CN100517598C - 喷淋头以及使用这种喷淋头的成膜装置 - Google Patents

喷淋头以及使用这种喷淋头的成膜装置 Download PDF

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Publication number
CN100517598C
CN100517598C CNB2004800314164A CN200480031416A CN100517598C CN 100517598 C CN100517598 C CN 100517598C CN B2004800314164 A CNB2004800314164 A CN B2004800314164A CN 200480031416 A CN200480031416 A CN 200480031416A CN 100517598 C CN100517598 C CN 100517598C
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gas injection
raw material
shower head
diffusion chamber
material gas
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CN1871694A (zh
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纲仓学
岩田辉夫
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Tokyo Electron Ltd
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Tokyo Electron Ltd
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    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
    • C23C16/45563—Gas nozzles
    • C23C16/45565—Shower nozzles

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  • Chemical & Material Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Chemical Vapour Deposition (AREA)
CNB2004800314164A 2003-10-23 2004-10-22 喷淋头以及使用这种喷淋头的成膜装置 Expired - Fee Related CN100517598C (zh)

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JP363448/2003 2003-10-23
JP2003363448A JP4306403B2 (ja) 2003-10-23 2003-10-23 シャワーヘッド構造及びこれを用いた成膜装置

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CN1871694A CN1871694A (zh) 2006-11-29
CN100517598C true CN100517598C (zh) 2009-07-22

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US (1) US7931749B2 (enExample)
JP (1) JP4306403B2 (enExample)
KR (1) KR100728401B1 (enExample)
CN (1) CN100517598C (enExample)
WO (1) WO2005041285A1 (enExample)

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KR20060086375A (ko) 2006-07-31
JP2005129712A (ja) 2005-05-19
KR100728401B1 (ko) 2007-06-13
WO2005041285A1 (ja) 2005-05-06
CN1871694A (zh) 2006-11-29
US20070272154A1 (en) 2007-11-29
JP4306403B2 (ja) 2009-08-05
US7931749B2 (en) 2011-04-26

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