BR112012029161A2 - fotoiniciador de bap líquida estável d1479 e seu uso nas composições curáveis por radiação - Google Patents
fotoiniciador de bap líquida estável d1479 e seu uso nas composições curáveis por radiaçãoInfo
- Publication number
- BR112012029161A2 BR112012029161A2 BR112012029161A BR112012029161A BR112012029161A2 BR 112012029161 A2 BR112012029161 A2 BR 112012029161A2 BR 112012029161 A BR112012029161 A BR 112012029161A BR 112012029161 A BR112012029161 A BR 112012029161A BR 112012029161 A2 BR112012029161 A2 BR 112012029161A2
- Authority
- BR
- Brazil
- Prior art keywords
- radiation curable
- curable compositions
- photoinitiator
- bap
- stable liquid
- Prior art date
Links
- 230000005855 radiation Effects 0.000 title abstract 7
- 239000000203 mixture Substances 0.000 title abstract 5
- 239000007788 liquid Substances 0.000 title abstract 4
- XYFCBTPGUUZFHI-UHFFFAOYSA-N Phosphine Chemical compound P XYFCBTPGUUZFHI-UHFFFAOYSA-N 0.000 abstract 3
- 239000008199 coating composition Substances 0.000 abstract 3
- 125000002252 acyl group Chemical group 0.000 abstract 2
- 125000003118 aryl group Chemical group 0.000 abstract 1
- 239000000835 fiber Substances 0.000 abstract 1
- 239000002184 metal Substances 0.000 abstract 1
- 229910000073 phosphorus hydride Inorganic materials 0.000 abstract 1
Classifications
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
-
- C03C25/1055—
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C25/00—Surface treatment of fibres or filaments made from glass, minerals or slags
- C03C25/10—Coating
- C03C25/104—Coating to obtain optical fibres
- C03C25/106—Single coatings
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C25/00—Surface treatment of fibres or filaments made from glass, minerals or slags
- C03C25/10—Coating
- C03C25/24—Coatings containing organic materials
- C03C25/25—Non-macromolecular compounds
-
- C—CHEMISTRY; METALLURGY
- C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
- C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
- C04B41/00—After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone
- C04B41/009—After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone characterised by the material treated
-
- C—CHEMISTRY; METALLURGY
- C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
- C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
- C04B41/00—After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone
- C04B41/45—Coating or impregnating, e.g. injection in masonry, partial coating of green or fired ceramics, organic coating compositions for adhering together two concrete elements
- C04B41/46—Coating or impregnating, e.g. injection in masonry, partial coating of green or fired ceramics, organic coating compositions for adhering together two concrete elements with organic materials
- C04B41/48—Macromolecular compounds
- C04B41/483—Polyacrylates
-
- C—CHEMISTRY; METALLURGY
- C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
- C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
- C04B41/00—After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone
- C04B41/60—After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone of only artificial stone
- C04B41/61—Coating or impregnation
- C04B41/62—Coating or impregnation with organic materials
- C04B41/63—Macromolecular compounds
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F9/00—Compounds containing elements of Groups 5 or 15 of the Periodic System
- C07F9/02—Phosphorus compounds
- C07F9/28—Phosphorus compounds with one or more P—C bonds
- C07F9/50—Organo-phosphines
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F9/00—Compounds containing elements of Groups 5 or 15 of the Periodic System
- C07F9/02—Phosphorus compounds
- C07F9/28—Phosphorus compounds with one or more P—C bonds
- C07F9/50—Organo-phosphines
- C07F9/5036—Phosphines containing the structure -C(=X)-P or NC-P
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F9/00—Compounds containing elements of Groups 5 or 15 of the Periodic System
- C07F9/02—Phosphorus compounds
- C07F9/28—Phosphorus compounds with one or more P—C bonds
- C07F9/50—Organo-phosphines
- C07F9/53—Organo-phosphine oxides; Organo-phosphine thioxides
- C07F9/5337—Phosphine oxides or thioxides containing the structure -C(=X)-P(=X) or NC-P(=X) (X = O, S, Se)
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F2/00—Processes of polymerisation
- C08F2/38—Polymerisation using regulators, e.g. chain terminating agents, e.g. telomerisation
- C08F2/40—Polymerisation using regulators, e.g. chain terminating agents, e.g. telomerisation using retarding agents
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F2/00—Processes of polymerisation
- C08F2/46—Polymerisation initiated by wave energy or particle radiation
- C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
- C08F2/50—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
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- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D133/00—Coating compositions based on homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides, or nitriles thereof; Coating compositions based on derivatives of such polymers
- C09D133/04—Homopolymers or copolymers of esters
- C09D133/06—Homopolymers or copolymers of esters of esters containing only carbon, hydrogen and oxygen, the oxygen atom being present only as part of the carboxyl radical
- C09D133/08—Homopolymers or copolymers of acrylic acid esters
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F222/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a carboxyl radical and containing at least one other carboxyl radical in the molecule; Salts, anhydrides, esters, amides, imides, or nitriles thereof
- C08F222/10—Esters
- C08F222/1006—Esters of polyhydric alcohols or polyhydric phenols
- C08F222/102—Esters of polyhydric alcohols or polyhydric phenols of dialcohols, e.g. ethylene glycol di(meth)acrylate or 1,4-butanediol dimethacrylate
- C08F222/1025—Esters of polyhydric alcohols or polyhydric phenols of dialcohols, e.g. ethylene glycol di(meth)acrylate or 1,4-butanediol dimethacrylate of aromatic dialcohols
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K5/00—Use of organic ingredients
- C08K5/49—Phosphorus-containing compounds
- C08K5/50—Phosphorus bound to carbon only
Abstract
fotoiniciador de bap líquida estável d1479 e seu uso nas composições curáveis por radiação. a presente invenção refere-se a composições curáveis por radiação que compreendem fotoiniciador de bis (acil) fosfina líquida da fórmula (i): em que cada um dentre ar ^1^, ar ^2^ e ar ^3^ é independentemente um grupo arila substituído ou não substituído. a invenção também se refere a formas estabilizadas de bis (acil) fosfinas lóquidas da fórmula (i) e a composição curável por radiação que compreende os ditos fotoiniciadores estabilizados. as composições curáveis por radiação são selecionadas do grupo consistindo em uma composição de revestimento de fibra ótica e uma composição de revestimento capaz de cura por radiação em concreto e uma composição de revestimento capaz de cura por radiação em metal.
Applications Claiming Priority (5)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US35994110P | 2010-06-30 | 2010-06-30 | |
US61/359,941 | 2010-06-30 | ||
EP10169857 | 2010-07-16 | ||
EP10169857.9 | 2010-07-16 | ||
PCT/US2011/041158 WO2012003106A1 (en) | 2010-06-30 | 2011-06-21 | D1479 stable liquid bap photoinitiator and its use in radiation curable compositions |
Publications (2)
Publication Number | Publication Date |
---|---|
BR112012029161A2 true BR112012029161A2 (pt) | 2017-02-21 |
BR112012029161B1 BR112012029161B1 (pt) | 2019-09-24 |
Family
ID=43257322
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
BR112012029161-0A BR112012029161B1 (pt) | 2010-06-30 | 2011-06-21 | Composição curável por radiação para fibra ótica, composição de revestimento de fibra ótica e composição curável por radiação |
Country Status (9)
Country | Link |
---|---|
US (2) | US9062082B2 (pt) |
EP (1) | EP2588549B1 (pt) |
JP (1) | JP5843326B2 (pt) |
KR (3) | KR101555800B1 (pt) |
CN (2) | CN102471633B (pt) |
BR (1) | BR112012029161B1 (pt) |
DK (1) | DK2588549T3 (pt) |
RU (1) | RU2600053C2 (pt) |
WO (1) | WO2012003106A1 (pt) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN108026393A (zh) * | 2015-09-22 | 2018-05-11 | 罗门哈斯公司 | 聚合物乳液和包含该乳液的抗微生物涂料组合物 |
Families Citing this family (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR101555800B1 (ko) | 2010-06-30 | 2015-09-24 | 디에스엠 아이피 어셋츠 비.브이. | D1479 안정한 액체 비스(아실)포스핀 광 개시제 및 방사선 경화성 조성물에서 이의 용도 |
CN103288873B (zh) * | 2012-03-02 | 2017-12-08 | 荆门市美邦化学有限公司 | 磺酰基或醌基官能化的酰基膦氧化合物 |
US9057817B2 (en) * | 2013-04-15 | 2015-06-16 | Corning Incorporated | Low diameter optical fiber |
WO2016018310A1 (en) | 2014-07-30 | 2016-02-04 | Hewlett-Packard Development Company, L.P. | Printable recording media |
KR20170043528A (ko) * | 2014-08-17 | 2017-04-21 | 디에스엠 아이피 어셋츠 비.브이. | 광섬유용의 단색 화학선 경화성 코팅 |
US10414953B2 (en) | 2016-02-19 | 2019-09-17 | Avery Dennison Corporation | Two stage methods for processing adhesives and related compositions |
KR102182235B1 (ko) | 2016-10-25 | 2020-11-24 | 애버리 데니슨 코포레이션 | 백본에 광개시제기를 갖는 블록 폴리머 및 접착제 조성물에서의 그것의 용도 |
CN106749689B (zh) * | 2016-11-14 | 2019-04-09 | 嘉宝莉化工集团股份有限公司 | 纳米纤维素晶须改性的双功能光引发剂及其制备方法 |
EP3820827A1 (en) | 2018-08-30 | 2021-05-19 | DSM IP Assets B.V. | Radiation curable compositions for coating optical fiber |
CN110183487A (zh) * | 2019-05-30 | 2019-08-30 | 王清才 | 一种苯基双(2,4,6-三甲基苯甲酰基)氧化膦的制备方法 |
US20230331899A1 (en) * | 2020-09-03 | 2023-10-19 | Basf Se | Reactive polyurethane elastomer |
Family Cites Families (57)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3668093A (en) * | 1971-05-06 | 1972-06-06 | Du Pont | Photoinitiation of vinyl polymerization by triaroylphosphines |
JPS5792552A (en) | 1980-11-29 | 1982-06-09 | Nitto Electric Ind Co Ltd | Covering material for optical glass fiber |
US4472019A (en) | 1982-12-28 | 1984-09-18 | Desoto, Inc. | Topcoats for buffer-coated optical fiber using urethane acrylate and epoxy acrylate and vinyl monomer |
US4474830A (en) | 1982-12-29 | 1984-10-02 | At&T Bell Laboratories | Multiple coating of fibers |
DE3443221A1 (de) | 1984-11-27 | 1986-06-05 | ESPE Fabrik pharmazeutischer Präparate GmbH, 8031 Seefeld | Bisacylphosphinoxide, ihre herstellung und verwendung |
