AU2001228504A1 - Gas supply device for precursors with a low vapor pressure - Google Patents

Gas supply device for precursors with a low vapor pressure

Info

Publication number
AU2001228504A1
AU2001228504A1 AU2001228504A AU2850401A AU2001228504A1 AU 2001228504 A1 AU2001228504 A1 AU 2001228504A1 AU 2001228504 A AU2001228504 A AU 2001228504A AU 2850401 A AU2850401 A AU 2850401A AU 2001228504 A1 AU2001228504 A1 AU 2001228504A1
Authority
AU
Australia
Prior art keywords
precursor
gas
pressure
storage device
vapor pressure
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
AU2001228504A
Other languages
English (en)
Inventor
Lutz Klippe
Thomas Kupper
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Individual
Original Assignee
Individual
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Individual filed Critical Individual
Publication of AU2001228504A1 publication Critical patent/AU2001228504A1/en
Abandoned legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/448—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials

Landscapes

  • Chemical & Material Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Chemical Vapour Deposition (AREA)
  • Feeding, Discharge, Calcimining, Fusing, And Gas-Generation Devices (AREA)
AU2001228504A 2000-02-10 2001-01-27 Gas supply device for precursors with a low vapor pressure Abandoned AU2001228504A1 (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
DE10005820A DE10005820C1 (de) 2000-02-10 2000-02-10 Gasversorungsvorrichtung für Precursoren geringen Dampfdrucks
DE10005820 2000-02-10
PCT/EP2001/000888 WO2001059176A1 (de) 2000-02-10 2001-01-27 Gasversorgungsvorrichtung für precursoren geringen dampfdrucks

Publications (1)

Publication Number Publication Date
AU2001228504A1 true AU2001228504A1 (en) 2001-08-20

Family

ID=7630411

Family Applications (1)

Application Number Title Priority Date Filing Date
AU2001228504A Abandoned AU2001228504A1 (en) 2000-02-10 2001-01-27 Gas supply device for precursors with a low vapor pressure

Country Status (11)

Country Link
US (2) US20030145789A1 (de)
EP (1) EP1264002B1 (de)
JP (1) JP4772246B2 (de)
CN (1) CN1234908C (de)
AT (1) ATE291105T1 (de)
AU (1) AU2001228504A1 (de)
CA (1) CA2399477A1 (de)
DE (2) DE10005820C1 (de)
HK (1) HK1052031A1 (de)
TW (1) TW527435B (de)
WO (1) WO2001059176A1 (de)

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CN1234908C (zh) 2006-01-04
CN1418261A (zh) 2003-05-14
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US7413767B2 (en) 2008-08-19
US20030145789A1 (en) 2003-08-07
JP4772246B2 (ja) 2011-09-14
JP2003527481A (ja) 2003-09-16
TW527435B (en) 2003-04-11
WO2001059176A1 (de) 2001-08-16
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ATE291105T1 (de) 2005-04-15
EP1264002A1 (de) 2002-12-11

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