CA1325855C - Encapsulated high brightness electron beam source and system therefor - Google Patents
Encapsulated high brightness electron beam source and system thereforInfo
- Publication number
- CA1325855C CA1325855C CA000597168A CA597168A CA1325855C CA 1325855 C CA1325855 C CA 1325855C CA 000597168 A CA000597168 A CA 000597168A CA 597168 A CA597168 A CA 597168A CA 1325855 C CA1325855 C CA 1325855C
- Authority
- CA
- Canada
- Prior art keywords
- source
- vacuum enclosure
- vacuum
- differential pressure
- pumping
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 238000010894 electron beam technology Methods 0.000 title claims abstract description 53
- 238000005086 pumping Methods 0.000 claims description 77
- 238000004891 communication Methods 0.000 claims description 13
- 239000000463 material Substances 0.000 claims description 13
- 230000008878 coupling Effects 0.000 claims description 12
- 238000010168 coupling process Methods 0.000 claims description 12
- 238000005859 coupling reaction Methods 0.000 claims description 12
- 229910001069 Ti alloy Inorganic materials 0.000 claims description 8
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 claims description 6
- 229910052737 gold Inorganic materials 0.000 claims description 6
- 239000010931 gold Substances 0.000 claims description 6
- 238000009434 installation Methods 0.000 claims description 6
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 claims description 6
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 claims description 3
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 claims description 3
- 239000011733 molybdenum Substances 0.000 claims description 3
- 229910052697 platinum Inorganic materials 0.000 claims description 3
- 229910052709 silver Inorganic materials 0.000 claims description 3
- 239000004332 silver Substances 0.000 claims description 3
- 238000012360 testing method Methods 0.000 claims description 3
- 239000000203 mixture Substances 0.000 claims description 2
- 229910052750 molybdenum Inorganic materials 0.000 claims description 2
- 238000007789 sealing Methods 0.000 claims 4
- 229910001182 Mo alloy Inorganic materials 0.000 claims 1
- 238000003384 imaging method Methods 0.000 claims 1
- 230000004913 activation Effects 0.000 description 8
- 230000007420 reactivation Effects 0.000 description 8
- 239000012212 insulator Substances 0.000 description 6
- 241000239290 Araneae Species 0.000 description 5
- 238000010438 heat treatment Methods 0.000 description 5
- 239000004020 conductor Substances 0.000 description 4
- 238000010276 construction Methods 0.000 description 4
- 238000003860 storage Methods 0.000 description 4
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 3
- 239000000919 ceramic Substances 0.000 description 3
- 229910052802 copper Inorganic materials 0.000 description 3
- 239000010949 copper Substances 0.000 description 3
- 239000007789 gas Substances 0.000 description 3
- 238000010943 off-gassing Methods 0.000 description 3
- 238000001179 sorption measurement Methods 0.000 description 3
- PNEYBMLMFCGWSK-UHFFFAOYSA-N Alumina Chemical compound [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 2
- QCWXUUIWCKQGHC-UHFFFAOYSA-N Zirconium Chemical compound [Zr] QCWXUUIWCKQGHC-UHFFFAOYSA-N 0.000 description 2
- 230000006978 adaptation Effects 0.000 description 2
- 230000004075 alteration Effects 0.000 description 2
- 238000005247 gettering Methods 0.000 description 2
- 230000003287 optical effect Effects 0.000 description 2
- 239000010963 304 stainless steel Substances 0.000 description 1
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
- 229910000589 SAE 304 stainless steel Inorganic materials 0.000 description 1
- 230000009471 action Effects 0.000 description 1
- 239000011149 active material Substances 0.000 description 1
- 239000001678 brown HT Substances 0.000 description 1
