CH661918A5 - Verfahren und einrichtung zur erzeugung von silizium aus siliciumtetrafluorid. - Google Patents
Verfahren und einrichtung zur erzeugung von silizium aus siliciumtetrafluorid. Download PDFInfo
- Publication number
- CH661918A5 CH661918A5 CH3707/84A CH370784A CH661918A5 CH 661918 A5 CH661918 A5 CH 661918A5 CH 3707/84 A CH3707/84 A CH 3707/84A CH 370784 A CH370784 A CH 370784A CH 661918 A5 CH661918 A5 CH 661918A5
- Authority
- CH
- Switzerland
- Prior art keywords
- silicon
- reaction
- solar cell
- nanis
- fluoride
- Prior art date
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- ABTOQLMXBSRXSM-UHFFFAOYSA-N silicon tetrafluoride Chemical compound F[Si](F)(F)F ABTOQLMXBSRXSM-UHFFFAOYSA-N 0.000 title claims description 88
- 239000010703 silicon Substances 0.000 title claims description 83
- 229910052710 silicon Inorganic materials 0.000 title claims description 83
- 238000000034 method Methods 0.000 title claims description 42
- PUZPDOWCWNUUKD-UHFFFAOYSA-M sodium fluoride Chemical compound [F-].[Na+] PUZPDOWCWNUUKD-UHFFFAOYSA-M 0.000 claims description 112
- 238000006243 chemical reaction Methods 0.000 claims description 103
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims description 81
- 239000011734 sodium Substances 0.000 claims description 71
- 229910004014 SiF4 Inorganic materials 0.000 claims description 69
- 239000011775 sodium fluoride Substances 0.000 claims description 55
- 235000013024 sodium fluoride Nutrition 0.000 claims description 55
- 239000007795 chemical reaction product Substances 0.000 claims description 42
- 230000008569 process Effects 0.000 claims description 27
- 238000004519 manufacturing process Methods 0.000 claims description 24
- 239000002253 acid Substances 0.000 claims description 19
- 239000000047 product Substances 0.000 claims description 19
- 239000007789 gas Substances 0.000 claims description 18
- 238000000151 deposition Methods 0.000 claims description 17
- 230000008021 deposition Effects 0.000 claims description 16
- 239000012535 impurity Substances 0.000 claims description 16
- 238000006722 reduction reaction Methods 0.000 claims description 16
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 claims description 14
- 229910052708 sodium Inorganic materials 0.000 claims description 14
- -1 sodium fluorosilicate Chemical group 0.000 claims description 13
- 238000002844 melting Methods 0.000 claims description 12
- 230000008018 melting Effects 0.000 claims description 12
- 150000003839 salts Chemical class 0.000 claims description 12
- 229910052751 metal Inorganic materials 0.000 claims description 10
- 239000002184 metal Substances 0.000 claims description 10
- 238000001556 precipitation Methods 0.000 claims description 10
- 238000000926 separation method Methods 0.000 claims description 10
- 239000000155 melt Substances 0.000 claims description 9
- 230000009467 reduction Effects 0.000 claims description 8
- 239000004065 semiconductor Substances 0.000 claims description 8
- 239000007787 solid Substances 0.000 claims description 8
- 239000000243 solution Substances 0.000 claims description 8
- 229940104869 fluorosilicate Drugs 0.000 claims description 7
- 239000000463 material Substances 0.000 claims description 7
- 229910052783 alkali metal Inorganic materials 0.000 claims description 5
- 150000001340 alkali metals Chemical class 0.000 claims description 5
- 238000010438 heat treatment Methods 0.000 claims description 5
- 150000002739 metals Chemical class 0.000 claims description 5
- 239000000843 powder Substances 0.000 claims description 5
- 238000000746 purification Methods 0.000 claims description 5
- 238000005979 thermal decomposition reaction Methods 0.000 claims description 5
- 230000007704 transition Effects 0.000 claims description 5
