CA2362637A1 - Retroreflective articles having polymer multilayer reflective coatings - Google Patents
Retroreflective articles having polymer multilayer reflective coatings Download PDFInfo
- Publication number
- CA2362637A1 CA2362637A1 CA002362637A CA2362637A CA2362637A1 CA 2362637 A1 CA2362637 A1 CA 2362637A1 CA 002362637 A CA002362637 A CA 002362637A CA 2362637 A CA2362637 A CA 2362637A CA 2362637 A1 CA2362637 A1 CA 2362637A1
- Authority
- CA
- Canada
- Prior art keywords
- layers
- reflective coating
- polymer
- retroreflective article
- optical elements
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Abandoned
Links
- 238000000576 coating method Methods 0.000 title claims abstract description 132
- 229920000642 polymer Polymers 0.000 title claims abstract description 59
- 239000011248 coating agent Substances 0.000 claims abstract description 112
- 230000003287 optical effect Effects 0.000 claims abstract description 75
- 239000000463 material Substances 0.000 claims description 58
- 239000004005 microsphere Substances 0.000 claims description 41
- 239000002861 polymer material Substances 0.000 claims description 9
- 239000000919 ceramic Substances 0.000 claims description 5
- 125000002524 organometallic group Chemical group 0.000 claims description 5
- 229910010293 ceramic material Inorganic materials 0.000 claims description 3
- 229910044991 metal oxide Inorganic materials 0.000 claims description 3
- 150000004706 metal oxides Chemical group 0.000 claims description 3
- 239000010410 layer Substances 0.000 description 131
- 238000000034 method Methods 0.000 description 29
- 239000000178 monomer Substances 0.000 description 25
- 239000000758 substrate Substances 0.000 description 17
- -1 CeF2 Chemical compound 0.000 description 12
- 229920001730 Moisture cure polyurethane Polymers 0.000 description 12
- 238000001723 curing Methods 0.000 description 9
- 239000007788 liquid Substances 0.000 description 9
- 238000000151 deposition Methods 0.000 description 7
- 239000010408 film Substances 0.000 description 7
- 239000011521 glass Substances 0.000 description 7
- 230000005855 radiation Effects 0.000 description 7
- ZDQNWDNMNKSMHI-UHFFFAOYSA-N 1-[2-(2-prop-2-enoyloxypropoxy)propoxy]propan-2-yl prop-2-enoate Chemical compound C=CC(=O)OC(C)COC(C)COCC(C)OC(=O)C=C ZDQNWDNMNKSMHI-UHFFFAOYSA-N 0.000 description 5
- 239000004593 Epoxy Chemical group 0.000 description 5
- 239000002318 adhesion promoter Substances 0.000 description 5
- 230000000052 comparative effect Effects 0.000 description 4
- 230000008021 deposition Effects 0.000 description 4
- 229910052751 metal Inorganic materials 0.000 description 4
- 239000002184 metal Substances 0.000 description 4
- 238000002310 reflectometry Methods 0.000 description 4
- 230000008016 vaporization Effects 0.000 description 4
- 239000006087 Silane Coupling Agent Substances 0.000 description 3
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 3
- 239000012159 carrier gas Substances 0.000 description 3
- 239000003054 catalyst Substances 0.000 description 3
- 238000005260 corrosion Methods 0.000 description 3
- 230000007797 corrosion Effects 0.000 description 3
- 238000001227 electron beam curing Methods 0.000 description 3
- 230000007613 environmental effect Effects 0.000 description 3
- 230000008020 evaporation Effects 0.000 description 3
- 238000001704 evaporation Methods 0.000 description 3
- 239000003999 initiator Substances 0.000 description 3
- 239000000203 mixture Substances 0.000 description 3
