KR100882892B1 - 리소그래피 장치 및 디바이스 제조 방법 - Google Patents

리소그래피 장치 및 디바이스 제조 방법 Download PDF

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Publication number
KR100882892B1
KR100882892B1 KR1020067012327A KR20067012327A KR100882892B1 KR 100882892 B1 KR100882892 B1 KR 100882892B1 KR 1020067012327 A KR1020067012327 A KR 1020067012327A KR 20067012327 A KR20067012327 A KR 20067012327A KR 100882892 B1 KR100882892 B1 KR 100882892B1
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South Korea
Prior art keywords
chuck
substrate
substrate support
frame
delete delete
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Expired - Fee Related
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Korean (ko)
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KR20060103269A (ko
Inventor
페터 슈미츠
파트리크 요한네스 코르넬루스 헨드리크 슈물더스
코엔 야코부스 요한네스 마리아 잘
헨리쿠스 헤어만 마리에 콕스
유스트 예뢴 오텐스
노우트 얀 길리센
예뢴 슈타레벨트
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에이에스엠엘 네델란즈 비.브이.
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70783—Handling stress or warp of chucks, masks or workpieces, e.g. to compensate for imaging errors or considerations related to warpage of masks or workpieces due to their own weight
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70275—Multiple projection paths, e.g. array of projection systems, microlens projection systems or tandem projection systems
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/707—Chucks, e.g. chucking or un-chucking operations or structural details

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
KR1020067012327A 2003-12-24 2004-12-20 리소그래피 장치 및 디바이스 제조 방법 Expired - Fee Related KR100882892B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US10/744,088 2003-12-24
US10/744,088 US7119884B2 (en) 2003-12-24 2003-12-24 Lithographic apparatus and device manufacturing method

Related Child Applications (1)

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KR1020087007394A Division KR100882893B1 (ko) 2003-12-24 2004-12-20 리소그래피 장치 및 디바이스 제조 방법

Publications (2)

Publication Number Publication Date
KR20060103269A KR20060103269A (ko) 2006-09-28
KR100882892B1 true KR100882892B1 (ko) 2009-02-10

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KR1020067012327A Expired - Fee Related KR100882892B1 (ko) 2003-12-24 2004-12-20 리소그래피 장치 및 디바이스 제조 방법
KR1020087020956A Expired - Fee Related KR100950069B1 (ko) 2003-12-24 2004-12-20 리소그래피 장치 및 디바이스 제조 방법
KR1020087007394A Expired - Fee Related KR100882893B1 (ko) 2003-12-24 2004-12-20 리소그래피 장치 및 디바이스 제조 방법

Family Applications After (2)

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KR1020087020956A Expired - Fee Related KR100950069B1 (ko) 2003-12-24 2004-12-20 리소그래피 장치 및 디바이스 제조 방법
KR1020087007394A Expired - Fee Related KR100882893B1 (ko) 2003-12-24 2004-12-20 리소그래피 장치 및 디바이스 제조 방법

Country Status (7)

Country Link
US (1) US7119884B2 (https=)
EP (1) EP1702241A2 (https=)
JP (1) JP4384181B2 (https=)
KR (3) KR100882892B1 (https=)
CN (1) CN100517074C (https=)
TW (1) TWI303355B (https=)
WO (1) WO2005064400A2 (https=)

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CN100517074C (zh) 2009-07-22
WO2005064400A3 (en) 2006-03-09
KR20060103269A (ko) 2006-09-28
TWI303355B (en) 2008-11-21
JP4384181B2 (ja) 2009-12-16
TW200530764A (en) 2005-09-16
KR100882893B1 (ko) 2009-02-10
KR20080032015A (ko) 2008-04-11
CN1898611A (zh) 2007-01-17
EP1702241A2 (en) 2006-09-20
US7119884B2 (en) 2006-10-10
JP2007515799A (ja) 2007-06-14
WO2005064400A2 (en) 2005-07-14
KR100950069B1 (ko) 2010-03-26
US20050140962A1 (en) 2005-06-30

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