CN101285865B - 探针针尖位置检测方法及装置、对准方法以及探针装置 - Google Patents

探针针尖位置检测方法及装置、对准方法以及探针装置 Download PDF

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Publication number
CN101285865B
CN101285865B CN2008100039701A CN200810003970A CN101285865B CN 101285865 B CN101285865 B CN 101285865B CN 2008100039701 A CN2008100039701 A CN 2008100039701A CN 200810003970 A CN200810003970 A CN 200810003970A CN 101285865 B CN101285865 B CN 101285865B
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probes
contact
tip position
probe
sensor part
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Chinese (zh)
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CN101285865A (zh
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山田浩史
铃木胜
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Tokyo Electron Ltd
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Tokyo Electron Ltd
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    • GPHYSICS
    • G01MEASURING; TESTING
    • G01RMEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
    • G01R31/00Arrangements for testing electric properties; Arrangements for locating electric faults; Arrangements for electrical testing characterised by what is being tested not provided for elsewhere
    • G01R31/26Testing of individual semiconductor devices
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01RMEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
    • G01R31/00Arrangements for testing electric properties; Arrangements for locating electric faults; Arrangements for electrical testing characterised by what is being tested not provided for elsewhere
    • G01R31/28Testing of electronic circuits, e.g. by signal tracer
    • G01R31/2851Testing of integrated circuits [IC]
    • G01R31/2886Features relating to contacting the IC under test, e.g. probe heads; chucks
    • G01R31/2891Features relating to contacting the IC under test, e.g. probe heads; chucks related to sensing or controlling of force, position, temperature
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L22/00Testing or measuring during manufacture or treatment; Reliability measurements, i.e. testing of parts without further processing to modify the parts as such; Structural arrangements therefor

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  • Engineering & Computer Science (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • General Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Power Engineering (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
  • Tests Of Electronic Circuits (AREA)
CN2008100039701A 2007-03-23 2008-01-23 探针针尖位置检测方法及装置、对准方法以及探针装置 Expired - Fee Related CN101285865B (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2007-077923 2007-03-23
JP2007077923A JP4950719B2 (ja) 2007-03-23 2007-03-23 プローブの針先位置の検出方法、アライメント方法、針先位置検出装置及びプローブ装置

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CN101285865A CN101285865A (zh) 2008-10-15
CN101285865B true CN101285865B (zh) 2011-07-20

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US (1) US7839156B2 (enExample)
JP (1) JP4950719B2 (enExample)
KR (1) KR100945328B1 (enExample)
CN (1) CN101285865B (enExample)
TW (1) TWI431705B (enExample)