- 239000013047 polymeric layer Substances 0.000 description 3
- 238000004321 preservation Methods 0.000 description 3
- 230000008569 process Effects 0.000 description 3
- 229920003002 synthetic resin Polymers 0.000 description 3
- 238000009834 vaporization Methods 0.000 description 3
- 229920002554 vinyl polymer Polymers 0.000 description 3
- 238000001429 visible spectrum Methods 0.000 description 3
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 3
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical group [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 description 2
- CERQOIWHTDAKMF-UHFFFAOYSA-M Methacrylate Chemical group CC(=C)C([O-])=O CERQOIWHTDAKMF-UHFFFAOYSA-M 0.000 description 2
- UFWIBTONFRDIAS-UHFFFAOYSA-N Naphthalene Chemical compound C1=CC=CC2=CC=CC=C21 UFWIBTONFRDIAS-UHFFFAOYSA-N 0.000 description 2
- 229910000831 Steel Inorganic materials 0.000 description 2
- 229910052782 aluminium Inorganic materials 0.000 description 2
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 2
- 239000011230 binding agent Substances 0.000 description 2
- 238000006243 chemical reaction Methods 0.000 description 2
- 238000005229 chemical vapour deposition Methods 0.000 description 2
- 238000009833 condensation Methods 0.000 description 2
- 230000005494 condensation Effects 0.000 description 2
- 239000003989 dielectric material Substances 0.000 description 2
- 238000009826 distribution Methods 0.000 description 2
- 238000010894 electron beam technology Methods 0.000 description 2
- FFUAGWLWBBFQJT-UHFFFAOYSA-N hexamethyldisilazane Chemical compound C[Si](C)(C)N[Si](C)(C)C FFUAGWLWBBFQJT-UHFFFAOYSA-N 0.000 description 2
- 230000001788 irregular Effects 0.000 description 2
- 230000031700 light absorption Effects 0.000 description 2
- 239000011241 protective layer Substances 0.000 description 2
- 239000007858 starting material Substances 0.000 description 2
- 239000010959 steel Substances 0.000 description 2
- 239000000057 synthetic resin Substances 0.000 description 2
- 238000007740 vapor deposition Methods 0.000 description 2
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 2
- YBNMDCCMCLUHBL-UHFFFAOYSA-N (2,5-dioxopyrrolidin-1-yl) 4-pyren-1-ylbutanoate Chemical compound C=1C=C(C2=C34)C=CC3=CC=CC4=CC=C2C=1CCCC(=O)ON1C(=O)CCC1=O YBNMDCCMCLUHBL-UHFFFAOYSA-N 0.000 description 1
- WYTZZXDRDKSJID-UHFFFAOYSA-N (3-aminopropyl)triethoxysilane Chemical compound CCO[Si](OCC)(OCC)CCCN WYTZZXDRDKSJID-UHFFFAOYSA-N 0.000 description 1
- XDLMVUHYZWKMMD-UHFFFAOYSA-N 3-trimethoxysilylpropyl 2-methylprop-2-enoate Chemical compound CO[Si](OC)(OC)CCCOC(=O)C(C)=C XDLMVUHYZWKMMD-UHFFFAOYSA-N 0.000 description 1
- DOKVLJLABBCKOJ-UHFFFAOYSA-N 6-hydrazinyl-1,3,5-triazine-2,4-diamine Chemical group NNC1=NC(N)=NC(N)=N1 DOKVLJLABBCKOJ-UHFFFAOYSA-N 0.000 description 1
- DXPPIEDUBFUSEZ-UHFFFAOYSA-N 6-methylheptyl prop-2-enoate Chemical compound CC(C)CCCCCOC(=O)C=C DXPPIEDUBFUSEZ-UHFFFAOYSA-N 0.000 description 1
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 1
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- 229910000673 Indium arsenide Inorganic materials 0.000 description 1
- GPXJNWSHGFTCBW-UHFFFAOYSA-N Indium phosphide Chemical compound [In]#P GPXJNWSHGFTCBW-UHFFFAOYSA-N 0.000 description 1
- 229920000877 Melamine resin Polymers 0.000 description 1
- 229910002665 PbTe Inorganic materials 0.000 description 1
- 239000002202 Polyethylene glycol Substances 0.000 description 1
- 239000004793 Polystyrene Substances 0.000 description 1
- 239000007983 Tris buffer Substances 0.000 description 1
