DE68927052D1 - Gekapselte elektronenquelle hoher helligkeit und dazugehörige vorrichtung - Google Patents

Gekapselte elektronenquelle hoher helligkeit und dazugehörige vorrichtung

Info

Publication number
DE68927052D1
DE68927052D1 DE68927052T DE68927052T DE68927052D1 DE 68927052 D1 DE68927052 D1 DE 68927052D1 DE 68927052 T DE68927052 T DE 68927052T DE 68927052 T DE68927052 T DE 68927052T DE 68927052 D1 DE68927052 D1 DE 68927052D1
Authority
DE
Germany
Prior art keywords
high brightness
electron source
related device
enclosed high
brightness electron
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE68927052T
Other languages
English (en)
Other versions
DE68927052T2 (de
Inventor
Albert Crewe
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Orchid One Corp
Original Assignee
Orchid One Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Orchid One Corp filed Critical Orchid One Corp
Application granted granted Critical
Publication of DE68927052D1 publication Critical patent/DE68927052D1/de
Publication of DE68927052T2 publication Critical patent/DE68927052T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement, ion-optical arrangement
    • H01J37/06—Electron sources; Electron guns
    • H01J37/073—Electron guns using field emission, photo emission, or secondary emission electron sources

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Electron Sources, Ion Sources (AREA)
DE68927052T 1988-04-19 1989-04-18 Gekapselte elektronenquelle hoher helligkeit und dazugehörige vorrichtung Expired - Fee Related DE68927052T2 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US07/183,643 US4833362A (en) 1988-04-19 1988-04-19 Encapsulated high brightness electron beam source and system
PCT/US1989/001626 WO1989010628A1 (en) 1988-04-19 1989-04-18 Encapsulated high brightness electron beam source and system therefor

Publications (2)

Publication Number Publication Date
DE68927052D1 true DE68927052D1 (de) 1996-10-02
DE68927052T2 DE68927052T2 (de) 1997-03-20

Family

ID=22673704

Family Applications (1)

Application Number Title Priority Date Filing Date
DE68927052T Expired - Fee Related DE68927052T2 (de) 1988-04-19 1989-04-18 Gekapselte elektronenquelle hoher helligkeit und dazugehörige vorrichtung

Country Status (6)

Country Link
US (1) US4833362A (de)
EP (1) EP0411043B1 (de)
JP (1) JP2779026B2 (de)
CA (1) CA1325855C (de)
DE (1) DE68927052T2 (de)
WO (1) WO1989010628A1 (de)

Families Citing this family (22)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL9000056A (nl) * 1990-01-10 1991-08-01 Philips Nv Afsluitinrichting voor deeltjesbundel apparaat.
NL9000057A (nl) * 1990-01-10 1991-08-01 Philips Nv Thermisch bedienbare vacuumklep voor deeltjesbundel apparaat.
US5008549A (en) * 1990-04-10 1991-04-16 Orchid One Corporation High performance, vacuum compatible electromagnetic lens coil
US5150001A (en) * 1990-04-10 1992-09-22 Orchid One Corporation Field emission electron gun and method having complementary passive and active vacuum pumping
US5241182A (en) * 1991-06-18 1993-08-31 Fei Company Precision electrostatic lens system and method of manufacture
JP2732961B2 (ja) * 1991-07-18 1998-03-30 株式会社日立製作所 荷電粒子線装置
US5304888A (en) * 1992-01-24 1994-04-19 Etec Systems, Inc. Mechanically stable field emission gun
JPH0719554B2 (ja) * 1993-03-25 1995-03-06 工業技術院長 荷電ビーム装置
US5909032A (en) * 1995-01-05 1999-06-01 American International Technologies, Inc. Apparatus and method for a modular electron beam system for the treatment of surfaces
US6252339B1 (en) * 1998-09-17 2001-06-26 Nikon Corporation Removable bombardment filament-module for electron beam projection systems
DE60134718D1 (de) * 2001-04-09 2008-08-21 Integrated Circuit Testing Vorrichtung und Verfahren zur Kontrolle von fokussierten Elektronenstrahlen
JP4538441B2 (ja) * 2003-09-10 2010-09-08 株式会社日立ハイテクノロジーズ 電子線応用装置
JP4349964B2 (ja) * 2003-09-10 2009-10-21 株式会社日立ハイテクノロジーズ 小型電子銃
JP4751635B2 (ja) * 2005-04-13 2011-08-17 株式会社日立ハイテクノロジーズ 磁界重畳型電子銃
JP4977399B2 (ja) * 2005-11-10 2012-07-18 株式会社日立ハイテクノロジーズ 荷電粒子線装置
JP5016988B2 (ja) * 2007-06-19 2012-09-05 株式会社日立ハイテクノロジーズ 荷電粒子線装置およびその真空立上げ方法
JP5514472B2 (ja) * 2008-05-28 2014-06-04 株式会社日立ハイテクノロジーズ 荷電粒子線装置
WO2009153939A1 (ja) 2008-06-20 2009-12-23 株式会社日立ハイテクノロジーズ 荷電粒子線装置、及びその制御方法
EP2399270B1 (de) * 2009-02-22 2013-06-12 Mapper Lithography IP B.V. Lithografievorrichtung mit geladenem teilchen
US20150221487A9 (en) * 2013-05-09 2015-08-06 Arash Akhavan Fomani Surface adsorption vacuum pumps and methods for producing adsorbate-free surfaces
DE112015006910B4 (de) 2015-09-16 2023-03-30 Hitachi High-Tech Corporation Vakuumvorrichtung
IT201800007349A1 (it) * 2018-07-19 2020-01-19 Apparecchio multistadio per vuoto con separazione degli stadi controllata da un attuatore in lega a memoria di forma

