CN101351538A - 包含不饱和氟化烃的溶剂组合物 - Google Patents
包含不饱和氟化烃的溶剂组合物 Download PDFInfo
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- CN101351538A CN101351538A CNA2006800502092A CN200680050209A CN101351538A CN 101351538 A CN101351538 A CN 101351538A CN A2006800502092 A CNA2006800502092 A CN A2006800502092A CN 200680050209 A CN200680050209 A CN 200680050209A CN 101351538 A CN101351538 A CN 101351538A
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- GVNVAWHJIKLAGL-UHFFFAOYSA-N 2-(cyclohexen-1-yl)cyclohexan-1-one Chemical compound O=C1CCCCC1C1=CCCCC1 GVNVAWHJIKLAGL-UHFFFAOYSA-N 0.000 claims description 36
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- WAEVWDZKMBQDEJ-UHFFFAOYSA-N 2-[2-(2-methoxypropoxy)propoxy]propan-1-ol Chemical compound COC(C)COC(C)COC(C)CO WAEVWDZKMBQDEJ-UHFFFAOYSA-N 0.000 description 1
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- HUAUNKAZQWMVFY-UHFFFAOYSA-M sodium;oxocalcium;hydroxide Chemical compound [OH-].[Na+].[Ca]=O HUAUNKAZQWMVFY-UHFFFAOYSA-M 0.000 description 1
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Classifications
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J9/00—Working-up of macromolecular substances to porous or cellular articles or materials; After-treatment thereof
- C08J9/04—Working-up of macromolecular substances to porous or cellular articles or materials; After-treatment thereof using blowing gases generated by a previously added blowing agent
- C08J9/12—Working-up of macromolecular substances to porous or cellular articles or materials; After-treatment thereof using blowing gases generated by a previously added blowing agent by a physical blowing agent
- C08J9/14—Working-up of macromolecular substances to porous or cellular articles or materials; After-treatment thereof using blowing gases generated by a previously added blowing agent by a physical blowing agent organic
- C08J9/143—Halogen containing compounds
- C08J9/144—Halogen containing compounds containing carbon, halogen and hydrogen only
- C08J9/146—Halogen containing compounds containing carbon, halogen and hydrogen only only fluorine as halogen atoms
-
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D3/00—Other compounding ingredients of detergent compositions covered in group C11D1/00
- C11D3/16—Organic compounds
- C11D3/24—Organic compounds containing halogen
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C23/00—Other surface treatment of glass not in the form of fibres or filaments
- C03C23/0075—Cleaning of glass
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C21/00—Acyclic unsaturated compounds containing halogen atoms
- C07C21/02—Acyclic unsaturated compounds containing halogen atoms containing carbon-to-carbon double bonds
- C07C21/18—Acyclic unsaturated compounds containing halogen atoms containing carbon-to-carbon double bonds containing fluorine
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G18/00—Polymeric products of isocyanates or isothiocyanates
- C08G18/06—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen
- C08G18/28—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen characterised by the compounds used containing active hydrogen
- C08G18/40—High-molecular-weight compounds
- C08G18/42—Polycondensates having carboxylic or carbonic ester groups in the main chain
- C08G18/4205—Polycondensates having carboxylic or carbonic ester groups in the main chain containing cyclic groups
- C08G18/4208—Polycondensates having carboxylic or carbonic ester groups in the main chain containing cyclic groups containing aromatic groups
-
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Abstract
公开了从表面上除去残留物的方法,包括:使表面与包含至少一种不饱和氟化烃的组合物接触,该不饱和氟化烃选自:具有式E-或Z-R1CH=CHR2的化合物,其中R1和R2独立地为C1至C6全氟烷基,或C1至C6氢氟烷基,并从该组合物中回收表面。
Description
对相关申请的交叉引用
本申请要求2005年11月1日提交的美国临时申请60/732,771的优先权。
发明领域
本发明涉及包含不饱和氟化烃的清洁组合物。本发明进一步涉及所述清洁组合物在清洁、除脂、去焊剂、脱水和沉积氟化碳润滑油的方法中的用途。本发明进一步涉及新型不饱和氟化烃及其作为清洁组合物和在上列方法中的用途。
发明背景
氯氟烃(CFC)化合物已经广泛用在半导体制造领域中以清洁磁盘介质之类的表面。但是,含氯化合物,例如CFC化合物,被认为对地球臭氧层有害。此外,用于替代CFC化合物的许多氢氟烃(hydrofluorocarbons)已经被发现是造成全球变暖的原因之一。因此,需要找出用于清洁用途,例如用于除去残留焊剂、润滑剂或油污染物和颗粒的新的环境安全的溶剂。还需要找出用于氟化碳润滑油的沉积和用于在水溶液中加工后的基底的干燥或脱水的新型溶剂。
本发明提供了包含不饱和氟化烃的新型组合物。这些组合物可用在之前使用CFC化合物的许多应用领域中。本发明的组合物具有几乎或完全没有环境影响的一些或所有所需性质,具有溶解油、油脂或润滑剂(特别是含氟润滑剂)的能力、不燃性、和溶解干燥或脱水方法中所用的表面活性剂化合物的能力。
发明概述
本文公开了使用包含至少一种不饱和氟化烃的组合物的新型方法,该不饱和氟化烃选自:具有式E-或Z-R1CH=CHR2的化合物,其中R1和R2独立地为C1至C6全氟烷基,或C1至C6氢氟烷基。
在一个实施方案中,本文公开的方法是使用具有式E-或Z-R1CH=CHR2的化合物来清洁制品或基底的方法,其中R1和R2独立地为C1至C6全氟烷基,或C1至C6氢氟烷基。
在另一实施方案中的是在表面上沉积氟化碳润滑油的方法,包括:
(a)将氟化碳润滑油与包含不饱和氟化烃的溶剂组合,该不饱和氟化烃选自:具有式E-或Z-R1CH=CHR2的不饱和氟化烃,其中R1和R2独立地为C1至C6全氟烷基,或C1至C6氢氟烷基;
从而形成润滑剂-溶剂的组合;
(b)使润滑剂-溶剂的组合与表面接触;和
(c)使溶剂从表面上蒸发以便在表面上形成氟化碳润滑油涂层。
在再一实施方案中的是从被润湿的基底表面上除去至少一部分水的方法,所述方法包括:
a)使基底与进一步包含表面活性剂的本发明组合物接触,然后
b)使基底与所述组合物脱离接触。
在再一实施方案中的是包含具有式R1CH=CHR2的不饱和氟化烃的组合物,其中R1和R2独立地为C1至C6全氟烷基,或C1至C6氢氟烷基。
本领域技术人员参照下列详述能够清楚看出本发明的其它目的和优点。
发明详述
上文已经描述了许多方面和实施方案并且仅是示例性而非限制性的。在阅读此说明书后,技术人员会认识到,可能具有不背离本发明的范围的其它方面和实施方案。根据下列详述和根据权利要求书,可以看出任何一个或多个实施方案的其它特征和益处。
在列出下述实施方案的详情之前,定义或澄清一些术语。
本文所用的术语“包含”、“包括”、“含有”、“涵盖”、“拥有”、“具有”或其任何其它变型旨在表示非穷尽性的包含。例如,包含所列要素的工艺、方法、制品或装置不一定仅限于这些要素,而是还可以包括没有明确列出的或是这类工艺、方法、制品或装置所固有的其它要素。此外,除非明确作出相反的论述,“或”是指可兼具的“或”而非排他性的“或”。例如下列任何一种情况满足条件A或B:A是真(或存在)且B是假(或不存在),A是假(或不存在)且B是真(或存在),和A和B都是真(或存在)。
此外,使用“a”或“an”描述本文所述的要素和组分。其仅为方便起见使用并且给出本发明的范围的一般意义。该描述应该被理解为包括一种或至少一种,单数也包括复数形式,除非其明显地意味着相反情况。
除非另行指明,否则本文所用的所有技术和科学术语具有本发明所属领域普通技术人员通常理解的相同含义。尽管可以在本发明的实施方案的实践或测试中使用与本文所述的类似或相当的方法和材料,但下面将描述合适的方法和材料。本文提到的所有出版物、专利申请、专利和其它参考文献均全文经此引用并入本文,除非列出具体的段落。在冲突的情况下,以本说明书,包括定义为准。此外,材料、方法和实例仅是示例性而非限制性的。
申请人明确地将所有列举的参考文献的全部内容并入本公开中。申请人还经此引用并入共有的临时申请:2005年11月1日提交的60/732,396、2005年11月1日提交的60/732,090、2005年11月1日提交的60/732,292和2005年11月1日提交的60/732,581。
此外,当量、浓度或其它值或参数作为范围、优选范围、或优选上限值和优选下限值的列表给出时,这被理解为具体公开了由任何范围上限或优选值和任何范围下限或优选值任意成对构成的所有范围,无论是否单独公开这些范围。当本文中列举数值范围时,除非另行指明,该范围旨在包括其端点和在该范围内的所有整数和分数。本发明的范围不限于界定一个范围时所列举的具体值。
在一个实施方案中,本发明提供了具有式E-或Z-R1CH=CHR2(式I)的化合物,其中R1和R2独立地为C1至C6全氟烷基,或C1至C6氢氟烷基。R1和R2基团的实例包括,但不限于,CF3、C2F5,CF2CF2CF3、CF(CF3)2、CF2CF2CF2CF3、CF(CF3)CF2CF3、CF2CF(CF3)2、C(CF3)3、CF2CF2CF2CF2CF3、CF2CF2CF(CF3)2、C(CF3)2C2F5、CF2CF2CF2CF2CF2CF3、CF(CF3)CF2CF2C2F5、C(CF3)2CF2C2F5、CHF2、CH2F、C2HF4、C2H2F3、C2H3F2、C3HF6、i-C3HF6、C3H2F5、C3H3F4、C4HF8、C4H3F6、C5HF10、C5H3F8或C6HF12。当位置异构体可行时,氢氟烷基的化学式旨在表示所有可能的位置异构体。也就是说,例如,C2HF4旨在表示-CHFCF3和-CF2CHF2基团。在一个实施方案中,氢氟烷基的具体实例包括,但不限于,-CHF2、-CH2F、-CF2CHF2、-CHFCF3、-CH2CHF2、-CF2CH3、-CH2CF3、-CH2CF2CHF2、-CF2CHFCF3、-CF2CF2CF2CH3、-CH2(CF2)3CHF2。示例性的非限制性的式I化合物列在表1中。
表1
代码 | 结构 | 化学名 |
F11E | CF3CH=CHCF3 | 1,1,1,4,4,4-六氟丁-2-烯 |
F12E | CF3CH=CHC2F5 | 1,1,1,4,4,5,5,5-八氟戊-2-烯 |
F13E | CF3CH=CHCF2C2F5 | 1,1,1,4,4,5,5,6,6,6-十氟己-2-烯 |
F13iE | CF3CH=CHCF(CF3)2 | 1,1,1,4,5,5,5-七氟-4-(三氟甲基)戊-2-烯 |
F22E | C2F5CH=CHC2F5 | 1,1,1,2,2,5,5,6,6,6-十氟己-3-烯 |
F14E | CF3CH=CH(CF2)3CF3 | 1,1,1,4,4,5,5,6,6,7,7,7-十二氟庚-2-烯 |
F14iE | CF3CH=CHCF2CF-(CF3)2 | 1,1,1,4,4,5,6,6,6-九氟-5-(三氟甲基)己-2-烯 |
F14sE | CF3CH=CHCF(CF3)-C2F5 | 1,1,1,4,5,5,6,6,6-九氟-4-(三氟甲基)己-2-烯 |
F14tE | CF3CH=CHC(CF3)3 | 1,1,1,5,5,5-六氟-4,4-双(三氟甲基)戊-2-烯 |
F23E | C2F5CH=CHCF2C2F5 | 1,1,1,2,2,5,5,6,6,7,7,7-十二氟庚-3-烯 |
F23iE | C2F5CH=CHCF(CF3)2 | 1,1,1,2,2,5,6,6,6-九氟-5-(三氟甲基)己-3-烯 |
F15E | CF3CH=CH(CF2)4CF3 | 1,1,1,4,4,5,5,6,6,7,7,8,8,8-十四氟辛-2-烯 |
F15iE | CF3CH=CH-CF2CF2CF(CF3)2 | 1,1,1,4,4,5,5,6,7,7,7-十一氟-6-(三氟甲基)庚-2-烯 |
F15tE | CF3CH=CH-C(CF3)2C2F5 | 1,1,1,5,5,6,6,6-八氟-4,4-双(三氟甲基)己-2-烯 |
F24E | C2F5CH=CH(CF2)3CF3 | 1,1,1,2,2,5,5,6,6,7,7,8,8,8-十四氟辛-3-烯 |
F24iE | C2F5CH=CHCF2CF-(CF3)2 | 1,1,1,2,2,5,5,6,7,7,7-十一氟-6-(三氟甲基)庚-3-烯 |
F24sE | C2F5CH=CHCF(CF3)-C2F5 | 1,1,1,2,2,5,6,6,7,7,7-十一氟-5-(三氟甲基)庚-3-烯 |
F24tE | C2F5CH=CHC(CF3)3 | 1,1,1,2,2,6,6,6-八氟-5,5-双(三氟甲基)己-3-烯 |
F33E | C2F5CF2CH=CH-CF2C2F5 | 1,1,1,2,2,3,3,6,6,7,7,8,8,8-十四氟辛-4-烯 |
F3i3iE | (CF3)2CFCH=CH-CF(CF3)2 | 1,1,1,2,5,6,6,6-八氟-2,5-双(三氟甲基)己-3-烯 |
F33iE | C2F5CF2CH=CH-CF(CF3)2 | 1,1,1,2,5,5,6,6,7,7,7-十一氟-2-(三氟甲基)庚-3-烯 |
F16E | CF3CH=CH(CF2)5CF3 | 1,1,1,4,4,5,5,6,6,7,7,8,8,,9,9,9-十六氟壬-2-烯 |
F16sE | CF3CH=CHCF(CF3)-(CF2)2C2F5 | 1,1,1,4,5,5,6,6,7,7,8,8,8-十三氟-4-(三氟甲基)庚-2-烯 |
F16tE | CF3CH=CHC(CF3)2-CF2C2F5 | 1,1,1,6,6,6-八氟-4,4-双(三氟甲基)庚-2-烯 |
F25E | C2F5CH=CH(CF2)4CF3 | 1,1,1,2,2,5,5,6,6,7,7,8,8,9,9,9-十六氟壬-3-烯 |
F25iE | C2F5CH=CH-CF2CF2CF(CF3)2 | 1,1,1,2,2,5,5,6,6,7,8,8,8-十三氟-7-(三氟甲基)辛-3-烯 |
F25tE | C2F5CH=CH-C(CF3)2C2F5 | 1,1,1,2,2,6,6,7,7,7-十氟-5,5-双(三氟甲基)庚-3-烯 |
F34E | C2F5CF2CH=CH-(CF2)3CF3 | 1,1,1,2,2,3,3,6,6,7,7,8,8,9,9,9-十六氟壬-4-烯 |
F34iE | C2F5CF2CH=CH-CF2CF(CF3)2 | 1,1,1,2,2,3,3,6,6,7,8,8,8-十三氟-7-(三氟甲基)辛-4-烯 |
F34sE | C2F5CF2CH=CH-CF(CF3)C2F5 | 1,1,1,2,2,3,3,6,7,7,8,8,8-十三氟-6-(三氟甲基)辛-4-烯 |
F34tE | C2F5CF2CH=CH-C(CF3)3 | 1,1,1,5,5,6,6,7,7,7-十氟-2,2-双(三氟甲基)庚-3-烯 |
F3i4E | (CF3)2CFCH=CH-(CF2)3CF3 | 1,1,1,2,5,5,6,6,7,7,8,8,8-十三氟-2(三氟甲基)辛-3-烯 |
F3i4iE | (CF3)2CFCH=CH-CF2CF(CF3)2 | 1,1,1,2,5,5,6,7,7,7-十氟-2,6-双(三氟甲基)庚-3-烯 |
F3i4sE | (CF3)2CFCH=CH-CF(CF3)C2F5 | 1,1,1,2,5,6,6,7,7,7-十氟-2,5-双(三氟甲基)庚-3-烯 |
F3i4tE | (CF3)2CFCH=CH-C(CF3)3 | 1,1,1,2,6,6,6-七氟-2,5,5-三(三氟甲基)己-3-烯 |
F26E | C2F5CH=CH(CF2)5CF3 | 1,1,1,2,2,5,5,6,6,7,7,8,8,9,9,10,10,10-十八氟癸-3-烯 |
F26sE | C2F5CH=CHCF(CF3)-(CF2)2C2F5 | 1,1,1,2,2,5,6,6,7,7,8,8,9,9,9-十五氟-5-(三氟甲基)壬-3-烯 |
F26tE | C2F5CH=CHC(CF3)2-CF2C2F5 | 1,1,1,2,2,6,6,7,7,8,8,8-十二氟-5,5-双(三氟甲基)辛-3-烯 |
F35E | C2F5CF2CH=CH-(CF2)4CF3 | 1,1,1,2,2,3,3,6,6,7,7,8,8,9,9,10,10,10-十八氟癸-4-烯 |
F35iE | C2F5CF2CH=CH-CF2CF2CF(CF3)2 | 1,1,1,2,2,3,3,6,6,7,7,8,9,9,9-十五氟-8-(三氟甲基)壬-4-烯 |
F35tE | C2F5CF2CH=CH-C(CF3)2C2F5 | 1,1,1,2,2,3,3,7,7,8,8,8-十二氟-6,6-双(三氟甲 |
基)辛-4-烯 | ||
F3i5E | (CF3)2CFCH=CH-(CF2)4CF3 | 1,1,1,2,5,5,6,6,7,7,8,8,9,9,9-十五氟-2-(三氟甲基)壬-3-烯 |
F3i5iE | (CF3)2CFCH=CH-CF2CF2CF(CF3)2 | 1,1,1,2,5,5,6,6,7,8,8,8-十二氟-2,7-双(三氟甲基)辛-3-烯 |
F3i5tE | (CF3)2CFCH=CH-C(CF3)2C2F5 | 1,1,1,2,6,6,7,7,7-九氟-2,5,5-三(三氟甲基)庚-3-烯 |
F44E | CF3(CF2)3CH=CH-(CF2)3CF3 | 1,1,1,2,2,3,3,4,4,7,7,8,8,9,9,10,10,10-十八氟癸-5-烯 |
F44iE | CF3(CF2)3CH=CH-CF2CF(CF3)2 | 1,1,1,2,3,3,6,6,7,7,8,8,9,9,9-十五氟-2-(三氟甲基)壬-4-烯 |
F44sE | CF3(CF2)3CH=CH-CF(CF3)C2F5 | 1,1,1,2,2,3,6,6,7,7,8,8,9,9,9-十五氟-3-(三氟甲基)壬-4-烯 |
F44tE | CF3(CF2)3CH=CH-C(CF3)3 | 1,1,1,5,5,6,6,7,7,8,8,8-十二氟-2,2,-双(三氟甲基)辛-3-烯 |
F4i4iE | (CF3)2CFCF2CH=CH-CF2CF(CF3)2 | 1,1,1,2,3,3,6,6,7,8,8,8-十二氟-2,7-双(三氟甲基)辛-4-烯 |
F4i4sE | (CF3)2CFCF2CH=CH-CF(CF3)C2F5 | 1,1,1,2,3,3,6,7,7,8,8,8-十二氟-2,6-双(三氟甲基)辛-4-烯 |
F4i4tE | (CF3)2CFCF2CH=CH-C(CF3)3 | 1,1,1,5,5,6,7,7,7-九氟-2,2,6-三(三氟甲基)庚-3-烯 |
F4s4sE | C2F5CF(CF3)CH=CH-CF(CF3)C2F5 | 1,1,1,2,2,3,6,7,7,8,8,8-十二氟-3,6-双(三氟甲基)辛-4-烯 |
F4s4tE | C2F5CF(CF3)CH=CH-C(CF3)3 | 1,1,1,5,6,6,7,7,7-九氟-2,2,5-三(三氟甲基)庚-3-烯 |
F4t4tE | (CF3)3CCH=CH-C(CF3)3 | 1,1,1,6,6,6-六氟-2,2,5,5-四(三氟甲基)己-3-烯 |