- QYKIQEUNHZKYBP-UHFFFAOYSA-N Vinyl ether Chemical class C=COC=C QYKIQEUNHZKYBP-UHFFFAOYSA-N 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- 150000007513 acids Chemical class 0.000 description 1
- 150000003926 acrylamides Chemical class 0.000 description 1
- 150000001252 acrylic acid derivatives Chemical class 0.000 description 1
- 150000001299 aldehydes Chemical group 0.000 description 1
- 150000001336 alkenes Chemical class 0.000 description 1
- 230000004075 alteration Effects 0.000 description 1
- 239000012298 atmosphere Substances 0.000 description 1
- 230000004888 barrier function Effects 0.000 description 1
- 239000002585 base Substances 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical class C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 description 1
- JEBSIUFTARBSPB-UHFFFAOYSA-N butan-2-yl 3,3-dibromo-2-phenylprop-2-enoate Chemical compound C(C)(CC)OC(C(=C(Br)Br)C1=CC=CC=C1)=O JEBSIUFTARBSPB-UHFFFAOYSA-N 0.000 description 1
- WUKWITHWXAAZEY-UHFFFAOYSA-L calcium difluoride Chemical compound [F-].[F-].[Ca+2] WUKWITHWXAAZEY-UHFFFAOYSA-L 0.000 description 1
- 229910001634 calcium fluoride Inorganic materials 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- BVKZGUZCCUSVTD-UHFFFAOYSA-N carbonic acid Chemical group OC(O)=O BVKZGUZCCUSVTD-UHFFFAOYSA-N 0.000 description 1
- 230000015556 catabolic process Effects 0.000 description 1
- WBYWAXJHAXSJNI-UHFFFAOYSA-N cinnamic acid Chemical class OC(=O)C=CC1=CC=CC=C1 WBYWAXJHAXSJNI-UHFFFAOYSA-N 0.000 description 1
- 239000003086 colorant Substances 0.000 description 1
- 239000000470 constituent Substances 0.000 description 1
- 239000007822 coupling agent Substances 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 238000006731 degradation reaction Methods 0.000 description 1
- 230000032798 delamination Effects 0.000 description 1
- 125000004386 diacrylate group Chemical group 0.000 description 1
- 229910001873 dinitrogen Inorganic materials 0.000 description 1
- 238000009713 electroplating Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 150000002118 epoxides Chemical class 0.000 description 1
- 229920006332 epoxy adhesive Polymers 0.000 description 1
- NKSJNEHGWDZZQF-UHFFFAOYSA-N ethenyl(trimethoxy)silane Chemical compound CO[Si](OC)(OC)C=C NKSJNEHGWDZZQF-UHFFFAOYSA-N 0.000 description 1
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 1
- 238000007765 extrusion coating Methods 0.000 description 1
- 239000012530 fluid Substances 0.000 description 1
- 238000007756 gravure coating Methods 0.000 description 1
- XXMIOPMDWAUFGU-UHFFFAOYSA-N hexane-1,6-diol Chemical compound OCCCCCCO XXMIOPMDWAUFGU-UHFFFAOYSA-N 0.000 description 1
- 125000004356 hydroxy functional group Chemical group O* 0.000 description 1
- WPYVAWXEWQSOGY-UHFFFAOYSA-N indium antimonide Chemical compound [Sb]#[In] WPYVAWXEWQSOGY-UHFFFAOYSA-N 0.000 description 1
- RPQDHPTXJYYUPQ-UHFFFAOYSA-N indium arsenide Chemical compound [In]#[As] RPQDHPTXJYYUPQ-UHFFFAOYSA-N 0.000 description 1
- 239000004615 ingredient Substances 0.000 description 1
- 229910010272 inorganic material Inorganic materials 0.000 description 1
- 239000011147 inorganic material Substances 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 230000001678 irradiating effect Effects 0.000 description 1
- 239000012948 isocyanate Chemical group 0.000 description 1
- 150000002513 isocyanates Chemical group 0.000 description 1
- 125000001449 isopropyl group Chemical group [H]C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 1