Family Cites Families (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3678333A (en) * 1970-06-15 1972-07-18 American Optical Corp Field emission electron gun utilizing means for protecting the field emission tip from high voltage discharges
US3881125A (en) * 1972-08-17 1975-04-29 Tektronix Inc Separable-chamber electron-beam tube including means for puncturing a pressure seal therein
JPS49107949U (de) * 1972-12-29 1974-09-14
JPS5034461A (de) * 1973-07-31 1975-04-02
JPS5518014B2 (de) * 1974-12-20 1980-05-15
JPS5249761A (en) * 1975-10-20 1977-04-21 Hitachi Ltd Field emission electronic gun
US4074313A (en) * 1976-06-14 1978-02-14 Rca Corporation Electron beam disc recorder
JPS53137660A (en) * 1977-05-09 1978-12-01 Hitachi Ltd Electron gun
JPS54124966A (en) * 1978-03-23 1979-09-28 Jeol Ltd Exhasut system of particle-beam equipment
IT1198325B (it) * 1980-06-04 1988-12-21 Getters Spa Struttura e composizione getteranti,particolarmente adatti per basse temperature
JPS58146344U (ja) * 1982-03-26 1983-10-01 日本電子株式会社 荷電粒子源
JPS5971561U (ja) * 1982-11-04 1984-05-15 株式会社日立製作所 粒子線装置の真空保護装置
JPS5979969U (ja) * 1982-11-18 1984-05-30 日本電子株式会社 カ−トリツジ式電子銃の接続構造
JPS62140333A (ja) * 1985-12-16 1987-06-23 Hitachi Ltd 電界放射陰極
JPS632180U (de) * 1986-06-24 1988-01-08
US4725736A (en) * 1986-08-11 1988-02-16 Electron Beam Memories Electrostatic electron gun with integrated electron beam deflection and/or stigmating system
JPS6351037A (ja) * 1986-08-20 1988-03-04 Toshiba Corp 電子ビ−ム装置の陽極室
WO1988002180A1 (en) * 1986-09-18 1988-03-24 Crewe Albert V Differential pressure electron beam system, method and gun

Also Published As

Publication number Publication date
DE68927052T2 (de) 1997-03-20
CA1325855C (en) 1994-01-04
EP0411043A1 (de) 1991-02-06
WO1989010628A1 (en) 1989-11-02
US4833362A (en) 1989-05-23
JPH03505386A (ja) 1991-11-21
JP2779026B2 (ja) 1998-07-23
EP0411043B1 (de) 1996-08-28

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee