for carrying current between separate components within a device
- H01L2221/1005—Formation and after-treatment of dielectrics
- H01L2221/101—Forming openings in dielectrics
- H01L2221/1015—Forming openings in dielectrics for dual damascene structures
- H01L2221/1036—Dual damascene with different via-level and trench-level dielectrics
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L28/00—Passive two-terminal components without a potential-jump or surface barrier for integrated circuits; Details thereof; Multistep manufacturing processes therefor
- H01L28/40—Capacitors
- H01L28/60—Electrodes
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/0001—Technical content checked by a classifier
- H01L2924/0002—Not covered by any one of groups H01L24/00, H01L24/00 and H01L2224/00
Abstract
Description
蚀刻工艺 | 工艺条件 | 注释 |
非选择性RIE | Ar/CF4/CHF3/O2 | 使部分过孔的底部穿过掩埋的氮化物,但停止在MIM之上。在实施例中,应该具有最小的过孔的拐角倒角(rounding),因为其导致掩埋的氮化物层的侵蚀。 |
选择性槽RIE | Ar/O2/C4F8/CO | 在部分过孔的底部触及MIM氮化物之前,清除槽氧化物以及终点(endpoint)。在实施例中,应该对掩埋的氮化物层具有非常小的侵蚀。 |
选择性过孔RIE | Ar/O2/C4F8/CO | 标准超选择性过孔蚀刻化学。在实施例中,应该具有足够的过蚀刻以确保层间良好的连接性。 |
无晶片偏置的抗蚀剂剥离 | O2 | 用于氮化物保存的标准抗蚀剂剥离 |
有晶片偏置的抗蚀剂剥离 | O2 | 用于氮化物保存的标准抗蚀剂剥离 |
氮化硅RIE | Ar/CF4/CHF3/O2 | 标准氮化物蚀刻 |
去氟(Deflourinati-on)清洁 | N2/H2 | 用于残留的蚀刻聚合物的标准DF清洁 |
层 | 厚度 | 注释 |
50 | 150nm | MIM底板 |
51 | 30nm | MIM介质 |
52 | 50nm | MIM顶板 |
53 | 50nm | MIM顶板蚀刻硬掩模 |
54 | 50nm | MIM底板蚀刻硬掩模 |
Claims (33)
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US11/275,604 US7602068B2 (en) | 2006-01-19 | 2006-01-19 | Dual-damascene process to fabricate thick wire structure |
US11/275,604 | 2006-01-19 | ||
PCT/US2007/060767 WO2007084982A2 (en) | 2006-01-19 | 2007-01-19 | Dual-damascene process to fabricate thick wire structure |
Publications (2)
Publication Number | Publication Date |
---|---|
CN101366116A CN101366116A (zh) | 2009-02-11 |
CN101366116B true CN101366116B (zh) | 2012-09-26 |
Family
ID=36316858
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN2007800021519A Active CN101366116B (zh) | 2006-01-19 | 2007-01-19 | 制造厚布线结构的双镶嵌工艺 |
Country Status (6)
Country | Link |
---|---|
US (4) | US7602068B2 (zh) |
EP (1) | EP1974379A4 (zh) |
JP (1) | JP2009524257A (zh) |
CN (1) | CN101366116B (zh) |
TW (1) | TWI397948B (zh) |
WO (1) | WO2007084982A2 (zh) |
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JP5824330B2 (ja) * | 2011-11-07 | 2015-11-25 | ルネサスエレクトロニクス株式会社 | 半導体装置及び半導体装置の製造方法 |
US9082624B2 (en) | 2013-01-02 | 2015-07-14 | International Business Machines Corporation | Signal path of a multiple-patterned semiconductor device |
US8866306B2 (en) | 2013-01-02 | 2014-10-21 | International Business Machines Corporation | Signal path and method of manufacturing a multiple-patterned semiconductor device |
US9257496B2 (en) * | 2013-01-16 | 2016-02-09 | United Microelectronics Corporation | Method of fabricating capacitor structure |
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US9373582B1 (en) * | 2015-06-24 | 2016-06-21 | International Business Machines Corporation | Self aligned via in integrated circuit |
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US10164003B2 (en) * | 2016-01-14 | 2018-12-25 | Taiwan Semiconductor Manufacturing Company Ltd. | MIM capacitor and method of forming the same |
EP3389085B1 (en) | 2017-04-12 | 2019-11-06 | Nxp B.V. | Method of making a plurality of packaged semiconductor devices |
CN110648960B (zh) * | 2018-06-27 | 2021-12-28 | 中电海康集团有限公司 | Mram器件与其制作方法 |
KR20200051215A (ko) * | 2018-11-05 | 2020-05-13 | 삼성전기주식회사 | 인쇄회로기판 및 이를 포함하는 패키지 구조물 |
KR20210009493A (ko) | 2019-07-17 | 2021-01-27 | 삼성전자주식회사 | 반도체 장치 및 이의 제조 방법 |
CN112885781B (zh) * | 2019-11-29 | 2022-06-24 | 长鑫存储技术有限公司 | 有源区的制备方法及半导体器件 |
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-
2006
- 2006-01-19 US US11/275,604 patent/US7602068B2/en active Active
-
2007
- 2007-01-15 TW TW096101395A patent/TWI397948B/zh not_active IP Right Cessation
- 2007-01-19 CN CN2007800021519A patent/CN101366116B/zh active Active
- 2007-01-19 EP EP07710226A patent/EP1974379A4/en not_active Withdrawn
- 2007-01-19 JP JP2008551545A patent/JP2009524257A/ja active Pending
- 2007-01-19 WO PCT/US2007/060767 patent/WO2007084982A2/en active Application Filing
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2009
- 2009-09-22 US US12/564,482 patent/US8236663B2/en not_active Expired - Fee Related
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2012
- 2012-03-28 US US13/432,421 patent/US8753950B2/en active Active
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2014
- 2014-01-28 US US14/166,274 patent/US9171778B2/en active Active
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US6204166B1 (en) * | 1998-08-21 | 2001-03-20 | Micron Technology, Inc. | Method for forming dual damascene structures |
US6597032B1 (en) * | 1999-02-04 | 2003-07-22 | Samsung Electronics Co., Ltd. | Metal-insulator-metal (MIM) capacitors |
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US6949442B2 (en) * | 2003-05-05 | 2005-09-27 | Infineon Technologies Ag | Methods of forming MIM capacitors |
Also Published As
Publication number | Publication date |
---|---|
US7602068B2 (en) | 2009-10-13 |
CN101366116A (zh) | 2009-02-11 |
US20120190164A1 (en) | 2012-07-26 |
EP1974379A4 (en) | 2011-06-01 |
WO2007084982A8 (en) | 2008-07-10 |
US9171778B2 (en) | 2015-10-27 |
US20100009509A1 (en) | 2010-01-14 |
US8753950B2 (en) | 2014-06-17 |
TW200809923A (en) | 2008-02-16 |
JP2009524257A (ja) | 2009-06-25 |
TWI397948B (zh) | 2013-06-01 |
WO2007084982A3 (en) | 2007-11-29 |
WO2007084982A2 (en) | 2007-07-26 |
US8236663B2 (en) | 2012-08-07 |
US20070190718A1 (en) | 2007-08-16 |
US20140151899A1 (en) | 2014-06-05 |
EP1974379A2 (en) | 2008-10-01 |
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