- 238000003475 lamination Methods 0.000 description 1
- 229910001635 magnesium fluoride Inorganic materials 0.000 description 1
- 150000002688 maleic acid derivatives Chemical class 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 150000007974 melamines Chemical class 0.000 description 1
- 150000002734 metacrylic acid derivatives Chemical class 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- FQPSGWSUVKBHSU-UHFFFAOYSA-N methacrylamide Chemical class CC(=C)C(N)=O FQPSGWSUVKBHSU-UHFFFAOYSA-N 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 150000004767 nitrides Chemical class 0.000 description 1
- 125000001181 organosilyl group Chemical group [SiH3]* 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 239000012071 phase Substances 0.000 description 1
- 238000005240 physical vapour deposition Methods 0.000 description 1
- 229920005593 poly(benzyl methacrylate) Polymers 0.000 description 1
- 229920000196 poly(lauryl methacrylate) Polymers 0.000 description 1
- 239000004417 polycarbonate Substances 0.000 description 1
- 229920000515 polycarbonate Polymers 0.000 description 1
- 229920001223 polyethylene glycol Polymers 0.000 description 1
- 229920006254 polymer film Polymers 0.000 description 1
- 239000002952 polymeric resin Substances 0.000 description 1
- 229920002223 polystyrene Polymers 0.000 description 1
- 125000002924 primary amino group Chemical group [H]N([H])* 0.000 description 1
- 238000003847 radiation curing Methods 0.000 description 1
- 238000009877 rendering Methods 0.000 description 1
- SBIBMFFZSBJNJF-UHFFFAOYSA-N selenium;zinc Chemical compound [Se]=[Zn] SBIBMFFZSBJNJF-UHFFFAOYSA-N 0.000 description 1
- 150000004756 silanes Chemical class 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 150000003440 styrenes Chemical class 0.000 description 1
- 125000005504 styryl group Chemical group 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- OCGWQDWYSQAFTO-UHFFFAOYSA-N tellanylidenelead Chemical compound [Pb]=[Te] OCGWQDWYSQAFTO-UHFFFAOYSA-N 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- 150000003568 thioethers Chemical class 0.000 description 1
- 239000010936 titanium Substances 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- BPSIOYPQMFLKFR-UHFFFAOYSA-N trimethoxy-[3-(oxiran-2-ylmethoxy)propyl]silane Chemical compound CO[Si](OC)(OC)CCCOCC1CO1 BPSIOYPQMFLKFR-UHFFFAOYSA-N 0.000 description 1
- LENZDBCJOHFCAS-UHFFFAOYSA-N tris Chemical compound OCC(N)(CO)CO LENZDBCJOHFCAS-UHFFFAOYSA-N 0.000 description 1
- 239000012808 vapor phase Substances 0.000 description 1
- 230000000007 visual effect Effects 0.000 description 1
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/12—Reflex reflectors
- G02B5/122—Reflex reflectors cube corner, trihedral or triple reflector type
- G02B5/124—Reflex reflectors cube corner, trihedral or triple reflector type plural reflecting elements forming part of a unitary plate or sheet
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/12—Reflex reflectors
- G02B5/126—Reflex reflectors including curved refracting surface
- G02B5/128—Reflex reflectors including curved refracting surface transparent spheres being embedded in matrix
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S359/00—Optical: systems and elements
- Y10S359/90—Methods
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Optical Elements Other Than Lenses (AREA)
- Laminated Bodies (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US09/259,100 US6172810B1 (en) | 1999-02-26 | 1999-02-26 | Retroreflective articles having polymer multilayer reflective coatings |
