BR0207202A - Rejuvenescência de produtos de metal refratário - Google Patents

Rejuvenescência de produtos de metal refratário

Info

Publication number
BR0207202A
BR0207202A BR0207202-5A BR0207202A BR0207202A BR 0207202 A BR0207202 A BR 0207202A BR 0207202 A BR0207202 A BR 0207202A BR 0207202 A BR0207202 A BR 0207202A
Authority
BR
Brazil
Prior art keywords
refractory metal
metal products
dust
refractory
plate
Prior art date
Application number
BR0207202-5A
Other languages
English (en)
Portuguese (pt)
Inventor
Paul Aimone
Prabhat Kumar
Peter R Jepson
Henning Uhlenhut
Howard V Goldberg
Original Assignee
Starck H C Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Starck H C Inc filed Critical Starck H C Inc
Publication of BR0207202A publication Critical patent/BR0207202A/pt

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
    • H01J37/3488—Constructional details of particle beam apparatus not otherwise provided for, e.g. arrangement, mounting, housing, environment; special provisions for cleaning or maintenance of the apparatus
    • H01J37/3491—Manufacturing of targets
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B22—CASTING; POWDER METALLURGY
    • B22F—WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
    • B22F7/00—Manufacture of composite layers, workpieces, or articles, comprising metallic powder, by sintering the powder, with or without compacting wherein at least one part is obtained by sintering or compression
    • B22F7/06—Manufacture of composite layers, workpieces, or articles, comprising metallic powder, by sintering the powder, with or without compacting wherein at least one part is obtained by sintering or compression of composite workpieces or articles from parts, e.g. to form tipped tools
    • B22F7/062—Manufacture of composite layers, workpieces, or articles, comprising metallic powder, by sintering the powder, with or without compacting wherein at least one part is obtained by sintering or compression of composite workpieces or articles from parts, e.g. to form tipped tools involving the connection or repairing of preformed parts
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/3407—Cathode assembly for sputtering apparatus, e.g. Target
    • C23C14/3414—Metallurgical or chemical aspects of target preparation, e.g. casting, powder metallurgy
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B22—CASTING; POWDER METALLURGY
    • B22F—WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
    • B22F7/00—Manufacture of composite layers, workpieces, or articles, comprising metallic powder, by sintering the powder, with or without compacting wherein at least one part is obtained by sintering or compression
    • B22F7/06—Manufacture of composite layers, workpieces, or articles, comprising metallic powder, by sintering the powder, with or without compacting wherein at least one part is obtained by sintering or compression of composite workpieces or articles from parts, e.g. to form tipped tools
    • B22F7/062—Manufacture of composite layers, workpieces, or articles, comprising metallic powder, by sintering the powder, with or without compacting wherein at least one part is obtained by sintering or compression of composite workpieces or articles from parts, e.g. to form tipped tools involving the connection or repairing of preformed parts
    • B22F2007/068—Manufacture of composite layers, workpieces, or articles, comprising metallic powder, by sintering the powder, with or without compacting wherein at least one part is obtained by sintering or compression of composite workpieces or articles from parts, e.g. to form tipped tools involving the connection or repairing of preformed parts repairing articles
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B22—CASTING; POWDER METALLURGY
    • B22F—WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
    • B22F2999/00—Aspects linked to processes or compositions used in powder metallurgy
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P10/00—Technologies related to metal processing
    • Y02P10/25—Process efficiency

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Analytical Chemistry (AREA)
  • Composite Materials (AREA)
  • Manufacturing & Machinery (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Powder Metallurgy (AREA)
  • Manufacture Of Alloys Or Alloy Compounds (AREA)
  • Manufacture And Refinement Of Metals (AREA)
  • Furnace Housings, Linings, Walls, And Ceilings (AREA)
  • Electrodes Of Semiconductors (AREA)
  • Solid-Sorbent Or Filter-Aiding Compositions (AREA)
  • Catalysts (AREA)
  • Arc-Extinguishing Devices That Are Switches (AREA)
  • Inorganic Insulating Materials (AREA)
  • Inorganic Compounds Of Heavy Metals (AREA)
  • Compositions Of Oxide Ceramics (AREA)
BR0207202-5A 2001-02-14 2002-02-14 Rejuvenescência de produtos de metal refratário BR0207202A (pt)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US26874201P 2001-02-14 2001-02-14
PCT/US2002/004306 WO2002064287A2 (en) 2001-02-14 2002-02-14 Rejuvenation of refractory metal products

Publications (1)

Publication Number Publication Date
BR0207202A true BR0207202A (pt) 2004-01-27

Family

ID=23024267

Family Applications (1)

Application Number Title Priority Date Filing Date
BR0207202-5A BR0207202A (pt) 2001-02-14 2002-02-14 Rejuvenescência de produtos de metal refratário

Country Status (24)

Country Link
US (1) US20020112955A1 (enExample)
EP (1) EP1362132B1 (enExample)
JP (1) JP2004523653A (enExample)
CN (1) CN1221684C (enExample)
AT (1) ATE325906T1 (enExample)
AU (1) AU2002250075B2 (enExample)
BG (1) BG64959B1 (enExample)
BR (1) BR0207202A (enExample)
CA (1) CA2437713A1 (enExample)
CZ (1) CZ20032186A3 (enExample)
DE (1) DE60211309T2 (enExample)
DK (1) DK1362132T3 (enExample)
ES (1) ES2261656T3 (enExample)
HU (1) HUP0400730A2 (enExample)
IS (1) IS6911A (enExample)
MX (1) MXPA03007293A (enExample)
NO (1) NO20033567L (enExample)
NZ (1) NZ527503A (enExample)
PL (1) PL363521A1 (enExample)
PT (1) PT1362132E (enExample)
RU (1) RU2304633C2 (enExample)
SK (1) SK10062003A3 (enExample)
WO (1) WO2002064287A2 (enExample)
ZA (1) ZA200306259B (enExample)

Families Citing this family (37)

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US7175802B2 (en) * 2001-09-17 2007-02-13 Heraeus, Inc. Refurbishing spent sputtering targets
NZ534237A (en) * 2002-01-24 2006-01-27 Starck H C Inc Refractory metal and alloy refining by laser forming and melting
US20040016635A1 (en) * 2002-07-19 2004-01-29 Ford Robert B. Monolithic sputtering target assembly
US20040065546A1 (en) * 2002-10-04 2004-04-08 Michaluk Christopher A. Method to recover spent components of a sputter target
US7504008B2 (en) * 2004-03-12 2009-03-17 Applied Materials, Inc. Refurbishment of sputtering targets
US20060021870A1 (en) * 2004-07-27 2006-02-02 Applied Materials, Inc. Profile detection and refurbishment of deposition targets
US20060081459A1 (en) * 2004-10-18 2006-04-20 Applied Materials, Inc. In-situ monitoring of target erosion
US8802191B2 (en) 2005-05-05 2014-08-12 H. C. Starck Gmbh Method for coating a substrate surface and coated product
AU2006243448B2 (en) 2005-05-05 2011-09-01 H.C. Starck Inc. Coating process for manufacture or reprocessing of sputter targets and X-ray anodes
US9127362B2 (en) 2005-10-31 2015-09-08 Applied Materials, Inc. Process kit and target for substrate processing chamber
JPWO2007052743A1 (ja) * 2005-11-07 2009-04-30 株式会社東芝 スパッタリングターゲットおよびその製造方法
DE102005055255A1 (de) * 2005-11-19 2007-05-31 Applied Materials Gmbh & Co. Kg Verfahren zum Herstellen eines Targets
US8647484B2 (en) 2005-11-25 2014-02-11 Applied Materials, Inc. Target for sputtering chamber
US20080078268A1 (en) 2006-10-03 2008-04-03 H.C. Starck Inc. Process for preparing metal powders having low oxygen content, powders so-produced and uses thereof
US20080145688A1 (en) 2006-12-13 2008-06-19 H.C. Starck Inc. Method of joining tantalum clade steel structures
US8197894B2 (en) * 2007-05-04 2012-06-12 H.C. Starck Gmbh Methods of forming sputtering targets
US8968536B2 (en) 2007-06-18 2015-03-03 Applied Materials, Inc. Sputtering target having increased life and sputtering uniformity
CN101779266A (zh) * 2007-08-08 2010-07-14 皇家飞利浦电子股份有限公司 用于将材料涂抹到x射线源的阳极表面的方法和装置、阳极以及x射线源
US8699667B2 (en) * 2007-10-02 2014-04-15 General Electric Company Apparatus for x-ray generation and method of making same
US7901552B2 (en) 2007-10-05 2011-03-08 Applied Materials, Inc. Sputtering target with grooves and intersecting channels
US8246903B2 (en) 2008-09-09 2012-08-21 H.C. Starck Inc. Dynamic dehydriding of refractory metal powders
US8043655B2 (en) * 2008-10-06 2011-10-25 H.C. Starck, Inc. Low-energy method of manufacturing bulk metallic structures with submicron grain sizes
FR2953747B1 (fr) * 2009-12-14 2012-03-23 Snecma Procede de reparation d'une aube en titane par rechargement laser et compression hip moderee
DE102010004241A1 (de) * 2010-01-08 2011-07-14 H.C. Starck GmbH, 38642 Verfahren zur Herstellung von Funktionsschichten auf der Oberfläche von Werkstücken, eine so hergestellte Funktionsschicht und ein Werkstück
WO2013049274A2 (en) 2011-09-29 2013-04-04 H.C. Starck, Inc. Large-area sputtering targets and methods of manufacturing large-area sputtering targets
JP6532219B2 (ja) * 2013-11-25 2019-06-19 株式会社フルヤ金属 スパッタリングターゲットの再生方法及び再生スパッタリングターゲット
AT14301U1 (de) * 2014-07-09 2015-07-15 Plansee Se Verfahren zur Herstellung eines Bauteils
CN104439239B (zh) * 2014-11-06 2017-05-03 金堆城钼业股份有限公司 一种重复利用中频感应烧结炉钨钼废发热体的方法
DE102015008921A1 (de) * 2015-07-15 2017-01-19 Evobeam GmbH Verfahren zur additiven Herstellung von Bauteilen
CN107614744B (zh) * 2015-12-28 2020-04-24 Ｊｘ金属株式会社 溅射靶的制造方法
CN105618753A (zh) * 2016-03-03 2016-06-01 中研智能装备有限公司 一种轧辊等离子3d打印再制造设备及再制造方法
DE102016121951A1 (de) * 2016-11-15 2018-05-17 Cl Schutzrechtsverwaltungs Gmbh Vorrichtung zur additiven Herstellung dreidimensionaler Objekte
JP6650141B1 (ja) * 2019-01-10 2020-02-19 株式会社ティー・オール 使用済み成膜用ターゲットの充填式再生方法
CA3130828A1 (en) * 2019-02-22 2020-08-27 Oerlikon Surface Solutions Ag, Pfaffikon Method for producing targets for physical vapor deposition (pvd)
CN110523987B (zh) * 2019-09-27 2021-02-05 华中科技大学 一种用于致密材料制备的激光烧结同步压制增材制造系统
CN111940745B (zh) * 2019-12-30 2024-01-19 宁夏东方钽业股份有限公司 大松装冶金级钽粉的制造方法
CN112522698B (zh) * 2020-11-26 2023-04-25 江苏科技大学 一种超声振动辅助激光熔覆钨钽铌合金装置及方法

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
SU1494559A1 (ru) * 1986-05-28 1996-03-10 Ярославское научно-производственное объединение ЭЛЕКТРОНПРИБОР" Способ изготовления мишени для распыления в вакууме
US5643472A (en) * 1988-07-08 1997-07-01 Cauldron Limited Partnership Selective removal of material by irradiation
WO1996036746A1 (fr) * 1995-05-18 1996-11-21 Asahi Glass Company Ltd. Procede de production d'une cible de pulverisation
DE19626732B4 (de) * 1996-07-03 2009-01-29 W.C. Heraeus Gmbh Vorrichtung und Verfahren zum Herstellen und Recyclen von Sputtertargets
US6348113B1 (en) * 1998-11-25 2002-02-19 Cabot Corporation High purity tantalum, products containing the same, and methods of making the same
DE19925330A1 (de) * 1999-06-02 2000-12-07 Leybold Materials Gmbh Verfahren zur Herstellung oder zum Recyceln von Sputtertargets

Also Published As

Publication number Publication date
CA2437713A1 (en) 2002-08-22
HUP0400730A2 (en) 2004-08-30
DE60211309D1 (de) 2006-06-14
EP1362132A2 (en) 2003-11-19
WO2002064287A2 (en) 2002-08-22
US20020112955A1 (en) 2002-08-22
NO20033567D0 (no) 2003-08-12
CZ20032186A3 (cs) 2004-02-18
DE60211309T2 (de) 2007-05-24
BG64959B1 (bg) 2006-10-31
MXPA03007293A (es) 2005-09-08
PT1362132E (pt) 2006-09-29
RU2304633C2 (ru) 2007-08-20
AU2002250075B2 (en) 2007-03-29
HK1062902A1 (en) 2004-12-03
BG108059A (en) 2005-04-30
ES2261656T3 (es) 2006-11-16
ATE325906T1 (de) 2006-06-15
CN1221684C (zh) 2005-10-05
WO2002064287A3 (en) 2002-10-10
EP1362132A4 (en) 2004-07-28
RU2003127947A (ru) 2005-04-10
IS6911A (is) 2003-08-13
EP1362132B1 (en) 2006-05-10
PL363521A1 (en) 2004-11-29
DK1362132T3 (da) 2006-09-11
CN1491294A (zh) 2004-04-21
NO20033567L (no) 2003-08-12
ZA200306259B (en) 2004-08-13
JP2004523653A (ja) 2004-08-05
NZ527503A (en) 2004-07-30
SK10062003A3 (sk) 2004-03-02

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Legal Events

Date Code Title Description
B08F Application dismissed because of non-payment of annual fees [chapter 8.6 patent gazette]

Free format text: REFERENTE A 7A E 8A ANUIDADES

B08K Patent lapsed as no evidence of payment of the annual fee has been furnished to inpi [chapter 8.11 patent gazette]

Free format text: REFERENTE AO DESPACHO 8.6 DA RPI 2055 DE 25/05/2010.