JP2007515799A5 - - Google Patents

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Publication number
JP2007515799A5
JP2007515799A5 JP2006546022A JP2006546022A JP2007515799A5 JP 2007515799 A5 JP2007515799 A5 JP 2007515799A5 JP 2006546022 A JP2006546022 A JP 2006546022A JP 2006546022 A JP2006546022 A JP 2006546022A JP 2007515799 A5 JP2007515799 A5 JP 2007515799A5
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JP
Japan
Prior art keywords
substrate
chuck
frame
substrate support
support
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JP2006546022A
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English (en)
Japanese (ja)
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JP2007515799A (ja
JP4384181B2 (ja
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Priority claimed from US10/744,088 external-priority patent/US7119884B2/en
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Publication of JP2007515799A5 publication Critical patent/JP2007515799A5/ja
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Publication of JP4384181B2 publication Critical patent/JP4384181B2/ja
Anticipated expiration legal-status Critical
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JP2006546022A 2003-12-24 2004-12-20 リソグラフィ装置およびデバイス製造方法 Expired - Fee Related JP4384181B2 (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US10/744,088 US7119884B2 (en) 2003-12-24 2003-12-24 Lithographic apparatus and device manufacturing method
PCT/EP2004/014481 WO2005064400A2 (en) 2003-12-24 2004-12-20 Chuck system, lithographic apparatus using the same and device manufacturing method

Publications (3)

Publication Number Publication Date
JP2007515799A JP2007515799A (ja) 2007-06-14
JP2007515799A5 true JP2007515799A5 (https=) 2007-07-26
JP4384181B2 JP4384181B2 (ja) 2009-12-16

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Family Applications (1)

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JP2006546022A Expired - Fee Related JP4384181B2 (ja) 2003-12-24 2004-12-20 リソグラフィ装置およびデバイス製造方法

Country Status (7)

Country Link
US (1) US7119884B2 (https=)
EP (1) EP1702241A2 (https=)
JP (1) JP4384181B2 (https=)
KR (3) KR100950069B1 (https=)
CN (1) CN100517074C (https=)
TW (1) TWI303355B (https=)
WO (1) WO2005064400A2 (https=)

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