JPS5583143A - Exhaust system for electron beam equipment - Google Patents
Exhaust system for electron beam equipmentInfo
- Publication number
- JPS5583143A JPS5583143A JP15886178A JP15886178A JPS5583143A JP S5583143 A JPS5583143 A JP S5583143A JP 15886178 A JP15886178 A JP 15886178A JP 15886178 A JP15886178 A JP 15886178A JP S5583143 A JPS5583143 A JP S5583143A
- Authority
- JP
- Japan
- Prior art keywords
- exhaust tube
- specimen
- sub
- chamber
- exhaust
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Abstract
PURPOSE: To prevent the pressure rise in electron gun chamber occurring during replacement of specimen without requiring dedicated vacuum pump, by providing such as orifice electromagnetic valve for reducing the exhaust conductance of sub- exhaust tube connected to specimen chamber.
CONSTITUTION: Orifice type electromagnetic valve 15, for example, is provided to aux. exhaust tube 14 for bypassing the main valve 5b provided on sub-exhaust tube 6b connected to specimen chamber 4, where the exhaust conductance due to exhaust tube 14 is made considerably smaller than that due to sub-exhaust tube 6b. Cooling trap 16 is provided at the cross-point between main exhaust tube 6 and sub-exhaust tube 6b connected to specimen chamber 4, and when providing said trap gas molecule from specimen chamber 4 through tube 6b impinges more than one time against the cooling face of trap. Consequently the pressure rise in electron chamber during replacement of specimen can be prevented.
COPYRIGHT: (C)1980,JPO&Japio
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP15886178A JPS5583143A (en) | 1978-12-19 | 1978-12-19 | Exhaust system for electron beam equipment |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP15886178A JPS5583143A (en) | 1978-12-19 | 1978-12-19 | Exhaust system for electron beam equipment |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS5583143A true JPS5583143A (en) | 1980-06-23 |
Family
ID=15680995
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP15886178A Pending JPS5583143A (en) | 1978-12-19 | 1978-12-19 | Exhaust system for electron beam equipment |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5583143A (en) |
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS59164471A (en) * | 1983-03-07 | 1984-09-17 | Anelva Corp | Conductance valve pressure controller |
| JPS59192258U (en) * | 1983-06-09 | 1984-12-20 | セイコーインスツルメンツ株式会社 | Aerotonic device in X-ray analyzer |
| JPS6363954A (en) * | 1986-09-05 | 1988-03-22 | Shimadzu Corp | Fluorescent x-ray analyzer |
| US5442183A (en) * | 1990-06-20 | 1995-08-15 | Hitachi, Ltd. | Charged particle beam apparatus including means for maintaining a vacuum seal |
| CN103370768A (en) * | 2011-03-01 | 2013-10-23 | 应用材料公司 | Vacuum chambers with shared pump |
-
1978
- 1978-12-19 JP JP15886178A patent/JPS5583143A/en active Pending
Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS59164471A (en) * | 1983-03-07 | 1984-09-17 | Anelva Corp | Conductance valve pressure controller |
| JPS59192258U (en) * | 1983-06-09 | 1984-12-20 | セイコーインスツルメンツ株式会社 | Aerotonic device in X-ray analyzer |
| JPS6363954A (en) * | 1986-09-05 | 1988-03-22 | Shimadzu Corp | Fluorescent x-ray analyzer |
| US5442183A (en) * | 1990-06-20 | 1995-08-15 | Hitachi, Ltd. | Charged particle beam apparatus including means for maintaining a vacuum seal |
| CN103370768A (en) * | 2011-03-01 | 2013-10-23 | 应用材料公司 | Vacuum chambers with shared pump |
| CN107164742A (en) * | 2011-03-01 | 2017-09-15 | 应用材料公司 | Vacuum chamber with shared pump |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JPS5620163A (en) | Beryllium oxide film and its formation | |
| JPS5583143A (en) | Exhaust system for electron beam equipment | |
| JPS57134559A (en) | Physical vapor deposition device | |
| JPS5460236A (en) | Etching method | |
| JPS5222477A (en) | Sic-si type equalizing tube for manufacturing gas impermeable semi conductors | |
| JPS544061A (en) | Test piece chamber for electronic microscope or the like | |
| JPS54124966A (en) | Exhasut system of particle-beam equipment | |
| JPS5344953A (en) | Bleeding equipment of refrigerator | |
| JPS524924A (en) | Pressure regulating equipment for exhaust system | |
| JPS5747800A (en) | Etching method for crystal substrate | |
| JPS5211323A (en) | Change valve of secondary air | |
| JPS5357743A (en) | Manufacture of cathode-ray tube | |
| EP0058137A3 (en) | Apparatus for providing x-rays | |
| JPS53126859A (en) | Field radiation type electronic gun | |
| JPS5423464A (en) | Exhaust system for vacuum unit | |
| JPS53135564A (en) | Thermal cathode and its manufacture | |
| JPS5542127A (en) | Electron beam welder | |
| JPS54146281A (en) | Metallizing apparatus by activation reaction | |
| EP0032709A3 (en) | Apparatus and method for the (patterned) coating of a substrate by cathodic sputtering and use thereof | |
| JPS51117568A (en) | Electron gun for use in electron microscope | |
| GB806381A (en) | Improvements in or relating to methods of, and apparatus for, etching metal surfaces by ionic bombardment and to articles produced thereby | |
| JPS56104178A (en) | Film coating differential air exhaust equipment in vacuum range | |
| JPS6482431A (en) | Ionized material introducing device | |
| JPS56165574A (en) | Electron beam welding method | |
| JPS5360406A (en) | Condenser exhaust gas control equipment |