CN101253423A - 用于结构化基材表面的方法 - Google Patents

用于结构化基材表面的方法 Download PDF

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CN101253423A
CN101253423A CNA200680031371XA CN200680031371A CN101253423A CN 101253423 A CN101253423 A CN 101253423A CN A200680031371X A CNA200680031371X A CN A200680031371XA CN 200680031371 A CN200680031371 A CN 200680031371A CN 101253423 A CN101253423 A CN 101253423A
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M·尤克利斯
M·库尔萨维
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Merck Patent GmbH
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Abstract

本发明涉及一种用于结构化基材表面的方法，其中在第一步中使基材结构化，在第二步中以溶胶－凝胶法涂覆使该结构化部分光滑，特别是得到一种弥散方式散射的表面。本发明的主题还在于以此方式结构化的基材及其在光学应用中的用途。

Description

用于结构化基材表面的方法
本发明涉及结构化基材表面的方法，其中在第一步中使基材结构化，在第二步中以溶胶-凝胶法涂覆使该结构化部分光滑，特别是得到呈弥散方式散射的表面。本发明的主题还在于以此方式结构化的表面及其在光学应用的用途。
经结构化的表面在一系列应用和工艺中起着重要的作用。经表面结构化的基材在光学应用中也越来越重要，如作为散射体或作为反射体。光学散射体是入射光在其上呈弥散方式散射的散射表面。应用光学散射体的实例是在照相技术或投影技术中在其上投射照片的毛玻璃(Mattscheibe)。在毛玻璃上产生图像的光经散射，即以不同方向偏转。通过散射可实现从不同方向观察到投影在毛玻璃上的图像。因此需要一种可制备呈弥散方式散射的表面的方法。
因此，本发明的目的在于提供一种用于结构化基材表面的方法，其可简单操作并可制备适于各类应用的结构化表面。
本发明的方法令人意外地满足了综合的要求。由此，本发明的主题是使基材表面结构化的方法，其中在第一步中使该基材结构化，在第二步中以溶胶-凝胶法涂覆以使该结构化部分地光滑，特别是得到一种呈弥散方式散射的表面。
本发明中的结构化表面意指具有规则结构或无规则结构，特别是呈任何类型的沟槽、压痕或凸起结构的表面。该压痕和凸起可呈各种任意形式并为纳米至毫米尺寸范围。
本发明的方法的优点是其可简单实施，并可产生呈弥散方式散射的结构化。由此可为应用者提供制备所需的结构化表面的可能性，其中该两方法步骤在工艺上易于操作、实施简单和易于控制。适用于所有需光散射的光学系统。
在一种特殊实施方案中，本发明方法适用于制备液晶显示器的散射体。通常对LCD需使用能提供足够对比度的背光。特别是在使用电池供电的LCD例如笔记本情况下，该相关能耗显然是不利的，因为电池运行时间是有限的。由此希望研制不需背光的LCD。对此需使用至少应能满足下列要求的反射体：
-入射光应均匀分布在观察者视角范围中的整个显示器区域上
-在视角范围外应有尽可能小的反射
-通过结构化应不出现干涉现象。
借助本发明方法，可以考虑制备这类结构化表面。
玻璃基材、陶瓷基材、金属基材或塑料基材适合用作本发明中的基材，优选
是玻璃基材、陶瓷基材或金属基材，非常特别优选为玻璃基材或金属基材。具有结构化表面的玻璃基材或金属基材特别适于光学应用，特别是用于LCD。
所有已知玻璃如所有本专业人员已知的玻璃组合物的浮法玻璃、铸玻璃、A-玻璃、C-玻璃、D-玻璃、E-玻璃、ECR-玻璃、R-玻璃或S-玻璃均适合作为玻璃基材的材料。例如平均粗糙度值＜1μm的抛光金属薄板或光亮拉制薄板均适合作为金属基材。适用的塑料基材例如由PMMA或聚碳酸酯制成。本领域技术人员已知的所有陶瓷，特别是透明陶瓷均适合作为陶瓷基材，该基材经下列所述方法之一结构化。
在本发明的两步法中，第一步骤进行该基材表面的结构化。该结构化可通过粒子射束、激光射束、蚀刻法的作用或通过压纹法进行。最理想是该结构化方法适于各有关基材，以实现最佳结构化。在塑料或金属制成的基材情况下压印法特别适用，其中塑料优选用压印法结构化。蚀刻法特别适于玻璃基材或陶瓷基材，其中可应用本领域技术人员已知的所有蚀刻法方案如RIE(反应性离子蚀刻)。
结构化优选用粒子射束进行，粒子射束可以是喷砂或电子射束。本发明中喷砂意指其粒子不属于原子或次原子尺寸范围(如电子)的所有的粒子射束。粒子尺寸可为1μm-4mm，这与所需的结构化和所用的粒子材料有关。该粒子的尺寸优选为5μm-1mm，特别是20μm-200μm。
