GB1141435A - Improvements in and relating to the measuring of the thickness of layers deposited from the vapour phase - Google Patents
Improvements in and relating to the measuring of the thickness of layers deposited from the vapour phaseInfo
- Publication number
- GB1141435A GB1141435A GB4918767A GB4918767A GB1141435A GB 1141435 A GB1141435 A GB 1141435A GB 4918767 A GB4918767 A GB 4918767A GB 4918767 A GB4918767 A GB 4918767A GB 1141435 A GB1141435 A GB 1141435A
- Authority
- GB
- United Kingdom
- Prior art keywords
- relating
- measuring
- thickness
- vapour phase
- layers deposited
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B7/00—Measuring arrangements characterised by the use of electric or magnetic techniques
- G01B7/02—Measuring arrangements characterised by the use of electric or magnetic techniques for measuring length, width or thickness
- G01B7/06—Measuring arrangements characterised by the use of electric or magnetic techniques for measuring length, width or thickness for measuring thickness
- G01B7/063—Measuring arrangements characterised by the use of electric or magnetic techniques for measuring length, width or thickness for measuring thickness using piezoelectric resonators
- G01B7/066—Measuring arrangements characterised by the use of electric or magnetic techniques for measuring length, width or thickness for measuring thickness using piezoelectric resonators for measuring thickness of coating
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/54—Controlling or regulating the coating process
- C23C14/542—Controlling the film thickness or evaporation rate
- C23C14/545—Controlling the film thickness or evaporation rate using measurement on deposited material
- C23C14/546—Controlling the film thickness or evaporation rate using measurement on deposited material using crystal oscillators
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B17/00—Measuring arrangements characterised by the use of infrasonic, sonic or ultrasonic vibrations
- G01B17/02—Measuring arrangements characterised by the use of infrasonic, sonic or ultrasonic vibrations for measuring thickness
- G01B17/025—Measuring arrangements characterised by the use of infrasonic, sonic or ultrasonic vibrations for measuring thickness for measuring thickness of coating
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
- H03H3/00—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators
- H03H3/007—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators for the manufacture of electromechanical resonators or networks
- H03H3/02—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators for the manufacture of electromechanical resonators or networks for the manufacture of piezoelectric or electrostrictive resonators or networks
Landscapes
- Chemical & Material Sciences (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Crystallography & Structural Chemistry (AREA)
- Manufacturing & Machinery (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
- Length Measuring Devices Characterised By Use Of Acoustic Means (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CH1701366A CH440731A (de) | 1966-11-24 | 1966-11-24 | Verfahren und Anordnung zur Messung der Dicke von Aufdampfschichten |
Publications (1)
Publication Number | Publication Date |
---|---|
GB1141435A true GB1141435A (en) | 1969-01-29 |
Family
ID=4422093
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
GB4918767A Expired GB1141435A (en) | 1966-11-24 | 1967-10-30 | Improvements in and relating to the measuring of the thickness of layers deposited from the vapour phase |
Country Status (5)
Country | Link |
---|---|
CH (1) | CH440731A (enrdf_load_stackoverflow) |
DE (1) | DE1623141B2 (enrdf_load_stackoverflow) |
FR (1) | FR1558966A (enrdf_load_stackoverflow) |
GB (1) | GB1141435A (enrdf_load_stackoverflow) |
NL (1) | NL6702076A (enrdf_load_stackoverflow) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN113106411A (zh) * | 2021-04-13 | 2021-07-13 | 京东方科技集团股份有限公司 | 一种镀膜检测装置、镀膜设备 |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CH662421A5 (de) * | 1983-07-13 | 1987-09-30 | Suisse Horlogerie Rech Lab | Piezoelektrischer kontaminationsdetektor. |
-
1966
- 1966-11-24 CH CH1701366A patent/CH440731A/de unknown
-
1967
- 1967-02-10 NL NL6702076A patent/NL6702076A/xx unknown
- 1967-10-18 DE DE19671623141 patent/DE1623141B2/de active Granted
- 1967-10-30 GB GB4918767A patent/GB1141435A/en not_active Expired
- 1967-11-24 FR FR1558966D patent/FR1558966A/fr not_active Expired
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN113106411A (zh) * | 2021-04-13 | 2021-07-13 | 京东方科技集团股份有限公司 | 一种镀膜检测装置、镀膜设备 |
Also Published As
Publication number | Publication date |
---|---|
FR1558966A (enrdf_load_stackoverflow) | 1969-03-07 |
DE1623141A1 (de) | 1971-02-04 |
CH440731A (de) | 1967-07-31 |
DE1623141B2 (de) | 1972-10-12 |
NL6702076A (enrdf_load_stackoverflow) | 1968-05-27 |
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