BRPI0508291A - composições e processo de limpeza para substratos nanoeletrÈnicas e microeletrÈnicas para limpeza - Google Patents

composições e processo de limpeza para substratos nanoeletrÈnicas e microeletrÈnicas para limpeza

Info

Publication number
BRPI0508291A
BRPI0508291A BRPI0508291-9A BRPI0508291A BRPI0508291A BR PI0508291 A BRPI0508291 A BR PI0508291A BR PI0508291 A BRPI0508291 A BR PI0508291A BR PI0508291 A BRPI0508291 A BR PI0508291A
Authority
BR
Brazil
Prior art keywords
formulation
weight
nanoelectronic
optionally
compositions
Prior art date
Application number
BRPI0508291-9A
Other languages
English (en)
Inventor
Chien Pin Sherman Hsu
Original Assignee
Mallinckrodt Baker Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mallinckrodt Baker Inc filed Critical Mallinckrodt Baker Inc
Publication of BRPI0508291A publication Critical patent/BRPI0508291A/pt

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D3/00—Other compounding ingredients of detergent compositions covered in group C11D1/00
    • C11D3/39—Organic or inorganic per-compounds
    • C11D3/3947—Liquid compositions
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D3/00—Other compounding ingredients of detergent compositions covered in group C11D1/00
    • C11D3/395—Bleaching agents
    • C11D3/3956—Liquid compositions
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
    • C11D7/22—Organic compounds
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
    • C11D7/22—Organic compounds
    • C11D7/26—Organic compounds containing oxygen
    • C11D7/261—Alcohols; Phenols
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
    • C11D7/22—Organic compounds
    • C11D7/34—Organic compounds containing sulfur
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
    • C11D7/50—Solvents
    • C11D7/5004—Organic solvents
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
    • C11D7/50—Solvents
    • C11D7/5004—Organic solvents
    • C11D7/5009—Organic solvents containing phosphorus, sulfur or silicon, e.g. dimethylsulfoxide
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
    • C11D7/50—Solvents
    • C11D7/5004—Organic solvents
    • C11D7/5013—Organic solvents containing nitrogen
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
    • C11D7/50—Solvents
    • C11D7/5004—Organic solvents
    • C11D7/5022—Organic solvents containing oxygen
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/42—Stripping or agents therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/42—Stripping or agents therefor
    • G03F7/422—Stripping or agents therefor using liquids only
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/42—Stripping or agents therefor
    • G03F7/422—Stripping or agents therefor using liquids only
    • G03F7/425—Stripping or agents therefor using liquids only containing mineral alkaline compounds; containing organic basic compounds, e.g. quaternary ammonium compounds; containing heterocyclic basic compounds containing nitrogen
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/42—Stripping or agents therefor
    • G03F7/422—Stripping or agents therefor using liquids only
    • G03F7/426—Stripping or agents therefor using liquids only containing organic halogen compounds; containing organic sulfonic acids or salts thereof; containing sulfoxides
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y40/00—Manufacture or treatment of nanostructures
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D2111/00—Cleaning compositions characterised by the objects to be cleaned; Cleaning compositions characterised by non-standard cleaning or washing processes
    • C11D2111/10—Objects to be cleaned
    • C11D2111/14—Hard surfaces
    • C11D2111/22—Electronic devices, e.g. PCBs or semiconductors
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D2111/00—Cleaning compositions characterised by the objects to be cleaned; Cleaning compositions characterised by non-standard cleaning or washing processes
    • C11D2111/40—Specific cleaning or washing processes

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Oil, Petroleum & Natural Gas (AREA)
  • Wood Science & Technology (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Emergency Medicine (AREA)
  • Inorganic Chemistry (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
  • Detergent Compositions (AREA)

