CN100456518C - 有机薄膜晶体管及其制备方法 - Google Patents

有机薄膜晶体管及其制备方法 Download PDF

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Publication number
CN100456518C
CN100456518C CNB038053217A CN03805321A CN100456518C CN 100456518 C CN100456518 C CN 100456518C CN B038053217 A CNB038053217 A CN B038053217A CN 03805321 A CN03805321 A CN 03805321A CN 100456518 C CN100456518 C CN 100456518C
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CN
China
Prior art keywords
thin film
film transistor
substituted
pentacene
groups
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Expired - Fee Related
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CNB038053217A
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English (en)
Chinese (zh)
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CN1639884A (zh
Inventor
特伦斯·P·史密斯
拉里·D·伯德曼
蒂莫西·D·邓巴
马克·J·佩勒瑞特
汤米·W·凯利
道恩·V·梅耶斯
丹尼斯·E·沃格尔
基姆·M·沃格尔
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3M Innovative Properties Co
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3M Innovative Properties Co
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Publication of CN1639884A publication Critical patent/CN1639884A/zh
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    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10KORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K10/00Organic devices specially adapted for rectifying, amplifying, oscillating or switching; Organic capacitors or resistors having potential barriers
    • H10K10/40Organic transistors
    • H10K10/46Field-effect transistors, e.g. organic thin-film transistors [OTFT]
    • H10K10/462Insulated gate field-effect transistors [IGFETs]
    • H10K10/468Insulated gate field-effect transistors [IGFETs] characterised by the gate dielectrics
    • H10K10/474Insulated gate field-effect transistors [IGFETs] characterised by the gate dielectrics the gate dielectric comprising a multilayered structure
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10KORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K10/00Organic devices specially adapted for rectifying, amplifying, oscillating or switching; Organic capacitors or resistors having potential barriers
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B82NANOTECHNOLOGY
    • B82YSPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B82NANOTECHNOLOGY
    • B82YSPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y30/00Nanotechnology for materials or surface science, e.g. nanocomposites
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01BCABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
    • H01B3/00Insulators or insulating bodies characterised by the insulating materials; Selection of materials for their insulating or dielectric properties
    • H01B3/18Insulators or insulating bodies characterised by the insulating materials; Selection of materials for their insulating or dielectric properties mainly consisting of organic substances
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10KORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K10/00Organic devices specially adapted for rectifying, amplifying, oscillating or switching; Organic capacitors or resistors having potential barriers
    • H10K10/40Organic transistors
    • H10K10/46Field-effect transistors, e.g. organic thin-film transistors [OTFT]
    • H10K10/462Insulated gate field-effect transistors [IGFETs]
    • H10K10/468Insulated gate field-effect transistors [IGFETs] characterised by the gate dielectrics
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10KORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K85/00Organic materials used in the body or electrodes of devices covered by this subclass
    • H10K85/60Organic compounds having low molecular weight
    • H10K85/615Polycyclic condensed aromatic hydrocarbons, e.g. anthracene
    • H10K85/623Polycyclic condensed aromatic hydrocarbons, e.g. anthracene containing five rings, e.g. pentacene
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10KORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K10/00Organic devices specially adapted for rectifying, amplifying, oscillating or switching; Organic capacitors or resistors having potential barriers
    • H10K10/40Organic transistors
    • H10K10/46Field-effect transistors, e.g. organic thin-film transistors [OTFT]
    • H10K10/462Insulated gate field-effect transistors [IGFETs]
    • H10K10/466Lateral bottom-gate IGFETs comprising only a single gate
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10KORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • H10K71/10Deposition of organic active material
    • H10K71/12Deposition of organic active material using liquid deposition, e.g. spin coating
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S428/00Stock material or miscellaneous articles
    • Y10S428/901Printed circuit

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  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Nanotechnology (AREA)
  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Materials Engineering (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Composite Materials (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Mathematical Physics (AREA)
  • Theoretical Computer Science (AREA)
  • Thin Film Transistor (AREA)
CNB038053217A 2002-03-07 2003-02-11 有机薄膜晶体管及其制备方法 Expired - Fee Related CN100456518C (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US10/094,007 2002-03-07
US10/094,007 US6768132B2 (en) 2002-03-07 2002-03-07 Surface modified organic thin film transistors

Publications (2)

Publication Number Publication Date
CN1639884A CN1639884A (zh) 2005-07-13
CN100456518C true CN100456518C (zh) 2009-01-28

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Family Applications (1)

