CA2409725A1 - Photosensitive resin laminate - Google Patents
Photosensitive resin laminate Download PDFInfo
- Publication number
- CA2409725A1 CA2409725A1 CA002409725A CA2409725A CA2409725A1 CA 2409725 A1 CA2409725 A1 CA 2409725A1 CA 002409725 A CA002409725 A CA 002409725A CA 2409725 A CA2409725 A CA 2409725A CA 2409725 A1 CA2409725 A1 CA 2409725A1
- Authority
- CA
- Canada
- Prior art keywords
- layer
- photosensitive resin
- resin laminate
- ablation
- plate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Abandoned
Links
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- 239000011347 resin Substances 0.000 title claims abstract description 135
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- 229920000468 styrene butadiene styrene block copolymer Polymers 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- CXVGEDCSTKKODG-UHFFFAOYSA-N sulisobenzone Chemical compound C1=C(S(O)(=O)=O)C(OC)=CC(O)=C1C(=O)C1=CC=CC=C1 CXVGEDCSTKKODG-UHFFFAOYSA-N 0.000 description 1
- 229910052715 tantalum Inorganic materials 0.000 description 1
- 125000000999 tert-butyl group Chemical group [H]C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- XLKZJJVNBQCVIX-UHFFFAOYSA-N tetradecane-1,14-diol Chemical compound OCCCCCCCCCCCCCCO XLKZJJVNBQCVIX-UHFFFAOYSA-N 0.000 description 1
- YRHRIQCWCFGUEQ-UHFFFAOYSA-N thioxanthen-9-one Chemical compound C1=CC=C2C(=O)C3=CC=CC=C3SC2=C1 YRHRIQCWCFGUEQ-UHFFFAOYSA-N 0.000 description 1
- 229910052718 tin Inorganic materials 0.000 description 1
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 1
- 150000004992 toluidines Chemical class 0.000 description 1
- GRPURDFRFHUDSP-UHFFFAOYSA-N tris(prop-2-enyl) benzene-1,2,4-tricarboxylate Chemical compound C=CCOC(=O)C1=CC=C(C(=O)OCC=C)C(C(=O)OCC=C)=C1 GRPURDFRFHUDSP-UHFFFAOYSA-N 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
- 229910052720 vanadium Inorganic materials 0.000 description 1
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 1
- 239000001993 wax Substances 0.000 description 1
- 229910052727 yttrium Inorganic materials 0.000 description 1
- 229910052726 zirconium Inorganic materials 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
- B41C1/00—Forme preparation
- B41C1/055—Thermographic processes for producing printing formes, e.g. with a thermal print head
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
- B41C1/00—Forme preparation
- B41C1/10—Forme preparation for lithographic printing; Master sheets for transferring a lithographic image to the forme
- B41C1/1008—Forme preparation for lithographic printing; Master sheets for transferring a lithographic image to the forme by removal or destruction of lithographic material on the lithographic support, e.g. by laser or spark ablation; by the use of materials rendered soluble or insoluble by heat exposure, e.g. by heat produced from a light to heat transforming system; by on-the-press exposure or on-the-press development, e.g. by the fountain of photolithographic materials
