CA2078830A1 - Positive type radiation-sensitive resist composition - Google Patents

Positive type radiation-sensitive resist composition

Info

Publication number
CA2078830A1
CA2078830A1 CA002078830A CA2078830A CA2078830A1 CA 2078830 A1 CA2078830 A1 CA 2078830A1 CA 002078830 A CA002078830 A CA 002078830A CA 2078830 A CA2078830 A CA 2078830A CA 2078830 A1 CA2078830 A1 CA 2078830A1
Authority
CA
Canada
Prior art keywords
positive type
resist composition
radiation
sensitive resist
sensitive
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
CA002078830A
Other languages
English (en)
French (fr)
Inventor
Hiroshi Moriuma
Hirotoshi Nakanishi
Yasunori Uetani
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sumitomo Chemical Co Ltd
Original Assignee
Sumitomo Chemical Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sumitomo Chemical Co Ltd filed Critical Sumitomo Chemical Co Ltd
Publication of CA2078830A1 publication Critical patent/CA2078830A1/en
Abandoned legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/04—Chromates
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides
    • G03F7/0226—Quinonediazides characterised by the non-macromolecular additives
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/106—Binder containing
    • Y10S430/11—Vinyl alcohol polymer or derivative

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Materials For Photolithography (AREA)
  • Phenolic Resins Or Amino Resins (AREA)
CA002078830A 1991-11-01 1992-09-22 Positive type radiation-sensitive resist composition Abandoned CA2078830A1 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP3287648A JP3039048B2 (ja) 1991-11-01 1991-11-01 ポジ型感放射線性レジスト組成物
JP03-287648 1991-11-01

Publications (1)

Publication Number Publication Date
CA2078830A1 true CA2078830A1 (en) 1993-05-02

Family

ID=17719932

Family Applications (1)

Application Number Title Priority Date Filing Date
CA002078830A Abandoned CA2078830A1 (en) 1991-11-01 1992-09-22 Positive type radiation-sensitive resist composition

Country Status (8)

Country Link
US (1) US5275910A (enExample)
EP (1) EP0539778B1 (enExample)
JP (1) JP3039048B2 (enExample)
KR (1) KR100192769B1 (enExample)
CA (1) CA2078830A1 (enExample)
DE (1) DE69226600T2 (enExample)
MX (1) MX9206155A (enExample)
TW (1) TW269019B (enExample)

Families Citing this family (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO1996022563A1 (en) * 1995-01-17 1996-07-25 Nippon Zeon Co., Ltd. Positive resist composition
JP3427562B2 (ja) * 1995-05-09 2003-07-22 住友化学工業株式会社 ポジ型レジスト組成物
JP3433017B2 (ja) * 1995-08-31 2003-08-04 株式会社東芝 感光性組成物
JPH1124271A (ja) * 1997-06-30 1999-01-29 Kurarianto Japan Kk 高耐熱性放射線感応性レジスト組成物
JP4057704B2 (ja) * 1998-07-10 2008-03-05 本州化学工業株式会社 ９，９−ビス（アルキル置換−４−ヒドロキシフェニル）フルオレン類とその製造方法
JP4429620B2 (ja) * 2002-10-15 2010-03-10 出光興産株式会社 感放射線性有機化合物
EP2381308B1 (en) * 2003-06-23 2015-07-29 Sumitomo Bakelite Co., Ltd. Positive-working photosensitive resin composition, method for producing pattern-formed resin film, semiconductor device, display device, and method for producing the semiconductor device and the display device
WO2005029189A1 (ja) * 2003-09-18 2005-03-31 Mitsubishi Gas Chemical Company, Inc. レジスト用化合物および感放射線性組成物
US7303855B2 (en) 2003-10-03 2007-12-04 Shin-Etsu Chemical Co., Ltd. Photoresist undercoat-forming material and patterning process
JP4575680B2 (ja) * 2004-02-23 2010-11-04 大阪瓦斯株式会社 新規フルオレン化合物
WO2005097725A1 (ja) * 2004-04-05 2005-10-20 Idemitsu Kosan Co., Ltd. カリックスレゾルシナレン化合物、フォトレジスト基材及びその組成物
JP4678195B2 (ja) * 2005-02-03 2011-04-27 三菱瓦斯化学株式会社 フェナントレンキノン誘導体及びその製造方法
DE102008017591A1 (de) * 2008-04-07 2009-10-08 Merck Patent Gmbh Neue Materialien für organische Elektrolumineszenzvorrichtungen
KR100913058B1 (ko) * 2008-08-25 2009-08-20 금호석유화학 주식회사 포지티브형 감광성 수지 조성물, 패턴 형성 방법 및 반도체소자
WO2016148176A1 (ja) * 2015-03-19 2016-09-22 東レ株式会社 ポジ型感光性樹脂組成物、硬化膜、ｔｆｔ基板、層間絶縁膜、表示装置、およびその製造方法
CN112745201A (zh) * 2020-12-25 2021-05-04 长春长光宇航复合材料有限公司 含芴环结构生物基双酚单体、生物基环氧树脂单体、生物基环氧树脂材料及其制备方法

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH063544B2 (ja) * 1988-07-07 1994-01-12 住友化学工業株式会社 ポジ型感放射線性レジスト組成物
AT393502B (de) * 1989-04-17 1991-11-11 Isovolta Verfahren zur synthese von 9,9-bis(4-hydroxyphenyl)fluoren
JP2629990B2 (ja) * 1989-12-20 1997-07-16 住友化学工業株式会社 ポジ型レジスト用組成物
JPH087435B2 (ja) * 1989-12-28 1996-01-29 日本ゼオン株式会社 ポジ型レジスト組成物
JPH061377B2 (ja) * 1989-12-28 1994-01-05 日本ゼオン株式会社 ポジ型レジスト組成物
JP2629403B2 (ja) * 1990-04-28 1997-07-09 東レ株式会社 ポジ型フォトレジスト組成物
JPH0413146A (ja) * 1990-05-02 1992-01-17 Sumitomo Chem Co Ltd 新規レジスト組成物
US5130225A (en) * 1990-05-24 1992-07-14 Sumitomo Chemical Co. Ltd. Positive resist composition comprising a cyclic dimer of isopropenyl phenol, also known as a 1,1,3 trimethyl-3-hydroxyphenyl indane

Also Published As

Publication number Publication date
MX9206155A (es) 1993-05-01
KR930010615A (ko) 1993-06-22
JPH05127374A (ja) 1993-05-25
EP0539778B1 (en) 1998-08-12
DE69226600D1 (de) 1998-09-17
KR100192769B1 (ko) 1999-06-15
EP0539778A1 (en) 1993-05-05
JP3039048B2 (ja) 2000-05-08
TW269019B (enExample) 1996-01-21
DE69226600T2 (de) 1999-02-04
US5275910A (en) 1994-01-04

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Legal Events

Date Code Title Description
EEER Examination request
FZDE Discontinued