Application Number Title Priority Date Filing Date
CNB038053217A Expired - Fee Related CN100456518C (zh) 2002-03-07 2003-02-11 有机薄膜晶体管及其制备方法

Country Status (8)

Country Link
US (1) US6768132B2 (enExample)
EP (1) EP1481428A1 (enExample)
JP (1) JP4589004B2 (enExample)
KR (1) KR20040094773A (enExample)
CN (1) CN100456518C (enExample)
AU (1) AU2003209087A1 (enExample)
TW (1) TWI278133B (enExample)
WO (1) WO2003077327A1 (enExample)

Families Citing this family (50)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6946676B2 (en) * 2001-11-05 2005-09-20 3M Innovative Properties Company Organic thin film transistor with polymeric interface
US7285440B2 (en) * 2002-11-25 2007-10-23 International Business Machines Corporation Organic underlayers that improve the performance of organic semiconductors
US7088145B2 (en) * 2002-12-23 2006-08-08 3M Innovative Properties Company AC powered logic circuitry
US20060163559A1 (en) * 2003-03-31 2006-07-27 Canon Kabushiki Kaisha Organic thin film transistor and manufacturing method thereof
US6858527B2 (en) * 2003-04-14 2005-02-22 Intel Corporation Method to increase electromigration resistance of copper using self-assembled organic thiolate monolayers
DE10328811B4 (de) * 2003-06-20 2005-12-29 Infineon Technologies Ag Verbindung zur Bildung einer selbstorganisierenden Monolage, Schichtstruktur, Halbleiterbauelement mit einer Schichtstruktur und Verfahren zur Herstellung einer Schichtstruktur
KR100995451B1 (ko) * 2003-07-03 2010-11-18 삼성전자주식회사 다층 구조의 게이트 절연막을 포함하는 유기 박막 트랜지스터
US7122828B2 (en) * 2003-09-24 2006-10-17 Lucent Technologies, Inc. Semiconductor devices having regions of induced high and low conductivity, and methods of making the same
US6969634B2 (en) * 2003-09-24 2005-11-29 Lucent Technologies Inc. Semiconductor layers with roughness patterning
US8450723B2 (en) 2003-11-04 2013-05-28 Alcatel Lucent Apparatus having an aromatic dielectric and an aromatic organic semiconductor including an alkyl chain
US7115900B2 (en) * 2003-11-26 2006-10-03 Lucent Technologies Inc. Devices having patterned regions of polycrystalline organic semiconductors, and methods of making the same
US7078937B2 (en) 2003-12-17 2006-07-18 3M Innovative Properties Company Logic circuitry powered by partially rectified ac waveform
JP4661065B2 (ja) * 2004-03-22 2011-03-30 セイコーエプソン株式会社 相補型有機半導体装置
DE102004025423B4 (de) * 2004-05-24 2008-03-06 Qimonda Ag Dünnfilm-Feldeffekt-Transistor mit Gate-Dielektrikum aus organischem Material und Verfahren zu dessen Herstellung
WO2005122293A2 (en) * 2004-06-08 2005-12-22 Princeton University Formation of ordered thin films of organics on metal oxide surfaces
US7374984B2 (en) * 2004-10-29 2008-05-20 Randy Hoffman Method of forming a thin film component
US7315042B2 (en) * 2004-11-18 2008-01-01 3M Innovative Properties Company Semiconductors containing trans-1,2-bis(acenyl)ethylene compounds
US20060105199A1 (en) * 2004-11-18 2006-05-18 3M Innovative Properties Company Electroluminescent devices containing trans-1,2-bis(acenyl)ethylene compounds