Families Citing this family (36)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5295588B2 (ja) * 2008-02-28 2013-09-18 東京エレクトロン株式会社 プローブカードの傾き調整方法、プローブカードの傾き検出方法及びプローブカードの傾き検出方法を記録したプログラム記録媒体
JP5260119B2 (ja) * 2008-04-02 2013-08-14 東京エレクトロン株式会社 アライメント方法
DE202008013982U1 (de) * 2008-10-20 2009-01-08 Rosenberger Hochfrequenztechnik Gmbh & Co. Kg Messsystem zum Bestimmen von Streuparametern
KR101090333B1 (ko) * 2009-06-03 2011-12-07 주식회사 쎄믹스 척의 능동적 기울기 제어가 가능한 웨이퍼 프로브 스테이션 및 그 제어방법
ITVI20110343A1 (it) * 2011-12-30 2013-07-01 St Microelectronics Srl Sistema e adattatore per testare chips con circuiti integrati in un package
JP5993649B2 (ja) * 2012-07-31 2016-09-14 東京エレクトロン株式会社 プローブカードへの基板当接装置、基板当接装置を備えた基板検査装置、及びプローブカードへの基板当接方法
JP5918682B2 (ja) * 2012-10-09 2016-05-18 東京エレクトロン株式会社 プローブカード取り付け方法
CN103091521B (zh) * 2013-01-08 2015-07-15 上海交通大学 一种探针和引脚自动对准的方法及其探针台测试系统
US9335345B1 (en) * 2013-03-18 2016-05-10 Christos Tsironis Method for planarity alignment of waveguide wafer probes
US9322843B1 (en) * 2013-03-19 2016-04-26 Christos Tsironis Method for planarity alignment of wafer probes
JP5819880B2 (ja) * 2013-05-08 2015-11-24 本田技研工業株式会社 平行度調整装置および平行度調整方法
US9347979B2 (en) * 2013-10-01 2016-05-24 Infineon Technologies Ag Touchdown monitoring for individual dies of a semiconductor wafer
TWI498565B (zh) * 2013-12-11 2015-09-01 Mpi Corp 探針點測系統、探針高度調整方法與探針位置監測方法
KR101934880B1 (ko) * 2014-05-15 2019-01-03 삼성전자주식회사 탐침 장치 및 그 운용 방법
TWI528041B (zh) * 2015-04-30 2016-04-01 The method of adjusting the displacement distance of the probe according to the horizontal position of the plurality of points to be measured
TWI560795B (en) * 2015-06-01 2016-12-01 Mpi Corp Wafer probing device
CN105097598B (zh) * 2015-08-14 2018-06-26 武汉新芯集成电路制造有限公司 一种晶圆探针卡自动检测装置
JP6406221B2 (ja) * 2015-11-17 2018-10-17 三菱電機株式会社 半導体装置の評価装置及び評価方法
EP3430349B1 (en) * 2016-03-16 2023-08-09 Hexagon Metrology, Inc Optical probe with crash protection and probe clips
JP6501726B2 (ja) 2016-04-19 2019-04-17 三菱電機株式会社 プローブ位置検査装置および半導体評価装置ならびにプローブ位置検査方法
US11262384B2 (en) 2016-12-23 2022-03-01 Intel Corporation Fine pitch probe card methods and systems
KR102799834B1 (ko) * 2017-01-11 2025-04-28 (주)테크윙 테스트핸들러용 가압장치
KR102755729B1 (ko) * 2017-01-26 2025-01-17 주식회사 탑 엔지니어링 프로브 장치
JP6869123B2 (ja) 2017-06-23 2021-05-12 東京エレクトロン株式会社 プローブ装置及び針跡転写方法
US11268983B2 (en) 2017-06-30 2022-03-08 Intel Corporation Chevron interconnect for very fine pitch probing
US10775414B2 (en) 2017-09-29 2020-09-15 Intel Corporation Low-profile gimbal platform for high-resolution in situ co-planarity adjustment
US11061068B2 (en) 2017-12-05 2021-07-13 Intel Corporation Multi-member test probe structure
US11204555B2 (en) 2017-12-28 2021-12-21 Intel Corporation Method and apparatus to develop lithographically defined high aspect ratio interconnects
US11073538B2 (en) 2018-01-03 2021-07-27 Intel Corporation Electrical testing apparatus with lateral movement of a probe support substrate
US10488438B2 (en) 2018-01-05 2019-11-26 Intel Corporation High density and fine pitch interconnect structures in an electric test apparatus
JP2019160937A (ja) * 2018-03-09 2019-09-19 東京エレクトロン株式会社 位置補正方法、検査装置及びプローブカード
CN108828425B (zh) * 2018-07-16 2024-08-27 苏州肯美特设备集成股份有限公司 一种半导体测试装置
US11543454B2 (en) 2018-09-25 2023-01-03 Intel Corporation Double-beam test probe
US10935573B2 (en) 2018-09-28 2021-03-02 Intel Corporation Slip-plane MEMS probe for high-density and fine pitch interconnects
JP7474678B2 (ja) * 2020-10-28 2024-04-25 東京エレクトロン株式会社 載置台、検査装置及び検査方法
CN114639520B (zh) * 2020-12-15 2025-07-15 泰科电子(上海)有限公司 检测机构、导线定位装置及导线加工设备

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5644245A (en) * 1993-11-24 1997-07-01 Tokyo Electron Limited Probe apparatus for inspecting electrical characteristics of a microelectronic element

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3208734B2 (ja) * 1990-08-20 2001-09-17 東京エレクトロン株式会社 プローブ装置
JPH07169801A (ja) * 1993-12-14 1995-07-04 Nec Yamaguchi Ltd プローバ
US5773987A (en) * 1996-02-26 1998-06-30 Motorola, Inc. Method for probing a semiconductor wafer using a motor controlled scrub process
JP2000260852A (ja) * 1999-03-11 2000-09-22 Tokyo Electron Ltd 検査ステージ及び検査装置
US7009415B2 (en) * 1999-10-06 2006-03-07 Tokyo Electron Limited Probing method and probing apparatus
JP2001356134A (ja) * 2000-04-13 2001-12-26 Innotech Corp プローブカード装置およびそれに用いられるプローブ
JP4339631B2 (ja) * 2003-06-20 2009-10-07 東京エレクトロン株式会社 検査方法及び検査装置
JP2005079253A (ja) * 2003-08-29 2005-03-24 Tokyo Electron Ltd 検査方法及び検査装置
JP2006339196A (ja) * 2005-05-31 2006-12-14 Tokyo Seimitsu Co Ltd プローバの移動量演算校正方法、移動量演算校正処理プログラム及びプローバ
US8311758B2 (en) * 2006-01-18 2012-11-13 Formfactor, Inc. Methods and apparatuses for dynamic probe adjustment
JP5034614B2 (ja) * 2007-03-30 2012-09-26 東京エレクトロン株式会社 プロービング方法、プローブ装置及び記憶媒体

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5644245A (en) * 1993-11-24 1997-07-01 Tokyo Electron Limited Probe apparatus for inspecting electrical characteristics of a microelectronic element

Also Published As

Publication number Publication date
TW200845261A (en) 2008-11-16
KR100945328B1 (ko) 2010-03-08
TWI431705B (zh) 2014-03-21
JP2008243860A (ja) 2008-10-09
US7839156B2 (en) 2010-11-23
KR20080086816A (ko) 2008-09-26
CN101285865A (zh) 2008-10-15
US20080231300A1 (en) 2008-09-25
JP4950719B2 (ja) 2012-06-13

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