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 claims description 4
- 238000004140 cleaning Methods 0.000 claims description 4
- 229910052802 copper Inorganic materials 0.000 claims description 4
- 238000005137 deposition process Methods 0.000 claims description 4
- 229910001512 metal fluoride Inorganic materials 0.000 claims description 4
- 239000010936 titanium Substances 0.000 claims description 4
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 4
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims description 3
- 239000007864 aqueous solution Substances 0.000 claims description 3
- 239000012298 atmosphere Substances 0.000 claims description 3
- 229910052791 calcium Inorganic materials 0.000 claims description 3
- 229910052739 hydrogen Inorganic materials 0.000 claims description 3
- 239000001257 hydrogen Substances 0.000 claims description 3
- 229910052749 magnesium Inorganic materials 0.000 claims description 3
- 239000000203 mixture Substances 0.000 claims description 3
- 229910052720 vanadium Inorganic materials 0.000 claims description 3
- 239000002699 waste material Substances 0.000 claims description 3
- 239000003638 chemical reducing agent Substances 0.000 claims description 2
- 150000001875 compounds Chemical class 0.000 claims description 2
- 229910052736 halogen Inorganic materials 0.000 claims description 2
- 229910000040 hydrogen fluoride Inorganic materials 0.000 claims description 2
- 239000002686 phosphate fertilizer Substances 0.000 claims description 2
- 230000000717 retained effect Effects 0.000 claims description 2
- 238000002848 electrochemical method Methods 0.000 claims 15
- 239000005046 Chlorosilane Substances 0.000 claims 4
- KRHYYFGTRYWZRS-UHFFFAOYSA-M Fluoride anion Chemical compound [F-] KRHYYFGTRYWZRS-UHFFFAOYSA-M 0.000 claims 4
- KOPOQZFJUQMUML-UHFFFAOYSA-N chlorosilane Chemical class Cl[SiH3] KOPOQZFJUQMUML-UHFFFAOYSA-N 0.000 claims 4
- 229910052719 titanium Inorganic materials 0.000 claims 3
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims 2
- 229910004883 Na2SiF6 Inorganic materials 0.000 claims 2
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 claims 2
- 238000005516 engineering process Methods 0.000 claims 2
- 150000004820 halides Chemical class 0.000 claims 2
- 229910052726 zirconium Inorganic materials 0.000 claims 2
- OYPRJOBELJOOCE-UHFFFAOYSA-N Calcium Chemical compound [Ca] OYPRJOBELJOOCE-UHFFFAOYSA-N 0.000 claims 1
- FYYHWMGAXLPEAU-UHFFFAOYSA-N Magnesium Chemical compound [Mg] FYYHWMGAXLPEAU-UHFFFAOYSA-N 0.000 claims 1
- 229910019142 PO4 Inorganic materials 0.000 claims 1
- QAOWNCQODCNURD-UHFFFAOYSA-L Sulfate Chemical compound [O-]S([O-])(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-L 0.000 claims 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 claims 1
- 239000000956 alloy Substances 0.000 claims 1
- 229910045601 alloy Inorganic materials 0.000 claims 1
- 239000011575 calcium Substances 0.000 claims 1
- 239000000969 carrier Substances 0.000 claims 1
- 239000010949 copper Substances 0.000 claims 1
- 230000005611 electricity Effects 0.000 claims 1
- 239000003337 fertilizer Substances 0.000 claims 1
- 239000010419 fine particle Substances 0.000 claims 1
- 229910052735 hafnium Inorganic materials 0.000 claims 1
- 238000002955 isolation Methods 0.000 claims 1
- 239000011777 magnesium Substances 0.000 claims 1
- 239000006262 metallic foam Substances 0.000 claims 1
- 238000002156 mixing Methods 0.000 claims 1
- 229910052758 niobium Inorganic materials 0.000 claims 1
- 239000012299 nitrogen atmosphere Substances 0.000 claims 1
- NBIIXXVUZAFLBC-UHFFFAOYSA-K phosphate Chemical compound [O-]P([O-])([O-])=O NBIIXXVUZAFLBC-UHFFFAOYSA-K 0.000 claims 1
- 239000010452 phosphate Substances 0.000 claims 1
- 239000002244 precipitate Substances 0.000 claims 1
