DE60222391T2 - Verfahren und vorrichtung zur plasmabehandlung von oberflächen - Google Patents
Verfahren und vorrichtung zur plasmabehandlung von oberflächen Download PDFInfo
- Publication number
- DE60222391T2 DE60222391T2 DE60222391T DE60222391T DE60222391T2 DE 60222391 T2 DE60222391 T2 DE 60222391T2 DE 60222391 T DE60222391 T DE 60222391T DE 60222391 T DE60222391 T DE 60222391T DE 60222391 T2 DE60222391 T2 DE 60222391T2
- Authority
- DE
- Germany
- Prior art keywords
- plasma
- treated
- treatment
- generated
- gas
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 238000000034 method Methods 0.000 title claims abstract description 107
- 238000009832 plasma treatment Methods 0.000 title claims description 22
- 230000033001 locomotion Effects 0.000 claims abstract description 53
- 238000004381 surface treatment Methods 0.000 claims abstract description 39
- 239000002245 particle Substances 0.000 claims abstract description 35
- 238000011282 treatment Methods 0.000 claims description 135
- 239000007789 gas Substances 0.000 claims description 112
- 230000035939 shock Effects 0.000 claims description 33
- 230000008569 process Effects 0.000 claims description 29
- 239000000463 material Substances 0.000 claims description 25
- 239000000203 mixture Substances 0.000 claims description 25
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 claims description 20
- 230000000694 effects Effects 0.000 claims description 20
- 239000007788 liquid Substances 0.000 claims description 18
- 229910052760 oxygen Inorganic materials 0.000 claims description 17
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims description 14
- 238000007906 compression Methods 0.000 claims description 14
- 239000001301 oxygen Substances 0.000 claims description 14
- 239000004033 plastic Substances 0.000 claims description 14
- 229920003023 plastic Polymers 0.000 claims description 14
- 238000005530 etching Methods 0.000 claims description 13
- 229910052786 argon Inorganic materials 0.000 claims description 12
- 230000006835 compression Effects 0.000 claims description 12
- 238000010438 heat treatment Methods 0.000 claims description 11
- 230000010355 oscillation Effects 0.000 claims description 10
- 229910052710 silicon Inorganic materials 0.000 claims description 10
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims description 8
- 239000010703 silicon Substances 0.000 claims description 8
- 238000004519 manufacturing process Methods 0.000 claims description 7
- 230000009471 action Effects 0.000 claims description 6
- 239000004744 fabric Substances 0.000 claims description 6
- 230000001965 increasing effect Effects 0.000 claims description 6
- 230000009022 nonlinear effect Effects 0.000 claims description 6
- 238000001816 cooling Methods 0.000 claims description 5
- 239000011888 foil Substances 0.000 claims description 4
- 229910052751 metal Inorganic materials 0.000 claims description 4
- 239000002184 metal Substances 0.000 claims description 4
- 230000005284 excitation Effects 0.000 claims description 3
- 238000004377 microelectronic Methods 0.000 claims description 3
- 230000006798 recombination Effects 0.000 claims description 3
- 238000005215 recombination Methods 0.000 claims description 3
- 230000009467 reduction Effects 0.000 claims description 3
- 239000004065 semiconductor Substances 0.000 claims description 3
- 239000004753 textile Substances 0.000 claims description 3
- 238000002604 ultrasonography Methods 0.000 claims description 3