- 229910010293 ceramic material Inorganic materials 0.000 description 1
- 238000011109 contamination Methods 0.000 description 1
- 230000001186 cumulative effect Effects 0.000 description 1
- 238000007872 degassing Methods 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 238000009792 diffusion process Methods 0.000 description 1
- 238000000609 electron-beam lithography Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 238000010348 incorporation Methods 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 238000000386 microscopy Methods 0.000 description 1
- 229910000595 mu-metal Inorganic materials 0.000 description 1
- 229910000986 non-evaporable getter Inorganic materials 0.000 description 1
- 238000013021 overheating Methods 0.000 description 1
- 230000008569 process Effects 0.000 description 1
- 230000000750 progressive effect Effects 0.000 description 1
- 239000011241 protective layer Substances 0.000 description 1
- 238000003303 reheating Methods 0.000 description 1
- 238000011160 research Methods 0.000 description 1
- 238000001275 scanning Auger electron spectroscopy Methods 0.000 description 1
- 238000004626 scanning electron microscopy Methods 0.000 description 1
- 241000894007 species Species 0.000 description 1
- 230000001960 triggered effect Effects 0.000 description 1
- 229910052726 zirconium Inorganic materials 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
- H01J37/06—Electron sources; Electron guns
- H01J37/073—Electron guns using field emission, photo emission, or secondary emission electron sources
Landscapes
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Electron Sources, Ion Sources (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US183,643 | 1988-04-19 | ||
| US07/183,643 US4833362A (en) | 1988-04-19 | 1988-04-19 | Encapsulated high brightness electron beam source and system |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CA1325855C true CA1325855C (en) | 1994-01-04 |
Family
ID=22673704
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CA000597168A Expired - Fee Related CA1325855C (en) | 1988-04-19 | 1989-04-19 | Encapsulated high brightness electron beam source and system therefor |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US4833362A (de) |
| EP (1) | EP0411043B1 (de) |
| JP (1) | JP2779026B2 (de) |
| CA (1) | CA1325855C (de) |
| DE (1) | DE68927052T2 (de) |
| WO (1) | WO1989010628A1 (de) |
Families Citing this family (22)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| NL9000056A (nl) * | 1990-01-10 | 1991-08-01 | Philips Nv | Afsluitinrichting voor deeltjesbundel apparaat. |
| NL9000057A (nl) * | 1990-01-10 | 1991-08-01 | Philips Nv | Thermisch bedienbare vacuumklep voor deeltjesbundel apparaat. |
| US5150001A (en) * | 1990-04-10 | 1992-09-22 | Orchid One Corporation | Field emission electron gun and method having complementary passive and active vacuum pumping |
| US5008549A (en) * | 1990-04-10 | 1991-04-16 | Orchid One Corporation | High performance, vacuum compatible electromagnetic lens coil |
| US5241182A (en) * | 1991-06-18 | 1993-08-31 | Fei Company | Precision electrostatic lens system and method of manufacture |
| JP2732961B2 (ja) * | 1991-07-18 | 1998-03-30 | 株式会社日立製作所 | 荷電粒子線装置 |
| US5304888A (en) * | 1992-01-24 | 1994-04-19 | Etec Systems, Inc. | Mechanically stable field emission gun |
| JPH0719554B2 (ja) * | 1993-03-25 | 1995-03-06 | 工業技術院長 | 荷電ビーム装置 |
| US5909032A (en) * | 1995-01-05 | 1999-06-01 | American International Technologies, Inc. | Apparatus and method for a modular electron beam system for the treatment of surfaces |
| US6252339B1 (en) * | 1998-09-17 | 2001-06-26 | Nikon Corporation | Removable bombardment filament-module for electron beam projection systems |
| EP1249855B1 (de) * | 2001-04-09 | 2008-07-09 | ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH | Vorrichtung und Verfahren zur Kontrolle von fokussierten Elektronenstrahlen |