- 238000011946 reduction process Methods 0.000 claims 1
- 239000000126 substance Substances 0.000 claims 1
- 150000003467 sulfuric acid derivatives Chemical class 0.000 claims 1
- 229910052715 tantalum Inorganic materials 0.000 claims 1
- 210000002268 wool Anatomy 0.000 claims 1
- 229910052845 zircon Inorganic materials 0.000 claims 1
- GFQYVLUOOAAOGM-UHFFFAOYSA-N zirconium(iv) silicate Chemical compound [Zr+4].[O-][Si]([O-])([O-])[O-] GFQYVLUOOAAOGM-UHFFFAOYSA-N 0.000 claims 1
- 239000000376 reactant Substances 0.000 description 17
- 238000002347 injection Methods 0.000 description 16
- 239000007924 injection Substances 0.000 description 16
- 239000007788 liquid Substances 0.000 description 15
- 229910003638 H2SiF6 Inorganic materials 0.000 description 9
- ZEFWRWWINDLIIV-UHFFFAOYSA-N tetrafluorosilane;dihydrofluoride Chemical compound F.F.F[Si](F)(F)F ZEFWRWWINDLIIV-UHFFFAOYSA-N 0.000 description 9
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 7
- 229910052742 iron Inorganic materials 0.000 description 7
- 239000000356 contaminant Substances 0.000 description 6
- 238000011109 contamination Methods 0.000 description 6
- 229910052759 nickel Inorganic materials 0.000 description 6
- 229910052698 phosphorus Inorganic materials 0.000 description 6
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 5
- 229910052785 arsenic Inorganic materials 0.000 description 5
- 229910052796 boron Inorganic materials 0.000 description 5
- 229910052804 chromium Inorganic materials 0.000 description 5
- 150000002222 fluorine compounds Chemical class 0.000 description 5
- 239000010439 graphite Substances 0.000 description 5
- 229910002804 graphite Inorganic materials 0.000 description 5
- 230000015572 biosynthetic process Effects 0.000 description 4
- 238000000354 decomposition reaction Methods 0.000 description 4
- 238000012546 transfer Methods 0.000 description 4
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 3
- 229910052782 aluminium Inorganic materials 0.000 description 3
- 230000004888 barrier function Effects 0.000 description 3
- 239000008139 complexing agent Substances 0.000 description 3
- 238000001816 cooling Methods 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 238000002474 experimental method Methods 0.000 description 3
- 238000002386 leaching Methods 0.000 description 3
- 238000010309 melting process Methods 0.000 description 3
- 229910052750 molybdenum Inorganic materials 0.000 description 3
- 230000000737 periodic effect Effects 0.000 description 3
- 230000002093 peripheral effect Effects 0.000 description 3
- 239000012071 phase Substances 0.000 description 3
- 238000007789 sealing Methods 0.000 description 3
- 229910001220 stainless steel Inorganic materials 0.000 description 3
- 239000010935 stainless steel Substances 0.000 description 3
- 239000007858 starting material Substances 0.000 description 3
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 2
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- KCXVZYZYPLLWCC-UHFFFAOYSA-N EDTA Chemical compound OC(=O)CN(CC(O)=O)CCN(CC(O)=O)CC(O)=O KCXVZYZYPLLWCC-UHFFFAOYSA-N 0.000 description 2
- 229910004074 SiF6 Inorganic materials 0.000 description 2
- FAPWRFPIFSIZLT-UHFFFAOYSA-M Sodium chloride Chemical compound [Na+].[Cl-] FAPWRFPIFSIZLT-UHFFFAOYSA-M 0.000 description 2
- 239000002019 doping agent Substances 0.000 description 2
- 238000001914 filtration Methods 0.000 description 2
- 150000002221 fluorine Chemical class 0.000 description 2
- 230000005484 gravity Effects 0.000 description 2
- 238000009413 insulation Methods 0.000 description 2
- 229910052748 manganese Inorganic materials 0.000 description 2
- 238000004949 mass spectrometry Methods 0.000 description 2
- 239000002245 particle Substances 0.000 description 2
- 238000001637 plasma atomic emission spectroscopy Methods 0.000 description 2