AU580856B2 (en) | 1985-03-29 | 1989-02-02 | Japan Synthetic Rubber Company Limited. | UV-ray curable resin composition and coated optical fiber |
JPH0670113B2 (ja) | 1988-01-22 | 1994-09-07 | デソト インコーポレーテツド | 光ファイバー被覆用樹脂組成物 |
US4923915A (en) | 1988-05-18 | 1990-05-08 | Corning Incorporated | Thermally stabilized resin coatings for optical fibers |
CA1321671C (en) | 1989-05-11 | 1993-08-24 | Paul J. Shustack | Ultraviolet radiation-curable coatings for optical fibers and optical fibers coated therewith |
US5218009A (en) | 1989-08-04 | 1993-06-08 | Ciba-Geigy Corporation | Mono- and di-acylphosphine oxides |
US5336563A (en) | 1989-09-06 | 1994-08-09 | Dsm Desotech, Inc. | Primary coatings for optical glass fibers including polyether acrylates |
EP0495751A1 (de) | 1991-01-14 | 1992-07-22 | Ciba-Geigy Ag | Bisacylphosphine |
DE4126860A1 (de) | 1991-08-14 | 1993-02-18 | Bayer Ag | Herstellung von lichtleitbaendern |
US5199098B1 (en) | 1991-10-09 | 1995-02-14 | Corning Ware Inc | Moisture resistant optical fiber coatings with improved stability |
GB9121655D0 (en) | 1991-10-11 | 1991-11-27 | Ici Plc | Optical fibre coating |
ZA941879B (en) | 1993-03-18 | 1994-09-19 | Ciba Geigy | Curing compositions containing bisacylphosphine oxide photoinitiators |
US5502145A (en) | 1994-03-02 | 1996-03-26 | Dsm Desotech. Inc. | Coating system for glass strength retention |
JPH08259642A (ja) | 1995-01-24 | 1996-10-08 | Japan Synthetic Rubber Co Ltd | 光硬化性樹脂組成物 |
SE520727C2 (sv) * | 1996-03-04 | 2003-08-19 | Ciba Sc Holding Ag | Alkylfenylbisacylfosfinoxid och fotoinitiatorblandningar |
AU7084798A (en) | 1997-04-22 | 1998-11-13 | Dsm N.V. | Liquid curable resin composition |
US6359025B1 (en) | 1997-05-16 | 2002-03-19 | Dsm N.V. | Radiation-curable liquid resin composition for coating optical fibers |
US6023547A (en) | 1997-06-09 | 2000-02-08 | Dsm N.V. | Radiation curable composition comprising a urethane oligomer having a polyester backbone |
JP2972172B2 (ja) | 1998-02-03 | 1999-11-08 | 株式会社リコー | 網点領域検出方法 |
JP3879888B2 (ja) | 1998-08-28 | 2007-02-14 | Jsr株式会社 | 液状硬化性樹脂組成物 |
US6638616B2 (en) | 1999-10-15 | 2003-10-28 | Dsm N.V. | Radiation-curable compositions comprising oligomers having an alkyd backbone |
US6438306B1 (en) | 2000-04-07 | 2002-08-20 | Dsm N.V. | Radiation curable resin composition |
US6775451B1 (en) | 1999-12-30 | 2004-08-10 | Corning Incorporated | Secondary coating composition for optical fibers |
CN1157433C (zh) * | 2000-03-13 | 2004-07-14 | 阿克佐诺贝尔股份有限公司 | 含异氰酸酯官能化合物、异氰酸酯反应性化合物和共催化剂的组合物 |
EP1282650A2 (en) * | 2000-05-01 | 2003-02-12 | Corning Incorporated | Optical fiber coating |
GB2365430B (en) * | 2000-06-08 | 2002-08-28 | Ciba Sc Holding Ag | Acylphosphine photoinitiators and intermediates |
US6584263B2 (en) | 2000-07-26 | 2003-06-24 | Corning Incorporated | Optical fiber coating compositions and coated optical fibers |
BR0113872A (pt) * | 2000-09-14 | 2003-07-22 | Ciba Sc Holding Ag | Fotoiniciadores de óxido de acilfosfina em resinas de moldagem de metacrilato |
US20020132871A1 (en) | 2000-11-13 | 2002-09-19 | Martin Colton | Transparent UV curable coating system |
AU2002228452A1 (en) | 2001-01-11 | 2002-07-24 | Dsm Ip Assets B.V. | Radiation curable coating composition |
US6707977B2 (en) | 2001-03-15 | 2004-03-16 | Corning Incorporated | All fiber polarization mode dispersion compensator |
US7276543B2 (en) | 2001-10-09 | 2007-10-02 | Dsm Ip Assets B.V. | Radiation curable resin composition |
JP2003312148A (ja) * | 2002-04-25 | 2003-11-06 | Fuji Photo Film Co Ltd | 感熱記録材料 |