| JP4538441B2 (ja) * | 2003-09-10 | 2010-09-08 | 株式会社日立ハイテクノロジーズ | 電子線応用装置 |
| JP4349964B2 (ja) * | 2003-09-10 | 2009-10-21 | 株式会社日立ハイテクノロジーズ | 小型電子銃 |
| JP4751635B2 (ja) * | 2005-04-13 | 2011-08-17 | 株式会社日立ハイテクノロジーズ | 磁界重畳型電子銃 |
| JP4977399B2 (ja) * | 2005-11-10 | 2012-07-18 | 株式会社日立ハイテクノロジーズ | 荷電粒子線装置 |
| JP5016988B2 (ja) * | 2007-06-19 | 2012-09-05 | 株式会社日立ハイテクノロジーズ | 荷電粒子線装置およびその真空立上げ方法 |
| JP5514472B2 (ja) * | 2008-05-28 | 2014-06-04 | 株式会社日立ハイテクノロジーズ | 荷電粒子線装置 |
| DE112009001537B8 (de) | 2008-06-20 | 2019-01-24 | Hitachi High-Technologies Corporation | Vorrichtung mit geladenem Teilchenstrahl und Verfahren zum Steuern der Vorrichtung |
| JP5680557B2 (ja) * | 2009-02-22 | 2015-03-04 | マッパー・リソグラフィー・アイピー・ビー．ブイ． | 荷電粒子リソグラフィ装置 |
| US20150221487A9 (en) * | 2013-05-09 | 2015-08-06 | Arash Akhavan Fomani | Surface adsorption vacuum pumps and methods for producing adsorbate-free surfaces |
| WO2017046886A1 (ja) | 2015-09-16 | 2017-03-23 | 株式会社日立ハイテクノロジーズ | 真空装置 |
| IT201800007349A1 (it) * | 2018-07-19 | 2020-01-19 | Apparecchio multistadio per vuoto con separazione degli stadi controllata da un attuatore in lega a memoria di forma |
Family Cites Families (18)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3678333A (en) * | 1970-06-15 | 1972-07-18 | American Optical Corp | Field emission electron gun utilizing means for protecting the field emission tip from high voltage discharges |
| US3881125A (en) * | 1972-08-17 | 1975-04-29 | Tektronix Inc | Separable-chamber electron-beam tube including means for puncturing a pressure seal therein |
| JPS49107949U (de) * | 1972-12-29 | 1974-09-14 | ||
| JPS5034461A (de) * | 1973-07-31 | 1975-04-02 | ||
| JPS5518014B2 (de) * | 1974-12-20 | 1980-05-15 | ||
| JPS5249761A (en) * | 1975-10-20 | 1977-04-21 | Hitachi Ltd | Field emission electronic gun |
| US4074313A (en) * | 1976-06-14 | 1978-02-14 | Rca Corporation | Electron beam disc recorder |
| JPS53137660A (en) * | 1977-05-09 | 1978-12-01 | Hitachi Ltd | Electron gun |
| JPS54124966A (en) * | 1978-03-23 | 1979-09-28 | Jeol Ltd | Exhasut system of particle-beam equipment |
| IT1198325B (it) * | 1980-06-04 | 1988-12-21 | Getters Spa | Struttura e composizione getteranti,particolarmente adatti per basse temperature |
| JPS58146344U (ja) * | 1982-03-26 | 1983-10-01 | 日本電子株式会社 | 荷電粒子源 |
| JPS5971561U (ja) * | 1982-11-04 | 1984-05-15 | 株式会社日立製作所 | 粒子線装置の真空保護装置 |
| JPS5979969U (ja) * | 1982-11-18 | 1984-05-30 | 日本電子株式会社 | カ−トリツジ式電子銃の接続構造 |
| JPS62140333A (ja) * | 1985-12-16 | 1987-06-23 | Hitachi Ltd | 電界放射陰極 |
| JPS632180U (de) * | 1986-06-24 | 1988-01-08 | ||
| US4725736A (en) * | 1986-08-11 | 1988-02-16 | Electron Beam Memories | Electrostatic electron gun with integrated electron beam deflection and/or stigmating system |
| JPS6351037A (ja) * | 1986-08-20 | 1988-03-04 | Toshiba Corp | 電子ビ−ム装置の陽極室 |
| WO1988002180A1 (en) * | 1986-09-18 | 1988-03-24 | Crewe Albert V | Differential pressure electron beam system, method and gun |
-
1988
- 1988-04-19 US US07/183,643 patent/US4833362A/en not_active Expired - Lifetime
-
1989
- 1989-04-18 WO PCT/US1989/001626 patent/WO1989010628A1/en active IP Right Grant
- 1989-04-18 DE DE68927052T patent/DE68927052T2/de not_active Expired - Fee Related
- 1989-04-18 EP EP89905572A patent/EP0411043B1/de not_active Expired - Lifetime
- 1989-04-18 JP JP1505244A patent/JP2779026B2/ja not_active Expired - Lifetime
- 1989-04-19 CA CA000597168A patent/CA1325855C/en not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| EP0411043A1 (de) | 1991-02-06 |
| JP2779026B2 (ja) | 1998-07-23 |
| EP0411043B1 (de) | 1996-08-28 |
| JPH03505386A (ja) | 1991-11-21 |
| US4833362A (en) | 1989-05-23 |
| DE68927052T2 (de) | 1997-03-20 |
| WO1989010628A1 (en) | 1989-11-02 |
| DE68927052D1 (de) | 1996-10-02 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| MKLA | Lapsed |