在一个实施方案中,式I的化合物可以通过使式R1I的全氟烷基碘与式R2CH=CH2的全氟烷基三氢烯烃接触来制备,以形成式R1CH2CHIR2的三氢碘代全氟烷烃。这种三氢碘代全氟烷烃随后可以脱氢碘(dehydroiodinated)以形成R1CH=CHR2。在另一实施方案中,烯烃R1CH=CHR2可以通过式R1CHICH2R2的三氢碘代全氟烷烃的脱氢碘来制备,后者又通过使式R2I的全氟烷基碘与式R1CH=CH2的全氟烷基三氢烯烃反应来形成。
在一个实施方案中,全氟烷基碘与全氟烷基三氢烯烃的所述接触可以以分批模式通过在能够在反应温度下在反应物与产物的自压下运行的合适的反应器中组合反应物来进行。合适的反应器包括由不锈钢,特别是奥氏体型不锈钢,和公知的高镍合金,例如镍-铜合金、镍基合金和镍-铬合金制成的那些。
在另一实施方案中,反应可以以半分批模式进行,其中将全氟烷基三氢烯烃反应物借助合适的添加装置,例如泵,在反应温度下添加到全氟烷基碘反应物中。
在一个实施方案中,全氟烷基碘与全氟烷基三氢烯烃的比率为大约1∶1至大约4∶1。在另一实施方案中,全氟烷基碘与全氟烷基三氢烯烃的比率为大约1.5∶1至2.5∶1。如Jeanneaux等人在Journal of FluorineChemistry,卷4,第261-270页(1974)中所报道,低于1.5∶1的比率容易产生大量的2∶1加合物。
在一个实施方案中,使所述全氟烷基碘与所述全氟烷基三氢烯烃接触的温度为大约150℃至大约300℃。在另一实施方案中,温度为大约170℃至大约250℃。在再一实施方案中,温度为大约180℃至大约230℃。
在一个实施方案中,全氟烷基碘与全氟烷基三氢烯烃的反应的接触时间为大约0.5小时至大约18小时。在另一实施方案中,接触时间为大约4至大约12小时。
在再一实施方案中,全氟烷基碘与全氟烷基三氢烯烃的接触在催化剂存在下进行。在一个实施方案中,合适的催化剂是VIII族过渡金属络合物。代表性的VIII族过渡金属络合物包括,但不限于,0价NiL4络合物,其中配体L可以是膦配体、亚磷酸根配体、羰基配体、异腈配体、链烯配体或其组合。在一个这样的实施方案中,Ni(0)L4络合物是NiL2(CO)2络合物。在一个具体实施方案中,VIII族过渡金属络合物是二羰基双(三苯膦)镍(0)。在一个实施方案中,全氟烷基碘与全氟烷基三氢烯烃的比率为大约3∶1至大约8∶1。在一个实施方案中,所述全氟烷基碘与所述全氟烷基三氢烯烃在催化剂存在下的接触温度为大约80℃至大约130℃。在另一实施方案中,该温度为大约90℃至大约120℃。
在一个实施方案中,全氟烷基碘与全氟烷基三氢烯烃在催化剂存在下的接触时间为大约0.5小时至大约18小时。在另一实施方案中,接触时间为大约4至大约12小时。
在一个实施方案中,通过全氟烷基碘与全氟烷基三氢烯烃的反应制成的三氢碘代全氟烷烃可以直接用在脱氢碘步骤中。在另一实施方案中,在脱氢碘步骤之前回收三氢全氟烷烃并通过蒸馏提纯。
在一个实施方案中,脱氢碘步骤通过使三氢碘代全氟烷烃与碱性物质接触来进行。在一个实施方案中,碱性物质包括碱金属氢氧化物(例如氢氧化钠或氢氧化钾)、碱金属氧化物(例如氧化钠)、碱土金属氢氧化物(例如氢氧化钙)、碱土金属氧化物(例如氧化钙)、碱金属醇盐(例如甲醇钠或乙醇钠)、氨水、氨基化钠、或碱性物质的混合物,例如碱石灰。在另一实施方案中,碱性物质是氢氧化钠或氢氧化钾。
在一个实施方案中,三氢碘代全氟烷烃与碱性物质的接触可以在液相中进行。在另一实施方案中,在液相中的接触进一步在能够溶解至少一部分这两种反应物的溶剂存在下进行。在一个实施方案中,适用于脱氢碘步骤的溶剂包括一种或多种极性有机溶剂,例如醇(例如甲醇、乙醇、正丙醇、异丙醇、正丁醇、异丁醇、和叔丁醇)、腈(例如乙腈、丙腈、丁腈、苄腈、或己二腈)、二甲亚砜、N,N-二甲基甲酰胺、N,N-二甲基乙酰胺、或环丁砜。在一个实施方案中,根据产物的沸点和在提纯过程中从产物中分离痕量溶剂的方便性来选择溶剂。在一个实施方案中,乙醇或异丙醇是用于该反应的良好溶剂。
在一个实施方案中,脱氢碘反应通过在合适的反应器中将反应物之一(碱性物质或三氢碘代全氟烷烃)添加到另一反应物中来进行。所述反应器可以由玻璃、陶瓷或金属制成并优选用叶轮或搅拌装置搅拌。
在一个实施方案中,脱氢碘反应的温度为大约10℃至大约100℃。在另一实施方案中,脱氢碘反应的温度为大约20℃至大约70℃。在一个实施方案中,脱氢碘反应在环境压力下进行。在另一实施方案中,脱氢碘反应在减压或升压下进行。在脱氢碘反应的一个实施方案中,式I的化合物在形成时从反应器中馏出。
在另一实施方案中,脱氢碘反应可以通过使所述碱性物质的水溶液与三氢碘代全氟烷烃在一种或多种较低极性的有机溶剂(例如烷烃(例如己烷、庚烷或辛烷)、芳烃(例如甲苯)、卤化烃(例如二氯甲烷、氯仿、四氯化碳或全氟乙烯)或醚(例如二乙醚、甲基叔丁基醚、四氢呋喃、2-甲基四氢呋喃、二氧杂环己烷、二甲氧基乙烷、二甘醇二甲醚或四甘醇二甲醚))中的溶液在相转移催化剂存在下接触来进行。在一个这样的实施方案中,相转移催化剂包括卤化季铵(例如溴化四丁铵、硫酸氢四丁铵、氯化三乙基苄铵、氯化十二烷基三甲铵、和氯化三辛酰基甲铵)、卤化季鏻(例如,溴化三苯基甲基鏻和氯化四苯基鏻)、或本领域中被称作冠醚的环聚醚化合物(例如18-冠-6和15-冠-5)。
在又一实施方案中,脱氢碘反应在不存在溶剂的情况下通过将三氢碘代全氟烷烃添加到固体或液体碱性物质中来进行。
在一个实施方案中,脱氢碘反应的反应时间根据反应物的溶解度为大约15分钟至大约6小时或更久。在另一实施方案中,脱氢碘反应的完成需要大约30分钟至大约3小时。
在一个实施方案中,通过添加水后的相分离从脱氢碘反应混合物中回收式I的化合物。在另一实施方案中,通过蒸馏从脱氢碘反应混合物中回收式I的化合物。在再一实施方案中,通过添加水后的相分离与蒸馏的组合从脱氢碘反应混合物中回收式I的化合物。
在一个实施方案中,本发明的组合物可以包含单独一种式I的化合物,例如表1中的化合物之一。在另一实施方案中,该组合物可以包含式I的化合物的组合。
式I的许多化合物作为不同的构型异构体或立体异构体存在。当没有指定具体的异构体时,本发明意在包括所有的单一构型异构体、单一立体异构体或其任意组合。例如,F11E意在表示E-异构体、Z-异构体或这两种异构体的任何比率的任何组合或混合物。另一实例是F33E,其代表E-异构体、Z-异构体或这两种异构体的任何比率的任何组合或混合物。
除了上述本发明的化合物外,表2中所列的不饱和氟化烃可以作为清洁组合物或作为清洁剂用于清洁表面或基底。
表2
代码 | 结构 | 化学名 |
HFC-1447fzy | (CF3)2CFCH=CH2 | 3,4,4,4-四氟-3-(三氟甲基)-1-丁烯 |
HFC-1447fz | CF3CF2CF2CH=CH2 | 3,3,4,4,5,5,5-七氟-1-戊烯 |
HFC-1447fycc | CH2=CFCF2CF2CHF2 | 2,3,3,4,4,5,5-七氟-1-戊烯 |
HFC-1447czcf | CF2=CHCF2CH2CF3 | 1,1,3,3,5,5,5-七氟-1-戊烯 |
HFC-1447mytm | CF3CF=C(CF3)(CH3) | 1,1,1,2,4,4,4-七氟-3-甲基-2-丁烯 |
HFC-1447fyz | CH2=CFCH(CF3)2 | 2,4,4,4-四氟-3-(三氟甲基)-1-丁烯 |
HFC-1447ezz | CHF=CHCH(CF3)2 | 1,4,4,4-四氟-3-(三氟甲基)-1-丁烯 |
HFC-1447qzt | CH2FCH=C(CF3)2 | 1,4,4,4-四氟-3-(三氟甲基)-2-丁烯 |
HFC-1447syt | CH3CF=C(CF3)2 | 2,4,4,4-四氟-3-(三氟甲基)-2-丁烯 |
HFC-1456szt | (CF3)2C=CHCH3 | 3-(三氟甲基)-4,4,4-三氟-2-丁烯 |
HFC-1456pcyy | CHF2CF2CF=CFCH3 | 2,3,4,4,5,5-六氟-2-戊烯 |
HFC-1456szy | CF3CF2CF=CHCH3 | 3,4,4,5,5,5-六氟-2-戊烯 |
HFC-1456mstz | CF3C(CH3)=CHCF3 | 1,1,1,4,4,4-六氟-2-甲基-2-丁烯 |
HFC-1456fzce | CH2=CHCF2CHFCF3 | 3,3,4,5,5,5-六氟-1-戊烯 |
HFC-1456ftmf | CH2=C(CF3)CH2CF3 | 4,4,4-三氟-2-(三氟甲基)-1-丁烯 |
HFC-1474mzyf | CF3CH=CFCH2CH3 | 1,1,1,3-四氟-2-戊烯 |
HFC-1483mzt | CF3CH=C(CH3)2 | 1,1,1-三氟-3-甲基-2-丁烯 |
FC-151-12c | CF3(CF2)3CF=CF2 | 1,1,2,3,3,4,4,5,5,6,6,6-十二氟-1-己烯(或全氟-1-己烯) |
FC-151-12mcy | CF3CF2CF=CFCF2CF3 | 1,1,1,2,2,3,4,5,5,6,6,6-十二氟-3-己烯(或全氟-3-己烯) |
FC-151-12mmtt | (CF3)2C=C(CF3)2 | 1,1,1,4,4,4-六氟-2,3-双(三氟甲基)-2-丁烯 |
FC-151-12mmzz | (CF3)2CFCF=CFCF3 | 1,1,1,2,3,4,5,5,5-九氟-4-(三氟甲基)-2-戊烯 |
HFC-152-11mmtz | (CF3)2C=CHC2F5 | 1,1,1,4,4,5,5,5-八氟-2-(三氟甲基)-2-戊烯 |
HFC-152-11mmyyz | (CF3)2CFCF=CHCF3 | 1,1,1,3,4,5,5,5-八氟-4-(三氟甲基)-2-戊烯 |
PFBE(或HFC-1549fz) | CF3CF2CF2CF2CH=CH2 | 3,3,4,4,5,5,6,6,6-九氟-1-己烯(或全氟丁基乙烯) |
HFC-1549fztmm | CH2=CHC(CF3)3 | 4,4,4-三氟-3,3-双(三氟甲基)-1-丁烯 |
HFC-1549mmtts | (CF3)2C=C(CH3)(CF3) | 1,1,1,4,4,4-六氟-3-甲基-2-(三氟甲基)-2-丁烯 |
HFC-1549fycz | CH2=CFCF2CH(CF3)2 | 2,3,3,5,5,5-六氟-4-(三氟甲基)-1-戊烯 |
HFC-1549myts | CF3CF=C(CH3)CF2CF3 | 1,1,1,2,4,4,5,5,5-九氟-3-甲基-2-戊烯 |
HFC-1549mzzz | CF3CH=CHCH(CF3)2 | 1,1,1,5,5,5-六氟-4-(三氟甲基)-2-戊烯 |
HFC-1558szcc | (CF3)2CFCF=CHCH3 | 3,4,5,5,5-五氟-4-三氟甲基-2-丁烯 |
HFC-1558szy | CF3CF2CF2CF=CHCH3 | 3,4,4,5,5,6,6,6-八氟-2-己烯 |
HFC-1558fzccc | CH2=CHCF2CF2CF2CHF2 | 3,3,4,4,5,5,6,6-八氟-2-己烯 |
HFC-1558mmtzc | (CF3)2C=CHCF2CH3 | 1,1,1,4,4-五氟-2-(三氟甲基)-2-戊烯 |
HFC-1558ftmf | CH2=C(CF3)CH2C2F5 | 4,4,5,5,5-五氟-2-(三氟甲基)-1-戊烯 |
HFC-1567fts | CF3CF2CF2C(CH3)=CH2 | 3,3,4,4,5,5,5-七氟-2-甲基-1-戊烯 |
HFC-1567szz | CF3CF2CF2CH=CHCH3 | 4,4,5,5,6,6,6-七氟-2-己烯 |
HFC-1567fzfc | CH2=CHCH2CF2C2F5 | 4,4,5,5,6,6,6-七氟-1-己烯 |
HFC-1567sfyy | CF3CF2CF=CFC2H5 | 1,1,1,2,2,3,4-七氟-3-己烯 |
HFC-1567fzfy | CH2=CHCH2CF(CF3)2 | 4,5,5,5-四氟-4-(三氟甲基)-1-戊烯 |
