JPS51135882A - Process for supplying continu ously evaporating substance - Google Patents
Process for supplying continu ously evaporating substanceInfo
- Publication number
- JPS51135882A JPS51135882A JP6066075A JP6066075A JPS51135882A JP S51135882 A JPS51135882 A JP S51135882A JP 6066075 A JP6066075 A JP 6066075A JP 6066075 A JP6066075 A JP 6066075A JP S51135882 A JPS51135882 A JP S51135882A
- Authority
- JP
- Japan
- Prior art keywords
- supplying
- evaporating substance
- continu ously
- evaporating
- substance
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/221—Ion beam deposition
Abstract
PURPOSE:Process that enables easy continuous supply fo evaporating substance in a heating crucible employed in evaporation process.
Priority Applications (5)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP6066075A JPS51135882A (en) | 1975-05-20 | 1975-05-20 | Process for supplying continu ously evaporating substance |
GB4345975A GB1483966A (en) | 1974-10-23 | 1975-10-22 | Vapourized-metal cluster ion source and ionized-cluster beam deposition |
US05/625,041 US4152478A (en) | 1974-10-23 | 1975-10-23 | Ionized-cluster deposited on a substrate and method of depositing ionized cluster on a substrate |
DE2547552A DE2547552B2 (en) | 1974-10-23 | 1975-10-23 | Layer vapor deposition process and equipment |
US06/011,917 US4217855A (en) | 1974-10-23 | 1979-02-13 | Vaporized-metal cluster ion source and ionized-cluster beam deposition device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP6066075A JPS51135882A (en) | 1975-05-20 | 1975-05-20 | Process for supplying continu ously evaporating substance |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS51135882A true JPS51135882A (en) | 1976-11-25 |
JPS5538029B2 JPS5538029B2 (en) | 1980-10-01 |
Family
ID=13148704
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP6066075A Granted JPS51135882A (en) | 1974-10-23 | 1975-05-20 | Process for supplying continu ously evaporating substance |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS51135882A (en) |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6097765U (en) * | 1983-12-05 | 1985-07-03 | 株式会社エイコーエンデニアリング | Evaporation equipment for vacuum deposition |
JPH03170662A (en) * | 1989-11-29 | 1991-07-24 | Matsushita Electric Ind Co Ltd | Method and apparatus for vapor deposition |
KR100984148B1 (en) * | 2007-12-21 | 2010-09-28 | 삼성전기주식회사 | Vacuum evaporator |
JP2011162831A (en) * | 2010-02-09 | 2011-08-25 | Panasonic Corp | Vapor deposition boat and vapor deposition apparatus using the same |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5973637U (en) * | 1982-11-10 | 1984-05-18 | サンデン株式会社 | electromagnetic clutch |
JPS6246029A (en) * | 1985-08-23 | 1987-02-27 | Sanden Corp | Electromagnetic clutch |
JPS6249025A (en) * | 1985-08-27 | 1987-03-03 | Sanden Corp | Electromagnetic clutch |
JPS6345429U (en) * | 1986-09-05 | 1988-03-26 |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5155787A (en) * | 1974-11-11 | 1976-05-17 | Copal Co Ltd | Shinkujochakuhoho oyobi sochi |
-
1975
- 1975-05-20 JP JP6066075A patent/JPS51135882A/en active Granted
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5155787A (en) * | 1974-11-11 | 1976-05-17 | Copal Co Ltd | Shinkujochakuhoho oyobi sochi |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6097765U (en) * | 1983-12-05 | 1985-07-03 | 株式会社エイコーエンデニアリング | Evaporation equipment for vacuum deposition |
JPH03170662A (en) * | 1989-11-29 | 1991-07-24 | Matsushita Electric Ind Co Ltd | Method and apparatus for vapor deposition |
KR100984148B1 (en) * | 2007-12-21 | 2010-09-28 | 삼성전기주식회사 | Vacuum evaporator |
JP2011162831A (en) * | 2010-02-09 | 2011-08-25 | Panasonic Corp | Vapor deposition boat and vapor deposition apparatus using the same |
Also Published As
Publication number | Publication date |
---|---|
JPS5538029B2 (en) | 1980-10-01 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JPS51135882A (en) | Process for supplying continu ously evaporating substance | |
HU172649B (en) | Process for producing new, biologically active lysergamides | |
CS193563B2 (en) | Process for preparing steric uniform cis-and trans-5,6-alkylen-5,6-dihydropyrimidin-4/3h/-ones | |
JPS51131481A (en) | A vacuum vaporizing apparatus | |
PH13065A (en) | Method for controlling unwanted vegetation sugarcane fields | |
JPS522845A (en) | Evaporation deposition apparatus by electron radiation heating | |
HU175610B (en) | Process for preparing 6,11-dihydro-11-oxo-dibenz/b,e/oxepin-alkane acids | |
JPS51133104A (en) | A process for producing single crystal from high-melting-point materia ls | |
JPS51129952A (en) | High frequency heater | |
FR2311443A1 (en) | PROCESS FOR PRIMING CONTROLLED ELECTRIC VALVES, MOUNTED IN PARALLEL | |
JPS51140889A (en) | A vapor phase growth apparatus | |
JPS5230793A (en) | Method for controlling evaporation rate | |
JPS5392390A (en) | Continuous evaporating apparatus | |
JPS5279339A (en) | Temperature control method of electric furnace | |
JPS51139774A (en) | Liquid phase growing device | |
JPS5231666A (en) | Source container for capor phase growing | |
JPS5279338A (en) | Temperature control method of electric furnace | |
JPS5379776A (en) | Sputtering apparatus | |
JPS5245592A (en) | Method of coating corrosion resistant substance on heating material | |
JPS51133105A (en) | A process for producing single crystal from high-melting-point materia ls | |
JPS53144890A (en) | Feeding method for raw material gas to reaction furnace | |
JPS522169A (en) | Heating table | |
JPS51133680A (en) | Temperature control process for heater device | |
JPS5227169A (en) | Parts feeder and the method of making same | |
JPS5223361A (en) | Process for controlling a gas concentration in a conservatory |