WO2004097520A3 - Fiber laser-based euv-lithography - Google Patents

Fiber laser-based euv-lithography Download PDF

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Publication number
WO2004097520A3
WO2004097520A3 PCT/US2004/012714 US2004012714W WO2004097520A3 WO 2004097520 A3 WO2004097520 A3 WO 2004097520A3 US 2004012714 W US2004012714 W US 2004012714W WO 2004097520 A3 WO2004097520 A3 WO 2004097520A3
Authority
WO
WIPO (PCT)
Prior art keywords
fiber laser
lithography
based euv
laser light
euv
Prior art date
Application number
PCT/US2004/012714
Other languages
French (fr)
Other versions
WO2004097520A2 (en
Inventor
Gerard A Mourou
Almantas Galvanauskas
Wolfgang Theobald
John Nees
Bixue Hou
Original Assignee
Univ Michigan
Gerard A Mourou
Almantas Galvanauskas
Wolfgang Theobald
John Nees
Bixue Hou
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Univ Michigan, Gerard A Mourou, Almantas Galvanauskas, Wolfgang Theobald, John Nees, Bixue Hou filed Critical Univ Michigan
Publication of WO2004097520A2 publication Critical patent/WO2004097520A2/en
Publication of WO2004097520A3 publication Critical patent/WO2004097520A3/en

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70008—Production of exposure light, i.e. light sources
    • G03F7/70033—Production of exposure light, i.e. light sources by plasma extreme ultraviolet [EUV] sources

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  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Nanotechnology (AREA)
  • Plasma & Fusion (AREA)
  • General Physics & Mathematics (AREA)
  • Mathematical Physics (AREA)
  • Theoretical Computer Science (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • X-Ray Techniques (AREA)

Abstract

A method and apparatus is disclosed for performing lithography operation. A fiber laser (18) is provided that generates laser light that is used by adaptive optics (20) to focus the laser light onto a plasma target (30) to generate plasma as a source of EUV radiation.
PCT/US2004/012714 2003-04-24 2004-04-26 Fiber laser-based euv-lithography WO2004097520A2 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US46506203P 2003-04-24 2003-04-24
US60/465,062 2003-04-24

Publications (2)

Publication Number Publication Date
WO2004097520A2 WO2004097520A2 (en) 2004-11-11
WO2004097520A3 true WO2004097520A3 (en) 2005-11-10

Family

ID=33418175

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/US2004/012714 WO2004097520A2 (en) 2003-04-24 2004-04-26 Fiber laser-based euv-lithography

Country Status (1)

Country Link
WO (1) WO2004097520A2 (en)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101748461B1 (en) 2010-02-09 2017-06-16 에너제틱 테크놀로지 아이엔씨. Laser-driven light source
IL234729B (en) 2013-09-20 2021-02-28 Asml Netherlands Bv Laser-operated light source and method including mode scrambler
IL234727B (en) 2013-09-20 2020-09-30 Asml Netherlands Bv Laser-operated light source in an optical system corrected for aberrations and method of designing the optical system
US10186416B2 (en) 2014-05-15 2019-01-22 Excelitas Technologies Corp. Apparatus and a method for operating a variable pressure sealed beam lamp
US9748086B2 (en) 2014-05-15 2017-08-29 Excelitas Technologies Corp. Laser driven sealed beam lamp
US9741553B2 (en) 2014-05-15 2017-08-22 Excelitas Technologies Corp. Elliptical and dual parabolic laser driven sealed beam lamps
US9576785B2 (en) 2015-05-14 2017-02-21 Excelitas Technologies Corp. Electrodeless single CW laser driven xenon lamp
US10008378B2 (en) 2015-05-14 2018-06-26 Excelitas Technologies Corp. Laser driven sealed beam lamp with improved stability
US10057973B2 (en) 2015-05-14 2018-08-21 Excelitas Technologies Corp. Electrodeless single low power CW laser driven plasma lamp
US10109473B1 (en) 2018-01-26 2018-10-23 Excelitas Technologies Corp. Mechanically sealed tube for laser sustained plasma lamp and production method for same

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6262826B1 (en) * 1998-02-20 2001-07-17 The Regents Of The University Of California Reflective optical imaging method and circuit
US20030147161A1 (en) * 2002-02-07 2003-08-07 Nikon Corporation Form-error-cancelling mirror-support devices and related methods, and microlithography systems comprising same
US20040057475A1 (en) * 2002-09-24 2004-03-25 Robert Frankel High-power pulsed laser device

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6262826B1 (en) * 1998-02-20 2001-07-17 The Regents Of The University Of California Reflective optical imaging method and circuit
US20030147161A1 (en) * 2002-02-07 2003-08-07 Nikon Corporation Form-error-cancelling mirror-support devices and related methods, and microlithography systems comprising same
US20040057475A1 (en) * 2002-09-24 2004-03-25 Robert Frankel High-power pulsed laser device

Also Published As

Publication number Publication date
WO2004097520A2 (en) 2004-11-11

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