HFC-1567myzzm | CF3CF=CHCH(CF3)(CH3) | 1,1,1,2,5,5,5-七氟-4-甲基-2-戊烯 |
HFC-1567mmtyf | (CF3)2C=CFC2H5 | 1,1,1,3-四氟-2-(三氟甲基)-2-戊烯 |
HFC-1576ssty | (CH3)2C=CFCF2CF3 | 3,4,4,5,5,5-六氟-2-甲基-2-戊烯 |
HFC-1576mmtt | (CF3)2C=C(CH3)2 | 4-甲基-1,1,1-三氟-2-三氟甲基-2-丁烯 |
FC-161-14myy | CF3CF=CFCF2CF2C2F5 | 1,1,1,2,3,4,4,5,5,6,6,7,7,7-十四氟-2-庚烯 |
FC-161-14mcyy | CF3CF2CF=CFCF2C2F5 | 1,1,1,2,2,3,4,5,5,6,6,7,7,7-十四氟-2-庚烯 |
HFC-162-13mzy | CF3CH=CFCF2CF2C2F5 | 1,1,1,3,4,4,5,5,6,6,7,7,7-十三氟-2-庚烯 |
HFC-162-13myz | CF3CF=CHCF2CF2C2F5 | 1,1,1,2,4,4,5,5,6,6,7,7,7-十三氟-2-庚烯 |
HFC-162-13mczy | CF3CF2CH=CFCF2C2F5 | 1,1,1,2,2,4,5,5,6,6,7,7,7-十三氟-3-庚烯 |
HFC-162-13mcyz | CF3CF2CF=CHCF2C2F5 | 1,1,1,2,2,3,5,5,6,6,7,7,7-十三氟-3-庚烯 |
HFC-1659szy | CF3CF2CF2CF2CF=CHCH3 | 3,4,4,5,5,6,6,6-八氟-2-庚烯 |
HFC-1678sfzy | CF3CF2CF2CF=CHCH2CH3 | 4,5,5,6,6,7,7,7-八氟-3-庚烯 |
HFC-1678ssty | (CH3)2C=CFCF2CF2CF3 | 3,4,4,5,5,6,6,6-八氟-2-甲基-2-己烯 |
HFC-C1538zz | 环-CF2CH=CHCF2CF2CF2- | 3,3,4,4,5,5,6,6-八氟环己烯 |
FC-C151-10y | 环-CF2CF=CFCF2CF2CF2- | 1,2,3,3,4,4,5,5,6,6-十氟环己烯 |
表2中所列的化合物可以购得或可以通过本领域已知的或如本文所述的方法制备。
在一个实施方案中,清洁组合物可以包含如表2中所列的单一化合物。在另一实施方案中,清洁组合物可以包含表2中的化合物的组合。在再一实施方案中,清洁组合物可以包含表2中的化合物与一种或多种式I的化合物的组合。
表2中的许多化合物作为不同的构型异构体或立体异构体存在。当没有指定具体的异构体时,本发明意在包括所有的单一构型异构体、单一立体异构体或其任意组合。例如,3,4,4,5,5,6,6,6-八氟-2-己烯(HFC-1558szy)意在表示E-异构体、Z-异构体或这两种异构体的任何比率的任何组合或混合物。另一实例是1,1,1,2,2,4,5,5,6,6,7,7,7-十三氟-3-庚烯(HFC-162-13mczy),其代表E-异构体、Z-异构体或这两种异构体的任何比率的任何组合或混合物。
除了上述本发明的化合物外,表3中所列的含溴的不饱和氟化烃可以用作清洁表面或基底用的清洁组合物。
表3
结构 | 化学名 |
CF2=CHCF2Br | 3-溴-1,1,3,3-四氟丙烯 |
CF2=CFCBrH2 | 3-溴-1,1,2-三氟丙烯 |
CHF=CBrCF3 | 2-溴-1,3,3,3-四氟丙烯 |
CHF=CHCBrF2 | 3-溴-1,3,3-三氟丙烯 |
CHF=CBrCHF2 | 2-溴-1,3,3-三氟丙烯 |
CHBr=CFCF3 | 1-溴-2,3,3,3-四氟丙烯 |
CHBr=CHCF3 | 1-溴-3,3,3-三氟丙烯 |
CH2=CBrCF3 | 2-溴-3,3,3-三氟丙烯 |
CH2=CFCBrF2 | 3-溴-2,3,3-三氟丙烯 |
CFBr=CHCF3 | 1-溴-1,3,3,3-四氟丙烯 |
CFBr=CFCF3 | 1-溴五氟丙烯 |
CH2=CBrCF2CF3 | 2-溴-3,3,4,4,4-五氟-1-丁烯 |
CHBr=CHCF2CF3 | 1-溴-3,3,4,4,4-五氟-1-丁烯 |
CH2=CHCF2CF2Br | 4-溴-3,3,4,4-四氟-1-丁烯 |
CH2=CHCBrFCF3 | 3-溴-3,4,4,4-四氟-1-丁烯 |
CF3CBr=CFCF3 | 2-溴-1,1,1,3,4,4,4-七氟-2-丁烯 |
CH3CBr=CHCF3 | 2-溴-4,4,4-三氟-2-丁烯 |
CF3CBr=CHCH3 | 2-溴-1,1,1-三氟-2-丁烯 |
(CF3)2C=CHBr | 1-溴-3,3,3-三氟-2-(三氟甲基)-丙烯 |
CF3CF=CBrCF2CF3 | 3-溴-1,1,1,2,4,4,5,5,5-九氟-2-戊烯 |
CHF2CBr=CFC2F5 | 2-溴-1,1,3,4,4,5,5,5-八氟-2-戊烯 |
CF2=CBrCHFC2F5 | 2-溴-1,1,3,4,4,5,5,5-八氟-1-戊烯 |
CHBr=CF(CF2)2CHF2 | 1-溴-2,3,3,4,4,5,5-七氟-1-戊烯 |
CH2=CBrCF2C2F5 | 2-溴-3,3,4,4,5,5,5-七氟-1-戊烯 |
CF2=CHCF2CH2CBrF2 | 5-溴-1,1,3,3,5,5-六氟-1-戊烯 |
(CF3)2CFCBr=CH2 | 2-溴-3,4,4,4-四氟-3-(三氟甲基)-1-丁烯 |
CF2=C(CH2Br)CF3 | 2-(溴甲基)-1,1,3,3,3-五氟丙烯 |
CH2=C(CBrF2)CF3 | 2-(溴二氟甲基)-3,3,3-三氟丙烯 |
(CF3)2CHCH=CHBr | 1-溴-4,4,4-三氟-3-(三氟甲基)-1-丁烯 |
(CF3)2C=CHCH2Br | 4-溴-1,1,1-三氟-2-(三氟甲基)-2-丁烯 |
CH2=CHCF(CF3)CBrF2 | 3-(溴二氟甲基)-3,4,4,4-四氟-1-丁烯 |
CF3CF2CF2CBr=CH2 | 2-溴-3,3,4,4,5,5,5-七氟-1-戊烯 |
CF3(CF2)3CBr=CH2 | 2-溴-3,3,4,4,5,5,6,6,6-九氟-1-己烯 |
表3中所列的化合物可购得或可以通过本领域已知的方法制备。
1-溴-3,3,4,4,4-五氟-1-丁烯可以通过三步次序制备,其从三溴化磷与3,3,4,4,4-五氟-1-丁醇反应产生4-溴-1,1,1,2,2-五氟丁烷开始。4-溴-1,1,1,2,2-五氟丁烷在350-400℃下的热溴化产生4,4-二溴-1,1,1,2,2-五氟丁烷,其又可以与粉状氢氧化钾一起加热以产生所需溴丁烯。
2-溴-3,4,4,4-四氟-3-(三氟甲基)-1-丁烯可以通过将溴添加到3,4,4-四氟-3-(三氟甲基)-1-丁烯中然后用氢氧化钾乙醇溶液(ethanolic potassiumhydroxide)处理所得二溴化物来制备。
除了上述本发明的化合物外,表4中所列的含氯的不饱和氟化烃可用作清洁表面或基底用的清洁组合物。
表4
结构 | 化学名 |
CHCl=CFCClF2 | 1,3-二氯-2,3,3-三氟-1-丙烯 |
CHCl=CClCF3 | 1,2-二氯-3,3,3-三氟-1-丙烯 |
CHCl=CHCH2F | 1-氯-3-氟-1-丙烯 |
CHCl=CFCH3 | 1-氯-2-氟-1-丙烯 |
CH2=CClCH2F | 2-氯-3-氟-1-丙烯 |
CHF=CClCH3 | 2-氯-1-氟-1-丙烯 |
CH2=CClCClF2 | 2,3-二氯-3,3-二氟-1-丙烯 |
CH2=CFCCl2F | 3,3-二氯-2,3-二氟-1-丙烯 |
CHCl=CClCHF2 | 1,2-二氯-3,3-二氟-1-丙烯 |
CHCl=CHCClF2 | 1,3-二氯-3,3-二氟-1-丙烯 |
CHF=CClCHClF | 2,3-二氯-1,3-二氟-1-丙烯 |
CCl2=CFCH3 | 1,1-二氯-2-氟-1-丙烯 |
CH2=CClCHClF | 2,3-二氯-3-氟-1-丙烯 |
CH2=C(CHF2)CClF2 | 3-氯-2-(二氟甲基)-3,3-二氟-1-丙烯 |
CH2=CHCF2CHClF | 4-氯-3,3,4-三氟-1-丁烯 |
CHCl=C(CH3)CF3 | 1-氯-3,3,3-三氟-2-甲基-1-丙烯 |
CH2=CHCHCl CF3 | 3-氯-4,4,4-三氟-1-丁烯 |
CH3CF=CHCClF2 | 1-氯-1,1,3-三氟-2-丁烯 |
CH2=CClCF2CF3 | 2-氯-3,3,4,4,4-五氟-1-丁烯 |
CHCl=CHCF2CF3 | 1-氯-3,3,4,4,4-五氟-1-丁烯 |
CH2=CHCF2CF2Cl | 4-氯-3,3,4,4-四氟-1-丁烯 |
CH2=CHCClFCF3 | 3-氯-3,4,4,4-四氟-1-丁烯 |
CH3CCl=CHCF3 | 2-氯-4,4,4-三氟-2-丁烯 |
CF3CCl=CHCH3 | 2-氯-1,1,1-三氟-2-丁烯 |
CH2=CHCClFCHCl2 | 3,4,4-三氯-3-氟-1-丁烯 |
CH2=CClCClFCClF2 | 2,3,4-三氯-3,4,4-三氟-1-丁烯 |
CH2=CClCH2CClF2 | 2,4-二氯-4,4-二氟-1-丁烯 |
CH2=CHCF2CHCl2 | 4,4-二氯-3,3-1-丁烯 |
CH2=CHCClFCClF2 | 3,4-二氯-3,4,4-三氟-1-丁烯 |
CCl2=C(CH3)CF3 | 1,1-二氯-3,3,3-三氟-2-甲基-1-丙烯 |
CCl2=CHCH2CF3 | 1,1-二氯-4,4,4-三氟-1-丁烯 |
CH2=CFCClFCClF2 | 3,4-二氯-2,3,4,4-四氟-1-丁烯 |
CClF=CHC2H5 | 1-氯-1-氟-1-丁烯 |
CHCl=CHCF2CH3 | 1-氯-3,3-二氟-1-丁烯 |
CH2=CClCF2CH3 | 2-氯-3,3-二氟-1-丁烯 |
CH3CH=CHCClF2 | 4-氯-4,4-二氟-2-丁烯 |
(CF3)2C=CHCl | 1-氯-3,3,3-三氟-2-(三氟甲基)-丙烯 |
CF3CH=C(CClF2)CF3 | 2-(氯二氟甲基)-1,1,1,4,4,4-六氟-2-丁烯 |
CHCl=CHCF2CClFCF3 | 1,4-二氯-3,3,4,5,5,5-六氟-1-戊烯 |
CHCl=CHCF(CClF2)CF3 | 1-氯-3-(氯二氟甲基)-3,4,4,4-四氟-1-丁烯 |
CF3CF=CClCF2CF3 | 3-氯-1,1,1,2,4,4,5,5,5-九氟-2-戊烯 |
CHCl=CF(CF2)2CHF2 | 1-氯-2,3,3,4,4,5,5-七氟-1-戊烯 |
CH2=CClCF2C2F5 | 2-氯-3,3,4,4,5,5,5-七氟-1-戊烯 |
CF2=CHCF2CH2CClF2 | 5-氯-1,1,3,3,5,5-六氟-1-戊烯 |
(CF3)2CFCCl=CH2 | 2-氯-3,4,4,4-四氟-3-(三氟甲基)-1-丁烯 |
(CF3)2CHCH=CHCl | 1-氯-4,4,4-三氟-3-(三氟甲基)-1-丁烯 |
(CF3)2C=CHCH2Cl | 4-氯-1,1,1-三氟-2-(三氟甲基)-2-丁烯 |
CH2=CHCF(CF3)CClF2 | 3-(氯二氟甲基)-3,4,4,4-四氟-1-丁烯 |
CH2=CClCF2CF2C2F5 | 2-氯-3,3,4,4,5,5,6,6,6-九氟-1-己烯 |
CHCl=CHCF2CF2C2F5 | 1-氯-3,3,4,4,5,5,6,6,6-九氟-1-己烯 |
表4中所列的化合物可购得或可以通过本领域已知的方法制备。
2-氯-3,3,4,4,4-五氟-1-丁烯可以通过3,3,4,4,4-五氟-1-丁烯氯化成3,4-二氯-1,1,1,2,2-五氟-丁烷随后使该二氯化物与氢氧化钾乙醇溶液反应来制备。
1-氯-3,3,4,4,4-五氟-1-丁烯可以通过首先将1,1,1,2,2-五氟丁烷光氯化成末端氯化的五氟丁烷的混合物来制备。在通过蒸馏分离4,4-二氯-1,1,1,2,2-五氟丁烷后,将二氯衍生物用粉状氢氧化钾回流以产生所需的1-氯-3,3,4,4,4-五氟-1-丁烯。
如Zapevalov等人在Russian Journal of Organic Chemistry,卷24,第1466至1472页(1988)中所报道,1-氯-2,3,3,4,4,5,5-七氟-1-戊烯可以通过使2,2,3,3,4,4,5,5-八氟-1-戊醇与二氯三苯基正膦反应然后使所得氯甲基衍生物与碱反应来制备。
2-氯-3,3,4,4,5,5,5-七氟-1-戊烯可以通过3,3,4,4,5,5,5-七氟-1-戊烯的氯化随后用氢氧化钾乙醇溶液处理所得二氯化物来制备。
2-氯-3,4,4,4-四氟-3-(三氟甲基)-1-丁烯可以通过3,4,4,4-四氟-3-(三氟甲基)-1-丁烯的氯化随后用氢氧化钾乙醇溶液处理所得二氯化物来制备。
2-氯-3,3,4,4,5,5,6,6,6-九氟-1-己烯可以通过3,3,4,4,5,5,6,6,6-九氟-1-己烯的氯化随后用氢氧化钾乙醇溶液处理所得二氯化物来制备。
1-氯-3,3,4,4,5,5,6,6,6-九氟-1-己烯可以通过首先将1,1,1,2,2,3,3,4,4-九氟己烷光氯化成末端氯化的五氟己烷的混合物来制备。在通过蒸馏分离6,6-二氯-1,1,1,2,2,3,3,4,4-九氟己烷后,将该二氯衍生物用粉状氢氧化钾回流以产生所需1-氯-3,3,4,4,5,5,6,6,6-九氟-1-己烯。清洁组合物可以包含如表3或4中所列的单一的不饱和氟化烃,或可以包含表3中的化合物的组合,或表4中的化合物的组合,或来自任意表2、3或4化合物的化合物与式I化合物的组合。不饱和氟化烃的这些组合可用于优化溶剂组合物对特定溶质的溶解能力。
表3和表4中的许多化合物作为不同的构型异构体或立体异构体存在。当没有指定具体的异构体时,本发明意在包括所有的单一构型异构体、单一立体异构体或其任意组合。例如,2-溴-1,3,3,3-四氟丙烯(CHF=CBrCF3)意在表示E-异构体、Z-异构体或这两种异构体的任何比率的任何组合或混合物。另一实例是1-氯-1,3,3,3-四氟丙烯(CFCl=CHCF3),其代表E-异构体、Z-异构体或这两种异构体的任何比率的任何组合或混合物。
在一个实施方案中,所公开的组合物具有不大于1000的全球变暖潜势(GWP)。在另一实施方案中,所公开的组合物具有不大于500的全球变暖潜势(GWP)。在再一实施方案中,所公开的组合物具有不大于150的全球变暖潜势(GWP)。在又一实施方案中,所公开的组合物具有不大于100的全球变暖潜势(GWP)。在再一实施方案中,所公开的组合物具有不大于50的全球变暖潜势(GWP)。如经此引用并入本文的“The Scientific Assessment of Ozone Depletion,2002,a report of theWorld Meteorological Association’s Global Ozone Research andMonitoring Project,”中所定义,本文所用的“GWP”相对于二氧化碳并经过100年时间范围测量。
在一个实施方案中,本组合物具有不大于0.05的臭氧消耗潜势(ODP)。在另一实施方案中,本组合物具有不大于0.02的臭氧消耗潜势(ODP)。在再一实施方案中,本组合物具有大约0的臭氧消耗潜势(ODP)。本文所用的“ODP”如经此引用并入本文的“The ScientificAssessment of Ozone Depletion,2002,A report of the WorldMeteorological Association′s Global Ozone Research and MonitoringProject”中所定义。
本组合物中所含的不饱和氟化烃(例如来自式I和表2、3或4)的量可以随特定用途而大幅变化,并且含有多于痕量和少于100%的该化合物的组合物在本发明的宽范围内。
在一个实施方案中,本发明可以进一步包含气溶胶推进剂。气溶胶推进剂可以辅助将本组合物以气溶胶形式从储存容器中输送到表面上。气溶胶推进剂任选以总组合物的最多大约25重量%包含在本组合物中。代表性的气溶胶推进剂包括空气、氮气、二氧化碳、二氟甲烷(CF2H2,HFC-32)、三氟甲烷(CF3H,HFC-23)、二氟乙烷(CHF2CH3,HFC-152a)、三氟乙烷(CH3CF3,HFC-143a;或CHF2CH2F,HFC-143)、四氟乙烷(CF3CH2F,HFC-134a;或CF2HCF2H,HFC-134)、五氟乙烷(CF3CF2H,HFC-125),和烃,例如丙烷、丁烷或戊烷,或二甲醚。
在另一实施方案中,本组合物可以进一步包含至少一种表面活性剂。本发明的表面活性剂包括本领域中已知的用于基底的脱水或干燥的所有表面活性剂。代表性表面活性剂包括烷基磷酸胺盐(例如2-乙基己基胺和磷酸异辛酯的1∶1盐);乙氧基化醇、硫醇或烷基酚;烷基磷酸的季铵盐(在铵或磷酸根上具有氟烷基);和氟化胺的单-或二-烷基磷酸盐。在经此引用并入本文的美国专利No.5,908,822中描述了其它氟化表面活性剂化合物。
本发明的脱水组合物中所含的表面活性剂的量可以随使用所述组合物的特定干燥用途而大幅变化,但却是本领域技术人员显而易见的。在一个实施方案中,溶解在不饱和氟化烃溶剂中的表面活性剂的量不大于表面活性剂/溶剂组合物总重量的大约1重量%。在另一实施方案中,如果在用组合物处理后,此后用不含或含有极少表面活性剂的溶剂处理干燥的表面,则可以使用更大量的表面活性剂。在一个实施方案中,表面活性剂的量为至少大约百万分之50份(ppm,按重量计)。在另一实施方案中,表面活性剂的量为大约100至大约5000ppm。在再一实施方案中,所用表面活性剂的量为脱水组合物总重量的大约200至大约2000ppm。
任选地,用在脱水中的本发明的包含溶剂和表面活性剂的组合物中可以包括其它添加剂。这类添加剂包括具有抗静电性质——使静电荷从不导电基底如玻璃和二氧化硅上散逸的能力——的化合物。在从不导电部件,如玻璃透镜和镜子上干燥水或水溶液时,为了防止污点和色斑,可能必须在本发明的脱水组合物中使用抗静电添加剂。本发明的多数卤代烃溶剂也可用作介电流体,即它们是差的电流导体并且不容易耗散静电荷。脱水组合物在传统干燥和清洁设备中的沸腾和一般循环可以产生静电荷,特别是在干燥过程的已经从基底上除去大部分水的较后阶段中。这类静电荷聚集在基底的不导电表面上并阻碍水从表面上释放。残留的水原位干燥,从而在基底上留下不合意的污点和色斑。留在基底上的静电荷可以从清洁过程中带出杂质或可以从空气中吸引杂质,例如棉绒,这造成不可接受的清洁性能。在一个实施方案中,合意的抗静电添加剂是极性化合物,其可溶于本不饱和氟化烃溶剂并造成不饱和氟化烃溶剂电导率的提高,这造成静电荷从基底上耗散。在另一实施方案中,抗静电添加剂具有接近不饱和氟化烃溶剂的正常沸点并具有最低程度至没有水溶性。在再一实施方案中,抗静电添加剂具有小于大约0.5重量%的水溶性。在一个实施方案中,抗静电剂在不饱和氟化烃溶剂中的溶解度为至少0.5重量%。在一个实施方案中,抗静电添加剂为硝基甲烷(CH3NO2)。
在一个实施方案中,含有抗静电添加剂的本脱水组合物在如下所述将基底脱水或干燥的方法中的脱水和干燥和漂洗步骤中均有效。
另一实施方案涉及将基底脱水或干燥的方法,包括:
a)使基底与本发明的包含表面活性剂的组合物接触,由此将所述基底脱水,和
b)从该组合物中回收脱水的基底。
许多工业将含水组合物用于金属、陶瓷、玻璃和塑料的表面处理。涂层的清洁、镀敷、和沉积通常在水性介质中进行并通常跟随着除去残留水的步骤。热空气干燥、离心干燥和溶剂基排水是用于除去这类残留水的方法。
尽管已经提出氢氟烃(HFC)在干燥或脱水用途中替代之前所用的CFC溶剂,许多HFC对水具有有限的溶解能力。有助于从基底上除水的表面活性剂的使用因此在许多干燥或脱水法中是必要的。已经在脱水或干燥溶剂中添加疏水表面活性剂以从基底上移走水。
脱水或干燥溶剂(不饱和氟化烃溶剂)在脱水或干燥组合物中的主要作用是减少干燥中的基底表面上的水量。表面活性剂的主要作用是从基底表面上移走任何残留的水。当结合不饱和氟化烃溶剂和表面活性剂时,获得高度有效的排水干燥组合物。
在一个实施方案中,本公开的干燥或脱水溶剂包括表1和表2中所列的那些不饱和氟化烃化合物。
在一个实施方案中,表1和表2中的用于基底的脱水或干燥的氟化烯烃具有大约25℃至大约120℃的正常沸点。
在一个实施方案中,用于脱水和干燥的表面活性剂可溶解至总溶剂/表面活性剂组合物重量的至少1重量%。
在一个实施方案中,本公开的脱水或干燥方法非常有效地从多种基底上移走水,所述基底包括金属,如钨、铜、金、铍、不锈钢、铝合金、黄铜和类似物;玻璃和陶瓷表面,如玻璃、蓝宝石、硅硼酸盐玻璃、氧化铝、二氧化硅,如电子电路中所用的硅片,烧制氧化铝和类似物;和塑料,如聚烯烃(″Alathon″,,″Tenite″)、聚氯乙烯、聚苯乙烯(Styron)、聚四氟乙烯()、四氟乙烯-乙烯共聚物()、聚偏二氟乙烯(″Kynar″)、离子交联聚合物()、丙烯腈-丁二烯-苯乙烯聚合物()、酚-甲醛共聚物、纤维素(″Ethocel″)、环氧树脂、聚乙缩醛()、聚(对苯醚)()、聚醚酮(″Ultrapek″)、聚醚醚酮(″Victrex″)、聚(对苯二甲酸丁二酯)(″Valox″)、聚芳基化合物()、液晶聚合物、聚酰亚胺()、聚醚酰亚胺(″Ultem″)、聚酰胺酰亚胺(″Torlon″)、聚(对苯硫醚)(″Rython″)、聚砜(″Udel″)和聚芳基砜(″Rydel″)。在另一实施方案中,本脱水或干燥方法中所用的组合物与弹性体相容。
在一个实施方案中,本公开涉及从被润湿的基底表面上除去至少一部分水的方法,即脱水的方法,其包括使基底与前述脱水组合物接触,然后使基底与脱水组合物脱离接触。在一个实施方案中,最初结合在基底表面上的水被溶剂和/或表面活性剂移走,并与脱水组合物一起离开。“至少一部分水”是指每一浸渍周期除去基底表面上的至少大约75重量%的水。“浸渍周期”是指一个包括将基底浸在本脱水组合物中的至少一个步骤的周期。任选地,仍然附着在基底上的极少量的表面活性剂可以通过使基底与无表面活性剂的卤代烃溶剂接触来进一步除去。将制品保存在溶剂蒸气或回流溶剂中将进一步降低留在基底上的表面活性剂的存在。通过蒸发除去附着在基底表面上的溶剂。可以使用在大气压或负压下的溶剂蒸发,并且可以使用高于和低于卤代烃溶剂沸点的温度。
基底与脱水组合物接触的方法不重要并且可以大幅变化。例如,基底可以浸在该组合物中,或可以使用传统设备用该组合物喷涂基底。基底的完全浸没是优选的,因为其通常确保组合物与基底的所有暴露表面之间的接触。但是,可以使用容易提供这类完全接触的任何其它方法。
基底与脱水组合物的接触时间可以大幅变化。通常,接触时间为高达大约5分钟,但是如果需要,可以使用更长时间。在脱水法的一个实施方案中,接触时间为大约1秒至大约5分钟。在另一实施方案中,脱水过程的接触时间为大约15秒至大约4分钟。
接触温度也可以随组合物的沸点而大幅变化。一般而言,接触温度等于或小于组合物的正常沸点。
在一个实施方案中,本公开的组合物可以进一步含有助溶剂。在清洁基底上的传统工艺残留物,例如除去焊剂和将包含本发明的基底的机械部件除脂中使用本组合物时,这类助溶剂是理想的。这类助溶剂包括醇(如甲醇、乙醇、异丙醇)、醚(如二乙醚、甲基叔丁基醚)、酮(如丙酮)、酯(如乙酸乙酯、十二烷酸甲酯、肉豆蔻酸异丙酯和丁二酸、戊二酸或己二酸的二甲酯或二异丁酯,或其混合物)、醚醇(如丙二醇单丙醚、二丙二醇单丁醚、和三丙二醇单甲醚)和烃(如戊烷、环戊烷、己烷、环己烷、庚烷、辛烷)和氢氯烃(如反式-1,2-二氯乙烯)。当这类助溶剂与本组合物一起用于基底脱水或清洁时,其可以以总组合物重量的大约1重量%至大约50重量%的量存在。