- 230000008859 change Effects 0.000 claims description 2
- 238000009826 distribution Methods 0.000 claims description 2
- 229930195733 hydrocarbon Natural products 0.000 claims description 2
- 150000002430 hydrocarbons Chemical class 0.000 claims description 2
- 229910021421 monocrystalline silicon Inorganic materials 0.000 claims description 2
- 229920002120 photoresistant polymer Polymers 0.000 claims description 2
- 230000000630 rising effect Effects 0.000 claims description 2
- 238000007664 blowing Methods 0.000 claims 1
- 230000015556 catabolic process Effects 0.000 claims 1
- 230000001419 dependent effect Effects 0.000 claims 1
- 239000012530 fluid Substances 0.000 claims 1
- 239000000523 sample Substances 0.000 claims 1
- 238000005507 spraying Methods 0.000 claims 1
- 210000002381 plasma Anatomy 0.000 description 243
- 239000010410 layer Substances 0.000 description 72
- 230000004888 barrier function Effects 0.000 description 34
- 238000000151 deposition Methods 0.000 description 34
- 230000008021 deposition Effects 0.000 description 31
- 239000000843 powder Substances 0.000 description 28
- 229920000139 polyethylene terephthalate Polymers 0.000 description 18
- 239000005020 polyethylene terephthalate Substances 0.000 description 18
- 230000015572 biosynthetic process Effects 0.000 description 13
- 230000008901 benefit Effects 0.000 description 11
- 230000001954 sterilising effect Effects 0.000 description 10
- 230000003993 interaction Effects 0.000 description 9
- 238000004659 sterilization and disinfection Methods 0.000 description 9
- 239000000126 substance Substances 0.000 description 9
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 8
- 235000013305 food Nutrition 0.000 description 8
- -1 on the other hand Substances 0.000 description 7
- 230000035699 permeability Effects 0.000 description 7
- LIVNPJMFVYWSIS-UHFFFAOYSA-N silicon monoxide Chemical compound [Si-]#[O+] LIVNPJMFVYWSIS-UHFFFAOYSA-N 0.000 description 7
- 239000003570 air Substances 0.000 description 6
- 125000004429 atom Chemical group 0.000 description 6
- 238000004140 cleaning Methods 0.000 description 6
- 239000002828 fuel tank Substances 0.000 description 6
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- 239000004698 Polyethylene Substances 0.000 description 5
- 229910004298 SiO 2 Inorganic materials 0.000 description 5
- 230000009286 beneficial effect Effects 0.000 description 5
- 238000009792 diffusion process Methods 0.000 description 5
- UQEAIHBTYFGYIE-UHFFFAOYSA-N hexamethyldisiloxane Chemical compound C[Si](C)(C)O[Si](C)(C)C UQEAIHBTYFGYIE-UHFFFAOYSA-N 0.000 description 5
- 229920000642 polymer Polymers 0.000 description 5
- 229910052814 silicon oxide Inorganic materials 0.000 description 5
- 230000000638 stimulation Effects 0.000 description 5
- 238000010408 sweeping Methods 0.000 description 5
- 229910052799 carbon Inorganic materials 0.000 description 4
- 230000005495 cold plasma Effects 0.000 description 4
- 239000003989 dielectric material Substances 0.000 description 4
- 230000005684 electric field Effects 0.000 description 4
- 238000002474 experimental method Methods 0.000 description 4
- 238000005187 foaming Methods 0.000 description 4
- 230000007246 mechanism Effects 0.000 description 4
- 229920000573 polyethylene Polymers 0.000 description 4
- 239000000758 substrate Substances 0.000 description 4
- 230000004913 activation Effects 0.000 description 3
- 238000001994 activation Methods 0.000 description 3
- 238000004458 analytical method Methods 0.000 description 3
