ATE532390T1 - Verfahren zur erzeugung von extrem-ultraviolett- strahlung - Google Patents
Verfahren zur erzeugung von extrem-ultraviolett- strahlungInfo
- Publication number
- ATE532390T1 ATE532390T1 AT03712605T AT03712605T ATE532390T1 AT E532390 T1 ATE532390 T1 AT E532390T1 AT 03712605 T AT03712605 T AT 03712605T AT 03712605 T AT03712605 T AT 03712605T AT E532390 T1 ATE532390 T1 AT E532390T1
- Authority
- AT
- Austria
- Prior art keywords
- ultraviolet radiation
- extreme ultraviolet
- generating extreme
- basic material
- lithium
- Prior art date
Links
- 238000000034 method Methods 0.000 title abstract 2
- 230000005855 radiation Effects 0.000 title abstract 2
- WHXSMMKQMYFTQS-UHFFFAOYSA-N Lithium Chemical compound [Li] WHXSMMKQMYFTQS-UHFFFAOYSA-N 0.000 abstract 2
- 239000000460 chlorine Substances 0.000 abstract 2
- 229910052744 lithium Inorganic materials 0.000 abstract 2
- 239000000463 material Substances 0.000 abstract 2
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 abstract 1
- PXGOKWXKJXAPGV-UHFFFAOYSA-N Fluorine Chemical compound FF PXGOKWXKJXAPGV-UHFFFAOYSA-N 0.000 abstract 1
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 abstract 1
- 229910052782 aluminium Inorganic materials 0.000 abstract 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 abstract 1
- 229910052787 antimony Inorganic materials 0.000 abstract 1
- WATWJIUSRGPENY-UHFFFAOYSA-N antimony atom Chemical compound [Sb] WATWJIUSRGPENY-UHFFFAOYSA-N 0.000 abstract 1
- 229910052801 chlorine Inorganic materials 0.000 abstract 1
- 229910052731 fluorine Inorganic materials 0.000 abstract 1
- 239000011737 fluorine Substances 0.000 abstract 1
- 229910052736 halogen Inorganic materials 0.000 abstract 1
- 150000002367 halogens Chemical class 0.000 abstract 1
- 229910052738 indium Inorganic materials 0.000 abstract 1
- APFVFJFRJDLVQX-UHFFFAOYSA-N indium atom Chemical compound [In] APFVFJFRJDLVQX-UHFFFAOYSA-N 0.000 abstract 1
- 239000011261 inert gas Substances 0.000 abstract 1
- 229910052751 metal Inorganic materials 0.000 abstract 1
- 239000002184 metal Substances 0.000 abstract 1
- 150000002739 metals Chemical class 0.000 abstract 1
- 229910052714 tellurium Inorganic materials 0.000 abstract 1
- PORWMNRCUJJQNO-UHFFFAOYSA-N tellurium atom Chemical compound [Te] PORWMNRCUJJQNO-UHFFFAOYSA-N 0.000 abstract 1
Classifications
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05G—X-RAY TECHNIQUE
- H05G2/00—Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05G—X-RAY TECHNIQUE
- H05G2/00—Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma
- H05G2/001—Production of X-ray radiation generated from plasma
- H05G2/003—Production of X-ray radiation generated from plasma the plasma being generated from a material in a liquid or gas state
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J61/00—Gas-discharge or vapour-discharge lamps
- H01J61/02—Details
- H01J61/12—Selection of substances for gas fillings; Specified operating pressure or temperature
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J61/00—Gas-discharge or vapour-discharge lamps
- H01J61/02—Details
- H01J61/24—Means for obtaining or maintaining the desired pressure within the vessel
