KR100728401B1 - 샤워 헤드 및 이것을 이용한 성막장치 - Google Patents

샤워 헤드 및 이것을 이용한 성막장치 Download PDF

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Publication number
KR100728401B1
KR100728401B1 KR1020067008748A KR20067008748A KR100728401B1 KR 100728401 B1 KR100728401 B1 KR 100728401B1 KR 1020067008748 A KR1020067008748 A KR 1020067008748A KR 20067008748 A KR20067008748 A KR 20067008748A KR 100728401 B1 KR100728401 B1 KR 100728401B1
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Prior art keywords
gas injection
shower head
gas
source gas
diffusion chamber
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Korean (ko)
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KR20060086375A (ko
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마나부 아미쿠라
데루오 이와타
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동경 엘렉트론 주식회사
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    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
    • C23C16/45563—Gas nozzles
    • C23C16/45565—Shower nozzles

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  • Chemical & Material Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Chemical Vapour Deposition (AREA)
KR1020067008748A 2003-10-23 2004-10-22 샤워 헤드 및 이것을 이용한 성막장치 Expired - Fee Related KR100728401B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JPJP-P-2003-00363448 2003-10-23
JP2003363448A JP4306403B2 (ja) 2003-10-23 2003-10-23 シャワーヘッド構造及びこれを用いた成膜装置

Publications (2)

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KR20060086375A KR20060086375A (ko) 2006-07-31
KR100728401B1 true KR100728401B1 (ko) 2007-06-13

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KR1020067008748A Expired - Fee Related KR100728401B1 (ko) 2003-10-23 2004-10-22 샤워 헤드 및 이것을 이용한 성막장치

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US (1) US7931749B2 (enExample)
JP (1) JP4306403B2 (enExample)
KR (1) KR100728401B1 (enExample)
CN (1) CN100517598C (enExample)
WO (1) WO2005041285A1 (enExample)

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JP4451684B2 (ja) 2004-03-17 2010-04-14 キヤノンアネルバ株式会社 真空処理装置
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KR100731164B1 (ko) * 2005-05-19 2007-06-20 주식회사 피에조닉스 샤워헤드를 구비한 화학기상 증착 방법 및 장치
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Also Published As

Publication number Publication date
KR20060086375A (ko) 2006-07-31
JP2005129712A (ja) 2005-05-19
CN100517598C (zh) 2009-07-22
WO2005041285A1 (ja) 2005-05-06
CN1871694A (zh) 2006-11-29
US20070272154A1 (en) 2007-11-29
JP4306403B2 (ja) 2009-08-05
US7931749B2 (en) 2011-04-26

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