JPS53144890A - Feeding method for raw material gas to reaction furnace - Google Patents

Feeding method for raw material gas to reaction furnace

Info

Publication number
JPS53144890A
JPS53144890A JP5976377A JP5976377A JPS53144890A JP S53144890 A JPS53144890 A JP S53144890A JP 5976377 A JP5976377 A JP 5976377A JP 5976377 A JP5976377 A JP 5976377A JP S53144890 A JPS53144890 A JP S53144890A
Authority
JP
Japan
Prior art keywords
raw material
material gas
reaction furnace
feeding method
gas
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP5976377A
Other languages
Japanese (ja)
Inventor
Mitsuru Ogawa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP5976377A priority Critical patent/JPS53144890A/en
Publication of JPS53144890A publication Critical patent/JPS53144890A/en
Pending legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/448—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials
    • C23C16/4485—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials by evaporation without using carrier gas in contact with the source material

Landscapes

  • Chemical & Material Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
  • Chemical Vapour Deposition (AREA)

Abstract

PURPOSE:To feed raw material gas without causing change in concentration to a reaction furnace by making desired raw material gas hyrough warming the raw material required for gas phase growth.
JP5976377A 1977-05-25 1977-05-25 Feeding method for raw material gas to reaction furnace Pending JPS53144890A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP5976377A JPS53144890A (en) 1977-05-25 1977-05-25 Feeding method for raw material gas to reaction furnace

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP5976377A JPS53144890A (en) 1977-05-25 1977-05-25 Feeding method for raw material gas to reaction furnace

Publications (1)

Publication Number Publication Date
JPS53144890A true JPS53144890A (en) 1978-12-16

Family

ID=13122625

Family Applications (1)

Application Number Title Priority Date Filing Date
JP5976377A Pending JPS53144890A (en) 1977-05-25 1977-05-25 Feeding method for raw material gas to reaction furnace

Country Status (1)

Country Link
JP (1) JPS53144890A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5959877A (en) * 1982-09-30 1984-04-05 Fujitsu Ltd Chemical vapor growth method

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5959877A (en) * 1982-09-30 1984-04-05 Fujitsu Ltd Chemical vapor growth method

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