作为射束材料可用所有合适的材料如砂、玻璃、刚玉、塑料、陶瓷、核桃壳、玉米粒、各种性能和组成的钢、金属如铝和/或它们的混合物。优选是玻璃粒或刚玉粒，特别是其粒度为5-100μm，非常特别优选的粒度为50-80μm。
该射束介质的射束压力以及入射角和方向也影响表面结构。通常射束压达10bar，优选达6bar，这时入射角通常为5-90°，优选30-80°。为调节结构化的所需类型和深度而使所述参数与粒子材料的各种适配为本领域技术人员的普通技能的一部分。实际的喷射过程相应通过适用的机器实施以达到结构的所需再现性。
以此方式所得的结构通常还具有棱边，该棱边对其后应用中的特性会产生不利影响。由此在本发明方法的第二步中要通过以溶胶-凝胶法涂覆使结构化光滑。通过光滑处理可部分再填补在结构化中产生的凹陷，并通过附加的涂覆使相应棱边光滑(见图1)。此外，通过相应溶胶如TiO2和SiO2溶胶的合适混合可在溶胶-凝胶法中达到控制光学效应的折射率适配。因此本发明方法中实施的第二步不仅用于第一步中产生的结构化的光滑处理，还可用于所得结构化表面的光学特性适配。
作为溶胶-凝胶法的溶胶可使用本领域技术人员已知的溶胶如元素钛、锆、硅、铝的化合物和/或它们的混合物的溶胶。优选使用硅溶胶。这些类型的溶胶或其前体是已知的且可由市售购得。通常该硅溶胶包括SiO2颗粒通过四烷氧基硅烷特别是四乙氧基硅烷(TEOS)在水性-醇-氨介质中水解缩聚所得的那些硅溶胶。当然也可使用以其它方法制备的水性的和/或含溶剂的溶胶作为涂覆溶液。此外该涂覆溶液还可含表面活性剂。另外，该适用于溶胶-凝胶法的涂覆溶液也可含其它成分如流动助剂或配合剂。
在涂覆溶液中的各国含量通常为0.1-20重量％，优选2-10重量％。
上述的涂覆溶液例如描述于DE 19828231、US 4775520、US5378400、DE 19642419、EP 1199288或WO 03/027015中，其公开内容引入本发明作为参考。在溶胶-凝胶法中的涂覆可按通常的和本领域技术人员已知的原理进行，如通过浸涂法、喷涂法或借助于流幕法(Flieβvorhang)涂覆。在浸涂时将经结构化的基材浸入涂覆溶液中，在喷涂法时借助于单组分喷嘴或多组分喷嘴在基材上涂以涂覆溶液。在应用流幕法时通过涂覆介质的自由流动幕进行涂覆，该待涂覆基材在该流动幕下面通过。优选是在溶胶-凝胶法中该涂覆以浸涂进行。为此在该最简单的实施方案中，具有经预结构化的基材用提升设备浸入充有溶胶的池中，接着以匀速从池中拉出。
所施加的层厚依在第一步中所进行结构化的深度和结构而定。如果结构化形成很多棱边、角和条纹或在结构的最凸点和最凹点之间有大的高度差，则该光滑层的部分要选择较厚。在结构化和接着的光滑化中各参数的准确适配基于本领域技术人员的专业知识。优选是各参数如此相互适配，以使结构化的表面满足针对最佳散射体/反射体的前述条件。在溶胶-凝胶法涂覆中的厚度控制在浸涂情况下基本上由该结构化基材在涂覆时的拉出速度决定。拉出速度越快，所得层越厚。通常该拉出速度为0.1-100mm/sec，优选1.6-8mm/sec。当然该涂覆过程也可重复一次或多次，直到达所需的结构化光滑度。
为使所施加的层密实和牢固，该结构化基材可经焙烧。通过焙烧该残余的溶剂含量由涂层中去除。焙烧温度通常为300-700℃，特别是500-600℃。
在本发明的另一实施方案中，该结构化表面还涂以金属层。该附加的步骤在溶胶-凝胶法中的涂覆之后进行，也可在其后的任何时候进行。涂覆以金属层可用湿化学法进行，如通过合适的还原法，通过CVD法和/或PVD法进行，其中优选PVD法。
作为该附加金属层的金属可使用例如铝、银、铬、镍或其它反射性金属层。金属层优选为铝。
该附加金属层的厚度依材料和所需特性而定，通常为10-150nm，特别是30-100nm。
本发明的主题还在于按本发明方法之一所制备的具有结构化表面的基材。
本发明的另一主题是按上述方法所得的具有结构化表面的基材在光学应用中作为散射体和/或反射体的用途。光学应用包括本领域技术人员已知的所有光学应用，如各类结构的照相机、投影仪和投影屏幕、液晶显示器、放大体系如显微镜等。优选本发明的基材应用于液晶显示器中。那里使用按本发明制备的结构化基材特别有利，如作为反射背景，其可取代背光并由此可降低显示器的能耗。本发明的结构化基材的其它应用领域包括本专业人员很容易设想到的领域。
下面的实施例用于详述本发明，但不受限于此。
实施例
实施例1
用尺寸范围为10-50μm的玻璃珠在2bar的喷射压力下从200mm的距离喷射厚度为1mm的玻璃板。该板经去灰尘并在水-醇SiO2溶胶(固含量：3重量％)中以4mm/sec拉出速度浸渍共三次。在各浸入步骤之间均在室温下使板各干燥10分钟。
经涂覆和干燥后，在该经结构化和涂覆的基材上涂以层厚为70nm的铝层。
由此得到具有弥散方式散射特性的含结构性表面的玻璃板。