| US09/259,100 | 1999-02-26 | ||
| PCT/US1999/011646 WO2000050931A1 (en) | 1999-02-26 | 1999-05-27 | Retroreflective articles having polymer multilayer reflective coatings |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CA2362637A1 true CA2362637A1 (en) | 2000-08-31 |
Family
ID=22983541
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CA002362637A Abandoned CA2362637A1 (en) | 1999-02-26 | 1999-05-27 | Retroreflective articles having polymer multilayer reflective coatings |
Country Status (11)
| Country | Link |
|---|---|
| US (4) | US6172810B1 (enExample) |
| EP (1) | EP1155346B1 (enExample) |
| JP (1) | JP2002538485A (enExample) |
| KR (1) | KR100609302B1 (enExample) |
| CN (1) | CN1158545C (enExample) |
| AU (1) | AU4208899A (enExample) |
| CA (1) | CA2362637A1 (enExample) |
| DE (1) | DE69905083T2 (enExample) |
| HK (1) | HK1043195A1 (enExample) |
| TW (1) | TWI292368B (enExample) |
| WO (1) | WO2000050931A1 (enExample) |
Families Citing this family (167)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| AU1339700A (en) * | 1998-11-02 | 2000-05-22 | Presstek, Inc. | Transparent conductive oxides for plastic flat panel displays |
| US6172810B1 (en) * | 1999-02-26 | 2001-01-09 | 3M Innovative Properties Company | Retroreflective articles having polymer multilayer reflective coatings |
| US6503564B1 (en) * | 1999-02-26 | 2003-01-07 | 3M Innovative Properties Company | Method of coating microstructured substrates with polymeric layer(s), allowing preservation of surface feature profile |
| JP3971529B2 (ja) * | 1999-03-03 | 2007-09-05 | 日本カーバイド工業株式会社 | 再帰反射シート |
| US6548164B1 (en) * | 1999-06-30 | 2003-04-15 | 3M Innovative Properties Company | Removable sheeting |
| US6590711B1 (en) | 2000-04-03 | 2003-07-08 | 3M Innovative Properties Co. | Light directing construction having corrosion resistant feature |
| US6623861B2 (en) * | 2001-04-16 | 2003-09-23 | Battelle Memorial Institute | Multilayer plastic substrates |
| US6413645B1 (en) | 2000-04-20 | 2002-07-02 | Battelle Memorial Institute | Ultrabarrier substrates |
| US20070196682A1 (en) * | 1999-10-25 | 2007-08-23 | Visser Robert J | Three dimensional multilayer barrier and method of making |
| US20100330748A1 (en) | 1999-10-25 | 2010-12-30 | Xi Chu | Method of encapsulating an environmentally sensitive device |
| US20090191342A1 (en) * | 1999-10-25 | 2009-07-30 | Vitex Systems, Inc. | Method for edge sealing barrier films |
| US6866901B2 (en) | 1999-10-25 | 2005-03-15 | Vitex Systems, Inc. | Method for edge sealing barrier films |
| US6521324B1 (en) | 1999-11-30 | 2003-02-18 | 3M Innovative Properties Company | Thermal transfer of microstructured layers |
| US6582777B1 (en) * | 2000-02-17 | 2003-06-24 | Applied Materials Inc. | Electron beam modification of CVD deposited low dielectric constant materials |
| US6735789B2 (en) | 2000-07-31 | 2004-05-18 | Southern Mills, Inc. | Reflective printing on flame resistant fabrics |
| US6892949B2 (en) * | 2000-12-29 | 2005-05-17 | Siemens Logistics And Assembly Systems Inc. | Low visual impact labeling method and system |
| US7311962B2 (en) * | 2001-07-16 | 2007-12-25 | Massachusetts Institute Of Technology | Method of forming reflecting dielectric mirrors |
| US7272285B2 (en) * | 2001-07-16 | 2007-09-18 | Massachusetts Institute Of Technology | Fiber waveguides and methods of making the same |
| US6789905B2 (en) * | 2001-08-17 | 2004-09-14 | Basf Corporation | Method of providing a retroreflective coating system through wet-on-wet application and a retroreflective coating system thereof |