US20040029044A1 (en) * | 2002-08-08 | 2004-02-12 | 3M Innovative Properties Company | Photocurable composition |
US6872760B2 (en) | 2003-02-06 | 2005-03-29 | Ppg Industries Ohio, Inc. | Radiation-curable composition for optical fiber coating materials |
US6862392B2 (en) | 2003-06-04 | 2005-03-01 | Corning Incorporated | Coated optical fiber and curable compositions suitable for coating optical fiber |
TW200523265A (en) * | 2003-07-31 | 2005-07-16 | Basf Ag | A process for the preparation of acylphosphines |
WO2005021824A2 (en) * | 2003-08-04 | 2005-03-10 | Ciba Specialty Chemicals Holding Inc. | Process for the production of strongly adherent coatings |
CN1842504B (zh) * | 2003-08-29 | 2010-12-08 | 西巴特殊化学品控股有限公司 | 光纤涂料 |
JP4143508B2 (ja) | 2003-09-17 | 2008-09-03 | Jsr株式会社 | 液状硬化性樹脂組成物 |
DE602005018259D1 (de) * | 2004-10-15 | 2010-01-21 | Dsm Ip Assets Bv | Strahlungshärtbare beschichtungszusammensetzung |
JP5148283B2 (ja) | 2004-11-23 | 2013-02-20 | チバ ホールディング インコーポレーテッド | アシルホスファン及びその誘導体の製造方法 |
BRPI0714189A8 (pt) * | 2006-07-04 | 2017-12-12 | Ciba Holding Inc | Dispersão aquosa concentrada de polímero, uso e processo para a preparação da mesma, pó de polímero e processo para a preparação do mesmo |
KR101105053B1 (ko) | 2006-12-14 | 2012-01-16 | 디에스엠 아이피 어셋츠 비.브이. | 광섬유용 d1368 cr 방사선 경화성 1차 코팅 |
EP2305617B1 (en) | 2006-12-14 | 2014-01-22 | DSM IP Assets B.V. | D1381 Supercoatings for optical fiber |
KR101155015B1 (ko) | 2006-12-14 | 2012-06-14 | 디에스엠 아이피 어셋츠 비.브이. | 광섬유 상의 d1363 bt 방사선 경화성 1차 코팅 |
RU2434915C2 (ru) | 2006-12-14 | 2011-11-27 | ДСМ Ай Пи ЭССЕТС Б.В. | Отверждаемое излучением вторичное покрытие d 1369 d для оптического волокна |
ATE511524T1 (de) | 2006-12-14 | 2011-06-15 | Dsm Ip Assets Bv | Strahlungshärtbare d 1365 bj-grundierbeschichtung für optische fasern |
EP2091879B1 (en) | 2006-12-14 | 2011-02-16 | DSM IP Assets B.V. | D1378 ca radiation curable primary coating for optical fiber |
KR101105083B1 (ko) | 2006-12-14 | 2012-01-16 | 디에스엠 아이피 어셋츠 비.브이. | 광섬유 상의 d1379 p 방사선 경화성 1차 코팅 |
JP2010509449A (ja) | 2006-12-14 | 2010-03-25 | ディーエスエム アイピー アセッツ ビー.ブイ. | D1370r光ファイバのための放射線硬化性二次被覆 |
EP2091883B1 (en) | 2006-12-14 | 2011-02-16 | DSM IP Assets B.V. | D1364 bt secondary coating on optical fiber |
KR101555800B1 (ko) | 2010-06-30 | 2015-09-24 | 디에스엠 아이피 어셋츠 비.브이. | D1479 안정한 액체 비스(아실)포스핀 광 개시제 및 방사선 경화성 조성물에서 이의 용도 |
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Publication number | Priority date | Publication date | Assignee | Title |
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CN108026393A (zh) * | 2015-09-22 | 2018-05-11 | 罗门哈斯公司 | 聚合物乳液和包含该乳液的抗微生物涂料组合物 |
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DK2588549T3 (en) | 2015-01-12 |
EP2588549B1 (en) | 2014-12-10 |
WO2012003106A8 (en) | 2012-08-02 |
KR20140129243A (ko) | 2014-11-06 |
KR101580424B1 (ko) | 2015-12-24 |
KR20140129242A (ko) | 2014-11-06 |
US20120129969A1 (en) | 2012-05-24 |
WO2012003106A1 (en) | 2012-01-05 |
EP2588549A1 (en) | 2013-05-08 |
US20130237626A1 (en) | 2013-09-12 |
CN104327116A (zh) | 2015-02-04 |
US9062082B2 (en) | 2015-06-23 |
RU2012148698A (ru) | 2014-08-10 |
JP5843326B2 (ja) | 2016-01-13 |
JP2013534935A (ja) | 2013-09-09 |
RU2600053C2 (ru) | 2016-10-20 |
KR20130020790A (ko) | 2013-02-28 |
CN102471633A (zh) | 2012-05-23 |
US9062083B2 (en) | 2015-06-23 |
BR112012029161B1 (pt) | 2019-09-24 |
KR101555800B1 (ko) | 2015-09-24 |
CN102471633B (zh) | 2015-03-18 |
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