CN100561734C - 半导体ic内设模块 - Google Patents
半导体ic内设模块 Download PDFInfo
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- CN100561734C CN100561734C CNB2006101538661A CN200610153866A CN100561734C CN 100561734 C CN100561734 C CN 100561734C CN B2006101538661 A CNB2006101538661 A CN B2006101538661A CN 200610153866 A CN200610153866 A CN 200610153866A CN 100561734 C CN100561734 C CN 100561734C
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Abstract
本发明提供一种半导体IC内设模块,该半导体IC内设模块通过以最短距离对连接半导体IC间的总线进行布线,从而实现小型薄型化以及噪音的进一步降低。所述半导体IC内设模块(100)具有:多层基板(101),其具有第1和第2绝缘层(101a、101b);以及嵌入在多层基板(101)内的控制器IC(102)和存储器IC(103),在多层基板(101)的内层设有布线层(104)。布线层(104)的一部分构成总线(104X),通过总线(104X)对控制器IC(102)和存储器IC(103)之间进行连接。控制器IC(102)和存储器IC(103)嵌入在第2绝缘层(101b)内。第1和第2绝缘层(101a、101b)的表面层分别设有第1和第2接地层(105a、105b)。
Description
技术领域
本发明涉及半导体IC内设模块,特别涉及在嵌入有半导体IC的基板的两表面具有接地层的半导体IC内设模块。
背景技术
作为以往的半导体IC内设模块,例如公知有在多层基板的纵方向上层叠配置半导体IC芯片的结构(参照专利文献1)。这是在多层基板的两侧形成比裸芯片(bare chip)厚的绝缘树脂层,并在其中嵌设裸芯片的结构。在这些绝缘树脂层的两侧设有布线层,表层侧的布线层被用作接地层,内层侧的布线层被用作电源线。半导体IC之间的连接通过形成于多层基板的表面层以及内层的布线层和导孔(via hole)来进行。
根据上述以往的半导体IC内设模块,在形成于多层基板的表面的绝缘树脂层的内部嵌设有半导体IC芯片,同时这种半导体IC与设于其两侧的电源线和接地层相连,因此可以缩短对电源线和接地层的布线距离,可提供一种电气特性优良的电路装置。
另外也有多种与本发明相关的现有技术(参照专利文献2、3)。
[专利文献1]日本特开2001-102517号公报
[专利文献2]日本特开2000-183540号公报
[专利文献3]日本特开2000-31207号公报
但是,上述以往的半导体IC内设模块由于具有积层(build up)结构,因此具有基板整体厚度很厚的问题。另外,由于使用导孔进行半导体IC之间的连接,所以具有为了半导体IC之间连接而需要很多空间,布线距离变长的问题。在布线距离变长的情况下容易产生阻抗错配,成为噪声增大的原因。特别是,连接控制器IC和存储器IC的总线例如以100MHz左右的高速时钟工作,因而具有布线距离越长其高次谐波越成为不需要的辐射,而对无线系统的模拟电路带来不良影响的问题。
发明内容
因此,本发明的目的在于,提供一种半导体IC内设模块,该半导体IC内设模块可以降低总线所产生的噪声的影响,并可以以最短距离对连接半导体IC之间的总线进行布线,由此可以实现小型薄型化以及噪声的进一步降低。
本发明的上述目的由这样一种半导体IC内设模块来实现,其特征在于,该半导体IC内设模块具有:层叠了多个绝缘层的多层基板;以互相横向并排配置的方式嵌入在上述多层基板内的第1和第2半导体IC芯片;以及对上述第1和第2半导体IC芯片之间进行连接的总线;以及覆盖上述总线的上方的第1导电层和覆盖上述总线的下方的第2导电层,上述多层基板包括:第1和第2绝缘层;以及设于上述第1和第2绝缘层之间的第1布线层,上述总线设于上述第1布线层上,上述第1和第2半导体IC芯片都嵌入在上述第1或第2绝缘层中的任意一方中,上述第1和第2导电层中的任意一方为电源层,另一方为接地层,在上述电源层和接地层之间设有旁路电容器。根据本发明,由于2个半导体IC芯片嵌入在多层基板内,因而可以以最短距离对连接两者的总线进行布线。并且可以提供一种实现小型薄型化的简单结构的半导体IC内设模块。另外,在导电层为电源层的情况下,通过在电源层和接地层之间插入旁路电容器,可以将电源层看作交流接地层。因此,无论在何种情况下,都可以通过导电层的屏蔽效果来降低噪声。
在本发明中,优选与上述总线连接的无源元件的芯片部件安装在上述第1或第2导电层上。由此,可以构成去除总线上的噪声的噪声过滤电路,可进一步降低总线所产生的噪声的影响。
在本发明中,优选上述第1和第2半导体IC芯片中的任意一方为控制器IC,另一方为存储器IC。这是由于连接控制器IC和存储器IC的总线以高速时钟工作,布线距离越长其高次谐波越成为不需要的辐射,而对其他电路带来的影响尤其大。
在本发明中,优选上述第1或第2绝缘层中至少一方构成为包含强磁性材料。由此,与包含强磁性材料的绝缘层相连的总线等价于阻尼电阻以及磁珠的串联电路,因而可更为抑制寄生的影响,可进一步降低总线产生的噪声。
在本发明中,优选上述第1和第2半导体IC芯片与上述总线之间通过导电性突起物而实质上直接连接。由此,总线的阻抗控制变得容易,通过以数字系统和模拟系统的相邻的总线之间不平行的方式来布线或配置屏蔽单元,从而可以将模拟-数字间的干扰抑制在最低限度。
在本发明中,优选构成上述总线的全部信号线设于上述第1布线层上,但也可以形成为作为构成上述总线的信号线的一部分的至少与其他信号线交叉的部分设于与上述第1布线层不同的第2布线层上。即使存在这种导孔电极,由于导孔电极302之间并不那么接近,因此与构成总线的信号线的大多数由导孔电极构成的情况相比,可认为导孔电极302引起的噪声的影响非常小。
在本发明中,优选至少在上述总线的周围,排列有多个对上述第1和第2导电层之间进行连接的导孔电极,特别优选排列在上述总线和模拟区域之间。由此,可以遮蔽从总线104X等产生的向基板的平面方向传递的噪声,同时可强化接地连接,因此可以将总线104X等产生的干扰抑制在最低限度。
在本发明中,优选该半导体IC内设模块还具有:设于上述多层基板内的模拟区域;设于与上述第1导电层同一层内,覆盖上述模拟区域上方的第3导电层;以及设于与上述第2导电层同一层内,覆盖上述模拟区域下方的第4导电层,上述第1和第2导电层与上述第3和第4导电层分开形成。由此,来自总线等的噪声不会通过接地层传递到模拟侧,可进一步抑制来自总线等的干扰。
根据本发明,由于使用接地层覆盖对第1和第2半导体IC之间进行连接的总线的上方和下方,因此可以降低总线产生的噪声的影响。另外,第1和第2半导体IC不是在纵方向上层叠而是相互横向并列配置,因此可以不使用作为层间连接单元的导孔电极就将两者直接连接起来。因此,可以以最短距离对总线进行布线,并且可以进一步降低总线产生的噪声,而且也可以实现半导体IC内设模块的小型薄型化。
附图说明
图1是表示本发明第一实施方式的半导体IC内设模块的结构的大致剖面图。
图2是表示本发明第一实施方式的半导体IC内设模块的结构的大致俯视图。
图3是表示总线104X的布线配置的其他例子的大致俯视图。
图4是表示本发明第二实施方式的半导体IC内设模块的结构的大致剖面图。
图5是表示本发明第三实施方式的半导体IC内设模块的结构的大致剖面图。
图6是示意性地示出总线104X的等效电路的电路图。
图7是表示本发明第四实施方式的半导体IC内设模块的结构的大致剖面图。
图8是表示本发明第五实施方式的半导体IC内设模块的结构的大致剖面图。
图9是表示本发明第六实施方式的半导体IC内设模块的结构的图,其中(a)是大致俯视图,(b)是其大致剖面图。
图10是表示本发明第七实施方式的半导体IC内设模块的结构的图,其中(a)是大致俯视图,(b)是其大致剖面图。
具体实施方式
下面参照附图详细说明本发明的优选实施方式。
图1是表示本发明第一实施方式的半导体IC内设模块的结构的大致剖面图。图2是表示该半导体IC内设模块的结构的大致俯视图。
如图1和图2所示,该半导体IC内设模块100具有:多层基板101、嵌入在多层基板101内的控制器IC 102以及存储器IC 103。本实施方式的多层基板101具有第1绝缘层101a和第2绝缘层101b,控制器IC 102以及存储器IC 103以裸芯片的状态嵌入到第2绝缘层101b中。第1和第2绝缘层101a、101b的层间(即,多层基板101的内层)设有布线层104,布线层104的一部分构成对控制器IC 102和存储器IC 103之间进行连接的总线104X。
裸芯片上的衬垫(pad)电极和总线104X之间的连接不通过导孔电极进行,而是通过凸块(bump)等的导电性突起物进行,即双方实质上直接连接。这是为了解决由于用导孔电极构成总线而难以进行该阻抗控制,从而容易产生噪声的问题。另外,在例如控制器IC混合安装有模拟电路和数字电路双方的情况下,如果通过导孔电极来连接控制器IC和总线,则构成各个信号线的导孔电极在彼此的附近被平行布线,从而由数字信号线对模拟信号线的干扰成为问题。但是,如果实质上直接连接这些半导体IC的衬垫电极和总线,则易于进行总线的阻抗控制,可按照相邻的总线之间不平行的方式来布线或是配置屏蔽单元,从而可以将模拟-数字之间的干扰抑制在最低限度。
在第1和第2绝缘层101a、101b的表面层(即,多层基板101的外层)上分别设有第1和第2接地层105a、105b。也就是说,第1接地层105a设于第1绝缘层101a的与第2绝缘层101b相反侧的表面上,第2接地层105b设于第2绝缘层101b的与第1绝缘层101a相反侧的表面上。因此,第1和第2接地层105a、105b分别覆盖总线104X的上方和下方。
总线104X是用100MHz这样的高速时钟传送例如5V或3.3V这样的高电压的数字信号的信号线。总线104X所产生的高次谐波噪声可使例如便携电话的接收灵敏度下降等,对无线系统的模拟电路带来不良影响,总线越长其影响就越大。但是,根据本实施方式的半导体IC内设模块100,由于接地层105a、105b形成于多层基板101的两面,第1和第2接地层105a、105b分别覆盖总线104X的上方和下方,因此通过接地层105a、105b的屏蔽效果可以抑制总线104X产生的噪声的影响。而且,为了提高屏蔽效果,优选接地层105a、105b尽可能宽范围地覆盖总线104X的周围。
另外,在本实施方式中,控制器IC 102和存储器IC 103互相横向并列配置,这些半导体IC的端子之间用总线104X直接连接。在以往那样纵向层叠半导体IC芯片的情况下,为了对半导体IC芯片之间进行连接,需要层间连接单元即导孔电极来作为总线的一部分,因而作为总线的形成区域需要大量空间,总线的阻抗控制也变得困难。并且,由于总线的布线距离也变长,所以高次谐波噪声的影响也变大。但是,根据本实施方式,由于不需要使用导孔电极作为总线的一部分,因而如图2所示,可用最短距离对总线104X进行布线,可以抑制总线104X产生的噪声的影响。
另外,如图1所示,优选总线不经由其他布线层而在一层上构成,但例如在不将总线中的某信号线与其他信号线交叉就无法高效地布线的情况下,如图3(a)和(b)所示那样,可以包括与其他信号线交叉的部分106,将该总线104X的一部分形成于第2布线层104b上。这种情况下需要导孔电极107,但由于构成总线104X的大多数的信号线形成于第1布线层104a上,而且不通过导孔电极与衬垫电极连接起来,导孔电极107之间也并不那么接近,因此可以认为导孔电极107带来的噪声的影响非常小。
在上述第一实施方式中,作为多层基板,采用如下的结构:使用所谓的3层基板,用设于多层基板101外层的接地层105a、105b夹住内层的总线104X,用接地层105a、105b覆盖总线104X的上方和下方,但本发明也可以用更多层结构的基板,在多层基板的内层设置接地层。
图4是表示本发明第二实施方式的半导体IC内设模块的结构的大致剖面图。
如图4所示,该半导体IC内设模块200的特征在于,多层基板101具有第1绝缘层101a、第2绝缘层101b以及第3绝缘层101c,第1接地层105a设于第1绝缘层101a的表面层(即,多层基板101的外层),第2接地层105b设于第2绝缘层101b和第3绝缘层101c的层间(即,多层基板101的内层)。第1和第2绝缘层101a、101b的层间设有第1布线层104a,在第3绝缘层101c的表面层还设有第2布线层104b。第1布线层104a的一部分构成总线104X,总线104X对控制器IC 102和存储器IC 103之间进行连接。控制器IC 102和存储器IC 103以裸芯片的状态嵌入在第2绝缘层101b中,裸芯片上的衬垫电极通过凸块等的导电性突起物与总线104X连接。
这样,在本实施方式的半导体IC内设模块200中,作为多层基板101,使用所谓的4层基板,用设于多层基板101外层的接地层105a和设于内层的接地层105b夹住总线104X,用接地层覆盖总线104X的上方和下方,因此可以获得与第一实施方式同样的效果。另外,关于本实施方式,对上下的接地层中的一方设于多层基板的内层的情况作了说明,但也可以将多层基板构成为5层以上的更多层结构,将上下的接地层都形成于多层基板101的内层。
图5是表示本发明第三实施方式的半导体IC内设模块的结构的大致剖面图。
如图5所示那样,该半导体IC内设模块300的特征在于,构成多层基板101的第1绝缘层101a是包含强磁性材料而构成的。作为强磁性材料,可以列举出铁氧体和强磁性金属。作为铁氧体,优选使用Mn-Mg-Zn系、Ni-Zn系和Mn-Zn系等。另外,作为强磁性金属,优选使用羰基铁、铁硅系合金、铁铝硅系合金(Sendust(注册商标))、铁镍系合金(Permalloy(注册商标))、铁系非晶质、钴系非晶质等。通过使用这种铁氧体的填充物或者混入有强磁性金属的粉末的树脂,可以将第1绝缘层101a构成为磁性层301。关于其他的结构与第一实施方式相同,因此对相同的构成要素赋予同样的符号并省略说明。
根据本实施方式的半导体IC内设模块300,不仅可以获得与第一实施方式同样的效果,而且由于与磁性层301相连的总线104X的等效电路如图6所示成为阻尼电阻302以及磁珠(beads)303的串联电路,所以更可以抑制寄生的影响,可进一步降低总线104X产生的噪声。
另外,在本实施方式中,对第1绝缘层101a构成为磁性层201的情况作了说明,但本发明不限于此,也可以把第2绝缘层101b构成为磁性层,还可以把第1和第2绝缘层101a、101b都构成为磁性层。也就是说,只要构成多层基板101的第1和第2绝缘层101a、101b中至少有一方构成为磁性层即可。
图7是表示本发明第四实施方式的半导体IC内设模块的结构的大致剖面图。
如图7所示,该半导体IC内设模块400的特征在于,在多层基板101的表面上安装有R、L、C等的无源元件的芯片部件401,通过该无源元件构成去除总线104X上的噪声的噪声过滤电路。为了在多层基板101的表面上形成接地层105a、105b,通过切除规定区域的周围的导体而形成连接盘图形(Land Pattern)402,用导孔电极403来连接该连接盘图形402和总线104X。而且,将芯片部件401的一个电极401a与接地层105a连接,将另一个电极401b与连接盘图形402连接。关于其他的结构与第一实施方式相同,因此对相同的构成要素赋予同样的符号并省略说明。
根据本实施方式的半导体IC内设模块400,由于R、L、C或者它们的复合部件安装于多层基板101上,所以不仅可以获得与第一实施方式同样的效果,还能进一步降低总线产生的噪声的影响。
图8是表示本发明第五实施方式的半导体IC内设模块的结构的大致剖面图。
如图8所示,该半导体IC内设模块500的特征在于,不用两个接地层夹持总线和半导体IC,而是将形成于多层基板101的两面的导电层中的一方作为电源层501,将另一方作为接地层105b,使用电源层501和接地层105b夹持总线和半导体IC。关于其他的结构与第一实施方式相同,因此对相同的构成要素赋予同样的符号并省略说明。由于向电源层501供给直流电源,所以只要通过大容量的旁路电容器502和导孔电极503将电源层501和接地层105b连接起来,就能够将电源层501视为交流接地层。因此,本实施方式的半导体IC内设模块500可以获得与第一实施方式同样的效果。
图9(a)和(b)是表示本发明第六实施方式的半导体IC内设模块的结构的图,图9(a)是大致俯视图,图9(b)是其大致剖面图。
如图9(a)和(b)所示,该半导体IC内设模块600的特征在于,用第1和第2接地层105a、105b夹持总线和半导体IC的上下,同时在总线104X和半导体IC 102、103的周围,例如总线104X与形成有不想受到来自该总线104X的干扰的模拟电路601和模拟信号线602的区域(模拟区域)之间的区域中,排列有多个对上下的接地层105a、105b进行连接的导孔电极603。关于其他的结构与第一实施方式相同,因此对相同的构成要素赋予同样的符号并省略说明。在这样构成的情况下,不仅可以获得与第一实施方式同样的效果,而且由于利用导孔电极603的排列可遮蔽总线104X等产生的、向基板的平面方向传递的噪声,所以可以将总线104X等带来的干扰降低到最低限度。
图10是表示本发明第七实施方式的半导体IC内设模块的结构的大致剖面图。
