CH619739A5 - Process and appliance for making a non-conductive porous grinding body electroconductive - Google Patents
Process and appliance for making a non-conductive porous grinding body electroconductive Download PDFInfo
- Publication number
- CH619739A5 CH619739A5 CH1302175A CH1302175A CH619739A5 CH 619739 A5 CH619739 A5 CH 619739A5 CH 1302175 A CH1302175 A CH 1302175A CH 1302175 A CH1302175 A CH 1302175A CH 619739 A5 CH619739 A5 CH 619739A5
- Authority
- CH
- Switzerland
- Prior art keywords
- solution
- metal
- grinding
- grinding wheel
- tool
- Prior art date
Links
- 238000000227 grinding Methods 0.000 title claims abstract description 66
- 238000000034 method Methods 0.000 title claims description 20
- 230000008569 process Effects 0.000 title description 2
- 238000007747 plating Methods 0.000 claims abstract description 54
- 229910052751 metal Inorganic materials 0.000 claims abstract description 35
- 239000002184 metal Substances 0.000 claims abstract description 35
- 239000011148 porous material Substances 0.000 claims abstract description 20
- 238000003860 storage Methods 0.000 claims abstract description 5
- 239000000126 substance Substances 0.000 claims description 34
- 238000003754 machining Methods 0.000 claims description 12
- 239000003638 chemical reducing agent Substances 0.000 claims description 10
- 150000003839 salts Chemical class 0.000 claims description 8
- 238000005516 engineering process Methods 0.000 claims description 7
- 238000004519 manufacturing process Methods 0.000 claims description 7
- 239000011248 coating agent Substances 0.000 claims description 6
- 238000000576 coating method Methods 0.000 claims description 6
- 230000001603 reducing effect Effects 0.000 claims description 6
- 238000006722 reduction reaction Methods 0.000 claims description 6
- 238000002156 mixing Methods 0.000 claims description 5
- 238000004062 sedimentation Methods 0.000 claims description 5
- 239000000853 adhesive Substances 0.000 claims description 4
- 230000001070 adhesive effect Effects 0.000 claims description 4
- 230000009467 reduction Effects 0.000 claims description 4
- 239000003082 abrasive agent Substances 0.000 claims description 3
- 229910003460 diamond Inorganic materials 0.000 claims description 3
- 239000010432 diamond Substances 0.000 claims description 3
- 239000000463 material Substances 0.000 claims description 3
- 238000002679 ablation Methods 0.000 claims description 2
- 238000005299 abrasion Methods 0.000 claims description 2
- 230000009471 action Effects 0.000 claims description 2
- 239000003795 chemical substances by application Substances 0.000 claims description 2
- 238000004090 dissolution Methods 0.000 claims description 2
- 239000003792 electrolyte Substances 0.000 claims description 2
- 238000012423 maintenance Methods 0.000 claims description 2
- 238000001556 precipitation Methods 0.000 claims description 2
- 238000011084 recovery Methods 0.000 claims description 2
- 239000000758 substrate Substances 0.000 claims description 2
- 239000012811 non-conductive material Substances 0.000 abstract 1
- WSFSSNUMVMOOMR-UHFFFAOYSA-N Formaldehyde Chemical compound O=C WSFSSNUMVMOOMR-UHFFFAOYSA-N 0.000 description 13
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 9
- 238000005470 impregnation Methods 0.000 description 8
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 6
- 229910052802 copper Inorganic materials 0.000 description 6
- 239000010949 copper Substances 0.000 description 6
- 239000007788 liquid Substances 0.000 description 6
- LJCNRYVRMXRIQR-OLXYHTOASA-L potassium sodium L-tartrate Chemical compound [Na+].[K+].[O-]C(=O)[C@H](O)[C@@H](O)C([O-])=O LJCNRYVRMXRIQR-OLXYHTOASA-L 0.000 description 4
- 238000004140 cleaning Methods 0.000 description 3
- 229910000365 copper sulfate Inorganic materials 0.000 description 3
- ARUVKPQLZAKDPS-UHFFFAOYSA-L copper(II) sulfate Chemical compound [Cu+2].[O-][S+2]([O-])([O-])[O-] ARUVKPQLZAKDPS-UHFFFAOYSA-L 0.000 description 3
- 238000006073 displacement reaction Methods 0.000 description 3
- 229940074439 potassium sodium tartrate Drugs 0.000 description 3
- 238000002203 pretreatment Methods 0.000 description 3
- 235000011006 sodium potassium tartrate Nutrition 0.000 description 3
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 description 2
- WCUXLLCKKVVCTQ-UHFFFAOYSA-M Potassium chloride Chemical compound [Cl-].[K+] WCUXLLCKKVVCTQ-UHFFFAOYSA-M 0.000 description 2
- XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 description 2
- 235000019256 formaldehyde Nutrition 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- 230000001235 sensitizing effect Effects 0.000 description 2
- 238000005406 washing Methods 0.000 description 2
- 229910052580 B4C Inorganic materials 0.000 description 1
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
- BPQQTUXANYXVAA-UHFFFAOYSA-N Orthosilicate Chemical compound [O-][Si]([O-])([O-])[O-] BPQQTUXANYXVAA-UHFFFAOYSA-N 0.000 description 1
- 206010070834 Sensitisation Diseases 0.000 description 1
- 229920001800 Shellac Polymers 0.000 description 1
- 229910021626 Tin(II) chloride Inorganic materials 0.000 description 1
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 1
- 230000003213 activating effect Effects 0.000 description 1
- 239000012190 activator Substances 0.000 description 1
- 239000011230 binding agent Substances 0.000 description 1
- INAHAJYZKVIDIZ-UHFFFAOYSA-N boron carbide Chemical compound B12B3B4C32B41 INAHAJYZKVIDIZ-UHFFFAOYSA-N 0.000 description 1
- 239000003054 catalyst Substances 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 239000007795 chemical reaction product Substances 0.000 description 1
- 239000000470 constituent Substances 0.000 description 1
- RCJVRSBWZCNNQT-UHFFFAOYSA-N dichloridooxygen Chemical compound ClOCl RCJVRSBWZCNNQT-UHFFFAOYSA-N 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 238000005868 electrolysis reaction Methods 0.000 description 1
- 238000003912 environmental pollution Methods 0.000 description 1
- 230000005284 excitation Effects 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 239000011261 inert gas Substances 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 description 1
- RVTZCBVAJQQJTK-UHFFFAOYSA-N oxygen(2-);zirconium(4+) Chemical compound [O-2].[O-2].[Zr+4] RVTZCBVAJQQJTK-UHFFFAOYSA-N 0.000 description 1
- 229910052763 palladium Inorganic materials 0.000 description 1
- PIBWKRNGBLPSSY-UHFFFAOYSA-L palladium(II) chloride Chemical compound Cl[Pd]Cl PIBWKRNGBLPSSY-UHFFFAOYSA-L 0.000 description 1
- 230000000737 periodic effect Effects 0.000 description 1
- AVTYONGGKAJVTE-OLXYHTOASA-L potassium L-tartrate Chemical compound [K+].[K+].[O-]C(=O)[C@H](O)[C@@H](O)C([O-])=O AVTYONGGKAJVTE-OLXYHTOASA-L 0.000 description 1
- 239000001103 potassium chloride Substances 0.000 description 1
- 235000011164 potassium chloride Nutrition 0.000 description 1
- 239000001472 potassium tartrate Substances 0.000 description 1
- 229940111695 potassium tartrate Drugs 0.000 description 1
- 235000011005 potassium tartrates Nutrition 0.000 description 1
- 239000002244 precipitate Substances 0.000 description 1
- 239000000047 product Substances 0.000 description 1
- 230000008313 sensitization Effects 0.000 description 1
- 239000004208 shellac Substances 0.000 description 1
- ZLGIYFNHBLSMPS-ATJNOEHPSA-N shellac Chemical compound OCCCCCC(O)C(O)CCCCCCCC(O)=O.C1C23[C@H](C(O)=O)CCC2[C@](C)(CO)[C@@H]1C(C(O)=O)=C[C@@H]3O ZLGIYFNHBLSMPS-ATJNOEHPSA-N 0.000 description 1
- 229940113147 shellac Drugs 0.000 description 1
- 235000013874 shellac Nutrition 0.000 description 1
- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 description 1
- 229910010271 silicon carbide Inorganic materials 0.000 description 1
- 235000011150 stannous chloride Nutrition 0.000 description 1
- -1 tin (II) ions Chemical class 0.000 description 1
- AXZWODMDQAVCJE-UHFFFAOYSA-L tin(II) chloride (anhydrous) Chemical compound [Cl-].[Cl-].[Sn+2] AXZWODMDQAVCJE-UHFFFAOYSA-L 0.000 description 1
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 1
- 239000011787 zinc oxide Substances 0.000 description 1
- 229910001928 zirconium oxide Inorganic materials 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
- C23C18/1601—Process or apparatus
- C23C18/1633—Process of electroless plating
- C23C18/1646—Characteristics of the product obtained
- C23C18/165—Multilayered product
- C23C18/1651—Two or more layers only obtained by electroless plating
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
- C23C18/1601—Process or apparatus
- C23C18/1633—Process of electroless plating
- C23C18/1635—Composition of the substrate
- C23C18/1644—Composition of the substrate porous substrates
Landscapes
- Chemical & Material Sciences (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Polishing Bodies And Polishing Tools (AREA)
- Chemically Coating (AREA)
- Electroplating Methods And Accessories (AREA)
- Mechanical Treatment Of Semiconductor (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP49122596A JPS5819745B2 (ja) | 1974-10-25 | 1974-10-25 | デンカイケンサクトイシノ ムデンカイメツキソウチ |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CH619739A5 true CH619739A5 (en) | 1980-10-15 |
Family
ID=14839833
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CH1302175A CH619739A5 (en) | 1974-10-25 | 1975-10-07 | Process and appliance for making a non-conductive porous grinding body electroconductive |
Country Status (8)
| Country | Link |
|---|---|
| JP (1) | JPS5819745B2 (enrdf_load_stackoverflow) |
| CH (1) | CH619739A5 (enrdf_load_stackoverflow) |
| CS (1) | CS189722B2 (enrdf_load_stackoverflow) |
| DD (1) | DD121609A5 (enrdf_load_stackoverflow) |
| DK (1) | DK443275A (enrdf_load_stackoverflow) |
| NL (1) | NL169092C (enrdf_load_stackoverflow) |
| NO (1) | NO145442C (enrdf_load_stackoverflow) |
| RO (1) | RO71718A (enrdf_load_stackoverflow) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5837255A (ja) * | 1981-08-26 | 1983-03-04 | 住金鋼材工業株式会社 | 合成床板 |
| JPS6278335A (ja) * | 1985-09-27 | 1987-04-10 | バトラ− マニユフアクチユアリング コンパニ | 壁パネル構造 |
Family Cites Families (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS542718B2 (enrdf_load_stackoverflow) * | 1971-08-27 | 1979-02-10 | ||
| JPS59347B2 (ja) * | 1974-09-04 | 1984-01-06 | カブシキガイシヤ イノウエジヤパツクスケンキユウジヨ | デンカイケンサクトイシノセイサクホウホウ オヨビ ソノソウチ |
-
1974
- 1974-10-25 JP JP49122596A patent/JPS5819745B2/ja not_active Expired
-
1975
- 1975-09-26 NO NO753270A patent/NO145442C/no unknown
- 1975-10-01 DK DK443275A patent/DK443275A/da not_active Application Discontinuation
- 1975-10-06 CS CS756746A patent/CS189722B2/cs unknown
- 1975-10-07 CH CH1302175A patent/CH619739A5/de not_active IP Right Cessation
- 1975-10-22 NL NLAANVRAGE7512355,A patent/NL169092C/xx not_active IP Right Cessation
- 1975-10-23 DD DD189014A patent/DD121609A5/xx unknown
- 1975-10-24 RO RO7583719A patent/RO71718A/ro unknown
Also Published As
| Publication number | Publication date |
|---|---|
| NO145442B (no) | 1981-12-14 |
| JPS5819745B2 (ja) | 1983-04-19 |
| DK443275A (da) | 1976-04-26 |
| CS189722B2 (en) | 1979-04-30 |
| NO753270L (enrdf_load_stackoverflow) | 1976-04-27 |
| NO145442C (no) | 1982-03-24 |
| NL7512355A (nl) | 1976-04-27 |
| NL169092C (nl) | 1982-06-01 |
| NL169092B (nl) | 1982-01-04 |
| DD121609A5 (enrdf_load_stackoverflow) | 1976-08-12 |
| JPS5149129A (enrdf_load_stackoverflow) | 1976-04-28 |
| RO71718A (ro) | 1982-02-26 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| EP0598249B1 (de) | Verfahren und Vorrichtung zum Entsalzen wässriger Lösungen mittels Ionenaustauschermassen | |
| DE3049982C2 (enrdf_load_stackoverflow) | ||
| DE2256286A1 (de) | Elektrodialyse-verfahren und -geraet | |
| DE1949129A1 (de) | Anordnung zum elektrolytischen Entfernen von Verunreinigungen aus waessrigen Fluessigkeiten | |
| DE60303393T2 (de) | Vorrichtung und verfahren zur regeneration eines bads zur stromlosen metallabscheidung | |
| EP0445120A1 (de) | Vorrichtung zum auf- und/oder abtragen von überzügen bei werkstücken. | |
| DE2539420A1 (de) | Verfahren und vorrichtung zum elektrischleitendmachen eines nichtleitenden poroesen schleifkoerpers | |
| DE4391902C2 (de) | Verfahren zur Zubereitung von wäßriger Arbeitsflüssigkeit für die Funkenerodierbearbeitung | |
| CH619739A5 (en) | Process and appliance for making a non-conductive porous grinding body electroconductive | |
| DE2507492C3 (de) | Verfahren und Vorrichtung zum elektrolytischen Entfernen von Metallionen aus einer Lösung | |
| EP0694090B1 (de) | Verfahren und vorrichtung zur elektrolytischen oberflächenbeschichtung von werkstücken | |
| DE10132349B4 (de) | Verfahren und Anlage zur kataphoretischen Tauchlackierung von Gegenständen | |
| DE2048562A1 (de) | Vorrichtung und Verfahren zum Elektro plattieren | |
| DE2929305C2 (de) | Verfahren und Vorrichtung zur kontinuierlichen galvanischen Abscheidung von Mangan auf Stahl | |
| DE2351445C2 (de) | Verfahren zur Regenerierung von Aktivkohle | |
| WO2010078866A2 (de) | Verfahren und vorrichtung zum regenerieren von peroxodisulfat-beizlösungen | |
| DE102004038693B4 (de) | Vorrichtung und Verfahren zur Entfernung von Fremdstoffen aus Prozesslösungen und Verfahren zur Regenerierung eines Kationenaustauschers | |
| DE4408337C2 (de) | Verwendung eines Diaphragmas zur Elektrodialyse von sauren Galvanikbädern | |
| DE1954024A1 (de) | Verfahren und Vorrichtung fuer die Oberflaechenbehandlung von Glasgegenstaenden | |
| DE1421956A1 (de) | Verfahren und Vorrichtungen zur elektrolytischen Formung | |
| EP0079032B1 (de) | Vorrichtung zum galvanischen Beschichten eines metallischen Werkstücks | |
| EP0473087A2 (de) | Verfahren zum Vermindern der Konzentration einer Lösung an einem bestimmten Ion oder einer bestimmten Gruppe von Ionen | |
| CN103249874A (zh) | 用于处理分散浴的方法和装置 | |
| DE4218843C2 (de) | Verfahren zur Regeneration eines ammoniakalischen Ätzmittels sowie Vorrichtung zur Durchführung dieses Verfahrens | |
| AT138152B (de) | Verfahren zum Sterilisieren von Flüssigkeiten, insbesondere Trinkwasser, mittels Oligodynamie. |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PL | Patent ceased | ||
| PL | Patent ceased |