ATE523476T1 - Ofen zum durchführen eines pcvd-verfahrens und das dazu gehörende verfahren - Google Patents

Ofen zum durchführen eines pcvd-verfahrens und das dazu gehörende verfahren

Info

Publication number
ATE523476T1
ATE523476T1 AT06076373T AT06076373T ATE523476T1 AT E523476 T1 ATE523476 T1 AT E523476T1 AT 06076373 T AT06076373 T AT 06076373T AT 06076373 T AT06076373 T AT 06076373T AT E523476 T1 ATE523476 T1 AT E523476T1
Authority
AT
Austria
Prior art keywords
applicator
pcvd
oven
wall
cylindrical axis
Prior art date
Application number
AT06076373T
Other languages
English (en)
Inventor
Rob Hubertus Matheus Decker
Stralen Mattheus Jacobus Nicolaas Van
Original Assignee
Draka Fibre Technology Bv
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Draka Fibre Technology Bv filed Critical Draka Fibre Technology Bv
Application granted granted Critical
Publication of ATE523476T1 publication Critical patent/ATE523476T1/de

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B37/00—Manufacture or treatment of flakes, fibres, or filaments from softened glass, minerals, or slags
    • C03B37/01—Manufacture of glass fibres or filaments
    • C03B37/012—Manufacture of preforms for drawing fibres or filaments
    • C03B37/014—Manufacture of preforms for drawing fibres or filaments made entirely or partially by chemical means, e.g. vapour phase deposition of bulk porous glass either by outside vapour deposition [OVD], or by outside vapour phase oxidation [OVPO] or by vapour axial deposition [VAD]
    • C03B37/018—Manufacture of preforms for drawing fibres or filaments made entirely or partially by chemical means, e.g. vapour phase deposition of bulk porous glass either by outside vapour deposition [OVD], or by outside vapour phase oxidation [OVPO] or by vapour axial deposition [VAD] by glass deposition on a glass substrate, e.g. by inside-, modified-, plasma-, or plasma modified- chemical vapour deposition [ICVD, MCVD, PCVD, PMCVD], i.e. by thin layer coating on the inside or outside of a glass tube or on a glass rod
    • C03B37/01807—Reactant delivery systems, e.g. reactant deposition burners
    • C03B37/01815—Reactant deposition burners or deposition heating means
    • C03B37/01823—Plasma deposition burners or heating means
    • C03B37/0183—Plasma deposition burners or heating means for plasma within a tube substrate
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P40/00—Technologies relating to the processing of minerals
    • Y02P40/50—Glass production, e.g. reusing waste heat during processing or shaping
    • Y02P40/57—Improving the yield, e-g- reduction of reject rates

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Materials Engineering (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Manufacturing & Machinery (AREA)
  • General Life Sciences & Earth Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Manufacture, Treatment Of Glass Fibers (AREA)
  • Chemical Vapour Deposition (AREA)
  • Plasma Technology (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
  • Surface Treatment Of Glass Fibres Or Filaments (AREA)
AT06076373T 2003-12-30 2004-12-24 Ofen zum durchführen eines pcvd-verfahrens und das dazu gehörende verfahren ATE523476T1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
NL1025155A NL1025155C2 (nl) 2003-12-30 2003-12-30 Inrichting voor het uitvoeren van PCVD, alsmede werkwijze voor het vervaardigen van een voorvorm.

Publications (1)

Publication Number Publication Date
ATE523476T1 true ATE523476T1 (de) 2011-09-15

Family

ID=34568035

Family Applications (2)

Application Number Title Priority Date Filing Date
AT04078524T ATE363459T1 (de) 2003-12-30 2004-12-24 Vorrichtung und verfahren zum herstellen einer vorform durch chemische abscheidung aus der dampfphase mittels plasma
AT06076373T ATE523476T1 (de) 2003-12-30 2004-12-24 Ofen zum durchführen eines pcvd-verfahrens und das dazu gehörende verfahren

Family Applications Before (1)

Application Number Title Priority Date Filing Date
AT04078524T ATE363459T1 (de) 2003-12-30 2004-12-24 Vorrichtung und verfahren zum herstellen einer vorform durch chemische abscheidung aus der dampfphase mittels plasma

Country Status (12)

Country Link
US (1) US7866188B2 (de)
EP (2) EP1712527B1 (de)
JP (1) JP4989027B2 (de)
KR (2) KR101159627B1 (de)
CN (2) CN1640832B (de)
AT (2) ATE363459T1 (de)
BR (1) BRPI0405970B1 (de)
DE (1) DE602004006706T9 (de)
DK (1) DK1712527T3 (de)
ES (1) ES2371176T3 (de)
NL (1) NL1025155C2 (de)
RU (1) RU2366758C2 (de)