如图10所示,该半导体IC内设模块700的特征在于,在多层基板101内形成有第1和第2接地层105a、105b以及第3和第4接地层701a、701b,其中,第1和第2接地层105a、105b覆盖总线104X和控制器IC102内的设有数字部分等的区域(数字区域),第3和第4接地层701a、701b覆盖控制器IC 102内的模拟部分和设有模拟信号线104Y的区域(模拟区域)的上下。模拟区域不限于控制器IC 102的模拟部分,也包含其他模拟电路的形成区域。第3接地层701a与第1接地层105a在同一层内分开形成,第4接地层702b与第1接地层105b在同一层内分开形成。这样,在同一层内分开形成覆盖多层基板101内的数字区域的接地层和覆盖模拟区域701a、701b的接地层的情况下,来自总线等的噪声不会通过接地层传递到模拟侧,可进一步抑制来自总线等的干扰。
本发明不限于上述各实施方式,可以在不脱离本发明主旨的范围内进行各种变更,当然这些变更后的实施方式也包含在本发明的范围之内。
例如,在上述各实施方式中,对使用第1和第2绝缘层构成多层基板的情况作了说明,但本发明不限于此,也可以适用于由3层以上的绝缘层构成的多层基板。但是,不推荐模拟布线层夹在总线和接地层之间的情况。
另外,在上述各实施方式中,列举了将控制器IC 102和存储器IC 103作为嵌入到多层基板内的半导体IC芯片的情况为例,但本发明不限于此,只要是使用总线作为输入输出接口的装置,就可以是任何用途的半导体IC。
另外,在上述各实施方式中,对将控制器IC 102和存储器IC 103都嵌入到第2绝缘层101b的情况作了说明,但本发明不限于此,例如也可以将控制器IC嵌入到第1绝缘层101a内,将存储器IC嵌入到第2绝缘层101b内。在这种情况下,连接控制器IC和存储器IC的总线可以形成于第1绝缘层101a和第2绝缘层101b的层间的布线层上,而不需要使用导孔电极。
Claims (9)
1.一种半导体IC内设模块,其特征在于,该半导体IC内设模块具有:层叠了多个绝缘层的多层基板;以互相横向并排配置的方式嵌入在上述多层基板内的第1和第2半导体IC芯片;对上述第1和第2半导体IC芯片之间进行连接的总线;以及覆盖上述总线的上方的第1导电层和覆盖上述总线的下方的第2导电层,
上述多层基板包括:第1和第2绝缘层;以及设于上述第1和第2绝缘层之间的第1布线层,上述总线设于上述第1布线层上,
上述第1和第2半导体IC芯片都嵌入在上述第1或第2绝缘层中的任意一方中,
上述第1和第2导电层中的任意一方为电源层,另一方为接地层,在上述电源层和接地层之间设有旁路电容器。
2.根据权利要求1所述的半导体IC内设模块,其特征在于,与上述总线连接的无源元件的芯片部件安装在上述第1或第2导电层上。
3.根据权利要求1所述的半导体IC内设模块,其特征在于,上述第1和第2半导体IC芯片中的任意一方为控制器IC,另一方为存储器IC。
4.根据权利要求1所述的半导体IC内设模块,其特征在于,上述第1或第2绝缘层中至少一方构成为包含强磁性材料。
5.根据权利要求1所述的半导体IC内设模块,其特征在于,上述第1和第2半导体IC芯片与上述总线之间通过导电性突起物而实质上直接连接。
6.根据权利要求1所述的半导体IC内设模块,其特征在于,作为构成上述总线的信号线的一部分的至少与其他信号线交叉的部分设于与上述第1布线层不同的第2布线层上。
7.根据权利要求1所述的半导体IC内设模块,其特征在于,至少在上述总线的周围,排列有多个在上述第1和第2导电层之间进行连接的导孔电极。
8.根据权利要求7所述的半导体IC内设模块,其特征在于,上述导
9.根据权利要求1至权利要求8中任一项所述的半导体IC内设模块,其特征在于,该半导体IC内设模块还具有:设于上述多层基板内的模拟区域;设于与上述第1导电层同一层内,覆盖上述模拟区域上方的第3导电层;以及设于与上述第2导电层同一层内,覆盖上述模拟区域下方的第4导电层,上述第1和第2导电层与上述第3和第4导电层分开形成。
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US11277917B2 (en) | 2019-03-12 | 2022-03-15 | Advanced Semiconductor Engineering, Inc. | Embedded component package structure, embedded type panel substrate and manufacturing method thereof |
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