- 238000010944 pre-mature reactiony Methods 0.000 description 2
- 239000000377 silicon dioxide Substances 0.000 description 2
- 239000007790 solid phase Substances 0.000 description 2
- 238000007711 solidification Methods 0.000 description 2
- 230000008023 solidification Effects 0.000 description 2
- 238000003860 storage Methods 0.000 description 2
- 239000006228 supernatant Substances 0.000 description 2
- XJDNKRIXUMDJCW-UHFFFAOYSA-J titanium tetrachloride Chemical class Cl[Ti](Cl)(Cl)Cl XJDNKRIXUMDJCW-UHFFFAOYSA-J 0.000 description 2
- 239000012498 ultrapure water Substances 0.000 description 2
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 description 1
- 206010010774 Constipation Diseases 0.000 description 1
- 241000198620 Infundibulicybe gibba Species 0.000 description 1
- 229910020440 K2SiF6 Inorganic materials 0.000 description 1
- 240000007594 Oryza sativa Species 0.000 description 1
- 235000007164 Oryza sativa Nutrition 0.000 description 1
- 238000002441 X-ray diffraction Methods 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 229910021529 ammonia Inorganic materials 0.000 description 1
- 238000004458 analytical method Methods 0.000 description 1
- 229910052787 antimony Inorganic materials 0.000 description 1
- 239000002585 base Substances 0.000 description 1
- 230000033228 biological regulation Effects 0.000 description 1
- 230000005587 bubbling Effects 0.000 description 1
- 238000005266 casting Methods 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 238000001514 detection method Methods 0.000 description 1
- 230000001627 detrimental effect Effects 0.000 description 1
- 238000009792 diffusion process Methods 0.000 description 1
- 239000012153 distilled water Substances 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 230000008020 evaporation Effects 0.000 description 1
- 238000000605 extraction Methods 0.000 description 1
- 230000002349 favourable effect Effects 0.000 description 1
- 239000012530 fluid Substances 0.000 description 1
- 150000004673 fluoride salts Chemical class 0.000 description 1
- 238000004868 gas analysis Methods 0.000 description 1
- 150000002367 halogens Chemical class 0.000 description 1
- 230000006698 induction Effects 0.000 description 1
- 230000003993 interaction Effects 0.000 description 1
- 238000011835 investigation Methods 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 230000000155 isotopic effect Effects 0.000 description 1
- 230000007246 mechanism Effects 0.000 description 1
- 230000005012 migration Effects 0.000 description 1
- 238000013508 migration Methods 0.000 description 1
- 239000003595 mist Substances 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 229910052700 potassium Inorganic materials 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 230000005855 radiation Effects 0.000 description 1
- 230000035484 reaction time Effects 0.000 description 1
- 230000001105 regulatory effect Effects 0.000 description 1
- 235000009566 rice Nutrition 0.000 description 1
- 150000004760 silicates Chemical class 0.000 description 1
- 235000012239 silicon dioxide Nutrition 0.000 description 1
- 239000002002 slurry Substances 0.000 description 1
- 239000000779 smoke Substances 0.000 description 1
- 239000011780 sodium chloride Substances 0.000 description 1
- 159000000000 sodium salts Chemical class 0.000 description 1
- 239000012265 solid product Substances 0.000 description 1
- 238000010183 spectrum analysis Methods 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- 239000010414 supernatant solution Substances 0.000 description 1
- 238000012360 testing method Methods 0.000 description 1
- ATVLVRVBCRICNU-UHFFFAOYSA-N trifluorosilicon Chemical compound F[Si](F)F ATVLVRVBCRICNU-UHFFFAOYSA-N 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
