CH647270A5 - Verfahren zur ergaenzung eines bades fuer die elektrolytische plattierung mit einer palladium/nickel-legierung mit palladium. - Google Patents
Verfahren zur ergaenzung eines bades fuer die elektrolytische plattierung mit einer palladium/nickel-legierung mit palladium. Download PDFInfo
- Publication number
- CH647270A5 CH647270A5 CH6108/81A CH610881A CH647270A5 CH 647270 A5 CH647270 A5 CH 647270A5 CH 6108/81 A CH6108/81 A CH 6108/81A CH 610881 A CH610881 A CH 610881A CH 647270 A5 CH647270 A5 CH 647270A5
- Authority
- CH
- Switzerland
- Prior art keywords
- palladium
- plating
- bath
- plating bath
- formula
- Prior art date
Links
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 title description 91
- 229910052763 palladium Inorganic materials 0.000 title description 34
- 238000000034 method Methods 0.000 title description 12
- 238000009713 electroplating Methods 0.000 title description 7
- 229910000990 Ni alloy Inorganic materials 0.000 title description 5
- 229910001252 Pd alloy Inorganic materials 0.000 title description 5
- 230000001502 supplementing effect Effects 0.000 title description 3
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 58
- 238000007747 plating Methods 0.000 description 54
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 18
- 229910000069 nitrogen hydride Inorganic materials 0.000 description 14
- 150000003839 salts Chemical class 0.000 description 14
- VHUUQVKOLVNVRT-UHFFFAOYSA-N Ammonium hydroxide Chemical compound [NH4+].[OH-] VHUUQVKOLVNVRT-UHFFFAOYSA-N 0.000 description 13
- 239000000243 solution Substances 0.000 description 13
- 229910052759 nickel Inorganic materials 0.000 description 10
- 239000013589 supplement Substances 0.000 description 10
- 229910021529 ammonia Inorganic materials 0.000 description 9
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 7
- 229910045601 alloy Inorganic materials 0.000 description 6
- 239000000956 alloy Substances 0.000 description 6
- 150000002940 palladium Chemical class 0.000 description 5
- PIBWKRNGBLPSSY-UHFFFAOYSA-L palladium(II) chloride Chemical compound Cl[Pd]Cl PIBWKRNGBLPSSY-UHFFFAOYSA-L 0.000 description 5
- LGQLOGILCSXPEA-UHFFFAOYSA-L nickel sulfate Chemical compound [Ni+2].[O-]S([O-])(=O)=O LGQLOGILCSXPEA-UHFFFAOYSA-L 0.000 description 4
- 229910000363 nickel(II) sulfate Inorganic materials 0.000 description 4
- 230000007797 corrosion Effects 0.000 description 3
- 238000005260 corrosion Methods 0.000 description 3
- 238000000151 deposition Methods 0.000 description 3
- 230000008021 deposition Effects 0.000 description 3
- 239000000126 substance Substances 0.000 description 3
- 229910001369 Brass Inorganic materials 0.000 description 2
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 2
- 230000005856 abnormality Effects 0.000 description 2
- BFNBIHQBYMNNAN-UHFFFAOYSA-N ammonium sulfate Chemical compound N.N.OS(O)(=O)=O BFNBIHQBYMNNAN-UHFFFAOYSA-N 0.000 description 2
- 229910052921 ammonium sulfate Inorganic materials 0.000 description 2
- 235000011130 ammonium sulphate Nutrition 0.000 description 2
- 239000007864 aqueous solution Substances 0.000 description 2
- 239000010951 brass Substances 0.000 description 2
- 238000001704 evaporation Methods 0.000 description 2
- 239000002245 particle Substances 0.000 description 2
- QGZKDVFQNNGYKY-UHFFFAOYSA-O Ammonium Chemical compound [NH4+] QGZKDVFQNNGYKY-UHFFFAOYSA-O 0.000 description 1
- ZLMJMSJWJFRBEC-UHFFFAOYSA-N Potassium Chemical compound [K] ZLMJMSJWJFRBEC-UHFFFAOYSA-N 0.000 description 1
- 239000003513 alkali Substances 0.000 description 1
- 238000004458 analytical method Methods 0.000 description 1
- 125000003118 aryl group Chemical group 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 238000005282 brightening Methods 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 238000004090 dissolution Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 230000005611 electricity Effects 0.000 description 1
- 238000004070 electrodeposition Methods 0.000 description 1
- 238000005868 electrolysis reaction Methods 0.000 description 1
- 230000008020 evaporation Effects 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 150000007522 mineralic acids Chemical class 0.000 description 1
- PSZYNBSKGUBXEH-UHFFFAOYSA-N naphthalene-1-sulfonic acid Chemical compound C1=CC=C2C(S(=O)(=O)O)=CC=CC2=C1 PSZYNBSKGUBXEH-UHFFFAOYSA-N 0.000 description 1
