JPS54124966A - Exhasut system of particle-beam equipment - Google Patents

Exhasut system of particle-beam equipment

Info

Publication number
JPS54124966A
JPS54124966A JP3352578A JP3352578A JPS54124966A JP S54124966 A JPS54124966 A JP S54124966A JP 3352578 A JP3352578 A JP 3352578A JP 3352578 A JP3352578 A JP 3352578A JP S54124966 A JPS54124966 A JP S54124966A
Authority
JP
Japan
Prior art keywords
chamber
pump
electron
gun
vacuum
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP3352578A
Other languages
Japanese (ja)
Inventor
Seiichi Nakagawa
Masanori Nakanishi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Jeol Ltd
Original Assignee
Jeol Ltd
Nihon Denshi KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Jeol Ltd, Nihon Denshi KK filed Critical Jeol Ltd
Priority to JP3352578A priority Critical patent/JPS54124966A/en
Publication of JPS54124966A publication Critical patent/JPS54124966A/en
Pending legal-status Critical Current

Links

Landscapes

  • Manufacture Of Electron Tubes, Discharge Lamp Vessels, Lead-In Wires, And The Like (AREA)

Abstract

PURPOSE: To shorten a time for recovery to fixed pressure and to stabilize a dischrage current by providing a high vacuum pump and an extremely-high vacuum pump for the evacuation of a vacuum chamber and by evacuating the chamber using two pumps when the pressure of the vacuum chamber becomes higher than the fixed pressure.
CONSTITUTION: Electron-gun chamber 2 is provided over mirror 1 of a scanning electron microscope, and in the chamber, electron gun 3 using LaB6 for a cathode material is arranged. Then, electron beams from this electron gun 3 are focused by condenser lenses 4a and 4b and caused to strike sample 6 on stage 7 arranged in sample chamber 5. In this constitution, oil diffusing pump 8 is connected to electron- gun chamber 2 and sample chamber 5 and low-vacuum oil pump 10 is to its backpressure side. Further, extremely-high vacuum ion pump 14 controlled by power supply 16 is connected to electron-gun chamber 2 and decision circuit 17 discriminates the current of pump 14 to control sluice valve 12 to the other pump. In addition, vacuum-degree measuring circuit 18 and timer 20 are combined to control the operations of pumps.
COPYRIGHT: (C)1979,JPO&Japio
JP3352578A 1978-03-23 1978-03-23 Exhasut system of particle-beam equipment Pending JPS54124966A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP3352578A JPS54124966A (en) 1978-03-23 1978-03-23 Exhasut system of particle-beam equipment

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP3352578A JPS54124966A (en) 1978-03-23 1978-03-23 Exhasut system of particle-beam equipment

Publications (1)

Publication Number Publication Date
JPS54124966A true JPS54124966A (en) 1979-09-28

Family

ID=12388952

Family Applications (1)

Application Number Title Priority Date Filing Date
JP3352578A Pending JPS54124966A (en) 1978-03-23 1978-03-23 Exhasut system of particle-beam equipment

Country Status (1)

Country Link
JP (1) JPS54124966A (en)

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58135558A (en) * 1982-02-06 1983-08-12 Jeol Ltd Vacuum discharge system of electron microscope, etc.
JPS6086747A (en) * 1983-10-19 1985-05-16 Natl Inst For Res In Inorg Mater Ultra-high vacuum exhaustion method
EP0199575A2 (en) * 1985-04-25 1986-10-29 Image Graphics, Inc. A vacuum system for a charged particle beam recording system
US4833362A (en) * 1988-04-19 1989-05-23 Orchid One Encapsulated high brightness electron beam source and system
JPH05325859A (en) * 1992-05-22 1993-12-10 Hitachi Ltd Electron beam irradiation device
US5376799A (en) * 1993-04-26 1994-12-27 Rj Lee Group, Inc. Turbo-pumped scanning electron microscope

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58135558A (en) * 1982-02-06 1983-08-12 Jeol Ltd Vacuum discharge system of electron microscope, etc.
JPS6086747A (en) * 1983-10-19 1985-05-16 Natl Inst For Res In Inorg Mater Ultra-high vacuum exhaustion method
JPH0255898B2 (en) * 1983-10-19 1990-11-28 Kagaku Gijutsucho Mukizaishitsu Kenkyushocho
EP0199575A2 (en) * 1985-04-25 1986-10-29 Image Graphics, Inc. A vacuum system for a charged particle beam recording system
US4833362A (en) * 1988-04-19 1989-05-23 Orchid One Encapsulated high brightness electron beam source and system
JPH05325859A (en) * 1992-05-22 1993-12-10 Hitachi Ltd Electron beam irradiation device
US5376799A (en) * 1993-04-26 1994-12-27 Rj Lee Group, Inc. Turbo-pumped scanning electron microscope

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