Families Citing this family (29)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL1025155C2 (nl) 2003-12-30 2005-07-04 Draka Fibre Technology Bv Inrichting voor het uitvoeren van PCVD, alsmede werkwijze voor het vervaardigen van een voorvorm.
KR100682507B1 (ko) 2005-05-12 2007-02-15 주식회사 배운산업 무선주파수 플라즈마 반응기의 누설 소오스 전력 처리 장치
NL1032015C2 (nl) * 2006-06-16 2008-01-08 Draka Comteq Bv Inrichting voor het uitvoeren van een plasma chemische dampdepositie (PCVD) en werkwijze ter vervaardiging van een optische vezel.
JP5283835B2 (ja) * 2006-07-06 2013-09-04 東京エレクトロン株式会社 マイクロ波プラズマ処理装置及びマイクロ波プラズマ処理装置用ゲートバルブ
NL1032867C2 (nl) * 2006-11-14 2008-05-15 Draka Comteq Bv Inrichting en een werkwijze voor het uitvoeren van een depositieproces van het type PCVD.
NL1034059C2 (nl) * 2007-06-29 2008-12-30 Draka Comteq Bv Werkwijze voor het vervaardigen van een voorvorm voor optische vezels onder toepassing van een dampdepositieproces.
NL1037164C2 (nl) 2009-07-30 2011-02-02 Draka Comteq Bv Werkwijze voor het vervaardigen van een primaire voorvorm voor optische vezels.
NL1037163C2 (nl) 2009-07-30 2011-02-02 Draka Comteq Bv Werkwijze en inrichting voor het vervaardigen van een primaire voorvorm voor optische vezels.
NL2004544C2 (nl) 2010-04-13 2011-10-17 Draka Comteq Bv Inwendig dampdepositieproces.
NL2004546C2 (nl) 2010-04-13 2011-10-17 Draka Comteq Bv Inwendig dampdepositieproces.
NL2004874C2 (nl) 2010-06-11 2011-12-19 Draka Comteq Bv Werkwijze voor het vervaardigen van een primaire voorvorm.
CN102263000B (zh) * 2011-06-24 2013-05-15 长飞光纤光缆有限公司 一种等离子体微波谐振腔
DE102011083051A1 (de) * 2011-09-20 2013-03-21 Hauni Maschinenbau Ag Mikrowellenresonatorgehäuse
NL2007448C2 (nl) * 2011-09-20 2013-03-21 Draka Comteq Bv Werkwijze voor de vervaardiging van een primaire voorvorm voor optische vezels, primaire voorvorm, uiteindelijke voorvorm, optische vezels.
NL2007447C2 (nl) * 2011-09-20 2013-03-21 Draka Comteq Bv Werkwijze voor de vervaardiging van een primaire voorvorm voor optische vezels, primaire voorvorm, uiteindelijke voorvorm, optische vezel.
NL2007809C2 (en) * 2011-11-17 2013-05-21 Draka Comteq Bv An apparatus for performing a plasma chemical vapour deposition process.
NL2007831C2 (en) 2011-11-21 2013-05-23 Draka Comteq Bv Apparatus and method for carrying out a pcvd deposition process.
NL2007968C2 (en) * 2011-12-14 2013-06-17 Draka Comteq Bv An apparatus for performing a plasma chemical vapour deposition process.
CN102569967B (zh) * 2012-01-04 2015-02-11 西安电子科技大学 波导调配器中抑制电磁场泄露的方法
NL2011075C2 (en) * 2013-07-01 2015-01-05 Draka Comteq Bv Pcvd process with removal of substrate tube.
KR101677323B1 (ko) * 2014-05-09 2016-11-17 주식회사 동부하이텍 반도체 소자들을 패키징하는 방법 및 이를 수행하기 위한 장치
KR101666711B1 (ko) * 2014-05-09 2016-10-14 주식회사 동부하이텍 반도체 소자들을 패키징하는 방법 및 이를 수행하기 위한 장치
CN105244251B (zh) * 2015-11-03 2017-11-17 长飞光纤光缆股份有限公司 一种大功率等离子体微波谐振腔
NL2017575B1 (en) 2016-10-04 2018-04-13 Draka Comteq Bv A method and an apparatus for performing a plasma chemical vapour deposition process and a method
CN108298810A (zh) * 2018-03-14 2018-07-20 长飞光纤光缆股份有限公司 一种pcvd沉积装置
CN110551987A (zh) * 2018-06-04 2019-12-10 至玥腾风科技投资集团有限公司 环形单晶无机非金属部件的制作方法、设备及飞轮
CN110459853A (zh) * 2019-08-21 2019-11-15 上海至纯洁净系统科技股份有限公司 一种适用于pcvd工艺的分体式易调谐微波谐振腔
RU2732367C1 (ru) * 2020-06-08 2020-09-16 Автономная некоммерческая образовательная организация высшего образования "Сколковский институт науки и технологий" Способ снижения переходного контактного сопротивления в конструкциях передачи электрической энергии большой мощности
CN115124234A (zh) * 2022-05-27 2022-09-30 长飞光纤光缆股份有限公司 一种用于光纤预制件制备的pcvd沉积车床