- 150000007524 organic acids Chemical class 0.000 description 1
- MUJIDPITZJWBSW-UHFFFAOYSA-N palladium(2+) Chemical compound [Pd+2] MUJIDPITZJWBSW-UHFFFAOYSA-N 0.000 description 1
- 229910052700 potassium Inorganic materials 0.000 description 1
- 239000011591 potassium Substances 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 239000010970 precious metal Substances 0.000 description 1
- 238000004445 quantitative analysis Methods 0.000 description 1
- 239000012047 saturated solution Substances 0.000 description 1
- 230000002269 spontaneous effect Effects 0.000 description 1
- 238000003756 stirring Methods 0.000 description 1
- 239000011550 stock solution Substances 0.000 description 1
- NVBFHJWHLNUMCV-UHFFFAOYSA-N sulfamide Chemical compound NS(N)(=O)=O NVBFHJWHLNUMCV-UHFFFAOYSA-N 0.000 description 1
- NJPKYOIXTSGVAN-UHFFFAOYSA-K trisodium;naphthalene-1,3,6-trisulfonate Chemical compound [Na+].[Na+].[Na+].[O-]S(=O)(=O)C1=CC(S([O-])(=O)=O)=CC2=CC(S(=O)(=O)[O-])=CC=C21 NJPKYOIXTSGVAN-UHFFFAOYSA-K 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/02—Electroplating: Baths therefor from solutions
- C25D3/56—Electroplating: Baths therefor from solutions of alloys
- C25D3/562—Electroplating: Baths therefor from solutions of alloys containing more than 50% by weight of iron or nickel or cobalt
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D21/00—Processes for servicing or operating cells for electrolytic coating
- C25D21/16—Regeneration of process solutions
- C25D21/18—Regeneration of process solutions of electrolytes
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/02—Electroplating: Baths therefor from solutions
- C25D3/56—Electroplating: Baths therefor from solutions of alloys
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/02—Electroplating: Baths therefor from solutions
- C25D3/56—Electroplating: Baths therefor from solutions of alloys
- C25D3/567—Electroplating: Baths therefor from solutions of alloys containing more than 50% by weight of platinum group metals
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Electroplating And Plating Baths Therefor (AREA)
- Water Treatment By Electricity Or Magnetism (AREA)
- Electrolytic Production Of Metals (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP55135623A JPS5760090A (en) | 1980-09-29 | 1980-09-29 | Supplying method for palladium to palladium-nickel alloy plating solution |
Publications (1)
Publication Number | Publication Date |
---|---|
CH647270A5 true CH647270A5 (de) | 1985-01-15 |
Family
ID=15156128
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CH6108/81A CH647270A5 (de) | 1980-09-29 | 1981-09-22 | Verfahren zur ergaenzung eines bades fuer die elektrolytische plattierung mit einer palladium/nickel-legierung mit palladium. |
Country Status (5)
Country | Link |
---|---|
JP (1) | JPS5760090A (it) |
CH (1) | CH647270A5 (it) |
DE (1) | DE3135597C2 (it) |
FR (1) | FR2491093B1 (it) |
IT (1) | IT1171457B (it) |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS60248892A (ja) * | 1984-05-24 | 1985-12-09 | Electroplating Eng Of Japan Co | 高純度パラジウム・ニッケル合金メッキ液及び方法 |
JPS6192731A (ja) * | 1984-10-12 | 1986-05-10 | Masanobu Nakamura | 溝付き回転体の製造方法 |
JPH02133595A (ja) * | 1988-11-15 | 1990-05-22 | Fujitsu Ltd | パラジウムめっき方法 |
Family Cites Families (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB381931A (en) * | 1931-07-11 | 1932-10-11 | Mond Nickel Co Ltd | Improvements relating to electro-plating and the electrodeposition of metals |
JPS4733176B1 (it) * | 1967-01-11 | 1972-08-23 | ||
CH572989A5 (it) * | 1973-04-27 | 1976-02-27 | Oxy Metal Industries Corp |
-
1980
- 1980-09-29 JP JP55135623A patent/JPS5760090A/ja active Pending
-
1981
- 1981-08-12 IT IT49097/81A patent/IT1171457B/it active
- 1981-09-09 DE DE3135597A patent/DE3135597C2/de not_active Expired
- 1981-09-16 FR FR8117487A patent/FR2491093B1/fr not_active Expired
- 1981-09-22 CH CH6108/81A patent/CH647270A5/de not_active IP Right Cessation
Also Published As
Publication number | Publication date |
---|---|
DE3135597C2 (de) | 1986-02-13 |
DE3135597A1 (de) | 1982-05-13 |
FR2491093B1 (fr) | 1985-11-15 |
IT8149097A0 (it) | 1981-08-12 |
IT1171457B (it) | 1987-06-10 |
JPS5760090A (en) | 1982-04-10 |
FR2491093A1 (fr) | 1982-04-02 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
PL | Patent ceased |