JPS54124966A - Exhasut system of particle-beam equipment - Google Patents
Exhasut system of particle-beam equipmentInfo
- Publication number
- JPS54124966A JPS54124966A JP3352578A JP3352578A JPS54124966A JP S54124966 A JPS54124966 A JP S54124966A JP 3352578 A JP3352578 A JP 3352578A JP 3352578 A JP3352578 A JP 3352578A JP S54124966 A JPS54124966 A JP S54124966A
- Authority
- JP
- Japan
- Prior art keywords
- chamber
- pump
- electron
- gun
- vacuum
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Manufacture Of Electron Tubes, Discharge Lamp Vessels, Lead-In Wires, And The Like (AREA)
Abstract
PURPOSE: To shorten a time for recovery to fixed pressure and to stabilize a dischrage current by providing a high vacuum pump and an extremely-high vacuum pump for the evacuation of a vacuum chamber and by evacuating the chamber using two pumps when the pressure of the vacuum chamber becomes higher than the fixed pressure.
CONSTITUTION: Electron-gun chamber 2 is provided over mirror 1 of a scanning electron microscope, and in the chamber, electron gun 3 using LaB6 for a cathode material is arranged. Then, electron beams from this electron gun 3 are focused by condenser lenses 4a and 4b and caused to strike sample 6 on stage 7 arranged in sample chamber 5. In this constitution, oil diffusing pump 8 is connected to electron- gun chamber 2 and sample chamber 5 and low-vacuum oil pump 10 is to its backpressure side. Further, extremely-high vacuum ion pump 14 controlled by power supply 16 is connected to electron-gun chamber 2 and decision circuit 17 discriminates the current of pump 14 to control sluice valve 12 to the other pump. In addition, vacuum-degree measuring circuit 18 and timer 20 are combined to control the operations of pumps.
COPYRIGHT: (C)1979,JPO&Japio
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP3352578A JPS54124966A (en) | 1978-03-23 | 1978-03-23 | Exhasut system of particle-beam equipment |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP3352578A JPS54124966A (en) | 1978-03-23 | 1978-03-23 | Exhasut system of particle-beam equipment |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS54124966A true JPS54124966A (en) | 1979-09-28 |
Family
ID=12388952
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP3352578A Pending JPS54124966A (en) | 1978-03-23 | 1978-03-23 | Exhasut system of particle-beam equipment |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS54124966A (en) |
Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS58135558A (en) * | 1982-02-06 | 1983-08-12 | Jeol Ltd | Vacuum discharge system of electron microscope, etc. |
JPS6086747A (en) * | 1983-10-19 | 1985-05-16 | Natl Inst For Res In Inorg Mater | Ultra-high vacuum exhaustion method |
EP0199575A2 (en) * | 1985-04-25 | 1986-10-29 | Image Graphics, Inc. | A vacuum system for a charged particle beam recording system |
US4833362A (en) * | 1988-04-19 | 1989-05-23 | Orchid One | Encapsulated high brightness electron beam source and system |
JPH05325859A (en) * | 1992-05-22 | 1993-12-10 | Hitachi Ltd | Electron beam irradiation device |
US5376799A (en) * | 1993-04-26 | 1994-12-27 | Rj Lee Group, Inc. | Turbo-pumped scanning electron microscope |
-
1978
- 1978-03-23 JP JP3352578A patent/JPS54124966A/en active Pending
Cited By (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS58135558A (en) * | 1982-02-06 | 1983-08-12 | Jeol Ltd | Vacuum discharge system of electron microscope, etc. |
JPS6086747A (en) * | 1983-10-19 | 1985-05-16 | Natl Inst For Res In Inorg Mater | Ultra-high vacuum exhaustion method |
JPH0255898B2 (en) * | 1983-10-19 | 1990-11-28 | Kagaku Gijutsucho Mukizaishitsu Kenkyushocho | |
EP0199575A2 (en) * | 1985-04-25 | 1986-10-29 | Image Graphics, Inc. | A vacuum system for a charged particle beam recording system |
US4833362A (en) * | 1988-04-19 | 1989-05-23 | Orchid One | Encapsulated high brightness electron beam source and system |
JPH05325859A (en) * | 1992-05-22 | 1993-12-10 | Hitachi Ltd | Electron beam irradiation device |
US5376799A (en) * | 1993-04-26 | 1994-12-27 | Rj Lee Group, Inc. | Turbo-pumped scanning electron microscope |
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