US20060142520A1 (en) * 2004-12-27 2006-06-29 3M Innovative Properties Company Hole transport layers for organic electroluminescent devices
KR100637210B1 (ko) * 2005-01-28 2006-10-23 삼성에스디아이 주식회사 박막 트랜지스터, 이의 제조 방법 및 이를 구비한 평판표시 장치
US7619242B2 (en) * 2005-02-25 2009-11-17 Xerox Corporation Celluloses and devices thereof
WO2006124670A2 (en) * 2005-05-12 2006-11-23 Georgia Tech Research Corporation Coated metal oxide nanoparticles and methods for producing same
KR100708720B1 (ko) * 2005-10-19 2007-04-17 삼성에스디아이 주식회사 유기 박막 트랜지스터, 이의 제조 방법 및 이를 구비한평판 표시 장치
US8414962B2 (en) 2005-10-28 2013-04-09 The Penn State Research Foundation Microcontact printed thin film capacitors
KR20070053060A (ko) 2005-11-19 2007-05-23 삼성전자주식회사 표시장치와 이의 제조방법
KR100661695B1 (ko) 2005-11-22 2006-12-26 삼성코닝 주식회사 자기조립단분자막을 이용한 반도체 박막 및 그 제조방법
US20070145359A1 (en) * 2005-12-07 2007-06-28 Chi Ming Che Materials for organic thin film transistors
JP2007266355A (ja) * 2006-03-29 2007-10-11 Brother Ind Ltd 有機トランジスタ及び有機トランジスタの製造方法
CN100590904C (zh) * 2006-06-06 2010-02-17 中华映管股份有限公司 图案化制程及应用此制程的有机薄膜晶体管的制作方法
KR101151159B1 (ko) 2006-09-19 2012-06-01 삼성전자주식회사 포스페이트계 자기조립단분자막을 포함하는 유기 박막트랜지스터 및 그 제조방법
US8405069B2 (en) * 2006-11-10 2013-03-26 Georgia Tech Research Corporation Printable thin-film transistors with high dielectric constant gate insulators and methods for producing same
WO2008063583A1 (en) * 2006-11-17 2008-05-29 Polyera Corporation Acene-based organic semiconductor materials and methods of preparing and using the same
JP5209996B2 (ja) 2007-03-23 2013-06-12 山本化成株式会社 有機トランジスタ
TWI355106B (en) 2007-05-07 2011-12-21 Chunghwa Picture Tubes Ltd Organic photodetector and fabricating method of or
JP5153227B2 (ja) * 2007-06-26 2013-02-27 キヤノン株式会社 有機発光素子
US7891636B2 (en) * 2007-08-27 2011-02-22 3M Innovative Properties Company Silicone mold and use thereof
JP5291321B2 (ja) * 2007-10-24 2013-09-18 旭化成株式会社 有機半導体薄膜及び有機半導体素子
JP5396709B2 (ja) * 2007-12-11 2014-01-22 セイコーエプソン株式会社 薄膜トランジスタ、電気光学装置および電子機器
JP5329816B2 (ja) * 2008-01-25 2013-10-30 旭化成株式会社 有機半導体層を有する新規光電界効果トランジスタ
EP2259355B1 (en) 2008-03-10 2013-02-20 Yamamoto Chemicals, Inc. Organic transistor
US8119445B2 (en) * 2008-05-27 2012-02-21 The Board Of Trustees Of The Leland Stanford Junior University Organic semiconductors and growth approaches therefor
JP5334465B2 (ja) * 2008-06-17 2013-11-06 山本化成株式会社 有機トランジスタ
JP5666474B2 (ja) * 2009-12-14 2015-02-12 出光興産株式会社 多環縮環化合物、及び、それを用いた有機薄膜トランジスタ
JP2012067051A (ja) * 2010-09-27 2012-04-05 Idemitsu Kosan Co Ltd 有機薄膜トランジスタ用化合物及びそれを用いた有機薄膜トランジスタ
EP2500009A1 (en) 2011-03-17 2012-09-19 3M Innovative Properties Company Dental ceramic article, process of production and use thereof
WO2013069366A1 (ja) * 2011-11-10 2013-05-16 富士電機株式会社 有機薄膜トランジスタ及びその製造方法
CN102507659B (zh) * 2011-11-28 2013-11-13 电子科技大学 基于有机薄膜晶体管的甲醛气体传感器及其制备方法
JP5921359B2 (ja) * 2012-06-22 2016-05-24 公立大学法人兵庫県立大学 テトラベンゾテトラセン誘導体、その合成方法およびその用途
CN103045232B (zh) * 2012-10-18 2014-07-23 吉林奥来德光电材料股份有限公司 二氢并五苯烯烃类有机发光材料及其制备方法和应用
KR102038124B1 (ko) * 2016-06-27 2019-10-29 숭실대학교산학협력단 유기 반도체 소자의 제조 방법

Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4363859A (en) * 1977-10-22 1982-12-14 Ricoh Company, Ltd. Electrophotographic photoconductor
US4539061A (en) * 1983-09-07 1985-09-03 Yeda Research And Development Co., Ltd. Process for the production of built-up films by the stepwise adsorption of individual monolayers
EP0344111A2 (de) * 1988-05-27 1989-11-29 Ciba-Geigy Ag Substituierte Tetrathio- und Tetraselenotetracene
DE19815220A1 (de) * 1998-03-27 1999-09-30 Univ Dresden Tech Verfahren zur haftfesten und dichten Metallisierung von chemisch oder galvanisch nicht oder nur schwer plattierbaren Oberflächen sowie Haftvermittler zur Durchführung des Verfahrens
JPH11354277A (ja) * 1998-06-08 1999-12-24 Nec Corp 有機エレクトロルミネッセンス素子
WO2001001502A2 (en) * 1999-06-30 2001-01-04 Thin Film Electronics Asa A means for electrical contacting or isolation of organic or inorganic semiconductors and a method for its fabrication
US6232157B1 (en) * 1998-08-20 2001-05-15 Agere Systems Inc. Thin film transistors

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB680343A (en) 1949-07-25 1952-10-01 C D Patents Ltd Improvements in or relating to the manufacture of synthetic resins from aromatic substituted olefinic hydrocarbons
US5079179A (en) 1987-10-09 1992-01-07 Hughes Aircraft Company Process of making GaAs electrical circuit devices with Langmuir-Blodgett insulator layer
FR2664430B1 (fr) 1990-07-04 1992-09-18 Centre Nat Rech Scient Transistor a effet de champ en couche mince de structure mis, dont l'isolant et le semiconducteur sont realises en materiaux organiques.
US5625199A (en) 1996-01-16 1997-04-29 Lucent Technologies Inc. Article comprising complementary circuit with inorganic n-channel and organic p-channel thin film transistors
US6326640B1 (en) 1996-01-29 2001-12-04 Motorola, Inc. Organic thin film transistor with enhanced carrier mobility
US5965679A (en) 1996-09-10 1999-10-12 The Dow Chemical Company Polyphenylene oligomers and polymers
US6528816B1 (en) 1998-06-19 2003-03-04 Thomas Jackson Integrated inorganic/organic complementary thin-film transistor circuit and a method for its production
US6265243B1 (en) 1999-03-29 2001-07-24 Lucent Technologies Inc. Process for fabricating organic circuits
US6252245B1 (en) 1999-03-29 2001-06-26 Howard Edan Katz Device comprising n-channel semiconductor material
JP2001244467A (ja) * 2000-02-28 2001-09-07 Hitachi Ltd コプラナー型半導体装置とそれを用いた表示装置および製法
CA2401487C (en) * 2000-02-29 2011-06-21 Japan Science And Technology Corporation Polyacene derivatives and process of producing thereof
US6433359B1 (en) * 2001-09-06 2002-08-13 3M Innovative Properties Company Surface modifying layers for organic thin film transistors
US20030097010A1 (en) * 2001-09-27 2003-05-22 Vogel Dennis E. Process for preparing pentacene derivatives

Patent Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4363859A (en) * 1977-10-22 1982-12-14 Ricoh Company, Ltd. Electrophotographic photoconductor
US4539061A (en) * 1983-09-07 1985-09-03 Yeda Research And Development Co., Ltd. Process for the production of built-up films by the stepwise adsorption of individual monolayers
EP0344111A2 (de) * 1988-05-27 1989-11-29 Ciba-Geigy Ag Substituierte Tetrathio- und Tetraselenotetracene
DE19815220A1 (de) * 1998-03-27 1999-09-30 Univ Dresden Tech Verfahren zur haftfesten und dichten Metallisierung von chemisch oder galvanisch nicht oder nur schwer plattierbaren Oberflächen sowie Haftvermittler zur Durchführung des Verfahrens
JPH11354277A (ja) * 1998-06-08 1999-12-24 Nec Corp 有機エレクトロルミネッセンス素子
US6232157B1 (en) * 1998-08-20 2001-05-15 Agere Systems Inc. Thin film transistors
WO2001001502A2 (en) * 1999-06-30 2001-01-04 Thin Film Electronics Asa A means for electrical contacting or isolation of organic or inorganic semiconductors and a method for its fabrication

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
Effects of hydrophobic treatment on the performance ofpentancene TFT. CHUNG-KUN SONG.KIEEE International Transactions on Electrophysics and Applications,Vol.12c No.2. 2002 *

Also Published As

Publication number Publication date
EP1481428A1 (en) 2004-12-01
US6768132B2 (en) 2004-07-27
KR20040094773A (ko) 2004-11-10
JP2005519486A (ja) 2005-06-30
TW200306027A (en) 2003-11-01
TWI278133B (en) 2007-04-01
WO2003077327A1 (en) 2003-09-18
AU2003209087A1 (en) 2003-09-22
CN1639884A (zh) 2005-07-13
JP4589004B2 (ja) 2010-12-01
US20030175551A1 (en) 2003-09-18

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Granted publication date: 20090128

Termination date: 20120211