AU2002236801A1 - Reduced edge contact wafer handling system and method of retrofitting and using same - Google Patents

Reduced edge contact wafer handling system and method of retrofitting and using same

Info

Publication number
AU2002236801A1
AU2002236801A1 AU2002236801A AU3680102A AU2002236801A1 AU 2002236801 A1 AU2002236801 A1 AU 2002236801A1 AU 2002236801 A AU2002236801 A AU 2002236801A AU 3680102 A AU3680102 A AU 3680102A AU 2002236801 A1 AU2002236801 A1 AU 2002236801A1
Authority
AU
Australia
Prior art keywords
retrofitting
same
handling system
edge contact
wafer handling
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
AU2002236801A
Other languages
English (en)
Inventor
Stanislaw Kopacz
Michael James Lombardi
Glyn Reynolds
Todd Michael Visconti
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Tokyo Electron Ltd
Original Assignee
Tokyo Electron Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokyo Electron Ltd filed Critical Tokyo Electron Ltd
Publication of AU2002236801A1 publication Critical patent/AU2002236801A1/en
Abandoned legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
    • H01L21/687—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches
    • H01L21/68714—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support
    • H01L21/68728—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support characterised by a plurality of separate clamping members, e.g. clamping fingers
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
    • H01L21/687—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches
    • H01L21/68707—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a robot blade, or gripped by a gripper for conveyance
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S414/00—Material or article handling
    • Y10S414/135—Associated with semiconductor wafer handling
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S414/00—Material or article handling
    • Y10S414/135—Associated with semiconductor wafer handling
    • Y10S414/139—Associated with semiconductor wafer handling including wafer charging or discharging means for vacuum chamber
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S414/00—Material or article handling
    • Y10S414/135—Associated with semiconductor wafer handling
    • Y10S414/14—Wafer cassette transporting

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Robotics (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
AU2002236801A 2000-11-29 2001-11-20 Reduced edge contact wafer handling system and method of retrofitting and using same Abandoned AU2002236801A1 (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US09/725,823 2000-11-29
US09/725,823 US6692219B2 (en) 2000-11-29 2000-11-29 Reduced edge contact wafer handling system and method of retrofitting and using same
PCT/US2002/001545 WO2002045137A2 (en) 2000-11-29 2001-11-20 Reduced edge contact wafer handling system and method of retrofitting and using same

Publications (1)

Publication Number Publication Date
AU2002236801A1 true AU2002236801A1 (en) 2002-06-11

Family

ID=24916099

Family Applications (1)

Application Number Title Priority Date Filing Date
AU2002236801A Abandoned AU2002236801A1 (en) 2000-11-29 2001-11-20 Reduced edge contact wafer handling system and method of retrofitting and using same

Country Status (7)

Country Link
US (1) US6692219B2 (ja)
EP (1) EP1340246A2 (ja)
JP (1) JP4060185B2 (ja)
CN (1) CN1481577A (ja)
AU (1) AU2002236801A1 (ja)
TW (1) TW511136B (ja)
WO (1) WO2002045137A2 (ja)

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US7819079B2 (en) * 2004-12-22 2010-10-26 Applied Materials, Inc. Cartesian cluster tool configuration for lithography type processes
US7651306B2 (en) * 2004-12-22 2010-01-26 Applied Materials, Inc. Cartesian robot cluster tool architecture
US7798764B2 (en) 2005-12-22 2010-09-21 Applied Materials, Inc. Substrate processing sequence in a cartesian robot cluster tool
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US20070231108A1 (en) * 2006-04-04 2007-10-04 Applied Materials, Inc. Method and apparatus for transferring wafers
KR100809594B1 (ko) * 2006-09-12 2008-03-04 세메스 주식회사 척킹부재 및 이를 포함하는 스핀헤드
WO2008072694A1 (ja) * 2006-12-14 2008-06-19 Is Technology Japan, Inc. 円板保持装置および欠陥異物検出装置
US20080166210A1 (en) * 2007-01-05 2008-07-10 Applied Materials, Inc. Supinating cartesian robot blade
US7694688B2 (en) 2007-01-05 2010-04-13 Applied Materials, Inc. Wet clean system design
US8550441B2 (en) * 2007-04-23 2013-10-08 Ulvac, Inc. Supporting member and carrier, and method of supporting
JP5206528B2 (ja) * 2009-03-19 2013-06-12 トヨタ自動車株式会社 ワーク搬送用機器およびワーク搬送方法
US8698099B2 (en) * 2009-09-30 2014-04-15 Kyocera Corporation Attraction member, and attraction device and charged particle beam apparatus using the same
US9859141B2 (en) 2010-04-15 2018-01-02 Suss Microtec Lithography Gmbh Apparatus and method for aligning and centering wafers
US9837295B2 (en) 2010-04-15 2017-12-05 Suss Microtec Lithography Gmbh Apparatus and method for semiconductor wafer leveling, force balancing and contact sensing
JP5574177B2 (ja) * 2010-09-16 2014-08-20 株式会社ダイフク 搬送装置
TWI579939B (zh) * 2011-08-04 2017-04-21 政美應用股份有限公司 檢測及分類晶圓的裝置及方法
JP5877016B2 (ja) * 2011-08-26 2016-03-02 株式会社Ｓｃｒｅｅｎホールディングス 基板反転装置および基板処理装置
US8556566B1 (en) * 2011-09-30 2013-10-15 WD Media, LLC Disk stacking method and apparatus
US9136155B2 (en) * 2011-11-17 2015-09-15 Lam Research Ag Method and device for processing wafer shaped articles
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US9431282B2 (en) * 2011-12-27 2016-08-30 Rudolph Technologies, Inc. Wafer inversion mechanism
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CN105619406B (zh) * 2015-12-31 2017-10-17 北京七星华创电子股份有限公司 多指机械手片叉的校准方法
USD803283S1 (en) 2016-05-16 2017-11-21 Veeco Instruments Inc. Wafer handling assembly
TWI766105B (zh) 2017-09-28 2022-06-01 美商魯道夫科技股份有限公司 晶圓級封裝組裝體處置
KR102242812B1 (ko) 2018-05-17 2021-04-22 세메스 주식회사 반송 유닛 및 이를 갖는 기판 처리 장치
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TW202038370A (zh) * 2019-03-13 2020-10-16 以色列商核心流有限公司 圓形晶圓側向定位裝置
CN111392395A (zh) * 2020-03-30 2020-07-10 武汉华星光电半导体显示技术有限公司 上料装置
JP7005690B2 (ja) * 2020-06-17 2022-02-10 株式会社Kokusai Electric 基板処理装置、半導体装置の製造方法、およびプログラム
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Also Published As

Publication number Publication date
US6692219B2 (en) 2004-02-17
JP2004515073A (ja) 2004-05-20
JP4060185B2 (ja) 2008-03-12
TW511136B (en) 2002-11-21
CN1481577A (zh) 2004-03-10
WO2002045137A2 (en) 2002-06-06
WO2002045137A3 (en) 2003-03-20
US20020064450A1 (en) 2002-05-30
EP1340246A2 (en) 2003-09-03

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