- H01J61/28—Means for producing, introducing, or replenishing gas or vapour during operation of the lamp
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05G—X-RAY TECHNIQUE
- H05G2/00—Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma
- H05G2/001—Production of X-ray radiation generated from plasma
- H05G2/003—Production of X-ray radiation generated from plasma the plasma being generated from a material in a liquid or gas state
- H05G2/005—Production of X-ray radiation generated from plasma the plasma being generated from a material in a liquid or gas state containing a metal as principal radiation generating component
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05G—X-RAY TECHNIQUE
- H05G2/00—Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma
- H05G2/001—Production of X-ray radiation generated from plasma
- H05G2/008—Production of X-ray radiation generated from plasma involving an energy-carrying beam in the process of plasma generation
Landscapes
- Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- General Physics & Mathematics (AREA)
- X-Ray Techniques (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
- Discharge Lamp (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE10219173A DE10219173A1 (de) | 2002-04-30 | 2002-04-30 | Verfahren zur Erzeugung von Extrem-Ultraviolett-Strahlung |
| PCT/IB2003/001611 WO2003094581A1 (en) | 2002-04-30 | 2003-04-22 | Method of generating extreme ultraviolet radiation |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| ATE532390T1 true ATE532390T1 (de) | 2011-11-15 |
Family
ID=29264908
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| AT03712605T ATE532390T1 (de) | 2002-04-30 | 2003-04-22 | Verfahren zur erzeugung von extrem-ultraviolett- strahlung |
Country Status (10)
| Country | Link |
|---|---|
| US (1) | US7385211B2 (de) |
| EP (1) | EP1502485B1 (de) |
| JP (1) | JP4657709B2 (de) |
| KR (1) | KR101068677B1 (de) |
| CN (1) | CN100342759C (de) |
| AT (1) | ATE532390T1 (de) |
| AU (1) | AU2003216694A1 (de) |
| DE (1) | DE10219173A1 (de) |
| TW (1) | TWI304306B (de) |
| WO (1) | WO2003094581A1 (de) |
Families Citing this family (25)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7465946B2 (en) * | 2004-03-10 | 2008-12-16 | Cymer, Inc. | Alternative fuels for EUV light source |
| TWI275325B (en) * | 2003-03-08 | 2007-03-01 | Cymer Inc | Discharge produced plasma EUV light source |
| JP4337648B2 (ja) * | 2004-06-24 | 2009-09-30 | 株式会社ニコン | Ｅｕｖ光源、ｅｕｖ露光装置、及び半導体デバイスの製造方法 |
| WO2006001459A1 (ja) | 2004-06-24 | 2006-01-05 | Nikon Corporation | Ｅｕｖ光源、ｅｕｖ露光装置、及び半導体デバイスの製造方法 |
| JP5503108B2 (ja) * | 2004-11-29 | 2014-05-28 | コーニンクレッカ フィリップス エヌ ヴェ | 約１ｎｍから約３０ｎｍの波長範囲の放射線を発生させる方法および機器、ならびにリソグラフィー装置 |
| DE102005007884A1 (de) | 2005-02-15 | 2006-08-24 | Xtreme Technologies Gmbh | Vorrichtung und Verfahren zur Erzeugung von extrem ultravioletter (EUV-) Strahlung |
| JP5176037B2 (ja) * | 2005-05-30 | 2013-04-03 | 国立大学法人大阪大学 | 極端紫外光源用ターゲット |
| US7141806B1 (en) * | 2005-06-27 | 2006-11-28 | Cymer, Inc. | EUV light source collector erosion mitigation |
| DE102005030304B4 (de) | 2005-06-27 | 2008-06-26 | Xtreme Technologies Gmbh | Vorrichtung und Verfahren zur Erzeugung von extrem ultravioletter Strahlung |