- 238000009489 vacuum treatment Methods 0.000 description 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J19/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
- B01J19/26—Nozzle-type reactors, i.e. the distribution of the initial reactants within the reactor is effected by their introduction or injection through nozzles
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J4/00—Feed or outlet devices; Feed or outlet control devices
- B01J4/001—Feed or outlet devices as such, e.g. feeding tubes
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B33/00—Silicon; Compounds thereof
- C01B33/02—Silicon
- C01B33/021—Preparation
- C01B33/027—Preparation by decomposition or reduction of gaseous or vaporised silicon compounds other than silica or silica-containing material
- C01B33/033—Preparation by decomposition or reduction of gaseous or vaporised silicon compounds other than silica or silica-containing material by reduction of silicon halides or halosilanes with a metal or a metallic alloy as the only reducing agents
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J2219/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
- B01J2219/00049—Controlling or regulating processes
- B01J2219/00051—Controlling the temperature
- B01J2219/00074—Controlling the temperature by indirect heating or cooling employing heat exchange fluids
- B01J2219/00087—Controlling the temperature by indirect heating or cooling employing heat exchange fluids with heat exchange elements outside the reactor
- B01J2219/0009—Coils
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J2219/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
- B01J2219/00049—Controlling or regulating processes
- B01J2219/00051—Controlling the temperature
- B01J2219/00132—Controlling the temperature using electric heating or cooling elements
- B01J2219/00135—Electric resistance heaters
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J2219/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
- B01J2219/00049—Controlling or regulating processes
- B01J2219/00051—Controlling the temperature
- B01J2219/0015—Controlling the temperature by thermal insulation means
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J2219/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
- B01J2219/00049—Controlling or regulating processes
- B01J2219/00162—Controlling or regulating processes controlling the pressure
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J2219/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
- B01J2219/00049—Controlling or regulating processes
- B01J2219/00164—Controlling or regulating processes controlling the flow
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J2219/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
- B01J2219/00049—Controlling or regulating processes
- B01J2219/00245—Avoiding undesirable reactions or side-effects
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Inorganic Chemistry (AREA)
- Silicon Compounds (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US06/453,337 US4584181A (en) | 1982-12-27 | 1982-12-27 | Process and apparatus for obtaining silicon from fluosilicic acid |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CH661918A5 true CH661918A5 (de) | 1987-08-31 |
Family
ID=23800171
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CH3707/84A CH661918A5 (de) | 1982-12-27 | 1983-11-07 | Verfahren und einrichtung zur erzeugung von silizium aus siliciumtetrafluorid. |
Country Status (12)
| Country | Link |
|---|---|
| US (1) | US4584181A (cg-RX-API-DMAC7.html) |
| EP (1) | EP0151569B1 (cg-RX-API-DMAC7.html) |
| CA (1) | CA1221816A (cg-RX-API-DMAC7.html) |
| CH (1) | CH661918A5 (cg-RX-API-DMAC7.html) |
| DE (1) | DE3390358T1 (cg-RX-API-DMAC7.html) |
| ES (1) | ES528413A0 (cg-RX-API-DMAC7.html) |
| GB (1) | GB2142918B (cg-RX-API-DMAC7.html) |
| GR (1) | GR78764B (cg-RX-API-DMAC7.html) |
| IT (1) | IT1172395B (cg-RX-API-DMAC7.html) |
| NL (1) | NL8320373A (cg-RX-API-DMAC7.html) |
| PT (1) | PT77852B (cg-RX-API-DMAC7.html) |
| WO (1) | WO1984002514A1 (cg-RX-API-DMAC7.html) |
Families Citing this family (15)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0166481A3 (en) * | 1984-06-26 | 1988-11-23 | AGIP S.p.A. | Process for obtaining silicon or transition metals from their halides |
| FI72952C (fi) * | 1985-03-11 | 1987-08-10 | Kemira Oy | Foerfarande foer framstaellning av kisel. |
| US4655827A (en) * | 1985-07-24 | 1987-04-07 | Angel Sanjurjo | Process for the reduction of fluorides of silicon, titanium, zirconium or uranium |
| US5925443A (en) * | 1991-09-10 | 1999-07-20 | International Business Machines Corporation | Copper-based paste containing copper aluminate for microstructural and shrinkage control of copper-filled vias |
| RU2131843C1 (ru) * | 1998-03-30 | 1999-06-20 | Институт геохимии им.Виноградова А.П. СО РАН | Способ получения кремния высокой чистоты |
| ATE334938T1 (de) * | 2002-01-18 | 2006-08-15 | Wacker Chemie Ag | Verfahren zur herstellung von organohalogensilanen aus amorphem silizium |
| JP5311930B2 (ja) * | 2007-08-29 | 2013-10-09 | 住友化学株式会社 | シリコンの製造方法 |
| US8709370B2 (en) * | 2008-08-28 | 2014-04-29 | Sri International | Method and system for producing fluoride gas and fluorine-doped glass or ceramics |
| EP2373577B1 (en) * | 2008-12-17 | 2014-09-10 | MEMC Electronic Materials, Inc. | Processes and systems for producing silicon tetrafluoride from fluorosilicates in a fluidized bed reactor |
| US8609057B2 (en) | 2010-06-07 | 2013-12-17 | Sri International | Method for separation of components from a reaction mixture via a concentrated acid |
| US9101896B2 (en) | 2010-07-09 | 2015-08-11 | Sri International | High temperature decomposition of complex precursor salts in a molten salt |
| DE102010045260A1 (de) | 2010-09-14 | 2012-03-15 | Spawnt Private S.À.R.L. | Verfahren zur Herstellung von fluorierten Polysilanen |
| US8701444B2 (en) * | 2012-06-22 | 2014-04-22 | Owens-Brockway Glass Container Inc. | Plunger and parison mold assembly for a narrow-neck press-and-blow wine bottle |
| CN103395785B (zh) * | 2013-07-18 | 2014-12-31 | 贵州省产品质量监督检验院 | 一种钠还原氟硅酸钠制备多晶硅的方法 |
| RU2690070C1 (ru) * | 2018-07-04 | 2019-05-30 | Общество с ограниченной ответственностью "Научно-производственное предприятие "ТЕХНОПРИБОР" (ООО "НПП "ТЕХНОПРИБОР") | Устройство дозирования подщелачивающего реагента анализатора натрия |
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| US524173A (en) * | 1894-08-07 | Variable-resistance medium for telephones | ||
| US1518872A (en) * | 1920-04-16 | 1924-12-09 | Pacz Aladar | Process of producing fluorides |
| US2172969A (en) * | 1936-09-28 | 1939-09-12 | Eringer Josef | Process for obtaining silicon from its compounds |
| US2828201A (en) * | 1950-10-13 | 1958-03-25 | Nat Res Corp | Method for producing titanium and zirconium |
| US2826491A (en) * | 1951-09-10 | 1958-03-11 | Nat Res Corp | Method of producing refractory metals |
| GB821817A (en) * | 1954-11-16 | 1959-10-14 | Peter Spence & Sons Ltd | Continuous process for the manufacture of titanium metal |
| US2840588A (en) * | 1956-03-22 | 1958-06-24 | Du Pont | Process for the preparation of difluorosilylene and the polymers thereof |
| US2816828A (en) * | 1956-06-20 | 1957-12-17 | Nat Res Corp | Method of producing refractory metals |
| US2909411A (en) * | 1957-01-15 | 1959-10-20 | Du Pont | Production of silicon |
| US3041145A (en) * | 1957-07-15 | 1962-06-26 | Robert S Aries | Production of pure silicon |
| US2941867A (en) * | 1957-10-14 | 1960-06-21 | Du Pont | Reduction of metal halides |