Abstract

COMPOSIçõES E PROCESSO DE LIMPEZA PARA SUBSTRATOS NANOELETRÈNICOS E MICROELETRÈNICOS. A presente invenção refere-se a composições de limpeza nanoeletrónicos e microeletrónicos em condições de estado de fluido supercrítico, e especificamente composições de limpeza úteis e possuindo compatibilidade aperfeiçoada com substratos nanoeletrónicos e microeletrónicos caracterizados por dióxido de silício, dielétricos sensíveis de baixo k ou alto k e cobre, tungstênio, tântalo, níquel, ouro, cobaldo, paládio, platina, cromo, rutênio, ródio, irídio, háfnio, titânio, molibdênio, estanho e outra metalização, bem como substratos de metalizações e AI ou AI(Cu) e tecnologias de interconexão avançadas, são providas por composições de limpeza nanoeletrónica e microeletrónica compreendendo composições de limpeza nanoeletrónica e microeletrónica dessa invenção sendo providas por composições compreendendo: (1) um fluido principal supercrítico alcançando um estado de fuido supercrítico a uma temperatura de 250 C ou menos e uma pressão de 60MPa (592,2 atm), e (2) como um fluido secundário, uma formulação modificadora selecionada do grupo consistindo nas formulações que se seguem: a) uma formulação compreendendo: um agente oxidante; solvente orgânico polar selecionado do grupo consistindo em amidas, sulfonas, sulfolenos, selenonas e álcoois saturados e opcionalmente outros componentes; b) uma formulação isenta de silicato compreendendo: um solvente orgânico polar selecionado do grupo consistindo em amidas, sulfonas, selenonas e álcoois saturados; uma base alcalina forte;e opcionalmente outros componentes; c) uma formulação compreendendo: cerca de 0,05% a 30% em peso de uma ou mais bases fortes de não produção de amónio contendo contra-íons carregados positivamente não-nucleofílicos; cerca de 0,5 a cerca de 99,95% em peso de um ou mais compostos solventes inibidores de corrosão, o composto solvente inibidor de corrosão possuindo pelo menos dois sítios capazes de complexação com metais; e opcionalmente outros componentes; d) uma formulação compreendendo: cerca de 0,05 a 20% em peso de um ou mais sal de fluoreto de não produção de HF, não produção de amónio; cerca de 5 a cerca de 99,95% em peso de água, solvente orgânico ou ambos água e solvente orgânico; e opcionalmente outros componentes; e e) uma formulação compreendendo: cerca de 0,05% a 30% em peso de uma ou mais bases fortes de não produção de amónio contendo contr-íons carregados positivamente não-nucleofílicos; cerca de 5 a cerca de 99,95% em peso de um ou mais solventes de amida impedida estperica e opcionalmente outros componentes.
BRPI0508291-9A 2004-03-01 2005-02-11 composições e processo de limpeza para substratos nanoeletrÈnicas e microeletrÈnicas para limpeza BRPI0508291A (pt)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US54897704P 2004-03-01 2004-03-01
PCT/US2005/004350 WO2005093032A1 (en) 2004-03-01 2005-02-11 Nanoelectronic and microelectronic cleaning compositions

Publications (1)

Publication Number Publication Date
BRPI0508291A true BRPI0508291A (pt) 2007-07-31

Family

ID=34960788

Family Applications (1)

Application Number Title Priority Date Filing Date
BRPI0508291-9A BRPI0508291A (pt) 2004-03-01 2005-02-11 composições e processo de limpeza para substratos nanoeletrÈnicas e microeletrÈnicas para limpeza

Country Status (20)

Country Link
US (1) US7767636B2 (pt)
EP (1) EP1720966B1 (pt)
JP (1) JP4633785B2 (pt)
KR (1) KR101154692B1 (pt)
CN (1) CN1961065B (pt)
AT (1) ATE488570T1 (pt)
BR (1) BRPI0508291A (pt)
CA (1) CA2558069A1 (pt)
DE (1) DE602005024772D1 (pt)
DK (1) DK1720966T3 (pt)
ES (1) ES2354077T3 (pt)
IL (1) IL177728A (pt)
MY (1) MY146442A (pt)
NO (1) NO20064349L (pt)
PL (1) PL1720966T3 (pt)
PT (1) PT1720966E (pt)
SG (1) SG150509A1 (pt)
TW (1) TWI379174B (pt)
WO (1) WO2005093032A1 (pt)
ZA (1) ZA200607122B (pt)

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KR102207306B1 (ko) * 2016-11-25 2021-01-22 엔테그리스, 아이엔씨. 에칭 후 잔류물을 제거하기 위한 세정 조성물
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Also Published As

Publication number Publication date
WO2005093032A1 (en) 2005-10-06
CN1961065B (zh) 2011-01-26
CN1961065A (zh) 2007-05-09
ES2354077T3 (es) 2011-03-09
ATE488570T1 (de) 2010-12-15
ZA200607122B (en) 2008-09-25
US20090163396A1 (en) 2009-06-25
JP2007525851A (ja) 2007-09-06
SG150509A1 (en) 2009-03-30
PT1720966E (pt) 2010-12-21
DE602005024772D1 (de) 2010-12-30
US7767636B2 (en) 2010-08-03
KR101154692B1 (ko) 2012-06-08
IL177728A (en) 2011-08-31
TWI379174B (en) 2012-12-11
EP1720966A1 (en) 2006-11-15
CA2558069A1 (en) 2005-10-06
IL177728A0 (en) 2006-12-31
TW200534054A (en) 2005-10-16
NO20064349L (no) 2006-11-30
DK1720966T3 (da) 2011-02-28
KR20070003888A (ko) 2007-01-05
PL1720966T3 (pl) 2011-06-30
EP1720966B1 (en) 2010-11-17
JP4633785B2 (ja) 2011-02-16
MY146442A (en) 2012-08-15

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