CN100517074C - 吸盘系统、使用该吸盘系统的光刻装置和器件制造方法 - Google Patents

吸盘系统、使用该吸盘系统的光刻装置和器件制造方法 Download PDF

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Publication number
CN100517074C
CN100517074C CNB2004800389194A CN200480038919A CN100517074C CN 100517074 C CN100517074 C CN 100517074C CN B2004800389194 A CNB2004800389194 A CN B2004800389194A CN 200480038919 A CN200480038919 A CN 200480038919A CN 100517074 C CN100517074 C CN 100517074C
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CN
China
Prior art keywords
sucker
substrate
suction cup
frame
framework
Prior art date
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Expired - Fee Related
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CNB2004800389194A
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English (en)
Chinese (zh)
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CN1898611A (zh
Inventor
P·史密特斯
P·J·C·H·斯穆尔德斯
K·J·J·M·扎尔
H·H·M·科西
J·J·奥坦斯
N·J·吉利森
J·斯塔里弗尔德
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ASML Netherlands BV
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ASML Netherlands BV
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Publication of CN1898611A publication Critical patent/CN1898611A/zh
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70783—Handling stress or warp of chucks, masks or workpieces, e.g. to compensate for imaging errors or considerations related to warpage of masks or workpieces due to their own weight
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70275—Multiple projection paths, e.g. array of projection systems, microlens projection systems or tandem projection systems
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/707—Chucks, e.g. chucking or un-chucking operations or structural details

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
CNB2004800389194A 2003-12-24 2004-12-20 吸盘系统、使用该吸盘系统的光刻装置和器件制造方法 Expired - Fee Related CN100517074C (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US10/744,088 2003-12-24
US10/744,088 US7119884B2 (en) 2003-12-24 2003-12-24 Lithographic apparatus and device manufacturing method

Publications (2)

Publication Number Publication Date
CN1898611A CN1898611A (zh) 2007-01-17
CN100517074C true CN100517074C (zh) 2009-07-22

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CNB2004800389194A Expired - Fee Related CN100517074C (zh) 2003-12-24 2004-12-20 吸盘系统、使用该吸盘系统的光刻装置和器件制造方法

Country Status (7)

Country Link
US (1) US7119884B2 (https=)
EP (1) EP1702241A2 (https=)
JP (1) JP4384181B2 (https=)
KR (3) KR100882892B1 (https=)
CN (1) CN100517074C (https=)
TW (1) TWI303355B (https=)
WO (1) WO2005064400A2 (https=)

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KR20080091268A (ko) 2008-10-09
WO2005064400A3 (en) 2006-03-09
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JP4384181B2 (ja) 2009-12-16
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KR100882893B1 (ko) 2009-02-10
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CN1898611A (zh) 2007-01-17
EP1702241A2 (en) 2006-09-20
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US20050140962A1 (en) 2005-06-30

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