CN100380707C - 应用有机材料制作有机发光装置 - Google Patents

应用有机材料制作有机发光装置 Download PDF

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Publication number
CN100380707C
CN100380707C CNB031044042A CN03104404A CN100380707C CN 100380707 C CN100380707 C CN 100380707C CN B031044042 A CNB031044042 A CN B031044042A CN 03104404 A CN03104404 A CN 03104404A CN 100380707 C CN100380707 C CN 100380707C
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China
Prior art keywords
organic
mixture
powder
wafer
sublimable
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
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CNB031044042A
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English (en)
Chinese (zh)
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CN1438826A (zh
Inventor
S·K·高希
D·B·卡尔顿
T·K·哈特瓦
S·A·范斯利克
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Global OLED Technology LLC
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Eastman Kodak Co
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Publication date
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Publication of CN1438826A publication Critical patent/CN1438826A/zh
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Publication of CN100380707C publication Critical patent/CN100380707C/zh
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    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05BELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B33/00Electroluminescent light sources
    • H05B33/10Apparatus or processes specially adapted to the manufacture of electroluminescent light sources
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/12Organic material
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10KORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • H10K71/10Deposition of organic active material
    • H10K71/16Deposition of organic active material using physical vapour deposition [PVD], e.g. vacuum deposition or sputtering
    • H10K71/164Deposition of organic active material using physical vapour deposition [PVD], e.g. vacuum deposition or sputtering using vacuum deposition
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10KORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • H10K71/30Doping active layers, e.g. electron transporting layers
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10KORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • H10K71/40Thermal treatment, e.g. annealing in the presence of a solvent vapour
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10KORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10KORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K85/00Organic materials used in the body or electrodes of devices covered by this subclass
    • H10K85/30Coordination compounds
    • H10K85/321Metal complexes comprising a group IIIA element, e.g. Tris (8-hydroxyquinoline) gallium [Gaq3]
    • H10K85/324Metal complexes comprising a group IIIA element, e.g. Tris (8-hydroxyquinoline) gallium [Gaq3] comprising aluminium, e.g. Alq3
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10KORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K85/00Organic materials used in the body or electrodes of devices covered by this subclass
    • H10K85/60Organic compounds having low molecular weight
    • H10K85/631Amine compounds having at least two aryl rest on at least one amine-nitrogen atom, e.g. triphenylamine

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  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Electroluminescent Light Sources (AREA)
  • Physical Vapour Deposition (AREA)
CNB031044042A 2002-02-11 2003-02-11 应用有机材料制作有机发光装置 Expired - Lifetime CN100380707C (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US10/073,690 US6649436B2 (en) 2002-02-11 2002-02-11 Using organic materials in making an organic light-emitting device
US10/073690 2002-02-11

Publications (2)

Publication Number Publication Date
CN1438826A CN1438826A (zh) 2003-08-27
CN100380707C true CN100380707C (zh) 2008-04-09

Family

ID=27622762

Family Applications (1)

Application Number Title Priority Date Filing Date
CNB031044042A Expired - Lifetime CN100380707C (zh) 2002-02-11 2003-02-11 应用有机材料制作有机发光装置

Country Status (7)

Country Link
US (1) US6649436B2 (enExample)
EP (1) EP1337132B1 (enExample)
JP (1) JP4275962B2 (enExample)
KR (1) KR20030068051A (enExample)
CN (1) CN100380707C (enExample)
DE (1) DE60300429T2 (enExample)
TW (1) TW200305350A (enExample)

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JP2004530627A (ja) * 2001-06-14 2004-10-07 ス、クンヒ 酸化マグネシウムを用いた建材の成形方法
US6797314B2 (en) * 2001-07-03 2004-09-28 Eastman Kodak Company Method of handling organic material in making an organic light-emitting device
TWI262034B (en) * 2002-02-05 2006-09-11 Semiconductor Energy Lab Manufacturing system, manufacturing method, method of operating a manufacturing apparatus, and light emitting device
TWI285515B (en) * 2002-02-22 2007-08-11 Semiconductor Energy Lab Light-emitting device and method of manufacturing the same, and method of operating manufacturing apparatus
US7238383B2 (en) * 2003-03-07 2007-07-03 Eastman Kodak Company Making and using compacted pellets for OLED displays
US20050056969A1 (en) * 2003-09-16 2005-03-17 Eastman Kodak Company Forming homogeneous mixtures of organic materials for physical vapor deposition using a solvent
US20050056968A1 (en) * 2003-09-16 2005-03-17 Eastman Kodak Company Forming homogeneous mixtures of organic materials for physical vapor deposition using wet mixing
US20050056958A1 (en) * 2003-09-16 2005-03-17 Eastman Kodak Company Forming homogeneous mixtures of organic materials for physical vapor deposition using dry mixing
US20050056960A1 (en) * 2003-09-16 2005-03-17 Eastman Kodak Company Forming homogeneous mixtures of organic materials for physical vapor deposition using melting
JP4366226B2 (ja) * 2004-03-30 2009-11-18 東北パイオニア株式会社 有機elパネルの製造方法、有機elパネルの成膜装置
KR100581918B1 (ko) * 2004-06-03 2006-05-23 삼성에스디아이 주식회사 유기 전계 발광 소자
US20060102079A1 (en) * 2004-11-15 2006-05-18 Glassman Timothy E Reducing variability in delivery rates of solid state precursors
US7252859B2 (en) * 2004-11-19 2007-08-07 Eastman Kodak Company Organic materials for an evaporation source
JP2006244906A (ja) * 2005-03-04 2006-09-14 Tohoku Pioneer Corp 自発光素子の製造方法及び製造装置
KR100623073B1 (ko) * 2005-09-15 2006-09-13 김일중 무광택표면과 광택표면을 함께 갖는 광고용 패드 및 그제조방법
EP1783846B1 (de) * 2005-10-28 2008-07-09 Novaled AG Abscheiden einer Schicht aus dotiertem organischen Material auf einem Substrat
TWI281760B (en) * 2005-12-30 2007-05-21 Ind Tech Res Inst Organic tri-stable device and method for manufacturing and operating the same
JP5045062B2 (ja) * 2006-10-30 2012-10-10 住友化学株式会社 固体有機金属化合物の供給方法
KR100949819B1 (ko) * 2008-03-11 2010-03-30 박진연 타블릿 성형 다이 어셈블리
DE102010007111B4 (de) * 2010-02-05 2012-02-16 Von Ardenne Anlagentechnik Gmbh Verfahren und Pulvermischung zur Beschichtung von Substraten aus der Dampfphase
JP2011199174A (ja) * 2010-03-23 2011-10-06 Fujifilm Corp 発光層形成用固形材料、並びに有機電界発光素子及びその製造方法
KR101747059B1 (ko) * 2011-06-21 2017-07-11 카티바, 인크. Oled 마이크로 공동 및 버퍼 층을 위한 물질과 그 생산 방법
KR101456669B1 (ko) * 2013-04-11 2014-11-04 주식회사 선익시스템 증발물질 공급장치
CN110770363A (zh) 2017-06-26 2020-02-07 默克专利有限公司 均质混合物
KR20200040537A (ko) * 2018-10-10 2020-04-20 엘지디스플레이 주식회사 측향식 진공증착용 소스, 소스 어셈블리 및 이를 이용한 측향식 진공증착 장치
KR102487491B1 (ko) * 2022-06-13 2023-01-12 솔루스첨단소재 주식회사 유기 전계 발광 소자용 펠릿 및 이를 이용한 유기 전계 발광 소자
JP7316599B1 (ja) * 2022-06-18 2023-07-28 ノベリオンシステムズ株式会社 蒸気発生材料

Citations (7)

* Cited by examiner, † Cited by third party
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JPH10324970A (ja) * 1997-03-28 1998-12-08 Dowa Mining Co Ltd Cvd用原料およびこれを用いた成膜法
JPH10330920A (ja) * 1997-06-05 1998-12-15 Matsushita Electric Ind Co Ltd 蒸着方法および蒸着装置
JP2000313952A (ja) * 1999-04-28 2000-11-14 Ulvac Japan Ltd 有機化合物用の蒸着源、及び蒸着装置有機薄膜製造方法
JP2001093667A (ja) * 1999-09-28 2001-04-06 Sanyo Electric Co Ltd 有機発光素子、その製造装置およびその製造方法
JP2001226144A (ja) * 2000-02-21 2001-08-21 Sanyo Shinku Kogyo Kk 有機系被膜の蒸着方法とその装置
JP2001323367A (ja) * 2000-03-09 2001-11-22 Junji Kido 有機化合物の蒸着方法、及び有機化合物の精製方法
JP2002025770A (ja) * 2000-05-19 2002-01-25 Eastman Kodak Co 有機発光材料の蒸着方法

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US4356429A (en) 1980-07-17 1982-10-26 Eastman Kodak Company Organic electroluminescent cell
US4539507A (en) 1983-03-25 1985-09-03 Eastman Kodak Company Organic electroluminescent devices having improved power conversion efficiencies
US4720432A (en) 1987-02-11 1988-01-19 Eastman Kodak Company Electroluminescent device with organic luminescent medium
US4769292A (en) 1987-03-02 1988-09-06 Eastman Kodak Company Electroluminescent device with modified thin film luminescent zone
US5294870A (en) 1991-12-30 1994-03-15 Eastman Kodak Company Organic electroluminescent multicolor image display device
JP2795194B2 (ja) * 1994-09-22 1998-09-10 株式会社デンソー エレクトロルミネッセンス素子とその製造方法
US5550066A (en) 1994-12-14 1996-08-27 Eastman Kodak Company Method of fabricating a TFT-EL pixel
US5946550A (en) * 1997-03-14 1999-08-31 University Of Connecticut Self-assembled semiconductor and method of making same
US6114088A (en) * 1999-01-15 2000-09-05 3M Innovative Properties Company Thermal transfer element for forming multilayer devices
JP4543446B2 (ja) * 1999-04-05 2010-09-15 Tdk株式会社 有機el素子
JP4423701B2 (ja) * 1999-06-07 2010-03-03 Tdk株式会社 有機el表示装置
US6489044B1 (en) * 1999-09-01 2002-12-03 Lucent Technologies Inc. Process for fabricating polarized organic photonics devices, and resultant articles
EP1132493A3 (en) * 2000-03-09 2001-09-19 Junji Kido Vapor deposition method of organic compound and refinement method of organic compound
US6558735B2 (en) * 2001-04-20 2003-05-06 Eastman Kodak Company Reusable mass-sensor in manufacture of organic light-emitting devices

Patent Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH10324970A (ja) * 1997-03-28 1998-12-08 Dowa Mining Co Ltd Cvd用原料およびこれを用いた成膜法
JPH10330920A (ja) * 1997-06-05 1998-12-15 Matsushita Electric Ind Co Ltd 蒸着方法および蒸着装置
JP2000313952A (ja) * 1999-04-28 2000-11-14 Ulvac Japan Ltd 有機化合物用の蒸着源、及び蒸着装置有機薄膜製造方法
JP2001093667A (ja) * 1999-09-28 2001-04-06 Sanyo Electric Co Ltd 有機発光素子、その製造装置およびその製造方法
JP2001226144A (ja) * 2000-02-21 2001-08-21 Sanyo Shinku Kogyo Kk 有機系被膜の蒸着方法とその装置
JP2001323367A (ja) * 2000-03-09 2001-11-22 Junji Kido 有機化合物の蒸着方法、及び有機化合物の精製方法
JP2002025770A (ja) * 2000-05-19 2002-01-25 Eastman Kodak Co 有機発光材料の蒸着方法

Also Published As

Publication number Publication date
DE60300429T2 (de) 2006-01-26
KR20030068051A (ko) 2003-08-19
TW200305350A (en) 2003-10-16
CN1438826A (zh) 2003-08-27
JP4275962B2 (ja) 2009-06-10
EP1337132A1 (en) 2003-08-20
US20030153109A1 (en) 2003-08-14
DE60300429D1 (de) 2005-05-04
JP2003249359A (ja) 2003-09-05
EP1337132B1 (en) 2005-03-30
US6649436B2 (en) 2003-11-18

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Owner name: GLOBAL OLED TECHNOLOGY CO., LTD.

Free format text: FORMER OWNER: EASTMAN KODAK COMPANY

Effective date: 20100421

C41 Transfer of patent application or patent right or utility model
COR Change of bibliographic data

Free format text: CORRECT: ADDRESS; FROM: NEW YORK, U.S.A. TO: DELAWARE, U.S.A.

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Effective date of registration: 20100421

Address after: Delaware, USA

Patentee after: Global OLED Technology LLC

Address before: American New York

Patentee before: Eastman Kodak Co.

CX01 Expiry of patent term
CX01 Expiry of patent term

Granted publication date: 20080409