ATE552923T1 - Plasmabehandlungsreaktor - Google Patents

Plasmabehandlungsreaktor

Info

Publication number
ATE552923T1
ATE552923T1 AT07751025T AT07751025T ATE552923T1 AT E552923 T1 ATE552923 T1 AT E552923T1 AT 07751025 T AT07751025 T AT 07751025T AT 07751025 T AT07751025 T AT 07751025T AT E552923 T1 ATE552923 T1 AT E552923T1
Authority
AT
Austria
Prior art keywords
bottom electrode
outer bottom
electrode
inner bottom
assembly
Prior art date
Application number
AT07751025T
Other languages
English (en)
Inventor
Rajinder Dhindsa
Original Assignee
Lam Res Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Lam Res Corp filed Critical Lam Res Corp
Application granted granted Critical
Publication of ATE552923T1 publication Critical patent/ATE552923T1/de

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25F—PROCESSES FOR THE ELECTROLYTIC REMOVAL OF MATERIALS FROM OBJECTS; APPARATUS THEREFOR
    • C25F5/00—Electrolytic stripping of metallic layers or coatings
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32082—Radio frequency generated discharge
    • H01J37/321—Radio frequency generated discharge the radio frequency energy being inductively coupled to the plasma
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B6/00—Cleaning by electrostatic means
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25F—PROCESSES FOR THE ELECTROLYTIC REMOVAL OF MATERIALS FROM OBJECTS; APPARATUS THEREFOR
    • C25F1/00—Electrolytic cleaning, degreasing, pickling or descaling
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25F—PROCESSES FOR THE ELECTROLYTIC REMOVAL OF MATERIALS FROM OBJECTS; APPARATUS THEREFOR
    • C25F3/00—Electrolytic etching or polishing
    • C25F3/16—Polishing
    • C25F3/30—Polishing of semiconducting materials
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32082—Radio frequency generated discharge
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32082—Radio frequency generated discharge
    • H01J37/32091—Radio frequency generated discharge the radio frequency energy being capacitively coupled to the plasma
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32623—Mechanical discharge control means
    • H01J37/32642—Focus rings
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32798—Further details of plasma apparatus not provided for in groups H01J37/3244 - H01J37/32788; special provisions for cleaning or maintenance of the apparatus
    • H01J37/32853—Hygiene
    • H01J37/32862—In situ cleaning of vessels and/or internal parts

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Analytical Chemistry (AREA)
  • Metallurgy (AREA)
  • Electrochemistry (AREA)
  • Materials Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Organic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Drying Of Semiconductors (AREA)
  • Plasma Technology (AREA)
  • Cleaning In General (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
  • Chemical Vapour Deposition (AREA)
AT07751025T 2006-02-15 2007-02-15 Plasmabehandlungsreaktor ATE552923T1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US11/355,458 US8012306B2 (en) 2006-02-15 2006-02-15 Plasma processing reactor with multiple capacitive and inductive power sources
PCT/US2007/004235 WO2007095388A2 (en) 2006-02-15 2007-02-15 Plasma processing reactor with multiple capacitive and inductive power sources

Publications (1)

Publication Number Publication Date
ATE552923T1 true ATE552923T1 (de) 2012-04-15

Family

ID=38367027

Family Applications (1)

Application Number Title Priority Date Filing Date
AT07751025T ATE552923T1 (de) 2006-02-15 2007-02-15 Plasmabehandlungsreaktor

Country Status (10)

Country Link
US (3) US8012306B2 (de)
EP (1) EP1993745B1 (de)
JP (3) JP5336199B2 (de)
KR (2) KR101391006B1 (de)
CN (1) CN101557885B (de)
AT (1) ATE552923T1 (de)
MY (1) MY151896A (de)
SG (1) SG169982A1 (de)
TW (1) TWI354309B (de)
WO (1) WO2007095388A2 (de)

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Also Published As

Publication number Publication date
JP2013080956A (ja) 2013-05-02
KR20080094794A (ko) 2008-10-24
JP5518174B2 (ja) 2014-06-11
TW200811905A (en) 2008-03-01
CN101557885A (zh) 2009-10-14
KR101391006B1 (ko) 2014-04-30
WO2007095388A2 (en) 2007-08-23
JP2009527128A (ja) 2009-07-23
CN101557885B (zh) 2015-03-11
EP1993745B1 (de) 2012-04-11
US8337623B2 (en) 2012-12-25
US8906197B2 (en) 2014-12-09
JP5470421B2 (ja) 2014-04-16
WO2007095388A3 (en) 2007-12-13
US20120279659A1 (en) 2012-11-08
US8012306B2 (en) 2011-09-06
TWI354309B (en) 2011-12-11
KR20130124394A (ko) 2013-11-13
SG169982A1 (en) 2011-04-29
EP1993745A4 (de) 2010-03-17
US20070186855A1 (en) 2007-08-16
JP5336199B2 (ja) 2013-11-06
KR101455954B1 (ko) 2014-10-31
US20110277784A1 (en) 2011-11-17
MY151896A (en) 2014-07-14
JP2012212916A (ja) 2012-11-01
EP1993745A2 (de) 2008-11-26

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