- 238000005056 compaction Methods 0.000 description 3
- 239000002131 composite material Substances 0.000 description 3
- 238000011049 filling Methods 0.000 description 3
- 229910052754 neon Inorganic materials 0.000 description 3
- GKAOGPIIYCISHV-UHFFFAOYSA-N neon atom Chemical compound [Ne] GKAOGPIIYCISHV-UHFFFAOYSA-N 0.000 description 3
- 208000001840 Dandruff Diseases 0.000 description 2
- 239000004743 Polypropylene Substances 0.000 description 2
- 230000003213 activating effect Effects 0.000 description 2
- 229910045601 alloy Inorganic materials 0.000 description 2
- 239000000956 alloy Substances 0.000 description 2
- 229910052782 aluminium Inorganic materials 0.000 description 2
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 2
- 235000013361 beverage Nutrition 0.000 description 2
- 230000002146 bilateral effect Effects 0.000 description 2
- 239000011248 coating agent Substances 0.000 description 2
- 238000000576 coating method Methods 0.000 description 2
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- 238000011161 development Methods 0.000 description 2
- 230000006870 function Effects 0.000 description 2
- 230000006872 improvement Effects 0.000 description 2
- 230000001939 inductive effect Effects 0.000 description 2
- 150000002500 ions Chemical class 0.000 description 2
- 239000011858 nanopowder Substances 0.000 description 2
- 230000003287 optical effect Effects 0.000 description 2
- 238000005457 optimization Methods 0.000 description 2
- 230000003534 oscillatory effect Effects 0.000 description 2
- 238000013021 overheating Methods 0.000 description 2
- 238000005192 partition Methods 0.000 description 2
- 239000011856 silicon-based particle Substances 0.000 description 2
- 239000002356 single layer Substances 0.000 description 2
- 239000002344 surface layer Substances 0.000 description 2
- 229910000952 Be alloy Inorganic materials 0.000 description 1
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- 239000004215 Carbon black (E152) Substances 0.000 description 1
- 206010013789 Dry throat Diseases 0.000 description 1
- 108020005351 Isochores Proteins 0.000 description 1
- BOTDANWDWHJENH-UHFFFAOYSA-N Tetraethyl orthosilicate Chemical compound CCO[Si](OCC)(OCC)OCC BOTDANWDWHJENH-UHFFFAOYSA-N 0.000 description 1
- VVTSZOCINPYFDP-UHFFFAOYSA-N [O].[Ar] Chemical compound [O].[Ar] VVTSZOCINPYFDP-UHFFFAOYSA-N 0.000 description 1
- 238000009825 accumulation Methods 0.000 description 1
- IKHGUXGNUITLKF-XPULMUKRSA-N acetaldehyde Chemical compound [14CH]([14CH3])=O IKHGUXGNUITLKF-XPULMUKRSA-N 0.000 description 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- 239000012080 ambient air Substances 0.000 description 1
- 125000003118 aryl group Chemical group 0.000 description 1
- 235000013405 beer Nutrition 0.000 description 1
- 239000003990 capacitor Substances 0.000 description 1
- 235000014171 carbonated beverage Nutrition 0.000 description 1
- 239000012159 carrier gas Substances 0.000 description 1
- 238000001311 chemical methods and process Methods 0.000 description 1
- 238000012993 chemical processing Methods 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 238000012733 comparative method Methods 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 239000000110 cooling liquid Substances 0.000 description 1
- 239000002537 cosmetic Substances 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 238000002425 crystallisation Methods 0.000 description 1
- 230000008025 crystallization Effects 0.000 description 1