| US20090208754A1 (en) * | 2001-09-28 | 2009-08-20 | Vitex Systems, Inc. | Method for edge sealing barrier films |
| US6632325B2 (en) * | 2002-02-07 | 2003-10-14 | Applied Materials, Inc. | Article for use in a semiconductor processing chamber and method of fabricating same |
| US8808457B2 (en) | 2002-04-15 | 2014-08-19 | Samsung Display Co., Ltd. | Apparatus for depositing a multilayer coating on discrete sheets |
| US8900366B2 (en) * | 2002-04-15 | 2014-12-02 | Samsung Display Co., Ltd. | Apparatus for depositing a multilayer coating on discrete sheets |
| US7215473B2 (en) * | 2002-08-17 | 2007-05-08 | 3M Innovative Properties Company | Enhanced heat mirror films |
| US6929864B2 (en) * | 2002-08-17 | 2005-08-16 | 3M Innovative Properties Company | Extensible, visible light-transmissive and infrared-reflective film and methods of making and using the film |
| US6933051B2 (en) * | 2002-08-17 | 2005-08-23 | 3M Innovative Properties Company | Flexible electrically conductive film |
| US6818291B2 (en) | 2002-08-17 | 2004-11-16 | 3M Innovative Properties Company | Durable transparent EMI shielding film |
| AU2003297588A1 (en) * | 2002-12-02 | 2004-06-23 | 3M Innovative Properties Company | Illumination system using a plurality of light sources |
| US7210977B2 (en) | 2003-01-27 | 2007-05-01 | 3M Innovative Properties Comapny | Phosphor based light source component and method of making |
| US7091653B2 (en) | 2003-01-27 | 2006-08-15 | 3M Innovative Properties Company | Phosphor based light sources having a non-planar long pass reflector |
| US7118438B2 (en) * | 2003-01-27 | 2006-10-10 | 3M Innovative Properties Company | Methods of making phosphor based light sources having an interference reflector |
| US7091661B2 (en) * | 2003-01-27 | 2006-08-15 | 3M Innovative Properties Company | Phosphor based light sources having a reflective polarizer |
| EP1588434A2 (en) * | 2003-01-27 | 2005-10-26 | 3M Innovative Properties Company | Phosphor based light source component and method of making |
| US7157839B2 (en) | 2003-01-27 | 2007-01-02 | 3M Innovative Properties Company | Phosphor based light sources utilizing total internal reflection |
| US20040145312A1 (en) * | 2003-01-27 | 2004-07-29 | 3M Innovative Properties Company | Phosphor based light source having a flexible short pass reflector |
| US7312560B2 (en) * | 2003-01-27 | 2007-12-25 | 3M Innovative Properties | Phosphor based light sources having a non-planar long pass reflector and method of making |
| US7245072B2 (en) * | 2003-01-27 | 2007-07-17 | 3M Innovative Properties Company | Phosphor based light sources having a polymeric long pass reflector |
| US7648925B2 (en) * | 2003-04-11 | 2010-01-19 | Vitex Systems, Inc. | Multilayer barrier stacks and methods of making multilayer barrier stacks |
| US7510913B2 (en) * | 2003-04-11 | 2009-03-31 | Vitex Systems, Inc. | Method of making an encapsulated plasma sensitive device |
| US20070006493A1 (en) * | 2003-05-12 | 2007-01-11 | Arnold Eberwein | Illuminated license plate for vehicles and vehicle provided with the same |
| US20070031641A1 (en) * | 2003-09-05 | 2007-02-08 | 3M Innovative Properties Company | License plate for back illumination and method for making same |
| US20050116635A1 (en) * | 2003-12-02 | 2005-06-02 | Walson James E. | Multiple LED source and method for assembling same |
| US20050116235A1 (en) * | 2003-12-02 | 2005-06-02 | Schultz John C. | Illumination assembly |
