JP4384181B2 - リソグラフィ装置およびデバイス製造方法 - Google Patents

リソグラフィ装置およびデバイス製造方法 Download PDF

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Publication number
JP4384181B2
JP4384181B2 JP2006546022A JP2006546022A JP4384181B2 JP 4384181 B2 JP4384181 B2 JP 4384181B2 JP 2006546022 A JP2006546022 A JP 2006546022A JP 2006546022 A JP2006546022 A JP 2006546022A JP 4384181 B2 JP4384181 B2 JP 4384181B2
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JP
Japan
Prior art keywords
chuck
frame
substrate
deformation
lithographic apparatus
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
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JP2006546022A
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English (en)
Japanese (ja)
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JP2007515799A5 (https=
JP2007515799A (ja
Inventor
スミツ、ペーター
スマルダース、パトリック、ヨハネス、コーネルス、ヘンドリック
ツァール、コーエン、ヤコブス、ヨハネス、マリア
コックス、ヘンリクス、ヘルマン、マリー
オッテンス、ヨースト、ジェローン
ジリッセン、ノード、ヤン
スターレフェルト、ジェローン、ピーター
Original Assignee
エーエスエムエル ネザーランズ ビー．ブイ．
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Publication of JP2007515799A publication Critical patent/JP2007515799A/ja
Publication of JP2007515799A5 publication Critical patent/JP2007515799A5/ja
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70783—Handling stress or warp of chucks, masks or workpieces, e.g. to compensate for imaging errors or considerations related to warpage of masks or workpieces due to their own weight
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70275—Multiple projection paths, e.g. array of projection systems, microlens projection systems or tandem projection systems
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/707—Chucks, e.g. chucking or un-chucking operations or structural details

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP2006546022A 2003-12-24 2004-12-20 リソグラフィ装置およびデバイス製造方法 Expired - Fee Related JP4384181B2 (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US10/744,088 US7119884B2 (en) 2003-12-24 2003-12-24 Lithographic apparatus and device manufacturing method
PCT/EP2004/014481 WO2005064400A2 (en) 2003-12-24 2004-12-20 Chuck system, lithographic apparatus using the same and device manufacturing method

Publications (3)

Publication Number Publication Date
JP2007515799A JP2007515799A (ja) 2007-06-14
JP2007515799A5 JP2007515799A5 (https=) 2007-07-26
JP4384181B2 true JP4384181B2 (ja) 2009-12-16

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Family Applications (1)

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JP2006546022A Expired - Fee Related JP4384181B2 (ja) 2003-12-24 2004-12-20 リソグラフィ装置およびデバイス製造方法

Country Status (7)

Country Link
US (1) US7119884B2 (https=)
EP (1) EP1702241A2 (https=)
JP (1) JP4384181B2 (https=)
KR (3) KR100882892B1 (https=)
CN (1) CN100517074C (https=)
TW (1) TWI303355B (https=)
WO (1) WO2005064400A2 (https=)

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Also Published As

Publication number Publication date
KR20080091268A (ko) 2008-10-09
CN100517074C (zh) 2009-07-22
WO2005064400A3 (en) 2006-03-09
KR20060103269A (ko) 2006-09-28
TWI303355B (en) 2008-11-21
TW200530764A (en) 2005-09-16
KR100882893B1 (ko) 2009-02-10
KR20080032015A (ko) 2008-04-11
CN1898611A (zh) 2007-01-17
EP1702241A2 (en) 2006-09-20
US7119884B2 (en) 2006-10-10
JP2007515799A (ja) 2007-06-14
KR100882892B1 (ko) 2009-02-10
WO2005064400A2 (en) 2005-07-14
KR100950069B1 (ko) 2010-03-26
US20050140962A1 (en) 2005-06-30

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