- 238000005238 degreasing Methods 0.000 description 1
- 238000001514 detection method Methods 0.000 description 1
- 230000001627 detrimental effect Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000007598 dipping method Methods 0.000 description 1
- 238000007599 discharging Methods 0.000 description 1
- 239000006185 dispersion Substances 0.000 description 1
- 230000005672 electromagnetic field Effects 0.000 description 1
- 238000000572 ellipsometry Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 230000002349 favourable effect Effects 0.000 description 1
- 238000007667 floating Methods 0.000 description 1
- 230000004907 flux Effects 0.000 description 1
- 239000003502 gasoline Substances 0.000 description 1
- 239000004519 grease Substances 0.000 description 1
- FFUAGWLWBBFQJT-UHFFFAOYSA-N hexamethyldisilazane Chemical compound C[Si](C)(C)N[Si](C)(C)C FFUAGWLWBBFQJT-UHFFFAOYSA-N 0.000 description 1
- 230000004941 influx Effects 0.000 description 1
- 230000000977 initiatory effect Effects 0.000 description 1
- 230000009021 linear effect Effects 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 239000002052 molecular layer Substances 0.000 description 1
- 239000003921 oil Substances 0.000 description 1
- 239000012044 organic layer Substances 0.000 description 1
- 125000004430 oxygen atom Chemical group O* 0.000 description 1
- 238000001020 plasma etching Methods 0.000 description 1
- 239000002985 plastic film Substances 0.000 description 1
- 229920006255 plastic film Polymers 0.000 description 1
- 238000006116 polymerization reaction Methods 0.000 description 1
- 229920001155 polypropylene Polymers 0.000 description 1
- 238000003908 quality control method Methods 0.000 description 1
- 230000000717 retained effect Effects 0.000 description 1
- 238000005096 rolling process Methods 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 230000002226 simultaneous effect Effects 0.000 description 1
- 238000004611 spectroscopical analysis Methods 0.000 description 1
- 238000001228 spectrum Methods 0.000 description 1
- 230000003068 static effect Effects 0.000 description 1
- 238000010025 steaming Methods 0.000 description 1
- 238000012360 testing method Methods 0.000 description 1
- 239000012780 transparent material Substances 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32431—Constructional details of the reactor
- H01J37/32623—Mechanical discharge control means
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
- H01J37/32321—Discharge generated by other radiation
Landscapes
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Physical Or Chemical Processes And Apparatus (AREA)
- Plasma Technology (AREA)
- Cleaning In General (AREA)
- Details Of Rigid Or Semi-Rigid Containers (AREA)
- Drying Of Semiconductors (AREA)
- Cleaning Or Drying Semiconductors (AREA)
- Treatments Of Macromolecular Shaped Articles (AREA)
- Encapsulation Of And Coatings For Semiconductor Or Solid State Devices (AREA)
Applications Claiming Priority (7)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| EP01810318 | 2001-03-27 | ||
| EP01810318 | 2001-03-27 | ||
| EP01120974 | 2001-08-31 | ||
| EP01120974 | 2001-08-31 | ||
| EP01810915 | 2001-09-20 | ||
| EP01810915 | 2001-09-20 | ||
| PCT/IB2002/001001 WO2002076511A2 (fr) | 2001-03-27 | 2002-03-26 | Procédé de traitement de surface par plasma et dispositif pour la mise en oeuvre du procédé |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| DE60222391D1 DE60222391D1 (de) | 2007-10-25 |
