CN101285865B - 探针针尖位置检测方法及装置、对准方法以及探针装置 - Google Patents
探针针尖位置检测方法及装置、对准方法以及探针装置 Download PDFInfo
- Publication number
- CN101285865B CN101285865B CN2008100039701A CN200810003970A CN101285865B CN 101285865 B CN101285865 B CN 101285865B CN 2008100039701 A CN2008100039701 A CN 2008100039701A CN 200810003970 A CN200810003970 A CN 200810003970A CN 101285865 B CN101285865 B CN 101285865B
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- probe
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- 239000000523 sample Substances 0.000 title claims abstract description 259
- 238000000034 method Methods 0.000 title claims abstract description 45
- 238000001514 detection method Methods 0.000 title claims abstract description 31
- 238000006073 displacement reaction Methods 0.000 claims description 14
- 238000010023 transfer printing Methods 0.000 claims description 13
- 230000005489 elastic deformation Effects 0.000 claims description 8
- 239000000463 material Substances 0.000 claims description 6
- 238000012360 testing method Methods 0.000 claims description 4
- 239000004065 semiconductor Substances 0.000 description 21
- 238000007689 inspection Methods 0.000 description 9
- 238000003860 storage Methods 0.000 description 8
- 238000012546 transfer Methods 0.000 description 5
- 230000007423 decrease Effects 0.000 description 4
- 238000005516 engineering process Methods 0.000 description 4
- 238000012545 processing Methods 0.000 description 4
- 230000033228 biological regulation Effects 0.000 description 3
- 238000004519 manufacturing process Methods 0.000 description 3
- 230000000630 rising effect Effects 0.000 description 3
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- 239000007779 soft material Substances 0.000 description 2
- 238000002788 crimping Methods 0.000 description 1
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- 238000011161 development Methods 0.000 description 1
- 238000012544 monitoring process Methods 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
Images
Classifications
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
- G01R31/00—Arrangements for testing electric properties; Arrangements for locating electric faults; Arrangements for electrical testing characterised by what is being tested not provided for elsewhere
- G01R31/26—Testing of individual semiconductor devices
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
- G01R31/00—Arrangements for testing electric properties; Arrangements for locating electric faults; Arrangements for electrical testing characterised by what is being tested not provided for elsewhere
- G01R31/28—Testing of electronic circuits, e.g. by signal tracer
- G01R31/2851—Testing of integrated circuits [IC]
- G01R31/2886—Features relating to contacting the IC under test, e.g. probe heads; chucks
- G01R31/2891—Features relating to contacting the IC under test, e.g. probe heads; chucks related to sensing or controlling of force, position, temperature
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L22/00—Testing or measuring during manufacture or treatment; Reliability measurements, i.e. testing of parts without further processing to modify the parts as such; Structural arrangements therefor
Landscapes
- Engineering & Computer Science (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- General Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Power Engineering (AREA)
- Testing Or Measuring Of Semiconductors Or The Like (AREA)
- Tests Of Electronic Circuits (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2007-077923 | 2007-03-23 | ||