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DE2929166A1 (de) 1979-07-19 1981-01-29 Philips Patentverwaltung Verfahren zur herstellung von lichtleitfasern
FR2584101B1 (fr) * 1985-06-26 1987-08-07 Comp Generale Electricite Dispositif pour fabriquer un composant optique a gradient d'indice de refraction
DE3632684A1 (de) 1986-09-26 1988-03-31 Philips Patentverwaltung Verfahren und vorrichtung zum innenbeschichten von rohren
NL8602910A (nl) * 1986-11-17 1988-06-16 Philips Nv Inrichting voor het aanbrengen van glaslagen op de binnenzijde van een buis.
US5130170A (en) * 1989-06-28 1992-07-14 Canon Kabushiki Kaisha Microwave pcvd method for continuously forming a large area functional deposited film using a curved moving substrate web with microwave energy with a directivity in one direction perpendicular to the direction of microwave propagation
EP0725164A3 (de) * 1992-01-30 1996-10-09 Hitachi Ltd Verfahren und Vorrichtung zur Plasmaerzeugung und Verfahren zur Bearbeitung eines Halbleiters
DE4203369C2 (de) * 1992-02-06 1994-08-11 Ceramoptec Gmbh Verfahren und Vorrichtung zur Herstellung von Vorformen für Lichtwellenleiter
DE19600223A1 (de) * 1996-01-05 1997-07-17 Ralf Dr Dipl Phys Spitzl Vorrichtung zur Erzeugung von Plasmen mittels Mikrowellen
JP3521681B2 (ja) * 1996-08-13 2004-04-19 住友電気工業株式会社 光ファイバ母材の製造方法
EP1060288B1 (de) 1997-12-31 2003-03-19 Draka Fibre Technology B.V. Pcvd-vorrichtung und verfahren zur herstellung einer optischen faser, eines vorform-stabes und eines mantelrohres und die damit hergestellte optische faser
US6408649B1 (en) * 2000-04-28 2002-06-25 Gyrotron Technology, Inc. Method for the rapid thermal treatment of glass and glass-like materials using microwave radiation
CN2504276Y (zh) * 2001-09-03 2002-08-07 浙江大学分析测试中心西溪校区分中心 一种电感耦合射频等离子体辅助钨丝加热制备薄膜的化学气相沉积装置
AU2002354375A1 (en) 2001-12-04 2003-06-17 Draka Fibre Technology B.V. Device for applying an electromagnetic microwave to a plasma container
US20030115909A1 (en) * 2001-12-21 2003-06-26 House Keith L. Plasma chemical vapor deposition methods and apparatus
NL1025155C2 (nl) 2003-12-30 2005-07-04 Draka Fibre Technology Bv Inrichting voor het uitvoeren van PCVD, alsmede werkwijze voor het vervaardigen van een voorvorm.

Also Published As

Publication number Publication date
JP2005247680A (ja) 2005-09-15
KR20050069919A (ko) 2005-07-05
EP1550640A1 (de) 2005-07-06
DE602004006706T2 (de) 2008-01-31
BRPI0405970A (pt) 2005-09-20
EP1712527A2 (de) 2006-10-18
KR20120008009A (ko) 2012-01-25
NL1025155C2 (nl) 2005-07-04
DE602004006706T9 (de) 2008-06-05
EP1712527A3 (de) 2008-04-30
EP1550640B1 (de) 2007-05-30
ES2371176T3 (es) 2011-12-28
DK1712527T3 (da) 2011-10-31
ATE363459T1 (de) 2007-06-15
RU2004138396A (ru) 2006-06-10
CN1640832A (zh) 2005-07-20
JP4989027B2 (ja) 2012-08-01
RU2366758C2 (ru) 2009-09-10
KR101125091B1 (ko) 2012-03-21
US7866188B2 (en) 2011-01-11
EP1712527B1 (de) 2011-09-07
BRPI0405970B1 (pt) 2014-11-18
CN1640832B (zh) 2012-01-04
CN102383108B (zh) 2014-01-01
CN102383108A (zh) 2012-03-21
DE602004006706D1 (de) 2007-07-12
KR101159627B1 (ko) 2012-06-27
US20050172902A1 (en) 2005-08-11

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