| DE60222391T2 true DE60222391T2 (de) | 2008-06-05 |
Family
ID=27224223
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| DE60222391T Expired - Lifetime DE60222391T2 (de) | 2001-03-27 | 2002-03-26 | Verfahren und vorrichtung zur plasmabehandlung von oberflächen |
Country Status (10)
| Country | Link |
|---|---|
| EP (1) | EP1374276B1 (https=) |
| JP (1) | JP2004527077A (https=) |
| CN (1) | CN100437883C (https=) |
| AT (1) | ATE373314T1 (https=) |
| AU (1) | AU2002242923A1 (https=) |
| BR (1) | BR0208242A (https=) |
| DE (1) | DE60222391T2 (https=) |
| ES (1) | ES2294112T3 (https=) |
| MX (1) | MXPA03008615A (https=) |
| WO (1) | WO2002076511A2 (https=) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2013152872A1 (de) * | 2012-04-13 | 2013-10-17 | Krones Ag | Beschichtung von behältern mit plasmadüsen |
Families Citing this family (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| FR2911610B1 (fr) * | 2007-01-24 | 2012-09-21 | Air Liquide | Procede de traitement de surface de substrats polymeres, substrats ainsi obtenus et leur utilisation pour la realisation de materiaux multicouches. |
| NL1033408C2 (nl) * | 2007-02-16 | 2008-08-19 | Omve Netherlands B V | Werkwijze resp. inrichting voor het desinfecteren van micro-organismen etc. |
| NO2153704T3 (https=) * | 2007-05-11 | 2018-07-14 | ||
| NL1033958C2 (nl) * | 2007-06-11 | 2008-12-12 | Omve Netherlands B V | Werkwijze voor het desinfecteren van kunststof flessen etc. |
| CN101974298A (zh) * | 2010-11-11 | 2011-02-16 | 复旦大学 | 用氩等离子体处理金属表面方法 |
| WO2012113568A1 (de) * | 2011-02-25 | 2012-08-30 | MAX-PLANCK-Gesellschaft zur Förderung der Wissenschaften e.V. | Desinfektionseinrichtung, behälter, verwendung eines behälters und desinfektionsverfahren zur desinfektion eines behälters, insbesondere für einen lebensmittelbehälter |
| CN102785376B (zh) * | 2012-08-14 | 2016-03-30 | 明尼苏达矿业制造特殊材料（上海）有限公司 | 聚乙烯表面处理方法 |
| JP6328537B2 (ja) * | 2014-10-31 | 2018-05-23 | エア・ウォーター・マッハ株式会社 | プラズマ処理方法およびプラズマ処理装置 |
| JP5795427B1 (ja) * | 2014-12-26 | 2015-10-14 | 竹本容器株式会社 | 被膜付き樹脂容器の製造方法及び樹脂容器被覆装置 |
| US20190093226A1 (en) * | 2016-04-08 | 2019-03-28 | Sio2 Medical Products, Inc. | Method for applying a pecvd lubricity layer with a moving gas inlet |
| CN106944419A (zh) * | 2017-05-12 | 2017-07-14 | 中国工程物理研究院核物理与化学研究所 | 一种去除表面氚污染的等离子体去污系统 |
Family Cites Families (28)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4778583A (en) * | 1987-05-11 | 1988-10-18 | Eastman Kodak Company | Semiconductor etching process which produces oriented sloped walls |
| JPH01111333A (ja) * | 1987-10-26 | 1989-04-28 | Oki Electric Ind Co Ltd | ドライエッチング装置 |
| DE3900768C1 (en) * | 1989-01-12 | 1990-02-22 | Fraunhofer-Gesellschaft Zur Foerderung Der Angewandten Forschung Ev, 8000 Muenchen, De | Plasma etching device and method for operating it |
| US5277740A (en) * | 1990-08-31 | 1994-01-11 | Mitsubishi Denki Kabushiki Kaisha | Apparatus and method for forming a fine pattern |
| JPH04111313A (ja) * | 1990-08-31 | 1992-04-13 | Mitsubishi Electric Corp | 微細加工装置及び方法 |
| JPH04357662A (ja) * | 1991-04-19 | 1992-12-10 | Matsushita Electric Works Ltd | 無電極放電ランプ |
| RU2000890C1 (ru) * | 1992-01-16 | 1993-10-15 | Совместное межотраслевое и межрегиональное производственно-торговое объединение "Край" | Установка дл получени ультрадисперсного порошка |
| US5569502A (en) * | 1992-09-11 | 1996-10-29 | Semiconductor Energy Laboratory Co., Ltd. | Film formation apparatus and method for forming a film |
| JP3297881B2 (ja) * | 1992-10-27 | 2002-07-02 | イーシー化学株式会社 | 超微粒子の表面処理方法 |
| JPH07106092A (ja) * | 1993-10-04 | 1995-04-21 | Matsushita Electric Ind Co Ltd | 衝撃波プラズマ発生装置 |
| JP3459672B2 (ja) * | 1993-12-01 | 2003-10-20 | 株式会社タクマ | ガス処理装置 |
| JPH07155529A (ja) * | 1993-12-01 | 1995-06-20 | Takuma Co Ltd | ガス処理装置とそれの運転方法 |
| JP3287124B2 (ja) * | 1994-08-17 | 2002-05-27 | ソニー株式会社 | ＳｉＮ系絶縁膜の成膜方法 |
| JP3428169B2 (ja) * | 1994-08-31 | 2003-07-22 | ソニー株式会社 | ニオブ系薄膜のドライエッチング方法 |
| JP3309581B2 (ja) * | 1994-08-31 | 2002-07-29 | ソニー株式会社 | ペロブスカイト型酸化膜のドライエッチング方法 |
| DE4438359C2 (de) * | 1994-10-27 | 2001-10-04 | Schott Glas | Behälter aus Kunststoff mit einer Sperrbeschichtung |
| JP3806847B2 (ja) * | 1995-11-24 | 2006-08-09 | イーシー化学株式会社 | 大気圧グロー放電プラズマによる粉体の処理方法及び装置 |
| JPH09157845A (ja) * | 1995-12-06 | 1997-06-17 | Hitachi Ltd | カオス処理成膜装置，カオス処理成膜方法及びカオス処理成膜媒体 |
| FR2744805B1 (fr) * | 1996-02-13 | 1998-03-20 | Pechiney Aluminium | Cibles de pulverisation cathodique selectionnees par controle ultrasons pour leur faible taux d'emissions de particules |
| JPH1033976A (ja) * | 1996-05-24 | 1998-02-10 | Sekisui Chem Co Ltd | 放電プラズマ処理方法及びその装置 |
| JPH1187098A (ja) * | 1997-09-03 | 1999-03-30 | Toshiba Corp | プラズマ処理装置 |
| US6423924B1 (en) * | 1998-03-10 | 2002-07-23 | Tepla Ag | Method for treating the surface of a material or an object and implementing device |
| JP3572942B2 (ja) * | 1998-05-22 | 2004-10-06 | 日新電機株式会社 | 放電ガス処理装置 |
| JP2000077372A (ja) * | 1998-08-31 | 2000-03-14 | Sumitomo Metal Ind Ltd | 気相成長用半導体ウェーハの製造方法 |
| JP3555470B2 (ja) * | 1998-12-04 | 2004-08-18 | セイコーエプソン株式会社 | 大気圧高周波プラズマによるエッチング方法 |
| US6231933B1 (en) * | 1999-03-18 | 2001-05-15 | Primaxx, Inc. | Method and apparatus for metal oxide chemical vapor deposition on a substrate surface |
| JP4372918B2 (ja) * | 1999-06-30 | 2009-11-25 | パナソニック電工株式会社 | プラズマ処理装置及びプラズマ処理方法 |
| JP2001035691A (ja) * | 1999-07-16 | 2001-02-09 | Japan Atom Energy Res Inst | Ｚピンチ放電によるレーザー光ガイド用プラズマチャンネルの形成法 |
-
2002
- 2002-03-26 CN CNB028073835A patent/CN100437883C/zh not_active Expired - Fee Related
- 2002-03-26 DE DE60222391T patent/DE60222391T2/de not_active Expired - Lifetime
- 2002-03-26 ES ES02708589T patent/ES2294112T3/es not_active Expired - Lifetime
- 2002-03-26 EP EP02708589A patent/EP1374276B1/fr not_active Expired - Lifetime
- 2002-03-26 MX MXPA03008615A patent/MXPA03008615A/es not_active Application Discontinuation
- 2002-03-26 WO PCT/IB2002/001001 patent/WO2002076511A2/fr not_active Ceased
- 2002-03-26 JP JP2002575023A patent/JP2004527077A/ja active Pending
- 2002-03-26 BR BR0208242-0A patent/BR0208242A/pt not_active IP Right Cessation
- 2002-03-26 AT AT02708589T patent/ATE373314T1/de not_active IP Right Cessation
- 2002-03-26 AU AU2002242923A patent/AU2002242923A1/en not_active Abandoned
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2013152872A1 (de) * | 2012-04-13 | 2013-10-17 | Krones Ag | Beschichtung von behältern mit plasmadüsen |
Also Published As
| Publication number | Publication date |
|---|---|
| DE60222391D1 (de) | 2007-10-25 |
| JP2004527077A (ja) | 2004-09-02 |
| CN1511333A (zh) | 2004-07-07 |
| EP1374276B1 (fr) | 2007-09-12 |
| EP1374276A2 (fr) | 2004-01-02 |
| ES2294112T3 (es) | 2008-04-01 |
| BR0208242A (pt) | 2004-04-13 |
| WO2002076511A3 (fr) | 2003-04-17 |
| AU2002242923A1 (en) | 2002-10-08 |
| ATE373314T1 (de) | 2007-09-15 |
| WO2002076511A2 (fr) | 2002-10-03 |
| MXPA03008615A (es) | 2005-03-07 |
| CN100437883C (zh) | 2008-11-26 |
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