CH440731A - Verfahren und Anordnung zur Messung der Dicke von Aufdampfschichten - Google Patents
Verfahren und Anordnung zur Messung der Dicke von AufdampfschichtenInfo
- Publication number
- CH440731A CH440731A CH1701366A CH1701366A CH440731A CH 440731 A CH440731 A CH 440731A CH 1701366 A CH1701366 A CH 1701366A CH 1701366 A CH1701366 A CH 1701366A CH 440731 A CH440731 A CH 440731A
- Authority
- CH
- Switzerland
- Prior art keywords
- vapor deposition
- quartz
- layer
- temperature
- auxiliary heating
- Prior art date
Links
- 238000007740 vapor deposition Methods 0.000 title claims description 41
- 238000000034 method Methods 0.000 title claims description 12
- 239000010453 quartz Substances 0.000 claims description 44
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 44
- 238000010438 heat treatment Methods 0.000 claims description 12
- 230000005855 radiation Effects 0.000 claims description 8
- 239000013078 crystal Substances 0.000 claims description 6
- 238000007738 vacuum evaporation Methods 0.000 claims description 3
- 230000008021 deposition Effects 0.000 claims 1
- 230000004941 influx Effects 0.000 claims 1
- 239000000758 substrate Substances 0.000 description 5
- 239000000126 substance Substances 0.000 description 4
- 238000005259 measurement Methods 0.000 description 3
- 238000011088 calibration curve Methods 0.000 description 2
- 238000009833 condensation Methods 0.000 description 2
- 230000005494 condensation Effects 0.000 description 2
- 238000009834 vaporization Methods 0.000 description 2
- 230000008016 vaporization Effects 0.000 description 2
- 238000001816 cooling Methods 0.000 description 1
- 238000012937 correction Methods 0.000 description 1
- 230000001419 dependent effect Effects 0.000 description 1
- 238000009792 diffusion process Methods 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 238000005086 pumping Methods 0.000 description 1
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B7/00—Measuring arrangements characterised by the use of electric or magnetic techniques
- G01B7/02—Measuring arrangements characterised by the use of electric or magnetic techniques for measuring length, width or thickness
- G01B7/06—Measuring arrangements characterised by the use of electric or magnetic techniques for measuring length, width or thickness for measuring thickness
- G01B7/063—Measuring arrangements characterised by the use of electric or magnetic techniques for measuring length, width or thickness for measuring thickness using piezoelectric resonators
- G01B7/066—Measuring arrangements characterised by the use of electric or magnetic techniques for measuring length, width or thickness for measuring thickness using piezoelectric resonators for measuring thickness of coating
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/54—Controlling or regulating the coating process
- C23C14/542—Controlling the film thickness or evaporation rate
- C23C14/545—Controlling the film thickness or evaporation rate using measurement on deposited material
- C23C14/546—Controlling the film thickness or evaporation rate using measurement on deposited material using crystal oscillators
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B17/00—Measuring arrangements characterised by the use of infrasonic, sonic or ultrasonic vibrations
- G01B17/02—Measuring arrangements characterised by the use of infrasonic, sonic or ultrasonic vibrations for measuring thickness
- G01B17/025—Measuring arrangements characterised by the use of infrasonic, sonic or ultrasonic vibrations for measuring thickness for measuring thickness of coating
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
- H03H3/00—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators
- H03H3/007—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators for the manufacture of electromechanical resonators or networks
- H03H3/02—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators for the manufacture of electromechanical resonators or networks for the manufacture of piezoelectric or electrostrictive resonators or networks
Landscapes
- Chemical & Material Sciences (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Crystallography & Structural Chemistry (AREA)
- Manufacturing & Machinery (AREA)
- Physical Vapour Deposition (AREA)
- Length Measuring Devices Characterised By Use Of Acoustic Means (AREA)
Priority Applications (5)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CH1701366A CH440731A (de) | 1966-11-24 | 1966-11-24 | Verfahren und Anordnung zur Messung der Dicke von Aufdampfschichten |
| NL6702076A NL6702076A (enrdf_load_stackoverflow) | 1966-11-24 | 1967-02-10 | |
| DE19671623141 DE1623141B2 (de) | 1966-11-24 | 1967-10-18 | Verfahren und Anordnung zur Messung der Dicke von Aufdampfschichten |
| GB4918767A GB1141435A (en) | 1966-11-24 | 1967-10-30 | Improvements in and relating to the measuring of the thickness of layers deposited from the vapour phase |
| FR1558966D FR1558966A (enrdf_load_stackoverflow) | 1966-11-24 | 1967-11-24 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CH1701366A CH440731A (de) | 1966-11-24 | 1966-11-24 | Verfahren und Anordnung zur Messung der Dicke von Aufdampfschichten |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CH440731A true CH440731A (de) | 1967-07-31 |
Family
ID=4422093
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CH1701366A CH440731A (de) | 1966-11-24 | 1966-11-24 | Verfahren und Anordnung zur Messung der Dicke von Aufdampfschichten |
Country Status (5)
| Country | Link |
|---|---|
| CH (1) | CH440731A (enrdf_load_stackoverflow) |
| DE (1) | DE1623141B2 (enrdf_load_stackoverflow) |
| FR (1) | FR1558966A (enrdf_load_stackoverflow) |
| GB (1) | GB1141435A (enrdf_load_stackoverflow) |
| NL (1) | NL6702076A (enrdf_load_stackoverflow) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE3422741A1 (de) * | 1983-07-13 | 1985-02-14 | Laboratoire Suisse de Recherches Horlogères, Neuchâtel | Piezoelektrischer kontaminationsdetektor |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN113106411A (zh) * | 2021-04-13 | 2021-07-13 | 京东方科技集团股份有限公司 | 一种镀膜检测装置、镀膜设备 |
-
1966
- 1966-11-24 CH CH1701366A patent/CH440731A/de unknown
-
1967
- 1967-02-10 NL NL6702076A patent/NL6702076A/xx unknown
- 1967-10-18 DE DE19671623141 patent/DE1623141B2/de active Granted
- 1967-10-30 GB GB4918767A patent/GB1141435A/en not_active Expired
- 1967-11-24 FR FR1558966D patent/FR1558966A/fr not_active Expired
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE3422741A1 (de) * | 1983-07-13 | 1985-02-14 | Laboratoire Suisse de Recherches Horlogères, Neuchâtel | Piezoelektrischer kontaminationsdetektor |
Also Published As
| Publication number | Publication date |
|---|---|
| GB1141435A (en) | 1969-01-29 |
| DE1623141B2 (de) | 1972-10-12 |
| DE1623141A1 (de) | 1971-02-04 |
| FR1558966A (enrdf_load_stackoverflow) | 1969-03-07 |
| NL6702076A (enrdf_load_stackoverflow) | 1968-05-27 |
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