Claims (13)

1.一种用于结构化基材表面的方法，其特征在于，在第一步中使基材结构化，在第二步中以溶胶-凝胶法涂覆使该结构化部分光滑。
2.权利要求1的方法，其特征在于，得到弥散方式散射的表面。
3.权利要求1或2的方法，其特征在于，该结构化通过粒子射束、激光射束、蚀刻法的作用或通过压纹法进行。
4.权利要求3的方法，其特征在于，粒子射束是喷砂或电子射束。
5.权利要求1-4中一项或多项的方法，其特征在于，在溶胶-凝胶法中使用的溶胶是元素钛、锆、硅、铝的化合物和/或它们的混合物的溶胶。
6.权利要求1-5中一项或多项的方法，其特征在于，在溶胶-凝胶法中的涂覆是借助于浸涂法、喷涂法或借助于流幕法进行。
7.权利要求1-6中一项或多项的方法，其特征在于，该结构化表面还涂以金属层。
8.权利要求7的方法，其特征在于，用金属层涂覆可以以湿化学法、CVD法和/或PVD法进行。
9.权利要求7或8的方法，其特征在于，金属包括铝、银、铬、镍或其它反射性金属层。
10.一种具有结构化表面的基材，按权利要求1-9中一项或多项的方法制备。
11.权利要求10的基材，其特征在于，该基材包括玻璃基材、陶瓷基材、金属基材或塑料基材。
12.一种具有按权利要求1-9中一项或多项的方法所制备的结构化表面的基材作为光学应用中的散射体和/或反射体的用途。
13.权利要求12的用途，其特征在于，该光学应用是液晶显示器。
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