CN100437883C - 等离子体表面处理的方法以及实现该方法的设备 - Google Patents

等离子体表面处理的方法以及实现该方法的设备 Download PDF

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Publication number
CN100437883C
CN100437883C CNB028073835A CN02807383A CN100437883C CN 100437883 C CN100437883 C CN 100437883C CN B028073835 A CNB028073835 A CN B028073835A CN 02807383 A CN02807383 A CN 02807383A CN 100437883 C CN100437883 C CN 100437883C
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China
Prior art keywords
plasma
pending
equipment
treated
gas
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Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
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CNB028073835A
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English (en)
Chinese (zh)
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CN1511333A (zh
Inventor
帕维尔·库里克
米克海尔·萨姆索诺夫
亚历山大·切列帕诺夫
叶夫根尼·彼得罗夫
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APIT Corp SA
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APIT Corp SA
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Publication of CN1511333A publication Critical patent/CN1511333A/zh
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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32623—Mechanical discharge control means
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32321—Discharge generated by other radiation

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  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
  • Plasma Technology (AREA)
  • Cleaning In General (AREA)
  • Details Of Rigid Or Semi-Rigid Containers (AREA)
  • Drying Of Semiconductors (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
  • Treatments Of Macromolecular Shaped Articles (AREA)
  • Encapsulation Of And Coatings For Semiconductor Or Solid State Devices (AREA)
CNB028073835A 2001-03-27 2002-03-26 等离子体表面处理的方法以及实现该方法的设备 Expired - Fee Related CN100437883C (zh)

Applications Claiming Priority (6)

Application Number Priority Date Filing Date Title
EP01810318 2001-03-27
EP01810318.4 2001-03-27
EP01120974 2001-08-31
EP01120974.9 2001-08-31
EP01810915 2001-09-20
EP01810915.7 2001-09-20

Publications (2)

Publication Number Publication Date
CN1511333A CN1511333A (zh) 2004-07-07
CN100437883C true CN100437883C (zh) 2008-11-26

Family

ID=27224223

Family Applications (1)

Application Number Title Priority Date Filing Date
CNB028073835A Expired - Fee Related CN100437883C (zh) 2001-03-27 2002-03-26 等离子体表面处理的方法以及实现该方法的设备

Country Status (10)

Country Link
EP (1) EP1374276B1 (https=)
JP (1) JP2004527077A (https=)
CN (1) CN100437883C (https=)
AT (1) ATE373314T1 (https=)
AU (1) AU2002242923A1 (https=)
BR (1) BR0208242A (https=)
DE (1) DE60222391T2 (https=)
ES (1) ES2294112T3 (https=)
MX (1) MXPA03008615A (https=)
WO (1) WO2002076511A2 (https=)

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2911610B1 (fr) * 2007-01-24 2012-09-21 Air Liquide Procede de traitement de surface de substrats polymeres, substrats ainsi obtenus et leur utilisation pour la realisation de materiaux multicouches.
NL1033408C2 (nl) * 2007-02-16 2008-08-19 Omve Netherlands B V Werkwijze resp. inrichting voor het desinfecteren van micro-organismen etc.
NO2153704T3 (https=) * 2007-05-11 2018-07-14
NL1033958C2 (nl) * 2007-06-11 2008-12-12 Omve Netherlands B V Werkwijze voor het desinfecteren van kunststof flessen etc.
CN101974298A (zh) * 2010-11-11 2011-02-16 复旦大学 用氩等离子体处理金属表面方法
WO2012113568A1 (de) * 2011-02-25 2012-08-30 MAX-PLANCK-Gesellschaft zur Förderung der Wissenschaften e.V. Desinfektionseinrichtung, behälter, verwendung eines behälters und desinfektionsverfahren zur desinfektion eines behälters, insbesondere für einen lebensmittelbehälter
DE102012206081A1 (de) * 2012-04-13 2013-10-17 Krones Ag Beschichtung von Behältern mit Plasmadüsen
CN102785376B (zh) * 2012-08-14 2016-03-30 明尼苏达矿业制造特殊材料（上海）有限公司 聚乙烯表面处理方法
JP6328537B2 (ja) * 2014-10-31 2018-05-23 エア・ウォーター・マッハ株式会社 プラズマ処理方法およびプラズマ処理装置
JP5795427B1 (ja) * 2014-12-26 2015-10-14 竹本容器株式会社 被膜付き樹脂容器の製造方法及び樹脂容器被覆装置
US20190093226A1 (en) * 2016-04-08 2019-03-28 Sio2 Medical Products, Inc. Method for applying a pecvd lubricity layer with a moving gas inlet
CN106944419A (zh) * 2017-05-12 2017-07-14 中国工程物理研究院核物理与化学研究所 一种去除表面氚污染的等离子体去污系统

Citations (7)

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Publication number Priority date Publication date Assignee Title
JPH01111333A (ja) * 1987-10-26 1989-04-28 Oki Electric Ind Co Ltd ドライエッチング装置
DE3900768C1 (en) * 1989-01-12 1990-02-22 Fraunhofer-Gesellschaft Zur Foerderung Der Angewandten Forschung Ev, 8000 Muenchen, De Plasma etching device and method for operating it
RU2000890C1 (ru) * 1992-01-16 1993-10-15 Совместное межотраслевое и межрегиональное производственно-торговое объединение "Край" Установка дл получени ультрадисперсного порошка
US5277740A (en) * 1990-08-31 1994-01-11 Mitsubishi Denki Kabushiki Kaisha Apparatus and method for forming a fine pattern
JPH0878745A (ja) * 1994-08-31 1996-03-22 Sony Corp ニオブ系薄膜のドライエッチング方法
US5569502A (en) * 1992-09-11 1996-10-29 Semiconductor Energy Laboratory Co., Ltd. Film formation apparatus and method for forming a film
WO1999046964A1 (fr) * 1998-03-10 1999-09-16 Ist Instant Surface Technology S.A. Procede de traitement de surface d'un materiau ou d'un objet et dispositif pour la mise en oeuvre du procede

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US4778583A (en) * 1987-05-11 1988-10-18 Eastman Kodak Company Semiconductor etching process which produces oriented sloped walls
JPH04111313A (ja) * 1990-08-31 1992-04-13 Mitsubishi Electric Corp 微細加工装置及び方法
JPH04357662A (ja) * 1991-04-19 1992-12-10 Matsushita Electric Works Ltd 無電極放電ランプ
JP3297881B2 (ja) * 1992-10-27 2002-07-02 イーシー化学株式会社 超微粒子の表面処理方法
JPH07106092A (ja) * 1993-10-04 1995-04-21 Matsushita Electric Ind Co Ltd 衝撃波プラズマ発生装置
JP3459672B2 (ja) * 1993-12-01 2003-10-20 株式会社タクマ ガス処理装置
JPH07155529A (ja) * 1993-12-01 1995-06-20 Takuma Co Ltd ガス処理装置とそれの運転方法
JP3287124B2 (ja) * 1994-08-17 2002-05-27 ソニー株式会社 ＳｉＮ系絶縁膜の成膜方法
JP3309581B2 (ja) * 1994-08-31 2002-07-29 ソニー株式会社 ペロブスカイト型酸化膜のドライエッチング方法
DE4438359C2 (de) * 1994-10-27 2001-10-04 Schott Glas Behälter aus Kunststoff mit einer Sperrbeschichtung
JP3806847B2 (ja) * 1995-11-24 2006-08-09 イーシー化学株式会社 大気圧グロー放電プラズマによる粉体の処理方法及び装置
JPH09157845A (ja) * 1995-12-06 1997-06-17 Hitachi Ltd カオス処理成膜装置，カオス処理成膜方法及びカオス処理成膜媒体
FR2744805B1 (fr) * 1996-02-13 1998-03-20 Pechiney Aluminium Cibles de pulverisation cathodique selectionnees par controle ultrasons pour leur faible taux d'emissions de particules
JPH1033976A (ja) * 1996-05-24 1998-02-10 Sekisui Chem Co Ltd 放電プラズマ処理方法及びその装置
JPH1187098A (ja) * 1997-09-03 1999-03-30 Toshiba Corp プラズマ処理装置
JP3572942B2 (ja) * 1998-05-22 2004-10-06 日新電機株式会社 放電ガス処理装置
JP2000077372A (ja) * 1998-08-31 2000-03-14 Sumitomo Metal Ind Ltd 気相成長用半導体ウェーハの製造方法
JP3555470B2 (ja) * 1998-12-04 2004-08-18 セイコーエプソン株式会社 大気圧高周波プラズマによるエッチング方法
US6231933B1 (en) * 1999-03-18 2001-05-15 Primaxx, Inc. Method and apparatus for metal oxide chemical vapor deposition on a substrate surface
JP4372918B2 (ja) * 1999-06-30 2009-11-25 パナソニック電工株式会社 プラズマ処理装置及びプラズマ処理方法
JP2001035691A (ja) * 1999-07-16 2001-02-09 Japan Atom Energy Res Inst Ｚピンチ放電によるレーザー光ガイド用プラズマチャンネルの形成法

Patent Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01111333A (ja) * 1987-10-26 1989-04-28 Oki Electric Ind Co Ltd ドライエッチング装置
DE3900768C1 (en) * 1989-01-12 1990-02-22 Fraunhofer-Gesellschaft Zur Foerderung Der Angewandten Forschung Ev, 8000 Muenchen, De Plasma etching device and method for operating it
US5277740A (en) * 1990-08-31 1994-01-11 Mitsubishi Denki Kabushiki Kaisha Apparatus and method for forming a fine pattern
RU2000890C1 (ru) * 1992-01-16 1993-10-15 Совместное межотраслевое и межрегиональное производственно-торговое объединение "Край" Установка дл получени ультрадисперсного порошка
US5569502A (en) * 1992-09-11 1996-10-29 Semiconductor Energy Laboratory Co., Ltd. Film formation apparatus and method for forming a film
JPH0878745A (ja) * 1994-08-31 1996-03-22 Sony Corp ニオブ系薄膜のドライエッチング方法
WO1999046964A1 (fr) * 1998-03-10 1999-09-16 Ist Instant Surface Technology S.A. Procede de traitement de surface d'un materiau ou d'un objet et dispositif pour la mise en oeuvre du procede

Also Published As

Publication number Publication date
DE60222391D1 (de) 2007-10-25
JP2004527077A (ja) 2004-09-02
CN1511333A (zh) 2004-07-07
EP1374276B1 (fr) 2007-09-12
DE60222391T2 (de) 2008-06-05
EP1374276A2 (fr) 2004-01-02
ES2294112T3 (es) 2008-04-01
BR0208242A (pt) 2004-04-13
WO2002076511A3 (fr) 2003-04-17
AU2002242923A1 (en) 2002-10-08
ATE373314T1 (de) 2007-09-15
WO2002076511A2 (fr) 2002-10-03
MXPA03008615A (es) 2005-03-07

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Granted publication date: 20081126