DE3678612D1 - Plasmareaktor mit entnehmbarem einsatz. - Google Patents

Plasmareaktor mit entnehmbarem einsatz.

Info

Publication number
DE3678612D1
DE3678612D1 DE8686303785T DE3678612T DE3678612D1 DE 3678612 D1 DE3678612 D1 DE 3678612D1 DE 8686303785 T DE8686303785 T DE 8686303785T DE 3678612 T DE3678612 T DE 3678612T DE 3678612 D1 DE3678612 D1 DE 3678612D1
Authority
DE
Germany
Prior art keywords
plasma reactor
removable insert
removable
insert
reactor
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE8686303785T
Other languages
English (en)
Inventor
David John Drage
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
CollabRx Inc
Original Assignee
CollabRx Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by CollabRx Inc filed Critical CollabRx Inc
Application granted granted Critical
Publication of DE3678612D1 publication Critical patent/DE3678612D1/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67017—Apparatus for fluid treatment
    • H01L21/67063—Apparatus for fluid treatment for etching
    • H01L21/67069—Apparatus for fluid treatment for etching for drying etching

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Drying Of Semiconductors (AREA)
DE8686303785T 1985-05-20 1986-05-19 Plasmareaktor mit entnehmbarem einsatz. Expired - Fee Related DE3678612D1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US73603285A 1985-05-20 1985-05-20

Publications (1)

Publication Number Publication Date
DE3678612D1 true DE3678612D1 (de) 1991-05-16

Family

ID=24958220

Family Applications (1)

Application Number Title Priority Date Filing Date
DE8686303785T Expired - Fee Related DE3678612D1 (de) 1985-05-20 1986-05-19 Plasmareaktor mit entnehmbarem einsatz.

Country Status (4)

Country Link
EP (1) EP0202904B1 (de)
JP (1) JPH0817167B2 (de)
DE (1) DE3678612D1 (de)
HK (1) HK7495A (de)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2677043B1 (fr) * 1991-05-29 1993-12-24 Solems Procede, dispositif et appareil pour traiter un substrat par un plasma basse pression.
KR100297358B1 (ko) * 1991-07-23 2001-11-30 히가시 데쓰로 플라즈마에칭장치
US5511799A (en) * 1993-06-07 1996-04-30 Applied Materials, Inc. Sealing device useful in semiconductor processing apparatus for bridging materials having a thermal expansion differential
JP4102873B2 (ja) 2002-03-29 2008-06-18 東京エレクトロン株式会社 プラズマ処理装置用電極板及びプラズマ処理装置
US8012306B2 (en) * 2006-02-15 2011-09-06 Lam Research Corporation Plasma processing reactor with multiple capacitive and inductive power sources

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3214256A1 (de) * 1982-04-17 1983-10-20 Licentia Patent-Verwaltungs-Gmbh, 6000 Frankfurt Vorrichtung zur handhabung eines substrates
JPS59132623A (ja) * 1983-01-20 1984-07-30 Ulvac Corp ドライエツチング用電極
DE3480573D1 (en) * 1984-01-06 1989-12-28 Tegal Corp Single electrode, multiple frequency plasma apparatus

Also Published As

Publication number Publication date
HK7495A (en) 1995-01-27
EP0202904A3 (en) 1988-01-07
EP0202904A2 (de) 1986-11-26
EP0202904B1 (de) 1991-04-10
JPH0817167B2 (ja) 1996-02-21
JPS61267326A (ja) 1986-11-26

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee