AU2005262191A1 - Gas bearing substrate-loading mechanism process - Google Patents
Gas bearing substrate-loading mechanism process Download PDFInfo
- Publication number
- AU2005262191A1 AU2005262191A1 AU2005262191A AU2005262191A AU2005262191A1 AU 2005262191 A1 AU2005262191 A1 AU 2005262191A1 AU 2005262191 A AU2005262191 A AU 2005262191A AU 2005262191 A AU2005262191 A AU 2005262191A AU 2005262191 A1 AU2005262191 A1 AU 2005262191A1
- Authority
- AU
- Australia
- Prior art keywords
- substrate
- levitation
- suction
- vacuum
- gas
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Abandoned
Links
- 238000000034 method Methods 0.000 title claims description 27
- 239000000758 substrate Substances 0.000 claims description 50
- 238000005339 levitation Methods 0.000 claims description 26
- 238000002347 injection Methods 0.000 claims description 21
- 239000007924 injection Substances 0.000 claims description 21
- 239000007789 gas Substances 0.000 description 20
- 239000011521 glass Substances 0.000 description 6
- 238000000151 deposition Methods 0.000 description 4
- 230000008021 deposition Effects 0.000 description 4
- 239000002245 particle Substances 0.000 description 4
- 238000000623 plasma-assisted chemical vapour deposition Methods 0.000 description 3
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- 238000005530 etching Methods 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- 239000000243 solution Substances 0.000 description 2
- 239000005328 architectural glass Substances 0.000 description 1
- 238000005229 chemical vapour deposition Methods 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 230000001419 dependent effect Effects 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 239000005357 flat glass Substances 0.000 description 1
- 230000005484 gravity Effects 0.000 description 1
- 239000011261 inert gas Substances 0.000 description 1
- 238000003754 machining Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 239000005304 optical glass Substances 0.000 description 1
- 229920000307 polymer substrate Polymers 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 238000001771 vacuum deposition Methods 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
- 235000012431 wafers Nutrition 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/6838—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping with gripping and holding devices using a vacuum; Bernoulli devices
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B65—CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
- B65G—TRANSPORT OR STORAGE DEVICES, e.g. CONVEYORS FOR LOADING OR TIPPING, SHOP CONVEYOR SYSTEMS OR PNEUMATIC TUBE CONVEYORS
- B65G49/00—Conveying systems characterised by their application for specified purposes not otherwise provided for
- B65G49/05—Conveying systems characterised by their application for specified purposes not otherwise provided for for fragile or damageable materials or articles
- B65G49/06—Conveying systems characterised by their application for specified purposes not otherwise provided for for fragile or damageable materials or articles for fragile sheets, e.g. glass
- B65G49/063—Transporting devices for sheet glass
- B65G49/064—Transporting devices for sheet glass in a horizontal position
- B65G49/065—Transporting devices for sheet glass in a horizontal position supported partially or completely on fluid cushions, e.g. a gas cushion
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B65—CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
- B65G—TRANSPORT OR STORAGE DEVICES, e.g. CONVEYORS FOR LOADING OR TIPPING, SHOP CONVEYOR SYSTEMS OR PNEUMATIC TUBE CONVEYORS