在清洁装置,包括蒸气除脂和蒸气去焊剂设备中,组合物可能在操作过程中通过在轴封、软管接头、焊接接头和破裂管道中的漏隙流失。此外,工作的组合物可能在设备上的维护程序中释放到大气中。如果该组合物不是纯组分,该组合物可能在从该设备泄漏或排放到大气中时改变,这可能造成留在设备中的组合物表现出不可接受的性能。相应地,使用包含单一不饱和氟化烃的清洁组合物是合意的。
在一个实施方案中,本公开的组合物可用作清洁组合物、清洁剂、沉积溶剂和用作脱水或干燥溶剂。为了在使用中适当操作,必须清洁微电子部件的焊剂残留物、油和油脂,和可能在制造完成后污染表面的微粒。在另一实施方案中,本公开涉及从表面或基底上除去残留物的方法,包括使表面或基底与本发明的清洁组合物或清洁剂接触,并任选从清洁组合物或清洁剂中回收基本不含残留物的表面或基底。
在再一实施方案中,本公开涉及通过从表面上除去污染物来清洁表面的方法。从表面上除去污染物的方法包括使具有污染物的表面与本发明的清洁组合物接触以使污染物溶解,并任选从清洁组合物中回收表面。该表面随后基本不含污染物。
如上所述,可以通过本方法除去的污染物或残留物包括,但不限于油和油脂、焊剂残留物,和微粒污染物。
在本方法的一个实施方案中,接触可以通过喷涂、冲洗、用其中或其上含有清洁组合物的底物(例如抹布或擦拭纸)擦拭来实现。在该方法的另一实施方案中,接触可以通过将盘浸渍或浸没在清洁组合物浴中来实现。
在该方法的一个实施方案中,所述回收通过从清洁组合物浴中移出已经接触的表面来进行(以如下针对在表面上沉积氟化碳润滑油的方法所述类似的方式)。在该方法的另一实施方案中,回收通过使已经喷涂、冲洗或擦拭到盘上的清洁组合物排尽来进行。另外,可能在之前的步骤完成后留下的任何残留清洁组合物也可以以与沉积法类似的方式蒸发。
清洁表面的方法可用于与下述沉积方法相同类型的表面上。二氧化硅、玻璃、金属或金属氧化物或碳的半导体表面或磁介质盘可能具有通过该方法除去的污染物。在上述方法中,可以通过使盘与清洁组合物接触并从清洁组合物中回收所述盘来除去污染物。
在再一实施方案中,本方法还提供了通过使制品与本发明的清洁组合物接触来从产品、部件、组件、基底、或任何其它制品或其部分上除去污染物的方法。为方便起见,术语“制品”在本文中用于表示所有这类产品、部件、组件、基底和类似物,并进一步用于表示其任何表面或部分。此外,术语“污染物”旨在表示制品上存在的任何不想要的材料或物质,即使这类物质是有意置于制品上的。例如,在半导体器件的制造中,通常将光致抗蚀剂材料沉积到基底上以形成用于蚀刻操作的掩模和随后从基底上除去光致抗蚀剂材料。本文所用的术语“污染物”旨在包含和覆盖这类光致抗蚀剂材料。烃基油和油脂和邻苯二甲酸二辛酯是可能在涂碳盘上发现的污染物的实例。
在一个实施方案中,本发明包括在蒸气除脂和溶剂清洁法中使制品与本发明的组合物接触。在一个这类实施方案中,蒸气除脂和溶剂清洁方法包括使制品优选在室温下暴露在沸腾清洁组合物蒸气中。在物体上冷凝的蒸气具有提供相对洁净的馏出清洁组合物以洗掉油脂或其它污染的优点。这类方法由此具有另一优点,即本清洁组合物从物体上的最终蒸发留下与在液体清洁组合物中简单清洗该物体的情况相比相对较少的残留物。
在另一实施方案中,对于制品包含难除的污染物的用途,本方法包括提高清洁组合物的温度至高于环境温度或在这类用途中有效地基本改进清洁组合物的清洁作用的任何其它温度。在一个这类实施方案中,这种方法也通常用于大体积组装管道操作,其中制品,特别是金属部件和装配件的清洁必须有效和迅速地进行。
在一个实施方案中,本发明的清洁方法包括将要清洁的制品浸在处于升高的温度下的液体清洁组合物中。在另一实施方案中,本发明的清洁方法包括将要清洁的制品浸在大约处于清洁组合物的沸点的清洁组合物中。在一个这类实施方案中,该步骤从制品上除去显著量的目标污染物。在再一实施方案中,该步骤从制品上除去大部分目标污染物。在一个实施方案中,在该步骤之后,将制品浸在新馏出的清洁组合物中,其温度低于前一浸渍步骤中的液体清洁组合物的温度。在一个这类实施方案中,新馏出的清洁组合物处于大约环境温度或室温。在再一实施方案中,该方法还包括随后通过使制品暴露在由与最先提到的浸渍步骤相关的热/沸腾清洁组合物产生的蒸气中来使制品与清洁组合物的相对较热的蒸气接触的步骤。在一个这类实施方案中,这造成清洁组合物蒸气在制品上的冷凝。在某些优选实施方案中,在最终漂洗之前用馏出的清洁组合物喷涂该制品。
许多种类和类型的蒸气除脂设备预计可以与本方法联用。这类设备的一个实例及其操作公开在美国专利No.3,085,918中,其经此引用并入本文。本文公开的设备包括用于容纳清洁组合物的沸腾池、用于容纳馏出的清洁组合物的清洁池、水分离器和其它辅助设备。
本清洁方法也可以包含冷清洁,其中将被污染的制品浸在处于环境温度或室温条件下的本发明的流体清洁组合物中,或在这类条件下用浸透清洁组合物的抹布或类似物体擦拭。
本发明还涉及在表面上沉积氟化碳润滑油的方法,所述方法包括将氟化碳润滑油与包含本发明的不饱和氟化烃的溶剂组合,使氟化碳润滑油与溶剂的所述组合与表面接触并蒸发溶剂以在表面上形成氟化碳润滑油涂层。
储存数字信息的最先进的、最高记录密度的和最低成本的方法涉及从涂有磁材料的旋转磁盘上写入和读取磁通量图案。在金属载体结构上溅射磁层,其中信息以比特形式储存。接着,在磁层上设置用于保护的顶涂层(通常碳基材料),并最后在顶涂层上施加润滑剂。读取-写入头在润滑剂上移动并在磁头与磁层之间交换信息。在试图提高信息传递效率时,硬驱动器制造商已经将磁头与磁层之间的距离或浮动高度(fly-height)降至小于100埃。
在正常磁盘驱动器使用过程中,磁头与磁盘表面始终保持接触。为了降低滑动和浮动(flying)接触在磁盘上造成的磨损,其必须润滑。
氟化碳润滑油广泛用作磁盘驱动器工业中的润滑剂以降低磁头与磁盘之间的摩擦,即降低磨损并因此使磁盘故障的可能性最小化。
在工业中需要改进的氟化碳润滑油沉积方法。某些溶剂,例如CFC-113和PFC-5060,由于它们对环境的影响,其应用已经受到管制。因此,在此用途中使用的溶剂应该考虑环境影响。此外,这类溶剂必须溶解氟化碳润滑油并形成基本均匀或均匀的氟化碳润滑油涂层。另外,现有溶剂已经被发现需要更高的氟化碳润滑油浓度以产生给定厚度的涂层并在氟化碳润滑油涂层的均匀性方面造成不规则性。
在一个实施方案中,本公开的氟化碳润滑油包含全氟聚醚(PFPF)化合物,或包含X-的润滑剂,其是含膦腈的磁盘润滑剂。这些全氟聚醚化合物有时被称作全氟烷基醚(PFAE)或全氟聚烷基醚(PFPAE)。这些PFPE化合物从简单的全氟化醚聚合物到官能化全氟化醚聚合物。可用作本发明中的氟化碳润滑油的不同种类的PFPE化合物可获自许多来源。在另一实施方案中,可用于本发明的方法的氟化碳润滑油包括但不限于GLP 100、GLP 105或GLP 160(E.I.du Pont de Nemours&Co.,Fluoroproducts,Wilmington,DE,19898,USA);Z-Dol2000、2500或4000,Z-Tetraol或AM 2001或AM 3001(SolvaySolexis S.p.A.,Milan,Italy出售);DemnumTM LR-200或S-65(DaikinAmerica,Inc.,Osaka,Japan供应);X-(部分氟化的hyxaphenoxy环三膦腈磁盘润滑剂,可获自Quixtor Technologies Corporation,DowChemical Co,Midland,MI的子公司);和它们的混合物。润滑剂是具有通用结构F(CF(CF3)CF2O)n-CF2CF3的全氟烷基聚醚,其中n为10至60。润滑剂是分子量为500至4000原子质量单位并具有通式X-CF2-O(CF2-CF2-O)p-(CF2O)q-CF2-X的官能化全氟聚醚,其中X可以是-CH2OH、CH2(O-CH2-CH2)nOH、CH2OCH2CH(OH)CH2OH或-CH2O-CH2-胡椒基。DemnumTM油是分子量为2700至8400原子质量单位的全氟聚醚基油。另外,正在开发新的润滑剂,例如来自Moresco(Thailand)Co.,Ltd的那些,其可用在本发明的方法中。
本发明的氟化碳润滑油可以另外包含用于改进氟化碳润滑油的性能的添加剂。本身可充当润滑剂的X-通常添加到其它较低成本的氟化碳润滑油中以通过钝化磁盘表面上造成PFPE降解的路易斯酸位点来提高磁盘驱动器的耐用性。
可以在本发明的方法的氟化碳润滑油中使用其它常见的润滑剂添加剂。
本发明的氟化碳润滑油可以进一步包括Z-DPA(Hitachi GlobalStorage Technologies,San Jose,CA),用二烷基胺端基封端的PFPE。亲核的端基起到与相同的作用,由此在没有任何添加剂的情况下提供相同的稳定性。
可以沉积氟化碳润滑油的表面是可获益于润滑的任何固体表面。半导体材料,例如二氧化硅盘、金属或金属氧化物表面、气相沉积的碳表面或玻璃表面,是可以使用本发明的方法的表面类型的代表。本发明的方法特别可用于涂布磁介质,例如电脑驱动硬盘。在电脑磁盘的制造中,表面可以是带有磁介质层的玻璃或铝基底,其也通过气相沉积被薄(10-50埃)的非晶氢化或氮化碳层涂布。氟化碳润滑油可以通过将氟化碳润滑油施加到磁盘碳层上来间接沉积在表面磁盘上。
组合氟化碳润滑油和溶剂的第一步骤可以以任何合适的方式实现,例如在合适的容器,例如烧杯或可用作沉积法的浴的其它容器中混合。不饱和氟化烃溶剂中氟化碳润滑油浓度可以为大约0.010%(wt/wt)至大约0.50%(wt/wt)。
使氟化碳润滑油与溶剂的所述组合与表面接触的步骤可以以任何适合所述表面(考虑表面的尺寸和形状)的方式实现。硬驱动磁盘必须以一定方式支承,例如使用心轴或可以穿过磁盘中心的孔安装的一些其它载体。磁盘由此保持垂直以使磁盘面垂直于溶剂浴。心轴可以具有不同形状,包括但不限于,圆柱棒或V-型棒。心轴形状决定了与磁盘的接触面积。心轴可以由任何强到足以支撑磁盘的材料构成,包括但不限于金属、金属合金、塑料或玻璃。另外,磁盘可以在纺织篮中垂直向上支承或在外缘上用1个或更多夹具夹到垂直位置上。载体可以由具有支承磁盘的强度的任何材料,例如金属、金属合金、塑料或玻璃构成。但是,无论磁盘怎样支承,将磁盘降至容纳氟化碳润滑油/溶剂组合的浴中。该浴可以保持在室温下或加热或冷却到大约0℃至大约50℃的温度。
或者,该磁盘可以如上所述支承,并且可以将该浴升高以浸渍磁盘。在任一情况下,随后将磁盘从浴中移出(通过降低该浴或通过升高磁盘)。可以将过量的氟化碳润滑油/溶剂组合排到该浴中。
将磁盘降至浴中或将浴升高以浸渍磁盘的使氟化碳润滑油/溶剂组合与磁盘表面接触的任一方法统称为浸涂法。可以在本发明的方法中使用其它使磁盘与氟化碳润滑油/溶剂组合接触的方法,包括喷涂或浸涂。
当磁盘从浴中移出时,磁盘将在其表面上具有氟化碳润滑油涂层和一些残留溶剂(不饱和氟化烃)。可以蒸发残留溶剂。蒸发通常在室温下进行。但是,也可以对蒸发步骤使用高于和低于室温的其它温度。可以对蒸发使用大约0℃至大约100℃的温度。
表面,或磁盘(如果该表面是磁盘),在涂布方法完成后留下基本不含溶剂的基本均匀或均匀的氟化碳润滑油涂层。氟化碳润滑油可以施加至小于大约300纳米的厚度,或施加至大约100至大约300纳米的厚度。
磁盘的适当运行需要均匀的氟化碳润滑油涂层,因此氟化碳润滑油厚度不定的区域在磁盘表面上是不合意的。随着越来越多的信息储存在相同尺寸的磁盘上,读取/写入头必须越来越接近磁盘才能适当工作。如果在磁盘表面上存在由涂层厚度的变化引起的不规则性,磁头与磁盘上这些区域接触的可能性大得多。尽管磁盘上需要具有足够的氟化碳润滑油以流入其可能被磁头触点或其它装置除去的区域,太厚的涂层仍会造成“拖尾”——与读取/写入头吸取过量氟化碳润滑油有关的问题。
在工业中观察到的一种具体的涂层厚度不规则性被称作“兔耳条纹(rabbit ears)”效应。在使用现有溶剂体系沉积氟化碳润滑油后,可以在磁盘表面上直观察觉到这些不规则性。当磁盘与氟化碳润滑油在溶剂中的溶液接触并随后从溶液中移出时,可能积聚溶液且不容易排尽溶液的任何点会产生不容易排尽的溶液滴。一个这类形成液滴的点是心轴或其它支承装置与磁盘的一个或多个接触点。当使用V-型心轴时,存在两个接触点,在此心轴与磁盘的内缘接触。当氟化碳润滑油溶液在这些位置形成在从浴中移出时不排尽的液滴时,在溶剂蒸发时产生具有更大氟化碳润滑油厚度的区域。与磁盘的两个接触点产生“兔耳条纹”效应,因为具有更大氟化碳润滑油厚度的区域在磁盘表面上产生直观可察觉的类似兔耳的图案。
当使用浸涂在表面上沉积氟化碳润滑油时,提拉速度(磁盘从浴中移出的速度)和氟化碳润滑油的密度和表面张力在决定氟化碳润滑油的所得薄膜厚度方面是相关的。为了获得所需薄膜厚度,需要知道这些参数。在“Dip-Coating of Ultra-Thin Liquid Lubricant and its Control forThin-Film Magnetic Hard Disks”in IEEE Transactions on Magnetics,卷31,no.6,1995年11月中给出这些参数如何影响涂层的详情。
根据本公开,可以在不过度实验的情况下进行和实施本文公开和提出权利要求的所有组合物和方法。尽管已经参照优选实施方案描述了本发明的组合物和方法,但本领域技术人员显而易见的是,可以在不背离本发明的原理、精神和范围的情况下,对组合物和方法和在本文所述的方法的步骤或步骤次序中作出变动。更具体地,明显的是,化学相关的某些清洁组合物或清洁剂可以代替本文所述的组合物,同时实现相同或类似的结果。本领域技术人员显而易见的所有这类类似的取代和修改被视为在所附权利要求所定义的本发明的精神、范围和原理内。
实施例
在下列实施例中进一步定义本发明。应该理解的是,描述本发明的优选实施方案的这些实施例仅作为例子给出。从上述论述和这些实施例中,技术人员可以弄清本发明的优选特征,并且在不背离其精神和范围的情况下作出本发明的各种变动和修改以使其适应各种用途和条件。
实施例1
1,1,1,4,4,5,5,6,6,7,7,7-十二氟庚-2-烯(F14E)的合成
C
4
F
9
CH
2
CHICF
3
的合成
将全氟-正丁基碘(180.1克,0.52摩尔)和2,2,2-三氟丙烯(25.0克,0.26摩尔)添加到400毫升HastelloyTM摇振管中并在增至最大428psig(3.05Mpa)的自压下加热至200℃8小时。在室温下收集产物。再在这些条件下进行上述反应,并合并产物。随后在相同的400毫升反应器中用双倍量的全氟-正丁基碘和2,2,2-三氟丙烯重复。在这种情况下,压力增至573psig(3.85Mpa)。合并三个反应的产物并蒸馏产生322.4克C4F9CH2CHICF3(52.2°/35mm),收率70%。
C
4
F
9
CH
2
CHICF
3
向F14E转化
将C4F9CH2CHICF3(322.4克,0.73摩尔)经由加料漏斗逐滴添加到配有搅拌棒并连接到填充蒸馏塔和蒸馏头上的2升圆底烧瓶上。该烧瓶含有异丙醇(95毫升)、KOH(303.7克,0.54摩尔)和水(303毫升)。收集产物,用偏亚硫酸氢钠、水洗涤,用MgSO4干燥,并经由配有玻璃螺旋管的6”塔蒸馏。产物F14E(173.4克,76%)的沸点为78.2℃。其特征在于,在氯仿-d溶液中19F NMR(δ-66.7(CF3,m,3F),-81.7(CF3,m3F),-124.8(CF2,m,2F),-126.4(CF2,m,2F)和-114.9ppm(CF2,m,2F))1H NMR(δ)。
实施例2
1,1,1,2,2,5,5,6,6,7,7,8,8,8-十四氟辛-3-烯(F24E)的合成
C
4
F
9
CHICH
2
C
2
F
5
的合成
将全氟乙基碘(220克,0.895摩尔)和3,3,4,4,5,5,6,6,6-九氟己-1-烯(123克,0.50摩尔)添加到400毫升HastelloyTM摇振管中并在自压下加热至200℃10小时。将来自该反应和在类似条件下进行的另外两个反应的产物合并并用两份200毫升10重量%亚硫酸氢钠水溶液洗涤。有机相在氯化钙上干燥然后蒸馏产生277.4克C4F9CH2CHICF3(79-81℃/67-68mm Hg),收率37%。
C
4
F
9
CHICH
2
C
2
F
5
向F24E转化
在配有机械搅拌器、加料漏斗、冷凝器和热电偶的1升圆底烧瓶中装入C4F9CHICH2C2F5(277.4克,0.56摩尔)和异丙醇(217.8克)。向加料漏斗中装入溶解在83.8克水中的氢氧化钾溶液(74.5g,1.13摩尔)。将KOH溶液在迅速搅拌下在温度从21℃缓慢升至42℃时经过大约1小时逐滴添加到烧瓶中。将反应物料用水稀释并通过相分离回收产物。将产物用50毫升的多份10重量%亚硫酸氢钠水溶液和水洗涤,在氯化钙上干燥,然后在大气压下蒸馏。产物F24E(128.7克,63%)的沸点为95.5℃。其特征在于在氯仿-d溶液中19F NMR(δ-81.6(CF3,m,3F),-85.4(CF3,m 3F),-114.7(CF2,m,2F),-118.1(CF2,m,2F),-124.8ppm(CF2,m,2F),-126.3ppm(CF2,m,2F))和1H NMR(6.48)。
实施例3
CF
3
CH=CHCF(CF
3
)
2
(F13iE)的合成
CF
3
CHICH
2
CF(CF
3
)
2
的合成
将(CF3)2CFI(265克,0.9摩尔)和2,2,2-三氟丙烯(44.0克,0.45摩尔)添加到400毫升HastelloyTM摇振管中并在自压下(最大585psig(4.14MPa))加热至200℃8小时。在室温下收集产物以产生110克(CF3)2CFCH2CHICF3(76-77℃/200mm),收率62%。
(CF
3
)
2
CFCH
2
CHICF
3
向F13iE的转化
500毫升圆底烧瓶配有搅拌棒和加料漏斗并连接到短路径蒸馏塔和干冰阱上。在烧瓶中装入异丙醇(50毫升)、氢氧化钾(109克,1.96摩尔)和水(109毫升)。将(CF3)2CFCH2CHICF3(109克,0.28摩尔)经由加料漏斗在42℃下逐滴缓慢加入。在添加过程中,温度从42升至55℃,并从烧瓶中馏出产物。在回流30分钟后,烧瓶中的温度升至62℃。收集产物,用水洗涤,用MgSO4干燥,并蒸馏。产物F13iE(41克,55%)的沸点为48-50℃且特征在于在氯仿-d溶液中19F NMR(δ-187.6(CF,m 1F),-77.1(CF3,m 6F),-66.3(CF3,m 3F)。
实施例4
C4F9CHICH2C2F5的合成
将3,3,4,4,5,5,6,6,6-九氟己-1-烯(20.5克,0.0833摩尔)、双(三苯膦)镍(0)二羰基(0.53克,0.0008摩尔)和全氟乙基碘(153.6克,0.625摩尔)添加到210毫升HastelloyTM摇振管中并在自压下在100℃下加热8小时。通过GC-MS分析产物表明,存在C4F9CHICH2C2F5(64.3GC面积%)和二元加成物(3.3GC面积%);3,3,4,4,5,5,6,6,6-九氟己-1-烯的转化率为80.1%。
实施例5
通过在不饱和氟烯烃化合物中添加一定量的油直至混合物变混浊或分成两相,测定不饱和氟烯烃化合物溶解氟化油的能力。表1中的结果表明,不饱和氟烯烃化合物具有高的溶解氟化油的能力。此外,在不饱和氟烯烃化合物中制备0.5重量%油的溶液。在此实施例中,不饱和氟烯烃是1,1,1,2,2,5,5,6,6,7,7,8,8,8-十四氟辛-3-烯(F24E)。将预称重的金属化合物浸入溶液,蒸发溶剂,并将取样管(coupon)再称重。表5显示了通过这种浸涂法获得的平均涂层。由此,不饱和氟烯烃化合物可以用作用于将氟化油沉积到基底上的载液。
表5
油 | 在F24E中的溶解度 | 涂层厚度 |
Krytox GPL 102油 | 混溶 | 2.9μg/cm2 |
Krytox GPL 106油 | 混溶 | 22.9μg/cm2 |
实施例6
将Krytox GPL 106油用药签擦到已知重量的洁净的金属取样管上。将取样管再称重,然后通过在室温下浸到1,1,1,2,2,5,5,6,6,7,7,8,8,8-十四氟辛-3-烯(F24E)中来清洁。将取样管浸泡1分钟然后风干。然后将取样管再称重,并测定除去的油的百分比。表6中的这些结果表明,溶剂在清洁氟化油方面具有优异的效率。
表6
样品 | 涂布前的取样管重量 | 用Krytox油涂布后的取样管重量 | 清洁后的取样管重量 | 除去的污渍的百分比 |
1 | 10.6782 | 10.7384 | 10.6786 | 99 |
2 | 10.4968 | 10.5328 | 10.4967 | 100 |
3 | 10.7183 | 10.7498 | 10.7183 | 100 |
Claims (30)
1.从表面上除去残留物的方法,包括:
(a)使表面与包含至少一种不饱和氟化烃的组合物接触,该不饱和氟化烃选自:具有式E-或Z-R1CH=CHR2的化合物,其中R1和R2独立地为C1至C6全氟烷基,或C1至C6氢氟烷基,
(b)从该组合物中回收表面。
2.权利要求1的方法,其中R1和R2独立地为CF3、C2F5、CF2CF2CF3、CF(CF3)2、CF2CF2CF2CF3、CF(CF3)CF2CF3、CF2CF(CF3)2、C(CF3)3、CF2CF2CF2CF2CF3、CF2CF2CF(CF3)2、C(CF3)2C2F5、
CF2CF2CF2CF2CF2CF3、CF(CF3)CF2CF2C2F5、C(CF3)2CF2C2F5、CHF2、CH2F、C2HF4、C2H2F3、C2H3F2、C3HF6、i-C3HF6、C3H2F5、C3H3F4、C4HF8、C4H3F6、C5HF10、C5H3F8或C6HF12。
3.权利要求1的方法,其中至少一种不饱和氟化烃是下列的至少一种:CF3CH=CHCF3、CF3CH=CHC2F5、CF3CH=CHCF2C2F5、CF3CH=CHCF(CF3)2、C2F5CH=CHC2F5、CF3CH=CH(CF2)3CF3、CF3CH=CHCF2CF(CF3)2、CF3CH=CHCF(CF3)C2F5、CF3CH=CHC(CF3)3、C2F5CH=CHCF2C2F5、C2F5CH=CHCF(CF3)2、CF3CH=CH(CF2)4CF3、CF3CH=CHCF2CF2CF(CF3)2、CF3CH=CHC(CF3)2C2F5、C2F5CH=CH(CF2)3CF3、C2F5CH=CHCF2CF(CF3)2、C2F5CH=CHCF(CF3)C2F5、C2F5CH=CHC(CF3)3、C2F5CF2CH=CHCF2C2F5、(CF3)2CFCH=CHCF(CF3)2、C2F5CF2CH=CHCF(CF3)2、CF3CH=CH(CF2)5CF3、CF3CH=CHCF(CF3)(CF2)2C2F5、CF3CH=CHC(CF3)2CF2C2F5、C2F5CH=CH(CF2)4CF3、C2F5CH=CHCF2CF2CF(CF3)2、C2F5CH=CHC(CF3)2C2F5、C2F5CF2CH=CH(CF2)3CF3、C2F5CF2CH=CHCF2CF(CF3)2、C2F5CF2CH=CHCF(CF3)C2F5、C2F5CF2CH=CHC(CF3)3、(CF3)2CFCH=CH(CF2)3CF3、(CF3)2CFCH=CHCF2CF(CF3)2、(CF3)2CFCH=CHCF(CF3)C2F5、(CF3)2CFCH=CHC(CF3)3、C2F5CH=CH(CF2)5CF3、C2F5CH=CHCF(CF3)(CF2)2C2F5、C2F5CH=CHC(CF3)2CF2C2F5、C2F5CF2CH=CH(CF2)4CF3、C2F5CF2CH=CHCF2CF2CF(CF3)2、C2F5CF2CH=CHC(CF3)2C2F5、(CF3)2CFCH=CH(CF2)4CF3、(CF3)2CFCH=CHCF2CF2CF(CF3)2、(CF3)2CFCH=CHC(CF3)2C2F5、CF3(CF2)3CH=CH(CF2)3CF3、CF3(CF2)3CH=CHCF2CF(CF3)2、CF3(CF2)3CH=CHCF(CF3)C2F5、CF3(CF2)3CH=CHC(CF3)3、(CF3)2CFCF2CH=CHCF2CF(CF3)2、(CF3)2CFCF2CH=CHCF(CF3)C2F5、(CF3)2CFCF2CH=CHC(CF3)3、C2F5CF(CF3)CH=CHCF(CF3)C2F5、C2F5CF(CF3)CH=CHC(CF3)3、或(CF3)3CCH=CHC(CF3)3。
4.权利要求1的方法,其中所述不饱和氟化烃进一步包含至少一种选自下列的不饱和氟化烃:(CF3)2CFCH=CH2、CF3CF2CF2CH=CH2、CH2=CFCF2CF2CHF2、CF2=CHCF2CH2CF3、CF3CF=C(CF3)(CH3)、CH2=CFCH(CF3)2、CHF=CHCH(CF3)2、CH2FCH=C(CF3)2、CH3CF=C(CF3)2、(CF3)2C=CHCH3、CHF2CF2CF=CFCH3、C2F5CF=CHCH3、CF3C(CH3)=CHCF3、CH2=CHCF2CHFCF3、CH2=C(CF3)CH2CF3、CF3CH=CFCH2CH3、CF3CH=C(CH3)2、CF3(CF2)3CF=CF2、CF3CF2CF=CFCF2CF3、(CF3)2C=C(CF3)2、(CF3)2CFCF=CFCF3、(CF3)2C=CHC2F5、(CF3)2CFCF=CHCF3、CF3CF2CF2CF2CH=CH2、CH2=CHC(CF3)3、(CF3)2C=C(CH3)(CF3)、CH2=CFCF2CH(CF3)2、CF3CF=C(CH3)CF2CF3、CF3CH=CHCH(CF3)2、(CF3)2CFCF=CHCH3、CF3CF2CF2CF=CHCH3、CH2=CHCF2CF2CF2CHF2、(CF3)2C=CHCF2CH3、CH2=C(CF3)CH2C2F5、CF3CF2CF2C(CH3)=CH2、CF3CF2CF2CH=CHCH3、CH2=CHCH2CF2C2F5、CF3CF2CF=CFC2H5、CH2=CHCH2CF(CF3)2、CF3CF=CHCH(CF3)(CH3)、(CF3)2C=CFC2H5、(CH3)2C=CFCF2CF3、(CF3)2C=C(CH3)2、CF3CF=CFCF2CF2C2F5、CF3CF2CF=CFCF2C2F5、CF3CH=CFCF2CF2C2F5、CF3CF=CHCF2CF2C2F5、CF3CF2CH=CFCF2C2F5、CF3CF2CF=CHCF2C2F5、CF3CF2CF2CF2CF=CHCH3、CF3CF2CF2CF=CHCH2CH3、(CH3)2C=CFCF2CF2CF3、环-CF2CH=CHCF2CF2CF2-、环-CF2CF=CFCF2CF2CF2-、CF2=CHCF2Br、CF2=CFCBrH2、CHF=CBrCF3、CHF=CHCBrF2、CHF=CBrCHF2、CHBr=CFCF3、CHBr=CHCF3、CH2=CBrCF3、CH2CFCBrF2、CFBr=CHCF3、CFBr=CFCF3、CH2=CBrCF2CF3、CHBr=CHCF2CF3、CH2=CHCF2CF2Br、CH2=CHCBrFCF3、CF3CBr=CFCF3、CH3CBr=CHCF3、CF3CBr=CHCH3、(CF3)2C=CHBr、CF3CF=CBrCF2CF3、CHF2CBr=CFC2F5、CF2=CBrCHFC2F5、CHBr=CF(CF2)2CHF2、CH2=CBrCF2C2F5、CF2=CHCF2CH2CBrF2、(CF3)2CFCBr=CH2、CF2=C(CH2Br)CF3、CH2=C(CBrF2)CF3、(CF3)2CHCH=CHBr、(CF3)2C=CHCH2Br、CH2=CHCF(CF3)CBrF2、CF3CF2CF2CBr=CH2、CF3(CF2)3CBr=CH2、CHCl=CFCClF2、CHCl=CClCF3、CHCl=CHCH2F、CHCl=CFCH3、CH2=CClCH2F、CHF=CClCH3、CH2=CClCClF2、CH2=CFCCl2F、CHCl=CClCHF2、CHCl=CHCClF2、CHF=CClCHClF、CCl2=CFCH3、CH2=CClCHClF、CH2=C(CHF2)CClF2、CH2=CHCF2CHClF、CHCl=C(CH3)CF3、CH2=CHCHClCF3、CH3CF=CHCClF2、CH2=CClCF2CF3、CHCl=CHCF2CF3、CH2=CHCF2CF2Cl、CH2=CHCClFCF3、CH3CCl=CHCF3、CF3CCl=CHCH3、CH2=CHCClFCHCl2、CH2=CClCClFCClF2、CH2=CClCH2CClF2、CH2=CHCF2CHCl2、CH2=CHCClFCClF2、CCl2=C(CH3)CF3、CCl2=CHCH2CF3、CH2=CFCClFCClF2、CClF=CHC2H5、CHCl=CHCF2CH3、CH2=CClCF2CH3、CH3CH=CHCClF2、(CF3)2C=CHCl、CF3CH=C(CClF2)CF3、CHCl=CHCF2CClFCF3、CHCl=CHCF(CClF2)CF3、CF3CF=CClCF2CF3、CHCl=CF(CF2)2CHF2、CH2=CClCF2C2F5、CF2=CHCF2CH2CClF2、(CF3)2CFCCl=CH2、(CF3)2CHCH=CHCl、(CF3)2C=CHCH2Cl、CH2=CHCF(CF3)CClF2、CH2=CClCF2CF2C2F5和CHCl=CHCF2CF2C2F5。
5.权利要求1的方法,其中所述组合物进一步包含气溶胶推进剂。
6.权利要求1的方法,其中所述组合物进一步包含表面活性剂。
7.权利要求1的方法,其中所述组合物进一步包含助溶剂。
8.权利要求1的方法,其中接触通过蒸气除脂来实现。
9.权利要求8的方法,其中蒸气除脂如下进行:
(i)使组合物沸腾;和
(ii)使制品暴露在沸腾的清洁组合物的蒸气中。
10.权利要求1的方法,其中接触通过将制品浸在所述组合物中来实现,其中该组合物处于比环境温度或室温高的温度。
11.权利要求10的方法,其中所述组合物大致处于该组合物的沸点温度。
12.权利要求10的方法,包括,在将制品浸在组合物中后,将制品浸在组合物中的进一步步骤,其中该组合物的温度低于第一浸渍步骤中的温度。
13.权利要求12的方法,其中第二浸渍步骤中的组合物处于环境温度或室温。
14.权利要求12的方法,包括,在第二浸渍步骤后,使组合物沸腾并使制品暴露在沸腾组合物的蒸气中的进一步步骤。
15.权利要求1的方法,其中所述组合物处于环境温度或室温。
16.权利要求1的方法,其中接触通过用组合物浸透的物体擦拭制品来实现。
17.在表面上沉积氟化碳润滑油的方法,包括:
(a)将氟化碳润滑油与溶剂组合,所述溶剂包含不饱和氟化烃,该不饱和氟化烃选自具有式E-或Z-R1CH=CHR2的不饱和氟化烃,其中R1和R2独立地为C1至C6全氟烷基,或C1至C6氢氟烷基,从而形成润滑剂-溶剂的组合;
(b)使润滑剂-溶剂的组合与表面接触;和
(c)使溶剂从表面上蒸发以便在表面上形成氟化碳润滑油涂层。
18.权利要求17的方法,其中所述表面是半导体材料、金属、金属氧化物、气相沉积的碳或玻璃的表面。
19.权利要求18的方法,其中所述表面是磁介质的表面。
20.权利要求19的方法,其中所述磁介质是计算机磁盘。
21.权利要求17的方法,其中接触步骤通过将表面浸渍或浸没在包含氟化碳润滑油的浴中来实现。
22.权利要求17的方法,其中接触步骤通过用氟化碳润滑油喷涂或旋涂表面来实现。
23.权利要求17的方法,其中润滑剂-溶剂的组合中氟化碳润滑油浓度为大约0.02重量%至大约0.5重量%。
24.权利要求17的方法,其中蒸发步骤在大约10℃至大约40℃的温度下进行。
25.权利要求17的方法,其中氟化碳润滑油包含全氟聚醚。
26.权利要求17的方法,其中氟化碳润滑油选自全氟聚醚及其混合物。
27.从被润湿的基底表面上除去至少一部分水的方法,所述方法包括:
a)使基底与权利要求1的组合物接触,其中该组合物进一步包含表面活性剂,然后
b)使基底与所述组合物脱离接触。
28.基本由具有式R1CH=CHR2的不饱和氟化烃构成的溶剂组合物,其中R1和R2独立地为C1至C6全氟烷基,或C1至C6氢氟烷基。
29.权利要求28的溶剂组合物,其中R1和R2独立地为CF3、C2F5、CF2CF2CF3、CF(CF3)2、CF2CF2CF2CF3、CF(CF3)CF2CF3、CF2CF(CF3)2、C(CF3)3、CF2CF2CF2CF2CF3、CF2CF2CF(CF3)2、C(CF3)2C2F5、CF2CF2CF2CF2CF2CF3、CF(CF3)CF2CF2C2F5、C(CF3)2CF2C2F5、CHF2、CH2F、C2HF4、C2H2F3、C2H3F2、C3HF6、i-C3HF6、C3H2F5、C3H3F4、C4HF8、C4H3F6、C5HF10、C5H3F8或C6HF12。
30.权利要求28的溶剂组合物,其中所述不饱和氟化烃是下列的至少一种:CF3CH=CHCF3、CF3CH=CHC2F5、CF3CH=CHCF2C2F5、CF3CH=CHCF(CF3)2、C2F5CH=CHC2F5、CF3CH=CH(CF2)3CF3、CF3CH=CHCF2CF(CF3)2、CF3CH=CHCF(CF3)C2F5、CF3CH=CHC(CF3)3、C2F5CH=CHCF2C2F5、C2F5CH=CHCF(CF3)2、CF3CH=CH(CF2)4CF3、CF3CH=CHCF2CF2CF(CF3)2、CF3CH=CHC(CF3)2C2F5、C2F5CH=CH(CF2)3CF3、C2F5CH=CHCF2CF(CF3)2、C2F5CH=CHCF(CF3)C2F5、C2F5CH=CHC(CF3)3、C2F5CF2CH=CHCF2C2F5、(CF3)2CFCH=CHCF(CF3)2、C2F5CF2CH=CHCF(CF3)2、CF3CH=CH(CF2)5CF3、CF3CH=CHCF(CF3)(CF2)2C2F5、CF3CH=CHC(CF3)2CF2C2F5、C2F5CH=CH(CF2)4CF3、C2F5CH=CHCF2CF2CF(CF3)2、C2F5CH=CHC(CF3)2C2F5、C2F5CF2CH=CH(CF2)3CF3、C2F5CF2CH=CHCF2CF(CF3)2、C2F5CF2CH=CHCF(CF3)C2F5、C2F5CF2CH=CHC(CF3)3、(CF3)2CFCH=CH(CF2)3CF3、(CF3)2CFCH=CHCF2CF(CF3)2、(CF3)2CFCH=CHCF(CF3)C2F5、(CF3)2CFCH=CHC(CF3)3、C2F5CH=CH(CF2)5CF3、C2F5CH=CHCF(CF3)(CF2)2C2F5、C2F5CH=CHC(CF3)2CF2C2F5、C2F5CF2CH=CH(CF2)4CF3、C2F5CF2CH=CHCF2CF2CF(CF3)2、C2F5CF2CH=CHC(CF3)2C2F5、(CF3)2CFCH=CH(CF2)4CF3、(CF3)2CFCH=CHCF2CF2CF(CF3)2、(CF3)2CFCH=CHC(CF3)2C2F5、CF3(CF2)3CH=CH(CF2)3CF3、CF3(CF2)3CH=CHCF2CF(CF3)2、CF3(CF2)3CH=CHCF(CF3)C2F5、CF3(CF2)3CH=CHC(CF3)3、(CF3)2CFCF2CH=CHCF2CF(CF3)2、(CF3)2CFCF2CH=CHCF(CF3)C2F5、(CF3)2CFCF2CH=CHC(CF3)3、C2F5CF(CF3)CH=CHCF(CF3)C2F5、C2F5CF(CF3)CH=CHC(CF3)3或(CF3)3CCH=CHC(CF3)3。
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CN114106944A (zh) * | 2016-01-15 | 2022-03-01 | Agc株式会社 | 溶剂组合物、清洗方法、涂膜的形成方法、热传导介质和热循环系统 |
CN111032846A (zh) * | 2017-08-25 | 2020-04-17 | Agc株式会社 | 溶剂组合物、清洗方法、带涂膜的基材的制造方法及热传递介质 |
CN111757863A (zh) * | 2018-03-07 | 2020-10-09 | 阿科玛法国公司 | 2-氯-3,3,3-三氟丙烯的生产工艺 |
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