| US7456805B2 (en) * | 2003-12-18 | 2008-11-25 | 3M Innovative Properties Company | Display including a solid state light device and method using same |
| EP1700142A1 (en) * | 2003-12-30 | 2006-09-13 | 3M Innovative Properties Company | Color shifting retroreflector and method of making same |
| US20050181128A1 (en) * | 2004-02-12 | 2005-08-18 | Nikolov Anguel N. | Films for optical use and methods of making such films |
| PL1584518T3 (pl) * | 2004-04-07 | 2008-03-31 | 3M Innovative Properties Co | Zespół tablicy rejestracyjnej zawierający źródło światła i podświetloną tablicę rejestracyjną |
| US7331954B2 (en) | 2004-04-08 | 2008-02-19 | Omniguide, Inc. | Photonic crystal fibers and medical systems including photonic crystal fibers |
| US7167622B2 (en) * | 2004-04-08 | 2007-01-23 | Omniguide, Inc. | Photonic crystal fibers and medical systems including photonic crystal fibers |
| US7349589B2 (en) * | 2004-04-08 | 2008-03-25 | Omniguide, Inc. | Photonic crystal fibers and medical systems including photonic crystal fibers |
| JP5079499B2 (ja) * | 2004-05-12 | 2012-11-21 | リフレキサイト コーポレイション | 再帰反射性構造 |
| US7213958B2 (en) * | 2004-06-30 | 2007-05-08 | 3M Innovative Properties Company | Phosphor based illumination system having light guide and an interference reflector |
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| US5691846A (en) | 1993-10-20 | 1997-11-25 | Minnesota Mining And Manufacturing Company | Ultra-flexible retroreflective cube corner composite sheetings and methods of manufacture |
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| DE69524215T2 (de) | 1994-05-12 | 2002-07-18 | Minnesota Mining And Mfg. Co., Saint Paul | Retroreflektierender körper und herstellungsverfahren |
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-
1999
- 1999-02-26 US US09/259,100 patent/US6172810B1/en not_active Expired - Lifetime
- 1999-05-27 AU AU42088/99A patent/AU4208899A/en not_active Abandoned
- 1999-05-27 CN CNB998163651A patent/CN1158545C/zh not_active Expired - Fee Related
- 1999-05-27 CA CA002362637A patent/CA2362637A1/en not_active Abandoned
- 1999-05-27 KR KR1020017010844A patent/KR100609302B1/ko not_active Expired - Fee Related
- 1999-05-27 HK HK02102789.9A patent/HK1043195A1/zh unknown
- 1999-05-27 DE DE69905083T patent/DE69905083T2/de not_active Expired - Fee Related
- 1999-05-27 EP EP99925887A patent/EP1155346B1/en not_active Expired - Lifetime
- 1999-05-27 JP JP2000601471A patent/JP2002538485A/ja not_active Withdrawn
- 1999-05-27 WO PCT/US1999/011646 patent/WO2000050931A1/en not_active Ceased
-
2000
- 2000-01-31 TW TW089101638A patent/TWI292368B/zh active
- 2000-04-10 US US09/545,952 patent/US6224219B1/en not_active Expired - Lifetime
- 2000-04-10 US US09/545,931 patent/US6350034B1/en not_active Expired - Lifetime
- 2000-07-26 US US09/625,796 patent/US6243201B1/en not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| JP2002538485A (ja) | 2002-11-12 |
| CN1338058A (zh) | 2002-02-27 |
| DE69905083D1 (de) | 2003-02-27 |
| HK1043195A1 (zh) | 2002-09-06 |
| US6243201B1 (en) | 2001-06-05 |
| US6224219B1 (en) | 2001-05-01 |
| WO2000050931A1 (en) | 2000-08-31 |
| KR100609302B1 (ko) | 2006-08-09 |
| AU4208899A (en) | 2000-09-14 |
| US6172810B1 (en) | 2001-01-09 |
| EP1155346B1 (en) | 2003-01-22 |
| TWI292368B (enExample) | 2008-01-11 |
| US6350034B1 (en) | 2002-02-26 |
| KR20010102392A (ko) | 2001-11-15 |
| EP1155346A1 (en) | 2001-11-21 |
| CN1158545C (zh) | 2004-07-21 |
| DE69905083T2 (de) | 2003-05-22 |
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