| DE102005041567B4 (de) * | 2005-08-30 | 2009-03-05 | Xtreme Technologies Gmbh | EUV-Strahlungsquelle mit hoher Strahlungsleistung auf Basis einer Gasentladung |
| JP5574705B2 (ja) * | 2006-05-16 | 2014-08-20 | コーニンクレッカ フィリップス エヌ ヴェ | Ｅｕｖランプおよび／または軟ｘ線ランプおよび対応する装置の変換効率を高める方法 |
| US7897948B2 (en) * | 2006-09-06 | 2011-03-01 | Koninklijke Philips Electronics N.V. | EUV plasma discharge lamp with conveyor belt electrodes |
| WO2008120171A2 (en) * | 2007-04-03 | 2008-10-09 | Koninklijke Philips Electronics N.V. | Discharge lamp comprising a low stability halogen donor material |
| US8493548B2 (en) * | 2007-08-06 | 2013-07-23 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
| US8519367B2 (en) * | 2008-07-07 | 2013-08-27 | Koninklijke Philips N.V. | Extreme UV radiation generating device comprising a corrosion-resistant material |
| EP2161725B1 (de) * | 2008-09-04 | 2015-07-08 | ASML Netherlands B.V. | Strahlungsquelle und entsprechendes Verfahren |
| DE102009020776B4 (de) | 2009-05-08 | 2011-07-28 | XTREME technologies GmbH, 37077 | Anordnung zur kontinuierlichen Erzeugung von flüssigem Zinn als Emittermaterial in EUV-Strahlungsquellen |
| CN102714911A (zh) * | 2010-01-07 | 2012-10-03 | Asml荷兰有限公司 | Euv辐射源和光刻设备 |
| KR102306612B1 (ko) | 2014-01-31 | 2021-09-29 | 램 리써치 코포레이션 | 진공-통합된 하드마스크 프로세스 및 장치 |
| GB201609447D0 (en) * | 2016-05-27 | 2016-07-13 | Hanovia Ltd | Mercury-free gas discharge lamp |
| US10796912B2 (en) | 2017-05-16 | 2020-10-06 | Lam Research Corporation | Eliminating yield impact of stochastics in lithography |
| WO2020102085A1 (en) | 2018-11-14 | 2020-05-22 | Lam Research Corporation | Methods for making hard masks useful in next-generation lithography |
| KR20210149893A (ko) | 2019-04-30 | 2021-12-09 | 램 리써치 코포레이션 | 극자외선 리소그래피 레지스트 개선을 위한 원자 층 에칭 및 선택적인 증착 프로세스 |
| SG11202108851RA (en) | 2020-01-15 | 2021-09-29 | Lam Res Corp | Underlayer for photoresist adhesion and dose reduction |
| WO2023135322A1 (en) * | 2022-01-17 | 2023-07-20 | Isteq B.V. | Target material, high-brightness euv source and method for generating euv radiation |
Family Cites Families (21)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6366836A (ja) * | 1986-09-06 | 1988-03-25 | Yoshiaki Arata | 大出力軟ｘ線連続発生方法 |
| JPH02230601A (ja) * | 1989-03-03 | 1990-09-13 | Toshiba Corp | 高効率真空紫外光源装置 |
| US5499282A (en) * | 1994-05-02 | 1996-03-12 | University Of Central Florida | Efficient narrow spectral width soft-X-ray discharge sources |
| US6031241A (en) | 1997-03-11 | 2000-02-29 | University Of Central Florida | Capillary discharge extreme ultraviolet lamp source for EUV microlithography and other related applications |
| US5963616A (en) * | 1997-03-11 | 1999-10-05 | University Of Central Florida | Configurations, materials and wavelengths for EUV lithium plasma discharge lamps |
| US6586757B2 (en) * | 1997-05-12 | 2003-07-01 | Cymer, Inc. | Plasma focus light source with active and buffer gas control |
| US6566668B2 (en) | 1997-05-12 | 2003-05-20 | Cymer, Inc. | Plasma focus light source with tandem ellipsoidal mirror units |
| US5763930A (en) * | 1997-05-12 | 1998-06-09 | Cymer, Inc. | Plasma focus high energy photon source |