| JP2007077923A JP4950719B2 (ja) | 2007-03-23 | 2007-03-23 | プローブの針先位置の検出方法、アライメント方法、針先位置検出装置及びプローブ装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN101285865A CN101285865A (zh) | 2008-10-15 |
| CN101285865B true CN101285865B (zh) | 2011-07-20 |
Family
ID=39774048
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN2008100039701A Expired - Fee Related CN101285865B (zh) | 2007-03-23 | 2008-01-23 | 探针针尖位置检测方法及装置、对准方法以及探针装置 |
Country Status (5)
| Country | Link |
|---|---|
| US (1) | US7839156B2 (enExample) |
| JP (1) | JP4950719B2 (enExample) |
| KR (1) | KR100945328B1 (enExample) |
| CN (1) | CN101285865B (enExample) |
| TW (1) | TWI431705B (enExample) |
Families Citing this family (36)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP5295588B2 (ja) * | 2008-02-28 | 2013-09-18 | 東京エレクトロン株式会社 | プローブカードの傾き調整方法、プローブカードの傾き検出方法及びプローブカードの傾き検出方法を記録したプログラム記録媒体 |
| JP5260119B2 (ja) * | 2008-04-02 | 2013-08-14 | 東京エレクトロン株式会社 | アライメント方法 |
| DE202008013982U1 (de) * | 2008-10-20 | 2009-01-08 | Rosenberger Hochfrequenztechnik Gmbh & Co. Kg | Messsystem zum Bestimmen von Streuparametern |
| KR101090333B1 (ko) * | 2009-06-03 | 2011-12-07 | 주식회사 쎄믹스 | 척의 능동적 기울기 제어가 가능한 웨이퍼 프로브 스테이션 및 그 제어방법 |
| ITVI20110343A1 (it) * | 2011-12-30 | 2013-07-01 | St Microelectronics Srl | Sistema e adattatore per testare chips con circuiti integrati in un package |
| JP5993649B2 (ja) * | 2012-07-31 | 2016-09-14 | 東京エレクトロン株式会社 | プローブカードへの基板当接装置、基板当接装置を備えた基板検査装置、及びプローブカードへの基板当接方法 |
| JP5918682B2 (ja) * | 2012-10-09 | 2016-05-18 | 東京エレクトロン株式会社 | プローブカード取り付け方法 |
| CN103091521B (zh) * | 2013-01-08 | 2015-07-15 | 上海交通大学 | 一种探针和引脚自动对准的方法及其探针台测试系统 |
| US9335345B1 (en) * | 2013-03-18 | 2016-05-10 | Christos Tsironis | Method for planarity alignment of waveguide wafer probes |
| US9322843B1 (en) * | 2013-03-19 | 2016-04-26 | Christos Tsironis | Method for planarity alignment of wafer probes |
| JP5819880B2 (ja) * | 2013-05-08 | 2015-11-24 | 本田技研工業株式会社 | 平行度調整装置および平行度調整方法 |
| US9347979B2 (en) * | 2013-10-01 | 2016-05-24 | Infineon Technologies Ag | Touchdown monitoring for individual dies of a semiconductor wafer |
| TWI498565B (zh) * | 2013-12-11 | 2015-09-01 | Mpi Corp | 探針點測系統、探針高度調整方法與探針位置監測方法 |
| KR101934880B1 (ko) * | 2014-05-15 | 2019-01-03 | 삼성전자주식회사 | 탐침 장치 및 그 운용 방법 |
| TWI528041B (zh) * | 2015-04-30 | 2016-04-01 | The method of adjusting the displacement distance of the probe according to the horizontal position of the plurality of points to be measured | |
| TWI560795B (en) * | 2015-06-01 | 2016-12-01 | Mpi Corp | Wafer probing device |
| CN105097598B (zh) * | 2015-08-14 | 2018-06-26 | 武汉新芯集成电路制造有限公司 | 一种晶圆探针卡自动检测装置 |
| JP6406221B2 (ja) * | 2015-11-17 | 2018-10-17 | 三菱電機株式会社 | 半導体装置の評価装置及び評価方法 |
| EP3430349B1 (en) * | 2016-03-16 | 2023-08-09 | Hexagon Metrology, Inc | Optical probe with crash protection and probe clips |
| JP6501726B2 (ja) | 2016-04-19 | 2019-04-17 | 三菱電機株式会社 | プローブ位置検査装置および半導体評価装置ならびにプローブ位置検査方法 |
| US11262384B2 (en) | 2016-12-23 | 2022-03-01 | Intel Corporation | Fine pitch probe card methods and systems |
| KR102799834B1 (ko) * | 2017-01-11 | 2025-04-28 | (주)테크윙 | 테스트핸들러용 가압장치 |
| KR102755729B1 (ko) * | 2017-01-26 | 2025-01-17 | 주식회사 탑 엔지니어링 | 프로브 장치 |
| JP6869123B2 (ja) | 2017-06-23 | 2021-05-12 | 東京エレクトロン株式会社 | プローブ装置及び針跡転写方法 |
| US11268983B2 (en) | 2017-06-30 | 2022-03-08 | Intel Corporation | Chevron interconnect for very fine pitch probing |
| US10775414B2 (en) | 2017-09-29 | 2020-09-15 | Intel Corporation | Low-profile gimbal platform for high-resolution in situ co-planarity adjustment |
| US11061068B2 (en) | 2017-12-05 | 2021-07-13 | Intel Corporation | Multi-member test probe structure |
| US11204555B2 (en) | 2017-12-28 | 2021-12-21 | Intel Corporation | Method and apparatus to develop lithographically defined high aspect ratio interconnects |
| US11073538B2 (en) | 2018-01-03 | 2021-07-27 | Intel Corporation | Electrical testing apparatus with lateral movement of a probe support substrate |
| US10488438B2 (en) | 2018-01-05 | 2019-11-26 | Intel Corporation | High density and fine pitch interconnect structures in an electric test apparatus |
| JP2019160937A (ja) * | 2018-03-09 | 2019-09-19 | 東京エレクトロン株式会社 | 位置補正方法、検査装置及びプローブカード |
| CN108828425B (zh) * | 2018-07-16 | 2024-08-27 | 苏州肯美特设备集成股份有限公司 | 一种半导体测试装置 |
| US11543454B2 (en) | 2018-09-25 | 2023-01-03 | Intel Corporation | Double-beam test probe |
| US10935573B2 (en) | 2018-09-28 | 2021-03-02 | Intel Corporation | Slip-plane MEMS probe for high-density and fine pitch interconnects |
| JP7474678B2 (ja) * | 2020-10-28 | 2024-04-25 | 東京エレクトロン株式会社 | 載置台、検査装置及び検査方法 |
| CN114639520B (zh) * | 2020-12-15 | 2025-07-15 | 泰科电子(上海)有限公司 | 检测机构、导线定位装置及导线加工设备 |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5644245A (en) * | 1993-11-24 | 1997-07-01 | Tokyo Electron Limited | Probe apparatus for inspecting electrical characteristics of a microelectronic element |
Family Cites Families (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP3208734B2 (ja) * | 1990-08-20 | 2001-09-17 | 東京エレクトロン株式会社 | プローブ装置 |
| JPH07169801A (ja) * | 1993-12-14 | 1995-07-04 | Nec Yamaguchi Ltd | プローバ |
| US5773987A (en) * | 1996-02-26 | 1998-06-30 | Motorola, Inc. | Method for probing a semiconductor wafer using a motor controlled scrub process |
| JP2000260852A (ja) * | 1999-03-11 | 2000-09-22 | Tokyo Electron Ltd | 検査ステージ及び検査装置 |
| US7009415B2 (en) * | 1999-10-06 | 2006-03-07 | Tokyo Electron Limited | Probing method and probing apparatus |
| JP2001356134A (ja) * | 2000-04-13 | 2001-12-26 | Innotech Corp | プローブカード装置およびそれに用いられるプローブ |
| JP4339631B2 (ja) * | 2003-06-20 | 2009-10-07 | 東京エレクトロン株式会社 | 検査方法及び検査装置 |
| JP2005079253A (ja) * | 2003-08-29 | 2005-03-24 | Tokyo Electron Ltd | 検査方法及び検査装置 |
| JP2006339196A (ja) * | 2005-05-31 | 2006-12-14 | Tokyo Seimitsu Co Ltd | プローバの移動量演算校正方法、移動量演算校正処理プログラム及びプローバ |
| US8311758B2 (en) * | 2006-01-18 | 2012-11-13 | Formfactor, Inc. | Methods and apparatuses for dynamic probe adjustment |
| JP5034614B2 (ja) * | 2007-03-30 | 2012-09-26 | 東京エレクトロン株式会社 | プロービング方法、プローブ装置及び記憶媒体 |
-
2007
- 2007-03-23 JP JP2007077923A patent/JP4950719B2/ja active Active
-
2008
- 2008-01-23 CN CN2008100039701A patent/CN101285865B/zh not_active Expired - Fee Related
- 2008-03-12 US US12/046,879 patent/US7839156B2/en not_active Expired - Fee Related
- 2008-03-12 KR KR1020080022752A patent/KR100945328B1/ko active Active
- 2008-03-21 TW TW097110056A patent/TWI431705B/zh active
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5644245A (en) * | 1993-11-24 | 1997-07-01 | Tokyo Electron Limited | Probe apparatus for inspecting electrical characteristics of a microelectronic element |
Also Published As
| Publication number | Publication date |
|---|---|
| TW200845261A (en) | 2008-11-16 |
| KR100945328B1 (ko) | 2010-03-08 |
| TWI431705B (zh) | 2014-03-21 |
| JP2008243860A (ja) | 2008-10-09 |
| US7839156B2 (en) | 2010-11-23 |
| KR20080086816A (ko) | 2008-09-26 |
| CN101285865A (zh) | 2008-10-15 |
| US20080231300A1 (en) | 2008-09-25 |
| JP4950719B2 (ja) | 2012-06-13 |
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Legal Events
| Date | Code | Title | Description |
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| C06 | Publication | ||
| PB01 | Publication | ||
| C10 | Entry into substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20110720 Termination date: 20150123 |
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| EXPY | Termination of patent right or utility model |