- B65G51/00—Conveying articles through pipes or tubes by fluid flow or pressure; Conveying articles over a flat surface, e.g. the base of a trough, by jets located in the surface
- B65G51/02—Directly conveying the articles, e.g. slips, sheets, stockings, containers or workpieces, by flowing gases
- B65G51/03—Directly conveying the articles, e.g. slips, sheets, stockings, containers or workpieces, by flowing gases over a flat surface or in troughs
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
- H01L21/67739—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations into and out of processing chamber
- H01L21/67748—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations into and out of processing chamber horizontal transfer of a single workpiece
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B65—CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
- B65G—TRANSPORT OR STORAGE DEVICES, e.g. CONVEYORS FOR LOADING OR TIPPING, SHOP CONVEYOR SYSTEMS OR PNEUMATIC TUBE CONVEYORS
- B65G2249/00—Aspects relating to conveying systems for the manufacture of fragile sheets
- B65G2249/02—Controlled or contamination-free environments or clean space conditions
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B65—CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
- B65G—TRANSPORT OR STORAGE DEVICES, e.g. CONVEYORS FOR LOADING OR TIPPING, SHOP CONVEYOR SYSTEMS OR PNEUMATIC TUBE CONVEYORS
- B65G2249/00—Aspects relating to conveying systems for the manufacture of fragile sheets
- B65G2249/04—Arrangements of vacuum systems or suction cups
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B65—CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
- B65G—TRANSPORT OR STORAGE DEVICES, e.g. CONVEYORS FOR LOADING OR TIPPING, SHOP CONVEYOR SYSTEMS OR PNEUMATIC TUBE CONVEYORS
- B65G2249/00—Aspects relating to conveying systems for the manufacture of fragile sheets
- B65G2249/04—Arrangements of vacuum systems or suction cups
- B65G2249/045—Details of suction cups suction cups
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Fluid Mechanics (AREA)
- Mechanical Engineering (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
- Magnetic Bearings And Hydrostatic Bearings (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US58664504P | 2004-07-09 | 2004-07-09 | |
| US60/586,645 | 2004-07-09 | ||
| PCT/CH2005/000392 WO2006005214A1 (en) | 2004-07-09 | 2005-07-07 | Gas bearing substrate-loading mechanism process |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| AU2005262191A1 true AU2005262191A1 (en) | 2006-01-19 |
Family
ID=34971820
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| AU2005262191A Abandoned AU2005262191A1 (en) | 2004-07-09 | 2005-07-07 | Gas bearing substrate-loading mechanism process |
Country Status (9)
| Country | Link |
|---|---|
| US (1) | US20070215437A1 (enExample) |
| EP (1) | EP1768921A1 (enExample) |
| JP (1) | JP2008505041A (enExample) |
| KR (1) | KR20070037741A (enExample) |
| CN (1) | CN101023011A (enExample) |
| AU (1) | AU2005262191A1 (enExample) |
| IL (1) | IL180080A0 (enExample) |
| TW (1) | TW200624357A (enExample) |
| WO (1) | WO2006005214A1 (enExample) |
Families Citing this family (34)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR100962810B1 (ko) | 2006-02-28 | 2010-06-10 | 파나소닉 주식회사 | 플라즈마 디스플레이 장치 |
| US20090291209A1 (en) | 2008-05-20 | 2009-11-26 | Asm International N.V. | Apparatus and method for high-throughput atomic layer deposition |
| US9238867B2 (en) * | 2008-05-20 | 2016-01-19 | Asm International N.V. | Apparatus and method for high-throughput atomic layer deposition |
| EP2281300A4 (en) * | 2008-05-30 | 2013-07-17 | Alta Devices Inc | METHOD AND DEVICE FOR A CHEMICAL STEAM SEPARATION REACTOR |
| KR100876337B1 (ko) * | 2008-06-25 | 2008-12-29 | 이재성 | 흡입력을 갖는 비접촉식 반송 플레이트 |