| US6064072A (en) * | 1997-05-12 | 2000-05-16 | Cymer, Inc. | Plasma focus high energy photon source |
| US6180952B1 (en) * | 1998-04-03 | 2001-01-30 | Advanced Energy Systems, Inc. | Holder assembly system and method in an emitted energy system for photolithography |
| JP2000091096A (ja) * | 1998-09-14 | 2000-03-31 | Nikon Corp | Ｘ線発生装置 |
| DE19922566B4 (de) | 1998-12-16 | 2004-11-04 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Verfahren zur Erzeugung von Ultraviolettstrahlung |
| JP3317957B2 (ja) * | 1999-03-15 | 2002-08-26 | サイマー インコーポレイテッド | ブラストシールドを備えるプラズマフォーカス高エネルギフォトン源 |
| US6190835B1 (en) * | 1999-05-06 | 2001-02-20 | Advanced Energy Systems, Inc. | System and method for providing a lithographic light source for a semiconductor manufacturing process |
| FR2801113B1 (fr) * | 1999-11-15 | 2003-05-09 | Commissariat Energie Atomique | Procede d'obtention et source de rayonnement extreme ultra violet, application en lithographie |
| DE10056623B4 (de) * | 1999-11-19 | 2015-08-20 | Panalytical B.V. | Röntgenröhre mit einer Seltenerdanode |
| US7180081B2 (en) | 2000-06-09 | 2007-02-20 | Cymer, Inc. | Discharge produced plasma EUV light source |
| JP2002020745A (ja) * | 2000-07-13 | 2002-01-23 | Nec Kansai Ltd | 弗化物蛍光体及びこれを使用した蛍光ランプ |
| DE10205189B4 (de) * | 2002-02-06 | 2012-06-28 | Xtreme Technologies Gmbh | Verfahren zur Erzeugung von extrem ultravioletter Strahlung auf Basis eines strahlungsemittierenden Plasmas |
| DE10260458B3 (de) * | 2002-12-19 | 2004-07-22 | Xtreme Technologies Gmbh | Strahlungsquelle mit hoher durchschnittlicher EUV-Strahlungsleistung |
| WO2004062050A2 (en) * | 2003-01-02 | 2004-07-22 | Jmar Research Inc. | Method and apparatus for generating a membrane target for laser produced plasma |
-
2002
- 2002-04-30 DE DE10219173A patent/DE10219173A1/de not_active Withdrawn
-
2003
- 2003-04-22 WO PCT/IB2003/001611 patent/WO2003094581A1/en active Application Filing
- 2003-04-22 KR KR1020047017423A patent/KR101068677B1/ko active IP Right Grant
- 2003-04-22 JP JP2004502683A patent/JP4657709B2/ja not_active Expired - Lifetime
- 2003-04-22 EP EP03712605A patent/EP1502485B1/de not_active Expired - Lifetime
- 2003-04-22 AU AU2003216694A patent/AU2003216694A1/en not_active Abandoned
- 2003-04-22 AT AT03712605T patent/ATE532390T1/de active
- 2003-04-22 CN CNB038096706A patent/CN100342759C/zh not_active Expired - Lifetime
- 2003-04-22 US US10/512,616 patent/US7385211B2/en not_active Expired - Lifetime
- 2003-04-25 TW TW092109737A patent/TWI304306B/zh not_active IP Right Cessation
Also Published As
| Publication number | Publication date |
|---|---|
| AU2003216694A1 (en) | 2003-11-17 |
| WO2003094581A1 (en) | 2003-11-13 |
| KR20040101571A (ko) | 2004-12-02 |
| EP1502485A1 (de) | 2005-02-02 |
| TWI304306B (en) | 2008-12-11 |
| US20050167617A1 (en) | 2005-08-04 |
| TW200404483A (en) | 2004-03-16 |
| KR101068677B1 (ko) | 2011-09-28 |
| US7385211B2 (en) | 2008-06-10 |
| DE10219173A1 (de) | 2003-11-20 |
| EP1502485B1 (de) | 2011-11-02 |
| CN1650676A (zh) | 2005-08-03 |
| JP2005524943A (ja) | 2005-08-18 |
| JP4657709B2 (ja) | 2011-03-23 |
| CN100342759C (zh) | 2007-10-10 |
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