| US3012865A (en) * | 1957-11-25 | 1961-12-12 | Du Pont | Silicon purification process |
| US3847596A (en) * | 1968-02-28 | 1974-11-12 | Halomet Ag | Process of obtaining metals from metal halides |
| US3966460A (en) * | 1974-09-06 | 1976-06-29 | Amax Specialty Metal Corporation | Reduction of metal halides |
| US4070444A (en) * | 1976-07-21 | 1978-01-24 | Motorola Inc. | Low cost, high volume silicon purification process |
| US4102764A (en) * | 1976-12-29 | 1978-07-25 | Westinghouse Electric Corp. | High purity silicon production by arc heater reduction of silicon intermediates |
| US4102765A (en) * | 1977-01-06 | 1978-07-25 | Westinghouse Electric Corp. | Arc heater production of silicon involving alkali or alkaline-earth metals |
| US4102985A (en) * | 1977-01-06 | 1978-07-25 | Westinghouse Electric Corp. | Arc heater production of silicon involving a hydrogen reduction |
| US4102766A (en) * | 1977-04-14 | 1978-07-25 | Westinghouse Electric Corp. | Process for doping high purity silicon in an arc heater |
| US4102767A (en) * | 1977-04-14 | 1978-07-25 | Westinghouse Electric Corp. | Arc heater method for the production of single crystal silicon |
| US4272488A (en) * | 1977-05-25 | 1981-06-09 | John S. Pennish | Apparatus for producing and casting liquid silicon |
| FR2401696A1 (fr) * | 1977-08-31 | 1979-03-30 | Ugine Kuhlmann | Methode de depot de silicium cristallin en films minces sur substrats graphites |
| US4162291A (en) * | 1977-10-12 | 1979-07-24 | Westinghouse Electric Corp. | Liquid silicon casting control mechanism |
| US4138509A (en) * | 1977-12-23 | 1979-02-06 | Motorola, Inc. | Silicon purification process |
| US4169129A (en) * | 1978-02-24 | 1979-09-25 | Nasa | Sodium storage and injection system |
| US4188368A (en) * | 1978-03-29 | 1980-02-12 | Nasa | Method of producing silicon |
| SE415558B (sv) * | 1978-06-02 | 1980-10-13 | Kema Nord Ab | Forfarande for framstellning av kisel eller fenokisel |
| DE2903061A1 (de) * | 1979-01-26 | 1980-08-07 | Heliotronic Gmbh | Verfahren zur herstellung grosskristalliner vorzugsorientierter siliciumfolien |
| US4298587A (en) * | 1980-10-28 | 1981-11-03 | Atlantic Richfield Company | Silicon purification |
| US4388286A (en) * | 1982-01-27 | 1983-06-14 | Atlantic Richfield Company | Silicon purification |
-
1982
- 1982-12-27 US US06/453,337 patent/US4584181A/en not_active Expired - Fee Related
-
1983
- 1983-11-07 GB GB08417389A patent/GB2142918B/en not_active Expired
- 1983-11-07 DE DE19833390358 patent/DE3390358T1/de not_active Withdrawn
- 1983-11-07 NL NL8320373A patent/NL8320373A/nl unknown
- 1983-11-07 WO PCT/US1983/001738 patent/WO1984002514A1/en not_active Ceased
- 1983-11-07 CH CH3707/84A patent/CH661918A5/de not_active IP Right Cessation
- 1983-11-07 EP EP83903866A patent/EP0151569B1/en not_active Expired
- 1983-12-02 GR GR73144A patent/GR78764B/el unknown
- 1983-12-07 CA CA000442780A patent/CA1221816A/en not_active Expired
- 1983-12-19 PT PT77852A patent/PT77852B/pt not_active IP Right Cessation
- 1983-12-26 ES ES528413A patent/ES528413A0/es active Granted
- 1983-12-27 IT IT49590/83A patent/IT1172395B/it active
Also Published As
| Publication number | Publication date |
|---|---|
| ES8602534A1 (es) | 1985-11-16 |
| EP0151569A4 (en) | 1986-07-10 |
| ES528413A0 (es) | 1985-11-16 |
| GB8417389D0 (en) | 1984-08-08 |
| EP0151569A1 (en) | 1985-08-21 |
| DE3390358T1 (de) | 1985-01-24 |
| IT1172395B (it) | 1987-06-18 |
| PT77852B (en) | 1986-04-16 |
| WO1984002514A1 (en) | 1984-07-05 |
| GB2142918B (en) | 1987-02-25 |
| NL8320373A (nl) | 1984-11-01 |
| GR78764B (cg-RX-API-DMAC7.html) | 1984-10-02 |
| CA1221816A (en) | 1987-05-19 |
| PT77852A (en) | 1984-01-01 |
| US4584181A (en) | 1986-04-22 |
| EP0151569B1 (en) | 1989-07-19 |
| GB2142918A (en) | 1985-01-30 |
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