| JP5399153B2 (ja) * | 2008-12-12 | 2014-01-29 | 東京エレクトロン株式会社 | 真空処理装置、真空処理システムおよび処理方法 |
| JP2010143733A (ja) * | 2008-12-19 | 2010-07-01 | Sumitomo Heavy Ind Ltd | 基板ハンドリングシステム及び基板ハンドリング方法 |
| KR101142959B1 (ko) * | 2009-06-29 | 2012-05-08 | 김영태 | 평판 정밀 플로팅 시스템 |
| JP5536516B2 (ja) * | 2010-04-14 | 2014-07-02 | オイレス工業株式会社 | 非接触搬送装置 |
| JP5465595B2 (ja) * | 2010-05-10 | 2014-04-09 | オイレス工業株式会社 | 非接触搬送装置 |
| KR101293289B1 (ko) * | 2010-06-04 | 2013-08-09 | 김영태 | 비접촉식 이송장치 |
| CN102020115B (zh) * | 2010-11-26 | 2013-01-30 | 认知精密制造(苏州)有限公司 | 装载及移送lcd机架部件用空气上升型载体 |
| JP6039260B2 (ja) * | 2012-06-21 | 2016-12-07 | 川崎重工業株式会社 | 基板搬送システム |
| DE102012219332B4 (de) * | 2012-10-23 | 2014-11-13 | Mdi Schott Advanced Processing Gmbh | Vorrichtung und Verfahren zum Lagern und Fixieren einer Glasscheibe |
| KR101978147B1 (ko) | 2012-11-15 | 2019-05-15 | (주)아모레퍼시픽 | 복분자딸기의 향취를 재현한 향료 조성물 |
| KR101451506B1 (ko) * | 2013-04-17 | 2014-10-17 | 삼성전기주식회사 | 비접촉 기판이송 반전기 |
| JP2014133655A (ja) * | 2014-03-17 | 2014-07-24 | Oiles Ind Co Ltd | 非接触搬送装置 |
| JP2015218055A (ja) * | 2014-05-20 | 2015-12-07 | オイレス工業株式会社 | 搬送用レールおよび浮上搬送装置 |
| US9506147B2 (en) | 2015-02-13 | 2016-11-29 | Eastman Kodak Company | Atomic-layer deposition apparatus using compound gas jet |
| US9499906B2 (en) | 2015-02-13 | 2016-11-22 | Eastman Kodak Company | Coating substrate using bernoulli atomic-layer deposition |
| US9499908B2 (en) | 2015-02-13 | 2016-11-22 | Eastman Kodak Company | Atomic layer deposition apparatus |
| US9528184B2 (en) | 2015-02-13 | 2016-12-27 | Eastman Kodak Company | Atomic-layer deposition method using compound gas jet |
| KR102298805B1 (ko) | 2015-03-05 | 2021-09-08 | (주)아모레퍼시픽 | 은목서의 향취를 재현한 향료 조성물 |
| CN104659039B (zh) * | 2015-03-13 | 2017-10-27 | 京东方科技集团股份有限公司 | 承载基板、柔性显示装置制作方法 |
| KR102610348B1 (ko) | 2015-10-30 | 2023-12-06 | (주)아모레퍼시픽 | 함박꽃의 향취를 재현한 향료 조성물 |
| KR20170138834A (ko) * | 2016-06-08 | 2017-12-18 | 코닝 인코포레이티드 | 라미네이팅 장치 |
| CN109982950B (zh) * | 2016-09-13 | 2022-04-08 | 康宁股份有限公司 | 用于处理玻璃基材的设备和方法 |
| US9889995B1 (en) * | 2017-03-15 | 2018-02-13 | Core Flow Ltd. | Noncontact support platform with blockage detection |
| CN107655788B (zh) * | 2017-11-16 | 2019-10-01 | 合肥工业大学 | 一种用于测量玻璃基板气浮系统节流板节流参数的装置 |
| CN110498233B (zh) * | 2019-07-26 | 2021-04-27 | 江苏科技大学 | 二维无接触输送平台装置 |
| US11335585B2 (en) * | 2020-05-08 | 2022-05-17 | Taiwan Semiconductor Manufacturing Co., Ltd. | Vacuum wafer chuck for manufacturing semiconductor devices |
| KR102578464B1 (ko) * | 2020-06-10 | 2023-09-14 | 세메스 주식회사 | 기판 이송 모듈 및 이를 포함하는 다이 본딩 장치 |
| CN114538111B (zh) * | 2022-03-21 | 2024-03-08 | 江苏威尔赛科技有限公司 | 一种带自动消毒功能的垃圾被服回收系统 |
| CN119117690B (zh) * | 2024-11-12 | 2025-02-07 | 合肥浩普智能装备科技有限公司 | 一种气浮式倒包输送机 |
Family Cites Families (19)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US2080083A (en) * | 1934-06-08 | 1937-05-11 | Assurex Le Roi Des Verres De S | Manufacture of hardened or tempered glass plates |
| US2905768A (en) * | 1954-09-24 | 1959-09-22 | Ibm | Air head |
| NL137693C (enExample) * | 1964-03-25 | |||
| GB1137555A (en) * | 1965-10-22 | 1968-12-27 | Pilkington Brothers Ltd | Improvements in or relating to the transporting of sheet materials |
| US3455669A (en) * | 1966-05-09 | 1969-07-15 | Permaglass | Apparatus for heat treating glass on a fluid support |
| FR1527937A (fr) * | 1967-03-31 | 1968-06-07 | Saint Gobain | Dispositif de transport d'un matériau en forme de feuille sur un coussin gazeux |
| US3517958A (en) * | 1968-06-17 | 1970-06-30 | Ibm | Vacuum pick-up with air shield |
| US4014576A (en) * | 1975-06-19 | 1977-03-29 | International Business Machines Corporation | Article carrier |
| US4521268A (en) * | 1981-08-26 | 1985-06-04 | Edward Bok | Apparatus for deposition of fluid and gaseous media on substrates |
| US4773687A (en) * | 1987-05-22 | 1988-09-27 | American Telephone And Telegraph Company, At&T Technologies, Inc. | Wafer handler |
| JP2865690B2 (ja) * | 1989-02-17 | 1999-03-08 | 株式会社日立製作所 | 嵌合挿入装置 |
| JPH0818678B2 (ja) * | 1989-09-05 | 1996-02-28 | 日本板硝子株式会社 | エアベッド搬送装置 |
| JP3128709B2 (ja) * | 1992-08-04 | 2001-01-29 | 株式会社新川 | 非接触型移動テーブル |
| US5634636A (en) * | 1996-01-11 | 1997-06-03 | Xerox Corporation | Flexible object handling system using feedback controlled air jets |
| DE19649488A1 (de) * | 1996-11-29 | 1997-11-06 | Schott Glaswerke | Vorrichtung zur Handhabung von dünnen Glasscheiben |
| JP4354039B2 (ja) * | 1999-04-02 | 2009-10-28 | 東京エレクトロン株式会社 | 駆動装置 |
| US6491435B1 (en) * | 2000-07-24 | 2002-12-10 | Moore Epitaxial, Inc. | Linear robot |
| DE10148038A1 (de) * | 2001-09-28 | 2003-04-17 | Grenzebach Maschb Gmbh | Einrichtung zur Plattenübergabe von einem Plattenförderer auf ein Stapelgestell oder dergleichen |
| TWI222423B (en) * | 2001-12-27 | 2004-10-21 | Orbotech Ltd | System and methods for conveying and transporting levitated articles |
-
2005
- 2005-07-07 JP JP2007519595A patent/JP2008505041A/ja not_active Withdrawn
- 2005-07-07 WO PCT/CH2005/000392 patent/WO2006005214A1/en not_active Ceased
- 2005-07-07 KR KR1020077000087A patent/KR20070037741A/ko not_active Withdrawn
- 2005-07-07 US US11/571,604 patent/US20070215437A1/en not_active Abandoned
- 2005-07-07 EP EP05756159A patent/EP1768921A1/en not_active Withdrawn
- 2005-07-07 CN CNA2005800232489A patent/CN101023011A/zh active Pending
- 2005-07-07 AU AU2005262191A patent/AU2005262191A1/en not_active Abandoned
- 2005-07-08 TW TW094123153A patent/TW200624357A/zh unknown
-
2006
- 2006-12-14 IL IL180080A patent/IL180080A0/en unknown
Also Published As
| Publication number | Publication date |
|---|---|
| JP2008505041A (ja) | 2008-02-21 |
| WO2006005214A1 (en) | 2006-01-19 |
| EP1768921A1 (en) | 2007-04-04 |
| TW200624357A (en) | 2006-07-16 |
| IL180080A0 (en) | 2007-05-15 |
| US20070215437A1 (en) | 2007-09-20 |
| KR20070037741A (ko) | 2007-04-06 |
| CN101023011A (zh) | 2007-08-22 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US20070215437A1 (en) | Gas Bearing Substrate-Loading Mechanism Process | |
| KR100310249B1 (ko) | 기판처리장치 | |
| KR101284961B1 (ko) | 평판 기판용 처리 시스템 | |
| JP3139155B2 (ja) | 真空処理装置 | |
| US8367565B2 (en) | Methods and systems of transferring, docking and processing substrates | |
| US20090179366A1 (en) | Apparatus for supporting a substrate during semiconductor processing operations | |
| KR102033694B1 (ko) | 기판 처리 시스템 | |
| WO2003100848A1 (fr) | Dispositif et procede de traitement de substrats | |
| JP4275769B2 (ja) | 基体の移載装置 | |
| CN101567311B (zh) | 真空处理设备、真空处理方法、电子装置及其制造方法 | |
| CN201274284Y (zh) | 真空腔室和具有该真空腔室的基板传送系统 | |
| JP2006513117A (ja) | 真空チャンバ内で平らな基板を移送するための装置 | |
| JP2011086795A (ja) | 基板搬送装置及びこの基板搬送装置を備えた真空処理システム | |
| JP4383636B2 (ja) | 半導体製造装置および半導体装置の製造方法 | |
| KR20130087604A (ko) | 성막 장치 | |
| JP2000177842A (ja) | 搬送装置及び真空処理システム | |
| US6860711B2 (en) | Semiconductor-manufacturing device having buffer mechanism and method for buffering semiconductor wafers | |
| KR20190002415A (ko) | 기판을 프로세싱하기 위한 장치, 기판을 프로세싱하기 위한 프로세싱 시스템 및 기판을 프로세싱하기 위한 장치를 서비싱하기 위한 방법 | |
| KR101688842B1 (ko) | 기판 처리 장치 | |
| JP3666636B2 (ja) | 基板の処理装置 | |
| CN112204164B (zh) | 在真空系统中处理掩模的方法、和真空系统 | |
| JP5145209B2 (ja) | 真空処理装置 | |
| CN114258584B (zh) | 路径切换组件、具有该路径切换组件的腔室和基板处理系统及其方法 | |
| KR20230106546A (ko) | 기판이송장치 | |
| JP2004300464A (ja) | 成膜処理装置 |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| MK4 | Application lapsed section 142(2)(d) - no continuation fee paid for the application |