- B41C1/1033—Forme preparation for lithographic printing; Master sheets for transferring a lithographic image to the forme by removal or destruction of lithographic material on the lithographic support, e.g. by laser or spark ablation; by the use of materials rendered soluble or insoluble by heat exposure, e.g. by heat produced from a light to heat transforming system; by on-the-press exposure or on-the-press development, e.g. by the fountain of photolithographic materials by laser or spark ablation
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
- G03F7/095—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having more than one photosensitive layer
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
- G03F7/11—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having cover layers or intermediate layers, e.g. subbing layers
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
- G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
- G03F7/2014—Contact or film exposure of light sensitive plates such as lithographic plates or circuit boards, e.g. in a vacuum frame
- G03F7/2016—Contact mask being integral part of the photosensitive element and subject to destructive removal during post-exposure processing
- G03F7/202—Masking pattern being obtained by thermal means, e.g. laser ablation
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/145—Infrared
Landscapes
- Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Engineering & Computer Science (AREA)
- General Physics & Mathematics (AREA)
- Thermal Sciences (AREA)
- Manufacturing & Machinery (AREA)
- Architecture (AREA)
- Structural Engineering (AREA)
- Materials For Photolithography (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Laminated Bodies (AREA)
- Heating, Cooling, Or Curing Plastics Or The Like In General (AREA)
- Encapsulation Of And Coatings For Semiconductor Or Solid State Devices (AREA)
Applications Claiming Priority (20)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP326576/2001 | 2001-10-24 | ||
| JP2001326576 | 2001-10-24 | ||
| JP394640/2001 | 2001-12-26 | ||
| JP2001394640A JP3765404B2 (ja) | 2001-12-26 | 2001-12-26 | 感光性印刷用原版 |
| JP5096/2002 | 2002-01-11 | ||
| JP2002005096A JP4051604B2 (ja) | 2002-01-11 | 2002-01-11 | 感光性印刷用原版 |
| JP74570/2002 | 2002-03-18 | ||
| JP74571/2002 | 2002-03-18 | ||
| JP2002074571A JP2003270778A (ja) | 2002-03-18 | 2002-03-18 | 感光性印刷用原版 |
| JP2002074570A JP2003270792A (ja) | 2002-03-18 | 2002-03-18 | 感光性レタープレス印刷用原版 |
| JP2002111073A JP3750806B2 (ja) | 2002-04-12 | 2002-04-12 | 感光性印刷用原版 |
| JP111073/2002 | 2002-04-12 | ||
| JP2002111072A JP3750805B2 (ja) | 2002-04-12 | 2002-04-12 | 感光性印刷原版 |
| JP111072/2002 | 2002-04-12 | ||
| JP138866/2002 | 2002-05-14 | ||
| JP2002138866 | 2002-05-14 | ||
| JP261878/2002 | 2002-09-06 | ||
| JP2002261878A JP3781188B2 (ja) | 2002-09-06 | 2002-09-06 | 感光性樹脂積層体 |
| JP290253/2002 | 2002-10-02 | ||
| JP2002290253A JP3741278B2 (ja) | 2002-10-02 | 2002-10-02 | 感光性印刷用刷版 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CA2409725A1 true CA2409725A1 (en) | 2003-04-24 |
Family
ID=27580554
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CA002409725A Abandoned CA2409725A1 (en) | 2001-10-24 | 2002-10-24 | Photosensitive resin laminate |
Country Status (10)
| Country | Link |
|---|---|
| US (3) | US7097957B2 (en, 2012) |
| EP (2) | EP1457818A3 (en, 2012) |
| KR (1) | KR20030052963A (en, 2012) |
| CN (1) | CN1414429A (en, 2012) |
| AT (1) | ATE299603T1 (en, 2012) |
| CA (1) | CA2409725A1 (en, 2012) |
| DE (1) | DE60205005T2 (en, 2012) |
| ES (1) | ES2241941T3 (en, 2012) |
| PT (1) | PT1306725E (en, 2012) |
| TW (1) | TWI297809B (en, 2012) |
Families Citing this family (27)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TWI297809B (en, 2012) * | 2001-10-24 | 2008-06-11 | Toyo Boseki | |
| KR100942485B1 (ko) * | 2002-04-02 | 2010-02-12 | 도요 보세키 가부시키가이샤 | 감광성 인쇄 원판 |
| CN1472597A (zh) * | 2002-07-16 | 2004-02-04 | 东洋纺织株式会社 | Ir烧蚀用层压体 |
| US7419611B2 (en) * | 2005-09-02 | 2008-09-02 | International Business Machines Corporation | Processes and materials for step and flash imprint lithography |
| US7488771B2 (en) * | 2005-09-02 | 2009-02-10 | International Business Machines Corporation | Stabilization of vinyl ether materials |
| JP5008849B2 (ja) * | 2005-09-08 | 2012-08-22 | ソニーモバイルディスプレイ株式会社 | レーザ加工方法及び透明樹脂層を有する表示装置の製造方法 |
| DE102006011949A1 (de) * | 2006-03-15 | 2007-09-20 | Epg (Engineered Nanoproducts Germany) Ag | Verfahren zur Herstellung von defektfreien mikrooptischen Lichtlenkelementen grosser Breite |
| CN101426659A (zh) * | 2006-04-20 | 2009-05-06 | 柯尼卡美能达医疗印刷器材株式会社 | 印刷版材料 |
| US7910287B2 (en) * | 2007-02-14 | 2011-03-22 | Toppan Printing Co., Ltd. | Relief printing plate, and method for manufacturing electronic circuit pattern, organic electroluminescence device and organic electronic device by using the same |
| US8991312B2 (en) * | 2008-05-23 | 2015-03-31 | Toyo Boseki Kabushiki Kaisha | Flexographic printing original plate |
| JP4200510B1 (ja) * | 2008-06-11 | 2008-12-24 | 東洋紡績株式会社 | 感光性フレキソ印刷原版 |
| JP4247725B1 (ja) * | 2008-07-16 | 2009-04-02 | 東洋紡績株式会社 | 感光性凸版印刷原版 |
| US8153347B2 (en) | 2008-12-04 | 2012-04-10 | Eastman Kodak Company | Flexographic element and method of imaging |
| CN102257434B (zh) * | 2008-12-18 | 2013-04-24 | 旭化成电子材料株式会社 | 烧蚀层、感光性树脂结构体、使用了该感光性树脂结构体的凸版印刷版的制造方法 |
| US9334406B2 (en) * | 2009-02-25 | 2016-05-10 | Lg Chem, Ltd. | Composition for primer coating, optical film comprising the same, and polarizing plate comprising the same |
| CN102114726B (zh) * | 2009-12-30 | 2013-01-23 | 中国印钞造币总公司 | 印刷版用激光热烧蚀掩膜涂层及其制备方法 |
| JP5710961B2 (ja) * | 2010-12-24 | 2015-04-30 | 住友理工株式会社 | フレキソ印刷版原版 |
| CN102636958A (zh) * | 2012-04-11 | 2012-08-15 | 中国科学院上海光学精密机械研究所 | 提高激光热刻蚀图形分辨率的薄膜结构及其制备方法 |
| KR102138089B1 (ko) * | 2013-07-04 | 2020-07-28 | 한국과학기술원 | 리소그래피용 메타-포토레지스트 |
| USD729486S1 (en) * | 2013-10-04 | 2015-05-12 | Earthbin Inc. | Garbage bin |
| CN105425536A (zh) * | 2015-11-12 | 2016-03-23 | 中国科学院上海光学精密机械研究所 | 激光直写用超分辨掩膜板及其制备方法 |
| DE102016108216B4 (de) | 2016-05-03 | 2023-11-02 | Schreiner Group Gmbh & Co. Kg | Folienaufbau mit Schutz vor Manipulation |
| CN108333878A (zh) * | 2018-01-25 | 2018-07-27 | 上海宝士嘉印刷器材有限公司 | 单层耐uv油墨热敏ctp版成像涂层 |
| WO2019215848A1 (ja) * | 2018-05-09 | 2019-11-14 | 日立化成株式会社 | 感光性エレメント、バリア層形成用樹脂組成物、レジストパターンの形成方法及びプリント配線板の製造方法 |
| JP7104805B2 (ja) * | 2018-12-10 | 2022-07-21 | 旭化成株式会社 | フレキソ印刷原版及びフレキソ印刷版の製造方法 |
| CN114401847B (zh) * | 2019-09-20 | 2024-06-07 | 东洋纺Mc株式会社 | 柔性印刷版原版 |
| JP7480617B2 (ja) * | 2020-07-29 | 2024-05-10 | コニカミノルタ株式会社 | 画像データ設定装置、画像データ設定方法および画像データ設定プログラム |
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| US3402087A (en) * | 1964-12-23 | 1968-09-17 | Eastman Kodak Co | Coating non-planar surfaces |
| CA1099435A (en) * | 1971-04-01 | 1981-04-14 | Gwendyline Y. Y. T. Chen | Photosensitive block copolymer composition and elements |
| CA1049312A (en) * | 1974-01-17 | 1979-02-27 | John O.H. Peterson | Presensitized printing plate with in-situ, laser imageable mask |
| US3954472A (en) * | 1974-08-26 | 1976-05-04 | S. O. Litho Corporation | Substractive developer for negative working lithographic plates |
| US4214965A (en) * | 1979-01-11 | 1980-07-29 | Polychrome Corporation | Polymers and process for their preparation |
| US4430366A (en) * | 1981-02-04 | 1984-02-07 | Minnesota Mining And Manufacturing Company | Metal/metal oxide coating |
| DE3704693A1 (de) * | 1987-02-14 | 1988-08-25 | Basf Ag | Verfahren zum nahtlosen und haftfesten verbinden der end- und/oder seitenbereiche von lichtempfindlichen schichten sowie verwendung der so verbundenen lichtempfindlichen schichten fuer die herstellung von druckformen |
| JP2640137B2 (ja) * | 1989-02-28 | 1997-08-13 | 富士写真フイルム株式会社 | ポジ型フオトレジスト組成物 |
| US5171650A (en) * | 1990-10-04 | 1992-12-15 | Graphics Technology International, Inc. | Ablation-transfer imaging/recording |
| EP0476840B1 (en) * | 1990-08-30 | 1997-06-18 | AT&T Corp. | Process for fabricating a device |
| US5330883A (en) * | 1992-06-29 | 1994-07-19 | Lsi Logic Corporation | Techniques for uniformizing photoresist thickness and critical dimension of underlying features |
| US5379698A (en) * | 1992-07-20 | 1995-01-10 | Presstek, Inc. | Lithographic printing members for use with laser-discharge imaging |
| USRE35512F1 (en) * | 1992-07-20 | 1998-08-04 | Presstek Inc | Lithographic printing members for use with laser-discharge imaging |
| US5719009A (en) | 1992-08-07 | 1998-02-17 | E. I. Du Pont De Nemours And Company | Laser ablatable photosensitive elements utilized to make flexographic printing plates |
| US5262275A (en) | 1992-08-07 | 1993-11-16 | E. I. Du Pont De Nemours And Company | Flexographic printing element having an IR ablatable layer and process for making a flexographic printing plate |
| US5308737A (en) * | 1993-03-18 | 1994-05-03 | Minnesota Mining And Manufacturing Company | Laser propulsion transfer using black metal coated substrates |
| US6238837B1 (en) * | 1995-05-01 | 2001-05-29 | E.I. Du Pont De Nemours And Company | Flexographic element having an infrared ablatable layer |
| US5776654A (en) * | 1995-10-11 | 1998-07-07 | Agfa-Gevaert N.V. | On the press development of a diazo based printing plate |
| US6859821B1 (en) | 1999-07-19 | 2005-02-22 | Groove Networks, Inc. | Method and apparatus for prioritizing data change requests and maintaining data consistency in a distributed computer system equipped for activity-based collaboration |
| US6367381B1 (en) * | 2000-02-22 | 2002-04-09 | Polyfibron Technologies, Inc. | Laser imaged printing plates comprising a multi-layer slip film |
| EP1146392B1 (en) | 2000-04-11 | 2013-08-07 | Agfa Graphics N.V. | Method for on-site preparation of a relief image |
| US6759175B2 (en) * | 2000-04-11 | 2004-07-06 | Agfa-Gevaert | Method for on-site preparation of a relief image |
| FR2809829B1 (fr) * | 2000-06-05 | 2002-07-26 | Rhodia Chimie Sa | Nouvelle composition photosensible pour la fabrication de photoresist |
| US6245486B1 (en) | 2000-06-30 | 2001-06-12 | Gary Ganghui Teng | Method for imaging a printing plate having a laser ablatable mask layer |
| US6787286B2 (en) * | 2001-03-08 | 2004-09-07 | Shipley Company, L.L.C. | Solvents and photoresist compositions for short wavelength imaging |
| JP2003066600A (ja) * | 2001-06-12 | 2003-03-05 | Canon Inc | フォトレジスト、これを用いた基板の加工方法、及びフォトレジストの製造方法 |
| TWI297809B (en, 2012) * | 2001-10-24 | 2008-06-11 | Toyo Boseki | |
| CN1472597A (zh) * | 2002-07-16 | 2004-02-04 | 东洋纺织株式会社 | Ir烧蚀用层压体 |
| US20050202351A1 (en) * | 2004-03-09 | 2005-09-15 | Houlihan Francis M. | Process of imaging a deep ultraviolet photoresist with a top coating and materials thereof |
| WO2005119371A1 (en) * | 2004-06-01 | 2005-12-15 | E.I. Dupont De Nemours And Company | Ultraviolet-transparent alkanes and processes using same in vacuum and deep ultraviolet applications |
| US7288362B2 (en) * | 2005-02-23 | 2007-10-30 | International Business Machines Corporation | Immersion topcoat materials with improved performance |
-
2002
- 2002-10-22 TW TW091124287A patent/TWI297809B/zh active
- 2002-10-23 CN CN02147383A patent/CN1414429A/zh active Pending
- 2002-10-23 KR KR1020020064889A patent/KR20030052963A/ko not_active Withdrawn
- 2002-10-24 AT AT02023876T patent/ATE299603T1/de not_active IP Right Cessation
- 2002-10-24 EP EP04014285A patent/EP1457818A3/en not_active Withdrawn
- 2002-10-24 EP EP02023876A patent/EP1306725B1/en not_active Expired - Lifetime
- 2002-10-24 US US10/279,005 patent/US7097957B2/en not_active Expired - Fee Related
- 2002-10-24 DE DE60205005T patent/DE60205005T2/de not_active Expired - Lifetime
- 2002-10-24 PT PT02023876T patent/PT1306725E/pt unknown
- 2002-10-24 ES ES02023876T patent/ES2241941T3/es not_active Expired - Lifetime
- 2002-10-24 CA CA002409725A patent/CA2409725A1/en not_active Abandoned
-
2004
- 2004-04-05 US US10/816,914 patent/US7070906B2/en not_active Expired - Fee Related
-
2005
- 2005-06-23 US US11/159,210 patent/US20050238996A1/en not_active Abandoned
Also Published As
| Publication number | Publication date |
|---|---|
| DE60205005D1 (de) | 2005-08-18 |
| PT1306725E (pt) | 2005-09-30 |
| US7070906B2 (en) | 2006-07-04 |
| ATE299603T1 (de) | 2005-07-15 |
| DE60205005T2 (de) | 2006-04-20 |
| EP1306725A1 (en) | 2003-05-02 |
| US20030082482A1 (en) | 2003-05-01 |
| US20050238996A1 (en) | 2005-10-27 |
| ES2241941T3 (es) | 2005-11-01 |
| CN1414429A (zh) | 2003-04-30 |
| KR20030052963A (ko) | 2003-06-27 |
| EP1457818A3 (en) | 2005-12-21 |
| EP1457818A2 (en) | 2004-09-15 |
| EP1306725B1 (en) | 2005-07-13 |
| TWI297809B (en, 2012) | 2008-06-11 |
| US7097957B2 (en) | 2006-08-29 |
| HK1055799A1 (en) | 2004-01-21 |
| US20040197706A1 (en) | 2004-10-07 |
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