CN101189245B - 制备氢氯硅烷的方法 - Google Patents

制备氢氯硅烷的方法 Download PDF

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Publication number
CN101189245B
CN101189245B CN2005800497460A CN200580049746A CN101189245B CN 101189245 B CN101189245 B CN 101189245B CN 2005800497460 A CN2005800497460 A CN 2005800497460A CN 200580049746 A CN200580049746 A CN 200580049746A CN 101189245 B CN101189245 B CN 101189245B
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Prior art keywords
silicon
hydrogen
promoter metals
metal
oxide
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CN2005800497460A
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Chinese (zh)
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CN101189245A (zh
Inventor
威廉·C·布勒内曼
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Rec Silicon Inc
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Rec Silicon Inc
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    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic System
    • C07F7/02—Silicon compounds
    • C07F7/08—Compounds having one or more C—Si linkages
    • C07F7/12—Organo silicon halides
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B33/00—Silicon; Compounds thereof
    • C01B33/08—Compounds containing halogen
    • C01B33/107—Halogenated silanes
    • C01B33/1071—Tetrachloride, trichlorosilane or silicochloroform, dichlorosilane, monochlorosilane or mixtures thereof
    • C01B33/10742—Tetrachloride, trichlorosilane or silicochloroform, dichlorosilane, monochlorosilane or mixtures thereof prepared by hydrochlorination of silicon or of a silicon-containing material
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J23/00—Catalysts comprising metals or metal oxides or hydroxides, not provided for in group B01J21/00
    • B01J23/38—Catalysts comprising metals or metal oxides or hydroxides, not provided for in group B01J21/00 of noble metals
    • B01J23/40—Catalysts comprising metals or metal oxides or hydroxides, not provided for in group B01J21/00 of noble metals of the platinum group metals
    • B01J23/42—Platinum
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J23/00—Catalysts comprising metals or metal oxides or hydroxides, not provided for in group B01J21/00
    • B01J23/70—Catalysts comprising metals or metal oxides or hydroxides, not provided for in group B01J21/00 of the iron group metals or copper
    • B01J23/72—Copper
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J27/00—Catalysts comprising the elements or compounds of halogens, sulfur, selenium, tellurium, phosphorus or nitrogen; Catalysts comprising carbon compounds
    • B01J27/06—Halogens; Compounds thereof
    • B01J27/08—Halides
    • B01J27/122—Halides of copper
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J37/00—Processes, in general, for preparing catalysts; Processes, in general, for activation of catalysts
    • B01J37/16—Reducing
    • B01J37/18—Reducing with gases containing free hydrogen
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic System
    • C07F7/02—Silicon compounds
    • C07F7/08—Compounds having one or more C—Si linkages
    • C07F7/12—Organo silicon halides
    • C07F7/16—Preparation thereof from silicon and halogenated hydrocarbons direct synthesis
CN2005800497460A 2005-03-09 2005-03-09 制备氢氯硅烷的方法 Active CN101189245B (zh)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
PCT/US2005/008204 WO2006098722A1 (en) 2005-03-09 2005-03-09 Process for the production of hydrochlorosilanes

Publications (2)

Publication Number Publication Date
CN101189245A CN101189245A (zh) 2008-05-28
CN101189245B true CN101189245B (zh) 2012-06-13

Family

ID=36991997

Family Applications (1)

Application Number Title Priority Date Filing Date
CN2005800497460A Active CN101189245B (zh) 2005-03-09 2005-03-09 制备氢氯硅烷的方法

Country Status (8)

Country Link
EP (1) EP1861408A4 (ja)
JP (1) JP4813545B2 (ja)
KR (1) KR101176088B1 (ja)
CN (1) CN101189245B (ja)
DE (1) DE112005003497T5 (ja)
NO (1) NO20076030L (ja)
TW (1) TWI454424B (ja)
WO (1) WO2006098722A1 (ja)

Families Citing this family (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN101279734B (zh) * 2008-05-30 2010-06-02 广州吉必盛科技实业有限公司 合成多晶硅原料三氯氢硅的方法
DE102008002537A1 (de) * 2008-06-19 2009-12-24 Evonik Degussa Gmbh Verfahren zur Entfernung von Bor enthaltenden Verunreinigungen aus Halogensilanen sowie Anlage zur Durchführung des Verfahrens
US7927984B2 (en) * 2008-11-05 2011-04-19 Hemlock Semiconductor Corporation Silicon production with a fluidized bed reactor utilizing tetrachlorosilane to reduce wall deposition
US8178051B2 (en) * 2008-11-05 2012-05-15 Stephen Michael Lord Apparatus and process for hydrogenation of a silicon tetrahalide and silicon to the trihalosilane
US8778292B2 (en) * 2009-05-12 2014-07-15 Procedyne Corporation Fluidized bed process for synthesizing trichlorosilane and a trichlorosilane synthesizer
KR101672796B1 (ko) * 2009-11-10 2016-11-07 주식회사 케이씨씨 염소가스 혹은 염화수소를 이용하여 다결정실리콘 제조원료인 고순도의 삼염화실란을 제조하는 방법
JP5542026B2 (ja) 2010-10-27 2014-07-09 信越化学工業株式会社 クロロシラン類の精製方法
TWI574915B (zh) * 2011-10-20 2017-03-21 陝西有色天宏瑞科矽材料有限責任公司 在製造氫氯矽烷中積垢的減少
US20150030520A1 (en) * 2012-03-14 2015-01-29 Centrotherm Photovoltaics Usa, Inc. Trichlorosilane production
KR101462634B1 (ko) * 2013-03-07 2014-11-17 한화케미칼 주식회사 트리클로로실란의 제조방법
US20140314655A1 (en) * 2013-04-19 2014-10-23 Rec Silicon Inc Corrosion and fouling reduction in hydrochlorosilane production
KR101519498B1 (ko) * 2013-06-19 2015-05-12 한화케미칼 주식회사 트리클로로실란의 제조방법
CN105080434B (zh) * 2014-04-18 2018-02-27 新特能源股份有限公司 一种催化反应器、系统、四氯化硅催化氢化反应的方法
KR101616043B1 (ko) 2014-07-22 2016-04-27 한화케미칼 주식회사 삼염화실란의 제조방법
WO2016100429A1 (en) * 2014-12-18 2016-06-23 Hemlock Semiconductor Corporation Methods of hydrogenating a halosilane
US11643330B2 (en) * 2017-10-05 2023-05-09 Wacker Chemie Ag Method for producing chlorosilanes
CN113651844B (zh) * 2021-08-20 2023-09-12 唐山偶联硅业有限公司 连续法制备二甲基氢氯硅烷的工艺

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4973725A (en) * 1988-06-28 1990-11-27 Union Carbide Chemicals And Plastics Company Inc. Direct synthesis process for organohalohydrosilanes
CN1157259A (zh) * 1995-12-25 1997-08-20 德山株式会社 三氯硅烷的生产方法

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US2499009A (en) * 1947-02-15 1950-02-28 Linde Air Prod Co Chlorosilanes
US4676967A (en) * 1978-08-23 1987-06-30 Union Carbide Corporation High purity silane and silicon production
US4314908A (en) * 1979-10-24 1982-02-09 Union Carbide Corporation Preparation of reaction mass for the production of methylchlorosilane
JPS58161915A (ja) * 1982-03-17 1983-09-26 Shin Etsu Chem Co Ltd トリクロロシランの製造方法
US4526769A (en) * 1983-07-18 1985-07-02 Motorola, Inc. Trichlorosilane production process
JPS62288109A (ja) * 1986-06-05 1987-12-15 Mitsubishi Metal Corp トリクロルシランの製造方法
JPH0788214B2 (ja) * 1986-10-15 1995-09-27 三井東圧化学株式会社 トリクロロシランの製造方法
JP2613259B2 (ja) * 1988-06-09 1997-05-21 三井東圧化学株式会社 トリクロロシランの製造方法
JP2613260B2 (ja) * 1988-06-09 1997-05-21 三井東圧化学株式会社 トリクロロシランの製造方法
JPH01313318A (ja) * 1988-06-10 1989-12-18 Mitsui Toatsu Chem Inc トリクロロシランの製造方法
US5051248A (en) * 1990-08-15 1991-09-24 Dow Corning Corporation Silane products from reaction of silicon monoxide with hydrogen halides
CA2055304A1 (en) * 1990-12-06 1992-06-07 Roland L. Halm Metal catalyzed production of tetrachlorosilanes
US5250716A (en) * 1992-05-28 1993-10-05 Mui Jeffrey Y P Method for making a silicon/copper contact mass suitable for direct reaction
US5329038A (en) * 1993-12-29 1994-07-12 Dow Corning Corporation Process for hydrogenation of chlorosilane
JP3708649B2 (ja) * 1995-12-25 2005-10-19 株式会社トクヤマ 銅シリサイドを有する金属珪素粒子の製造方法
JP3708648B2 (ja) * 1995-12-25 2005-10-19 株式会社トクヤマ トリクロロシランの製造方法
KR100210261B1 (ko) * 1997-03-13 1999-07-15 이서봉 발열반응을 이용한 다결정 실리콘의 제조 방법
US6057469A (en) 1997-07-24 2000-05-02 Pechiney Electrometallurgie Process for manufacturing active silicon powder for the preparation of alkyl- or aryl-halosilanes
DE10045367A1 (de) * 2000-09-14 2002-03-28 Bayer Ag Verfahren zur Herstellung von Trichlorsilan
DE10049963B4 (de) * 2000-10-10 2009-04-09 Evonik Degussa Gmbh Verfahren zur Herstellung von Trichlorsilan

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4973725A (en) * 1988-06-28 1990-11-27 Union Carbide Chemicals And Plastics Company Inc. Direct synthesis process for organohalohydrosilanes
CN1157259A (zh) * 1995-12-25 1997-08-20 德山株式会社 三氯硅烷的生产方法

Non-Patent Citations (2)

* Cited by examiner, † Cited by third party
Title
JP平1-313314A 1989.12.18
JP平1-313315A 1998.12.18

Also Published As

Publication number Publication date
WO2006098722A1 (en) 2006-09-21
CN101189245A (zh) 2008-05-28
JP4813545B2 (ja) 2011-11-09
DE112005003497T5 (de) 2008-01-24
EP1861408A4 (en) 2011-08-03
NO20076030L (no) 2007-12-07
TWI454424B (zh) 2014-10-01
KR20080008323A (ko) 2008-01-23
KR101176088B1 (ko) 2012-08-22
EP1861408A1 (en) 2007-12-05
TW200704589A (en) 2007-02-01
JP2008532907A (ja) 2008-08-21

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Effective date of registration: 20151228

Address after: 719314 Yulin City, Zhejiang Province, Yu Jia Industrial Park

Patentee after: REC SILICON INC

Address before: Washington, USA

Patentee before: Rec Silicon Inc.